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    • 4. 发明授权
    • Inductively coupled plasma apparatus
    • 电感耦合等离子体装置
    • US08293069B2
    • 2012-10-23
    • US12331981
    • 2008-12-10
    • Geun-Young YeomKyong-Nam KimSeung-Jae Jung
    • Geun-Young YeomKyong-Nam KimSeung-Jae Jung
    • C23C16/00C23F1/00H01L21/306H05B31/26
    • H01J37/321
    • A inductively coupled plasma apparatus includes reaction chamber in which a substrate is loaded, and a double comb type antenna structure including first linear antennas and second linear antennas respectively arranged horizontally to pass through the reaction chamber inside the reaction chamber. The first and second linear antenna are alternately aligned each other. First ends the first linear antennas are protruded out of the reaction chamber and coupled to each other so as to be coupled to a first induced RF power, and first ends of the second linear antennas are protruded out of the reaction chamber in opposition to the first ends of the first linear antennas and coupled to each other so as to be coupled to a second induced RF power. Plasma uniformity is improved and superior plasma uniformity is maintained by adjusting a distance between antennas according to a size of the substrate.
    • 电感耦合等离子体装置包括其中装载有基板的反应室,以及包括分别水平布置以通过反应室内的反应室的第一线性天线和第二线性天线的双梳型天线结构。 第一和第二线性天线彼此交替地对准。 首先,第一线性天线从反应室突出并彼此耦合,以便耦合到第一感应RF功率,并且第二线性天线的第一端与第一线性天线相反地突出出反应室 第一线性天线的端部并且彼此耦合,以便耦合到第二感应RF功率。 等离子体均匀性得到改善,并且通过根据基板的尺寸调节天线之间的距离来维持优异的等离子体均匀性。