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1. 发明授权

US08541158B2 Positive resist compositions and patterning process 有权
标题翻译：正极抗蚀剂组成和图案化工艺
公开(公告)号：US08541158B2
公开(公告)日：2013-09-24
申请号：US13013143
申请日：2011-01-25
申请人： Wataru Kusaki , Takeshi Kinsho , Takeru Watanabe
发明人： Wataru Kusaki , Takeshi Kinsho , Takeru Watanabe
IPC分类号： G03F7/039 , G03F7/20 , G03F7/30 , G03F7/38
CPC分类号： G03F7/0397 , G03F7/2041
摘要： A positive resist composition is provided comprising an acid generator, a resin component which generates resin-solubilizing groups under the action of acid so that the resin component becomes soluble in an alkaline developer, at least some resin-solubilizing groups being carboxyl groups, and a compound for activating or condensing a carboxyl group. When processed by the lithography, the resist composition forms a resist pattern having a very high resolution and good mask fidelity.
摘要翻译：提供了一种正性抗蚀剂组合物，其包含酸产生剂，在酸的作用下产生树脂增溶基团的树脂组分，使得树脂组分变得可溶于碱性显影剂，至少一些树脂增溶基团为羧基，用于活化或缩合羧基的化合物。当通过光刻处理时，抗蚀剂组合物形成具有非常高的分辨率和良好的掩模保真度的抗蚀剂图案。

2. 发明授权

US08367311B2 Method for producing hollow structure 有权
标题翻译：中空结构的制造方法
公开(公告)号：US08367311B2
公开(公告)日：2013-02-05
申请号：US12909329
申请日：2010-10-21
申请人： Wataru Kusaki , Toshinobu Ishihara
发明人： Wataru Kusaki , Toshinobu Ishihara
IPC分类号： G03F7/26
CPC分类号： B32B38/10
摘要： Provided is a fabrication method with which a laminate having a hollow structure can be produced more easily, while enabling to produce a multilayer structure as well. That is, a method for producing a hollow structure, a fabrication method by stacking-up a structural material among fabrication methods of a hollow structure on a substrate, the method including; a step of forming a structural material layer on a substrate, a step of forming a pattern on the structural material layer, a step of forming a sacrificial material layer by burying between the patterns with a water-soluble or an alkaline-soluble polymer as the sacrificial material to be buried between the patterns, a step of further laminating a structural material layer and forming a pattern on the structural material layer laminated, and a step of finally removing the sacrificial material after all of lamination is completed.
摘要翻译：提供了一种能够更容易地制造具有中空结构的层叠体的制造方法，同时能够制造多层结构。即，一种中空结构的制造方法，在基板的中空结构的制造方法中堆叠结构材料的制造方法，其特征在于，包括：在基材上形成结构材料层的步骤，在结构材料层上形成图案的步骤，通过用水溶性或碱溶性聚合物将图案之间埋入形成牺牲材料层的步骤牺牲材料被埋在图案之间，进一步层压结构材料层并在层压的结构材料层上形成图案的步骤，以及完成所有层压之后最终去除牺牲材料的步骤。

3. 发明授权

US07629108B2 Nitrogen-containing organic compound, resist composition and patterning process 有权
标题翻译：含氮有机化合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07629108B2
公开(公告)日：2009-12-08
申请号：US11976426
申请日：2007-10-24
申请人： Takeru Watanabe , Youichi Ohsawa , Masaki Ohashi , Wataru Kusaki , Tomohiro Kobayashi
发明人： Takeru Watanabe , Youichi Ohsawa , Masaki Ohashi , Wataru Kusaki , Tomohiro Kobayashi
IPC分类号： G03F7/00 , G03F7/004
CPC分类号： G03F7/0392 , C07D233/60 , C07D235/06 , C07D295/088 , G03F7/0045 , G03F7/0382
摘要： A resist composition comprising as a quencher a nitrogen-containing organic compound bearing a nitrogen-containing heterocycle and having a molecular weight of at least 380 exhibits a high resolution and satisfactory mask coverage dependence and is useful in microfabrication using electron beam or deep-UV.
摘要翻译：包含作为猝灭剂的带有含氮杂环并且分子量至少为380的含氮有机化合物的抗蚀剂组合物显示出高分辨率和令人满意的掩模覆盖度依赖性，并且可用于使用电子束或深UV的微细加工。

