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1. 发明申请

WO2011049994A2 CURRENT CONTROL IN PLASMA PROCESSING SYSTEMS 审中-公开
标题翻译：等离子体处理系统中的电流控制
公开(公告)号：WO2011049994A2
公开(公告)日：2011-04-28
申请号：PCT/US2010053264
申请日：2010-10-19
申请人： LAM RES CORP , LONG MAOLIN , JAFARIAN-TEHRANI SEYED JAFAR , SATO ARTHUR , BENJAMIN NEIL MARTIN PAUL , WILLIAMS NORMAN
发明人： LONG MAOLIN , JAFARIAN-TEHRANI SEYED JAFAR , SATO ARTHUR , BENJAMIN NEIL MARTIN PAUL , WILLIAMS NORMAN
IPC分类号： H05H1/46 , H01L21/3065 , H03H7/40
CPC分类号： H01J37/321 , H01J37/32174 , H01J37/32935
摘要： A plasma processing system for generating plasma to process at least a wafer. The plasma processing system includes a coil for conducting a current for sustaining at least a portion of the plasma. The plasma processing system also includes a sensor coupled with the coil for measuring a magnitude of a supplied current to provide a magnitude measurement without measuring any phase angle of the supplied current. The supplied current is the current or a total current that is used for providing a plurality of currents (e.g., including the current). The plasma processing system also includes a controller coupled with the sensor for generating a command using the magnitude measurement and/or information derived using the magnitude measurement, without using information related to phase angle measurement, and for providing the command for controlling the magnitude of the supplied current and/or a magnitude of the total current.
摘要翻译：一种用于产生等离子体以处理至少晶片的等离子体处理系统。等离子体处理系统包括用于传导电流以维持等离子体的至少一部分的线圈。等离子体处理系统还包括与线圈耦合的传感器，用于测量供电电流的大小以提供幅度测量，而不测量所提供的电流的任何相位角。所提供的电流是用于提供多个电流（例如，包括电流）的电流或总电流。等离子体处理系统还包括与传感器耦合的控制器，用于使用使用幅度测量导出的幅度测量和/或信息来生成指令，而不使用与相位角测量相关的信息，并且提供用于控制提供电流和/或总电流的大小。

2. 发明申请

WO2011008376A3 DETERMINING PLASMA PROCESSING SYSTEM READINESS WITHOUT GENERATING PLASMA 审中-公开
标题翻译：在不产生等离子体的情况下确定等离子体处理系统的准备情况
公开(公告)号：WO2011008376A3
公开(公告)日：2011-03-10
申请号：PCT/US2010037936
申请日：2010-06-09
申请人： LAM RES CORP , CHOI BRIAN , YUN GUNSU , VENUGOPAL VIJAYAKUMAR C , WILLIAMS NORMAN
发明人： CHOI BRIAN , YUN GUNSU , VENUGOPAL VIJAYAKUMAR C , WILLIAMS NORMAN
IPC分类号： H01L21/66 , H01L21/00 , H01L21/02
CPC分类号： H01J37/32935
摘要： A test system for facilitating determining whether a plasma processing system (which includes a plasma processing chamber) is ready for processing wafers. The test system may include a computer-readable medium storing at least a test program. The test program may include code for receiving electric parameter values derived from signals detected by at least one sensor when no plasma is present in the plasma processing chamber. The test program may also include code for generating electric model parameter values using the electric parameter values and a mathematical model. The test program may also include code for comparing the electric model parameter values with baseline model parameter value information. The test program may also include code for determining readiness of the plasma processing system based on the comparison. The test system may also include circuit hardware for performing one or more tasks associated with the test program.
摘要翻译：一种便于确定等离子体处理系统（包括等离子体处理室）是否准备好处理晶片的测试系统。测试系统可以包括存储至少一个测试程序的计算机可读介质。测试程序可以包括用于当在等离子体处理室中不存在等离子体时接收由至少一个传感器检测到的信号导出的电参数值的代码。测试程序还可以包括用于使用电参数值和数学模型来生成电模型参数值的代码。测试程序还可以包括用于将电模型参数值与基线模型参数值信息进行比较的代码。测试程序还可以包括用于基于比较确定等离子体处理系统的准备状态的代码。测试系统还可以包括用于执行与测试程序相关联的一个或多个任务的电路硬件。

