专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

WO2010129229A3 ARRANGEMENTS FOR DETECTING DISCONTINUITY OF FLEXIBLE CONNECTIONS FOR CURRENT FLOW AND METHODS THEREOF 审中-公开
标题翻译：用于检测电流流动的柔性连接不连续的安排及其方法
公开(公告)号：WO2010129229A3
公开(公告)日：2011-02-03
申请号：PCT/US2010032413
申请日：2010-04-26
申请人： LAM RES CORP , JAFARIAN-TEHRANI SEYED JAFAR
发明人： JAFARIAN-TEHRANI SEYED JAFAR
IPC分类号： H05H1/34 , H05H1/36
CPC分类号： G01R31/026 , H01J37/32568 , H01J37/32577 , H01J37/32935
摘要： A detection circuit arrangement in a plasma processing chamber having movable lower electrode is provided. The arrangement includes flexible connector having a first flexible connector end, a second flexible connector end and at least a slit. At least portion of the slit is disposed in a direction parallel to a line drawn between two flexible connector ends. One end is coupled to the movable lower electrode and another end is coupled to a component of the plasma processing chamber. Flexible conductor provides low impedance current path between the movable lower electrode and the component of the plasma processing chamber. The arrangement also includes means for detecting current flow through connector material disposed on one side of the slit. The means for detecting includes at least a coil wound around the conductor material and a detector circuit coupled to the coil for detecting the current flow interruption due to a tear.
摘要翻译：提供具有可移动下电极的等离子体处理室中的检测电路装置。该装置包括具有第一柔性连接器端，第二柔性连接器端和至少狭缝的柔性连接器。狭缝的至少一部分设置在平行于两个柔性连接器端之间的线的方向上。一端连接到可移动的下电极，另一端与等离子体处理室的部件连接。柔性导体在可移动下电极和等离子体处理室的部件之间提供低阻抗电流路径。该装置还包括用于检测通过设置在狭缝一侧的连接器材料的电流的装置。用于检测的装置包括至少缠绕在导体材料上的线圈和耦合到线圈的检测器电路，用于检测由于撕裂引起的电流流动中断。

2. 发明申请

WO2004030016A3 METHOD FOR TOOLMATCHING AND TROUBLESHOOTING A PLASMA PROCESSING SYSTEM 审中-公开
标题翻译：一种等离子体处理系统的刀具切削和故障排除方法
公开(公告)号：WO2004030016A3
公开(公告)日：2004-07-29
申请号：PCT/US0330426
申请日：2003-09-26
申请人： LAM RES INC , AVOYAN ARMEN , JAFARIAN-TEHRANI SEYED JAFAR
发明人： AVOYAN ARMEN , JAFARIAN-TEHRANI SEYED JAFAR
IPC分类号： H01J37/32
CPC分类号： H01J37/32935 , H01J37/32082
摘要： A method tests a plasma processing system having a chamber, an RF power source, and a matching network. An RF power signal is generated from the RF power source to the chamber without igniting any plasma within the chamber. The voltage of the RF power signal, the current of the RF power signal, and the phase of the RF power signal, received by the chamber is measured while holding other parameters affecting the chamber constant. A value representative of an impedance of the chamber is computed based on the voltage, the current, and the phase. The value is then compared with a reference value to determine any defects in the plasma processing system. The reference value is representative of the impedance of a defect-free chamber.
摘要翻译：一种方法测试具有腔室，RF功率源和匹配网络的等离子体处理系统。射频功率信号从射频功率源产生到室而不点燃室内的任何等离子体。测量室接收的RF功率信号的电压，RF功率信号的电流和RF功率信号的相位，同时保持影响室的其他参数恒定。基于电压，电流和相位来计算代表室的阻抗的值。然后将该值与参考值进行比较以确定等离子体处理系统中的任何缺陷。参考值代表无缺陷腔室的阻抗。