4. 发明授权

US07537880B2 Polymer, resist composition, and patterning process 有权
标题翻译：聚合物，抗蚀剂组合物和图案化工艺
公开(公告)号：US07537880B2
公开(公告)日：2009-05-26
申请号：US11905763
申请日：2007-10-03
申请人： Yuji Harada , Jun Hatakeyama , Takao Yoshihara , Wataru Kusaki , Tomohiro Kobayashi , Koji Hasegawa
发明人： Yuji Harada , Jun Hatakeyama , Takao Yoshihara , Wataru Kusaki , Tomohiro Kobayashi , Koji Hasegawa
IPC分类号： G03F7/004 , G03F7/30 , C08F24/00
CPC分类号： G03F7/0397 , C08F24/00 , C08F220/32 , G03F7/0046 , G03F7/11 , G03F7/2041 , Y10S430/106 , Y10S430/108 , Y10S430/111
摘要： To a resist composition, an alkali-soluble polymer having fluorinated ester-containing lactone units incorporated therein is included as an additive. The resist composition forms a resist film having a reduced contact angle after development. The resist film prevents water penetration during immersion lithography.
摘要翻译：作为添加剂，作为抗蚀剂组合物，含有含有含氟酯的内酯单元的碱溶性聚合物。抗蚀剂组合物形成显影后具有降低的接触角的抗蚀剂膜。抗蚀剂膜防止浸渍光刻时的水渗透。

5. 发明授权

US09034661B2 Method for producing molecule immobilizing substrate, and molecule immobilizing substrate 有权
标题翻译：制备分子固定底物的方法和分子固定底物
公开(公告)号：US09034661B2
公开(公告)日：2015-05-19
申请号：US12709020
申请日：2010-02-19
申请人： Wataru Kusaki , Toshinobu Ishihara , Takeshi Kinsho , Takeru Watanabe
发明人： Wataru Kusaki , Toshinobu Ishihara , Takeshi Kinsho , Takeru Watanabe
IPC分类号： G01N33/544 , G01N33/543 , G01N33/53 , C08L83/04 , C08L83/06
CPC分类号： G01N33/54393 , C08L83/04 , C08L83/06 , G01N33/543 , G01N33/54353
摘要： There is disclosed a method for producing a molecule immobilizing substrate, comprising at least the steps of: forming, on a substrate, a monomolecular film including hydroxyl groups, cyano groups, or oxiranyl groups, which are oriented toward an outmost surface of the monomolecular film; and chemically modifying the hydroxyl groups, cyano groups, or oxiranyl groups of the monomolecular film to transform them into carboxyl groups, to thereby form, on the substrate, the monomolecular film including the carboxyl groups, which are oriented toward an outmost surface of the monomolecular film. There can be provided: a method for producing a molecule immobilizing substrate which is free of occurrence of an immobilized-molecule peeling problem in the case of conducting an assay by immobilizing molecules on the substrate.
摘要翻译：公开了一种分子固定基板的制造方法，至少包括以下步骤：在基板上形成包含羟基，氰基或环氧乙烷基的单分子膜，该单分子膜朝向单分子膜的最外表面 ; 并对单分子膜的羟基，氰基或环氧乙烷基进行化学改性，将其转化为羧基，从而在基材上形成包含羧基的单分子膜，该单分子膜朝向单分子膜的最外表面电影。可以提供：在通过将分子固定在基材上进行测定的情况下，制备不存在固定化分子剥离问题的分子固定化基质的方法。