3. 发明申请

WO2012032303A1 FORCEPS COMPRISING A TROCAR TIP 审中-公开
标题翻译：包含TROCAR提示的强力
公开(公告)号：WO2012032303A1
公开(公告)日：2012-03-15
申请号：PCT/GB2011/001327
申请日：2011-09-09
申请人： QUEEN MARY & WESTFIELD COLLEGE , FRANKENMAN INTERNATIONAL LIMITED , WILLIAMS, Norman Stanley , WENG, Zhiqiang
发明人： WILLIAMS, Norman Stanley , WENG, Zhiqiang
IPC分类号： A61B17/115 , A61B17/29 , A61B17/34 , A61B17/00
CPC分类号： A61B17/115 , A61B17/02 , A61B17/1155 , A61B17/29 , A61B17/3417 , A61B2017/00353 , A61B2017/2926
摘要： The present invention relates to a forceps comprising an elongate body, a grip region at end of the elongate body, the grip region comprising a lever, a grasping assembly at the opposite end of the elongate body, the grasping assembly comprising a moveable grasper and a trocar, and an actuating mechanism coupling the lever to the grasping assembly for effecting movement of the grasper relative to the elongate body. The present invention also relates to a kit of parts comprising a forceps of the invention and additional components. The invention further relates to a method of forming an anastomosis between two surfaces and a method of forming a stoma trephine in a subject using the kit of parts of the invention. The present invention also relates to the use of the forceps and the kit or parts of the invention in such methods.
摘要翻译：本发明涉及一种镊子，其包括细长主体，在细长主体的端部处的握持区域，手柄区域包括杠杆，在细长主体的相对端处的抓握组件，所述抓握组件包括可移动的抓紧器和套管针，以及将杠杆连接到把持组件的致动机构，用于实现抓紧器相对于细长主体的运动。本发明还涉及包括本发明的镊子和附加部件的部件套件。本发明还涉及在两个表面之间形成吻合的方法以及使用本发明的试剂盒在受试者中形成造口环蒂的方法。本发明还涉及在这些方法中使用镊子和本发明的试剂盒或部件。

4. 发明申请

WO2012032302A9 METHOD AND APPARATUS FOR FORMING STOMA TREPHINES AND ANASTOMOSES 审中-公开
公开(公告)号：WO2012032302A9
公开(公告)日：2012-03-15
申请号：PCT/GB2011/001326
申请日：2011-09-09
申请人： QUEEN MARY & WESTFILED COLLEGE, UNIVERSITY OF LONDON , FRANKENMAN INTERNATIONAL LIMITED , WILLIAMS, Norman Stanley , WENG, Zhiqiang
发明人： WILLIAMS, Norman Stanley , WENG, Zhiqiang
IPC分类号： A61B17/115 , A61B19/00 , A61B17/00 , A61B17/072
摘要： The present invention relates to a stapler apparatus, comprising a stapler having a proximal end, a distal end and a longitudinal axis, the stapler further comprising a trigger, an anvil docking pin aligned substantially parallel with the longitudinal axis of the stapler, and a stapling means, the anvil docking pin and stapling means being at the distal end of the stapler, and a detachable anvil, comprising an anvil head and an anvil shaft, wherein the anvil shaft is adapted to receive the anvil docking pin and operation of the trigger causes the stapling means to be actuated, characterised in that the length of the anvil shaft is at least 4 cm. The present invention also relates to a method of forming an anastomosis between two surfaces using the stapler apparatus of the invention and a method of forming a stoma trephine in a subject using the stapler apparatus of the invention. The present invention further relates to the use of the stapler apparatus or anvil for a stapler apparatus in such methods and a kit of parts comprising the stapler apparatus of the invention and additional components.