3. 发明申请

WO2011049994A2 CURRENT CONTROL IN PLASMA PROCESSING SYSTEMS 审中-公开
标题翻译：等离子体处理系统中的电流控制
公开(公告)号：WO2011049994A2
公开(公告)日：2011-04-28
申请号：PCT/US2010053264
申请日：2010-10-19
申请人： LAM RES CORP , LONG MAOLIN , JAFARIAN-TEHRANI SEYED JAFAR , SATO ARTHUR , BENJAMIN NEIL MARTIN PAUL , WILLIAMS NORMAN
发明人： LONG MAOLIN , JAFARIAN-TEHRANI SEYED JAFAR , SATO ARTHUR , BENJAMIN NEIL MARTIN PAUL , WILLIAMS NORMAN
IPC分类号： H05H1/46 , H01L21/3065 , H03H7/40
CPC分类号： H01J37/321 , H01J37/32174 , H01J37/32935
摘要： A plasma processing system for generating plasma to process at least a wafer. The plasma processing system includes a coil for conducting a current for sustaining at least a portion of the plasma. The plasma processing system also includes a sensor coupled with the coil for measuring a magnitude of a supplied current to provide a magnitude measurement without measuring any phase angle of the supplied current. The supplied current is the current or a total current that is used for providing a plurality of currents (e.g., including the current). The plasma processing system also includes a controller coupled with the sensor for generating a command using the magnitude measurement and/or information derived using the magnitude measurement, without using information related to phase angle measurement, and for providing the command for controlling the magnitude of the supplied current and/or a magnitude of the total current.
摘要翻译：一种用于产生等离子体以处理至少晶片的等离子体处理系统。等离子体处理系统包括用于传导电流以维持等离子体的至少一部分的线圈。等离子体处理系统还包括与线圈耦合的传感器，用于测量供电电流的大小以提供幅度测量，而不测量所提供的电流的任何相位角。所提供的电流是用于提供多个电流（例如，包括电流）的电流或总电流。等离子体处理系统还包括与传感器耦合的控制器，用于使用使用幅度测量导出的幅度测量和/或信息来生成指令，而不使用与相位角测量相关的信息，并且提供用于控制提供电流和/或总电流的大小。

4. 发明申请

WO2010144555A2 ADJUSTING CURRENT RATIOS IN INDUCTIVELY COUPLED PLASMA PROCESSING SYSTEMS 审中-公开
标题翻译：在电感耦合等离子体处理系统中调整电流比
公开(公告)号：WO2010144555A2
公开(公告)日：2010-12-16
申请号：PCT/US2010037942
申请日：2010-06-09
申请人： LAM RES CORP , LONG MAOLIN , JAFARIAN-TEHRANI SEYED JAFAR
发明人： LONG MAOLIN , JAFARIAN-TEHRANI SEYED JAFAR
IPC分类号： H05H1/46 , H01L21/205 , H01L21/3065
CPC分类号： H01J37/32174 , H01J37/321 , H01J37/3211 , H01J37/32137 , H01J37/32183 , H05H1/46 , H05H2001/4652 , H05H2001/4667
摘要： A plasma processing system for generating plasma to process at least a wafer. The plasma processing system may include a first coil for conducting a first current for sustaining at least a first portion of the plasma. The plasma processing system may also include a second coil for conducting a second current for sustaining at least a second portion of the plasma. The plasma processing system may also include a power source for powering the first current and the second current. The plasma processing system may also include a parallel circuit for adjusting one of the amperage of the first current and the amperage of the second current. The parallel circuit may be electrically coupled between the power source and at least one of the first coil and the second coil. The parallel circuit may include an inductor and a variable capacitor electrically connected in parallel to each other.
摘要翻译：一种用于产生等离子体以处理至少晶片的等离子体处理系统。等离子体处理系统可以包括用于传导第一电流以维持等离子体的至少第一部分的第一线圈。等离子体处理系统还可以包括用于传导第二电流以维持等离子体的至少第二部分的第二线圈。等离子体处理系统还可以包括用于为第一电流和第二电流供电的电源。等离子体处理系统还可以包括并联电路，用于调节第一电流的电流强度和第二电流的电流强度之一。并联电路可以电耦合在电源和第一线圈和第二线圈中的至少一个之间。并联电路可以包括彼此并联电连接的电感器和可变电容器。