6. 发明申请

US20110123935A1 METHOD FOR PRODUCING HOLLOW STRUCTURE 有权
标题翻译：生产中空结构的方法
公开(公告)号：US20110123935A1
公开(公告)日：2011-05-26
申请号：US12909329
申请日：2010-10-21
申请人： Wataru Kusaki , Toshinobu Ishihara
发明人： Wataru Kusaki , Toshinobu Ishihara
IPC分类号： G03F7/20 , B32B38/10
CPC分类号： B32B38/10
摘要： Provided is a fabrication method with which a laminate having a hollow structure can be produced more easily, while enabling to produce a multilayer structure as well. That is, a method for producing a hollow structure, a fabrication method by stacking-up a structural material among fabrication methods of a hollow structure on a substrate, the method including a step of forming a structural material layer on a substrate, a step of forming a pattern on the structural material layer, a step of forming a sacrificial material layer by burying between the patterns with a water-soluble or an alkaline-soluble polymer as the sacrificial material to be buried between the patterns, a step of further laminating a structural material layer and forming a pattern on the structural material layer laminated, and a step of finally removing the sacrificial material after all of lamination is completed.
摘要翻译：提供了一种能够更容易地制造具有中空结构的层叠体的制造方法，同时能够制造多层结构。也就是说，制造中空结构体的方法，在基材的中空结构体的制造方法中堆叠结构材料的制造方法，该方法包括在基板上形成结构材料层的工序，在结构材料层上形成图案，通过用水溶性或碱溶性聚合物之间掩埋图案形成牺牲材料层作为待掩埋在图案之间的牺牲材料的步骤，进一步层压结构材料层并在层压的结构材料层上形成图案，并且完成所有层压之后最后去除牺牲材料的步骤。

7. 发明申请

US20100233827A1 METHOD FOR PRODUCING MOLECULE IMMOBILIZING SUBSTRATE, AND MOLECULE IMMOBILIZING SUBSTRATE 有权
标题翻译：生产分子固定基质的方法和分子固定基质
公开(公告)号：US20100233827A1
公开(公告)日：2010-09-16
申请号：US12709020
申请日：2010-02-19
申请人： Wataru KUSAKI , Toshinobu ISHIHARA , Takeshi KINSHO , Takeru WATANABE
发明人： Wataru KUSAKI , Toshinobu ISHIHARA , Takeshi KINSHO , Takeru WATANABE
IPC分类号： G01N33/544 , B05D3/10
CPC分类号： G01N33/54393 , C08L83/04 , C08L83/06 , G01N33/543 , G01N33/54353
摘要： There is disclosed a method for producing a molecule immobilizing substrate, comprising at least the steps of: forming, on a substrate, a monomolecular film including hydroxyl groups, cyano groups, or oxiranyl groups, which are oriented toward an outmost surface of the monomolecular film; and chemically modifying the hydroxyl groups, cyano groups, or oxiranyl groups of the monomolecular film to transform them into carboxyl groups, to thereby form, on the substrate, the monomolecular film including the carboxyl groups, which are oriented toward an outmost surface of the monomolecular film. There can be provided: a method for producing a molecule immobilizing substrate which is free of occurrence of an immobilized-molecule peeling problem in the case of conducting an assay by immobilizing molecules on the substrate.
摘要翻译：公开了一种分子固定基板的制造方法，至少包括以下步骤：在基板上形成包含羟基，氰基或环氧乙烷基的单分子膜，该单分子膜朝向单分子膜的最外表面 ; 并对单分子膜的羟基，氰基或环氧乙烷基进行化学改性，将其转化为羧基，从而在基材上形成包含羧基的单分子膜，该单分子膜朝向单分子膜的最外表面电影。可以提供：在通过将分子固定在基材上进行测定的情况下，制备不存在固定化分子剥离问题的分子固定化基质的方法。

8. 发明授权

US07771914B2 Resist composition and patterning process 有权
标题翻译：抗蚀剂组成和图案化工艺
公开(公告)号：US07771914B2
公开(公告)日：2010-08-10
申请号：US11872952
申请日：2007-10-16
申请人： Jun Hatakeyama , Takao Yoshihara , Yuji Harada , Wataru Kusaki
发明人： Jun Hatakeyama , Takao Yoshihara , Yuji Harada , Wataru Kusaki
IPC分类号： G03F7/039 , G03F7/038 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0397 , C08F220/10 , G03F7/0046 , G03F7/0382 , G03F7/0392 , Y10S430/108 , Y10S430/111 , Y10S430/143
摘要： A resist composition comprises a polymer comprising recurring units having formula (1) wherein R1, R4, R7, and R14 are H or methyl, R2, R3, R15, and R16 are H, alkyl or fluoroalkyl, R is F or H, R5 is alkylene, R6 is fluorinated alkyl, R8 is a single bond or alkylene, R10 and R11 are H, F, methyl or trifluoromethyl, R12 and R13 are a single bond, —O— or —CR18R19—, R9, R18, and R19 are H, F, methyl or trifluoromethyl, R17 is alkylene, X1, X2 and X3 are —C(═O)—O—, —O—, or —C(═O)—R20—C(═O)—O— wherein R20 is alkylene, 0≦(a-1)
摘要翻译：抗蚀剂组合物包含含有式（1）的重复单元的聚合物，其中R 1，R 4，R 7和R 14为H或甲基，R 2，R 3，R 15和R 16为H，烷基或氟代烷基，R为F或H，R 5 是亚烷基，R6是氟化烷基，R8是单键或亚烷基，R10和R11是H，F，甲基或三氟甲基，R12和R13是单键，-O-或-CR18R19-，R9，R18和R19 是H，F，甲基或三氟甲基，R 17是亚烷基，X 1，X 2和X 3是-C（= O）-O-，-O-或-C（= O）-R 20 -C（= O）-O （a-1）+（a-2）+（a-1）+（a-2）+（a-2）（a-3）<1,0