5. 发明申请

WO2011008376A2 DETERMINING PLASMA PROCESSING SYSTEM READINESS WITHOUT GENERATING PLASMA 审中-公开
标题翻译：确定等离子体处理系统无需生成等离子体
公开(公告)号：WO2011008376A2
公开(公告)日：2011-01-20
申请号：PCT/US2010/037936
申请日：2010-06-09
申请人： LAM RESEARCH CORPORATION , CHOI, Brian , YUN, Gunsu , VENUGOPAL, Vijayakumar C. , WILLIAMS, Norman
发明人： CHOI, Brian , YUN, Gunsu , VENUGOPAL, Vijayakumar C. , WILLIAMS, Norman
IPC分类号： H01L21/66 , H01L21/02 , H01L21/00
CPC分类号： H01J37/32935
摘要： A test system for facilitating determining whether a plasma processing system (which includes a plasma processing chamber) is ready for processing wafers. The test system may include a computer-readable medium storing at least a test program. The test program may include code for receiving electric parameter values derived from signals detected by at least one sensor when no plasma is present in the plasma processing chamber. The test program may also include code for generating electric model parameter values using the electric parameter values and a mathematical model. The test program may also include code for comparing the electric model parameter values with baseline model parameter value information. The test program may also include code for determining readiness of the plasma processing system based on the comparison. The test system may also include circuit hardware for performing one or more tasks associated with the test program.
摘要翻译：用于有助于确定等离子体处理系统（其包括等离子体处理室）是否准备好用于处理晶片的测试系统。测试系统可以包括至少存储测试程序的计算机可读介质。测试程序可以包括用于接收由等离子体处理室中没有等离子体时由至少一个传感器检测的信号导出的电参数值的代码。测试程序还可以包括使用电参数值和数学模型产生电模型参数值的代码。测试程序还可以包括用于将电模型参数值与基准模型参数值信息进行比较的代码。测试程序还可以包括用于基于比较来确定等离子体处理系统的准备状态的代码。测试系统还可以包括用于执行与测试程序相关联的一个或多个任务的电路硬件。

6. 发明申请

WO2005048301A3 METHODS AND APPARATUS FOR OPTIMIZING A SUBSTRATE IN A PLASMA PROCESSING SYSTEM 审中-公开
标题翻译：用于优化等离子体处理系统中的基板的方法和装置
公开(公告)号：WO2005048301A3
公开(公告)日：2006-02-02
申请号：PCT/US2004035980
申请日：2004-10-28
申请人： LAM RES CORP , PATRICK ROGER , RICHARDSON BRETT , WILLIAMS NORMAN
发明人： PATRICK ROGER , RICHARDSON BRETT , WILLIAMS NORMAN
IPC分类号： B23K9/02 , C23F1/00 , H01J7/24 , H01L20060101 , H01L21/306 , H05B31/26
CPC分类号： H01J37/3299 , H01J37/32082 , H01J37/321 , H01J37/32174 , H01J37/32183 , H01J37/32935 , H03H7/40
摘要： An arrangement for processing a semiconductor substrate in a plasma processing system is disclosed. The arrangement includes providing a RF coupling structure having a first terminal and a second terminal, the first terminal being coupled with a first electrical measuring device, the second terminal being coupled with a second electrical measuring device. The arrangement also includes coupling a compensating circuit to the second terminal. The arrangement further includes providing a feedback circuit coupled to receive information from the first electrical measuring device and the second electrical measuring device, an output of the feedback circuit being employed to control the compensating circuit in order to keep a ratio between a first electrical value at the first terminal and a second electrical value at the second terminal substantially at a predefined value.
摘要翻译：公开了一种在等离子体处理系统中处理半导体衬底的装置。该装置包括提供具有第一端子和第二端子的RF耦合结构，第一端子与第一电测量装置耦合，第二端子与第二电测量装置耦合。该布置还包括将补偿电路耦合到第二端子。该装置还包括提供耦合以从第一电测量装置和第二电测量装置接收信息的反馈电路，反馈电路的输出被用于控制补偿电路，以便保持第一电气值在第一端子和第二端子处的第二电气值基本上是预定义的值。