5. 发明申请

WO2009076568A2 PLASMA UNCONFINEMENT SENSOR AND METHODS THEREOF 审中-公开
标题翻译：等离子体不连续传感器及其方法
公开(公告)号：WO2009076568A2
公开(公告)日：2009-06-18
申请号：PCT/US2008086495
申请日：2008-12-12
申请人： LAM RES CORP , BOOTH JEAN-PAUL , MARAKHTANOV ALEXEI , DHINDSA RAJINDER , ALBAREDE LUC , JAFARIAN-TEHRANI SEYED JAFAR
发明人： BOOTH JEAN-PAUL , MARAKHTANOV ALEXEI , DHINDSA RAJINDER , ALBAREDE LUC , JAFARIAN-TEHRANI SEYED JAFAR
IPC分类号： B23K10/00
CPC分类号： H01J37/32935
摘要： An arrangement within a plasma reactor for detecting a plasma unconfinement event is provided. The arrangement includes a sensor, which is a capacitive-based sensor implemented within the plasma reactor. The sensor is implemented outside of a plasma confinement region and is configured to produce a transient current when the sensor is exposed to plasma associated with the plasma unconfinement event. The sensor has at least one electrically insulative layer oriented toward the plasma associated with the plasma unconfined event. The arrangement also includes a detection circuit, which is electrically connected to the sensor for converting the transient current into a transient voltage signal and for processing the transient voltage signal to ascertain whether the plasma unconfinement event exists.
摘要翻译：提供了用于检测等离子体无约束事件的等离子体反应器内的布置。该装置包括传感器，其是在等离子体反应器内实现的基于电容的传感器。传感器在等离子体限制区域外部实现，并且被配置为当传感器暴露于与等离子体无约束事件相关联的等离子体时产生瞬态电流。传感器具有至少一个朝向与等离子体无约束事件相关联的等离子体的电绝缘层。该装置还包括检测电路，其与传感器电连接，用于将瞬态电流转换成瞬态电压信号，并用于处理瞬态电压信号以确定是否存在等离子体无约束事件。

6. 发明申请

WO2004030016A2 METHOD FOR TOOLMATCHING AND TROUBLESHOOTING A PLASMA PROCESSING SYSTEM 审中-公开
标题翻译：一种等离子体加工系统的工具化和故障排除方法
公开(公告)号：WO2004030016A2
公开(公告)日：2004-04-08
申请号：PCT/US2003/030426
申请日：2003-09-26
申请人： LAM RESEARCH, INC. , AVOYAN, Armen , JAFARIAN-TEHRANI, Seyed, Jafar
发明人： AVOYAN, Armen , JAFARIAN-TEHRANI, Seyed, Jafar
IPC分类号： H01J37/00
CPC分类号： H01J37/32935 , H01J37/32082
摘要： A method tests a plasma processing system having a chamber, an RF power source, and a matching network. An RF power signal is generated from the RF power source to the chamber without igniting any plasma within the chamber. The voltage of the RF power signal, the current of the RF power signal, and the phase of the RF power signal, received by the chamber is measured while holding other parameters affecting the chamber constant. A value representative of an impedance of the chamber is computed based on the voltage, the current, and the phase. The value is then compared with a reference value to determine any defects in the plasma processing system. The reference value is representative of the impedance of a defect-free chamber.
摘要翻译：一种方法测试具有室，RF电源和匹配网络的等离子体处理系统。 RF功率信号从RF电源产生到室，而不点燃室内的任何等离子体。测量RF功率信号的电压，RF功率信号的电流以及由腔室接收的RF功率信号的相位，同时保持影响室的其它参数恒定。基于电压，电流和相位来计算代表室的阻抗的值。然后将该值与参考值进行比较，以确定等离子体处理系统中的任何缺陷。参考值代表无缺陷室的阻抗。