9. 发明授权

US06440634B1 Onium salts, photoacid generators for resist compositions, resist compositions, and patterning process 有权
标题翻译：用于抗蚀剂组合物的鎓盐，光酸产生剂，抗蚀剂组合物和图案化方法
公开(公告)号：US06440634B1
公开(公告)日：2002-08-27
申请号：US09637363
申请日：2000-08-15
申请人： Youichi Ohsawa , Jun Watanabe , Wataru Kusaki , Satoshi Watanabe , Takeshi Nagata , Shigehiro Nagura
发明人： Youichi Ohsawa , Jun Watanabe , Wataru Kusaki , Satoshi Watanabe , Takeshi Nagata , Shigehiro Nagura
IPC分类号： G03F7004
CPC分类号： C07C309/73 , C07C309/71 , C07C381/12 , C07C2602/42 , G03F7/0045 , G03F7/039 , Y10S430/115 , Y10S430/122
摘要： Onium salts of the formula (1) are novel. R1 is C1-10 alkyl or C6-14 aryl, R2 is H or C1-6 alkyl, p is an integer of 1 to 5, q is an integer of 0 to 4, p+q=5, R3 is C1-10 alkyl or C6-14 aryl, M is a sulfur or iodine atom, and “a” is equal to 3 or 2. A chemical amplification type resist composition comprising the onium salt as a photoacid generator is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution, minimized line width variation or shape degradation even on long-term PED, minimized defect after coating, development and stripping, and improved pattern profile after development.
摘要翻译：式（1）的鎓盐是新的，R 1是C 1-10烷基或C 6-14芳基，R 2是H或C 1-6烷基，p是1至5的整数，q是0至4的整数， p + q = 5，R3是C1-10烷基或C6-14芳基，M是硫或碘原子，“a”等于3或2.包含鎓盐作为光酸的化学放大型抗蚀剂组合物发生器适用于微细加工，特别是通过深紫外光刻，因为许多优点，包括改进的分辨率，最小化线宽变化或形状退化，即使长期PED，最小化涂层后的缺陷，显影和剥离，以及改进的图案轮廓。

10. 发明申请

US20110183262A1 POSITIVE RESIST COMPOSITIONS AND PATTERNING PROCESS 有权
标题翻译：积极的组合物和绘图过程
公开(公告)号：US20110183262A1
公开(公告)日：2011-07-28
申请号：US13013143
申请日：2011-01-25
申请人： Wataru Kusaki , Takeshi Kinsho , Takeru Watanabe
发明人： Wataru Kusaki , Takeshi Kinsho , Takeru Watanabe
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0397 , G03F7/2041
摘要： A positive resist composition is provided comprising an acid generator, a resin component which generates resin-solubilizing groups under the action of acid so that the resin component becomes soluble in an alkaline developer, at least some resin-solubilizing groups being carboxyl groups, and a compound for activating or condensing a carboxyl group. When processed by the lithography, the resist composition forms a resist pattern having a very high resolution and good mask fidelity.
摘要翻译：提供了一种正性抗蚀剂组合物，其包含酸产生剂，在酸的作用下产生树脂增溶基团的树脂组分，使得树脂组分变得可溶于碱性显影剂，至少一些树脂增溶基团为羧基，用于活化或缩合羧基的化合物。当通过光刻处理时，抗蚀剂组合物形成具有非常高的分辨率和良好的掩模保真度的抗蚀剂图案。

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