7. 发明申请

WO2005048301A2 METHODS AND APPARATUS FOR OPTIMIZING A SUBSTRATE IN A PLASMA PROCESSING SYSTEM 审中-公开
标题翻译：用于优化等离子体处理系统中的基板的方法和装置
公开(公告)号：WO2005048301A2
公开(公告)日：2005-05-26
申请号：PCT/US2004/035980
申请日：2004-10-28
申请人： LAM RESEARCH CORPORATION , PATRICK, Roger , RICHARDSON, Brett , WILLIAMS, Norman
发明人： PATRICK, Roger , RICHARDSON, Brett , WILLIAMS, Norman
IPC分类号： H01L
CPC分类号： H01J37/3299 , H01J37/32082 , H01J37/321 , H01J37/32174 , H01J37/32183 , H01J37/32935 , H03H7/40
摘要： An arrangement for processing a semiconductor substrate in a plasma processing system is disclosed. The arrangement includes providing a RF coupling structure having a first terminal and a second terminal, the first terminal being coupled with a first electrical measuring device, the second terminal being coupled with a second electrical measuring device. The arrangement also includes coupling a compensating circuit to the second terminal. The arrangement further includes providing a feedback circuit coupled to receive information from the first electrical measuring device and the second electrical measuring device, an output of the feedback circuit being employed to control the compensating circuit in order to keep a ratio between a first electrical value at the first terminal and a second electrical value at the second terminal substantially at a predefined value.
摘要翻译：公开了一种在等离子体处理系统中处理半导体衬底的装置。该装置包括提供具有第一端子和第二端子的RF耦合结构，第一端子与第一电测量装置耦合，第二端子与第二电测量装置耦合。该布置还包括将补偿电路耦合到第二端子。该装置还包括提供耦合以从第一电测量装置和第二电测量装置接收信息的反馈电路，反馈电路的输出被用于控制补偿电路，以便保持第一电气值在第一端子和第二端子处的第二电气值基本上是预定义的值。

8. 发明申请

WO2012032302A1 METHOD AND APPARATUS FOR FORMING STOMA TREPHINES AND ANASTOMOSES 审中-公开
标题翻译：用于形成STOMA TREPHINES和ANASTOMOSES的方法和装置
公开(公告)号：WO2012032302A1
公开(公告)日：2012-03-15
申请号：PCT/GB2011001326
申请日：2011-09-09
申请人： QUEEN MARY & WESTFILED COLLEGE , FRANKENMAN INTERNAT LTD , WILLIAMS NORMAN STANLEY , WENG ZHIQIANG
发明人： WILLIAMS NORMAN STANLEY , WENG ZHIQIANG
IPC分类号： A61B17/115 , A61B17/00 , A61B17/072 , A61B19/00
CPC分类号： A61B17/115 , A61B17/02 , A61B17/07292 , A61B17/1155 , A61B2017/0023 , A61B2017/00818 , A61B2017/0287 , A61B2017/1142 , A61B2090/0808 , A61B2090/0811
摘要： The present invention relates to a stapler apparatus, comprising a stapler having a proximal end, a distal end and a longitudinal axis, the stapler further comprising a trigger, an anvil docking pin aligned substantially parallel with the longitudinal axis of the stapler, and a stapling means, the anvil docking pin and stapling means being at the distal end of the stapler, and a detachable anvil, comprising an anvil head and an anvil shaft, wherein the anvil shaft is adapted to receive the anvil docking pin and operation of the trigger causes the stapling means to be actuated, characterised in that the length of the anvil shaft is at least 4 cm. The present invention also relates to a method of forming an anastomosis between two surfaces using the stapler apparatus of the invention and a method of forming a stoma trephine in a subject using the stapler apparatus of the invention. The present invention further relates to the use of the stapler apparatus or anvil for a stapler apparatus in such methods and a kit of parts comprising the stapler apparatus of the invention and additional components.
摘要翻译：本发明涉及一种吻合器装置，其包括具有近端，远端和纵向轴线的吻合器，所述吻合器还包括触发器，基本上与缝合器的纵向轴线平行排列的砧座对接针，以及缝合装置，砧座对接销和装订装置位于订书机的远端，以及可拆卸的砧座，其包括砧头和砧座轴，其中砧座轴适于接收砧对接销和触发器的操作所述装订装置被致动，其特征在于，所述砧座轴的长度至少为4cm。本发明还涉及使用本发明的吻合器装置在两个表面之间形成吻合的方法以及使用本发明的吻合器装置在受试者中形成造口环蒂的方法。本发明还涉及在这种方法中使用用于吻合器装置的吻合器装置或砧座，以及包括本发明的缝合器装置和附加部件的部件套件。

9. 发明申请

WO2011049994A3 CURRENT CONTROL IN PLASMA PROCESSING SYSTEMS 审中-公开
公开(公告)号：WO2011049994A3
公开(公告)日：2011-04-28
申请号：PCT/US2010/053264
申请日：2010-10-19
申请人： LAM RESEARCH CORPORATION , LONG, Maolin , JAFARIAN-TEHRANI, Seyed Jafar , SATO, Arthur , BENJAMIN, Neil Martin Paul , WILLIAMS, Norman
发明人： LONG, Maolin , JAFARIAN-TEHRANI, Seyed Jafar , SATO, Arthur , BENJAMIN, Neil Martin Paul , WILLIAMS, Norman
IPC分类号： H05H1/46 , H01L21/3065 , H03H7/40
摘要： A plasma processing system for generating plasma to process at least a wafer. The plasma processing system includes a coil for conducting a current for sustaining at least a portion of the plasma. The plasma processing system also includes a sensor coupled with the coil for measuring a magnitude of a supplied current to provide a magnitude measurement without measuring any phase angle of the supplied current. The supplied current is the current or a total current that is used for providing a plurality of currents (e.g., including the current). The plasma processing system also includes a controller coupled with the sensor for generating a command using the magnitude measurement and/or information derived using the magnitude measurement, without using information related to phase angle measurement, and for providing the command for controlling the magnitude of the supplied current and/or a magnitude of the total current.

10. 发明申请

WO1998011789A1 FLAVONOL CONTAINING FOOD SUPPLEMENTS 审中-公开
标题翻译：含有FLAVONOL的食品补充品
公开(公告)号：WO1998011789A1
公开(公告)日：1998-03-26
申请号：PCT/GB1997002537
申请日：1997-09-19
申请人： THE HOWARD FOUNDATION , HOWARD, Alan, Norman , NIGDIKAR, Shailja, Vijay , RAJPUT-WILLIAMS, Jayshri , WILLIAMS, Norman, Ross
发明人： THE HOWARD FOUNDATION
IPC分类号： A23L01/30
CPC分类号： A61K45/06 , A23L33/105 , A23L33/15 , A23V2002/00 , A61K36/87 , A23V2250/2132 , A23V2250/2116 , A23V2250/1886 , A23V2250/161 , A23V2250/51084 , A23V2250/61 , A23V2250/032 , A23V2250/1614 , A23V2250/2482 , A23V2250/154 , A23V2250/21 , A23V2250/712 , A23V2250/708 , A23V2250/1842 , A23V2250/30
摘要： Disclosed is a plant-derived flavonol-containing dry composition suitable for human consumption, wherein at least 25 % of the plant-derived material in the composition comprises polyphenols, together with uses thereof.
摘要翻译：公开了适用于人类消费的植物来源的含黄酮醇的干燥组合物，其中组合物中至少25％的植物来源的材料包括多酚及其用途。

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