7. 发明申请

WO2010129229A2 ARRANGEMENTS FOR DETECTING DISCONTINUITY OF FLEXIBLE CONNECTIONS FOR CURRENT FLOW AND METHODS THEREOF 审中-公开
标题翻译：用于检测电流流动的柔性连接不连续的安排及其方法
公开(公告)号：WO2010129229A2
公开(公告)日：2010-11-11
申请号：PCT/US2010/032413
申请日：2010-04-26
申请人： LAM RESEARCH CORPORATION , JAFARIAN-TEHRANI, Seyed Jafar
发明人： JAFARIAN-TEHRANI, Seyed Jafar
IPC分类号： H05H1/34 , H05H1/36
CPC分类号： G01R31/026 , H01J37/32568 , H01J37/32577 , H01J37/32935
摘要： A detection circuit arrangement in a plasma processing chamber having movable lower electrode is provided. The arrangement includes flexible connector having a first flexible connector end, a second flexible connector end and at least a slit. At least portion of the slit is disposed in a direction parallel to a line drawn between two flexible connector ends. One end is coupled to the movable lower electrode and another end is coupled to a component of the plasma processing chamber. Flexible conductor provides low impedance current path between the movable lower electrode and the component of the plasma processing chamber. The arrangement also includes means for detecting current flow through connector material disposed on one side of the slit. The means for detecting includes at least a coil wound around the conductor material and a detector circuit coupled to the coil for detecting the current flow interruption due to a tear.
摘要翻译：提供具有可移动下电极的等离子体处理室中的检测电路装置。该装置包括具有第一柔性连接器端，第二柔性连接器端和至少狭缝的柔性连接器。狭缝的至少一部分设置在平行于两个柔性连接器端之间的线的方向上。一端连接到可移动的下电极，另一端与等离子体处理室的部件连接。柔性导体在可移动下电极和等离子体处理室的部件之间提供低阻抗电流路径。该装置还包括用于检测通过设置在狭缝一侧的连接器材料的电流的装置。用于检测的装置包括至少缠绕在导体材料上的线圈和耦合到线圈的检测器电路，用于检测由于撕裂引起的电流流动中断。

8. 发明申请

WO2009100343A3 SYSTEMS FOR DETECTING UNCONFINED-PLASMA EVENTS 审中-公开
标题翻译：用于检测不确定等离子体事件的系统
公开(公告)号：WO2009100343A3
公开(公告)日：2009-11-05
申请号：PCT/US2009033408
申请日：2009-02-06
申请人： LAM RES CORP , PEASE JOHN , JAFARIAN-TEHRANI SEYED JAFAR
发明人： PEASE JOHN , JAFARIAN-TEHRANI SEYED JAFAR
IPC分类号： H05H1/34 , H05H1/36
CPC分类号： C23F4/00 , H01J37/32935 , H05H1/0081
摘要： A system for detecting unconfined-plasma events in a plasma processing chamber is disclosed. The system may include a sensor disposed in the plasma processing chamber for providing a current when unconfined plasma is present in the plasma processing chamber. The system may also include a converter for converting the current into a voltage and a filter for removing noise from the voltage to provide a first signal. The system may also include a detector for determining presence of the unconfined plasma using an amplified level of the first signal and/or the first signal. The system may also include a conductor for coupling the sensor and the converter to conduct the current from the sensor to the converter. The system may also include a shield for enclosing at least a portion of the conductor to at least reduce electromagnetic noise received by the conductor.
摘要翻译：公开了一种用于检测等离子体处理室中的无约束等离子体事件的系统。该系统可以包括设置在等离子体处理室中的传感器，用于当等离子体处理室中存在无约束等离子体时提供电流。该系统还可以包括用于将电流转换成电压的转换器和用于从电压去除噪声以提供第一信号的滤波器。该系统还可以包括用于使用第一信号和/或第一信号的放大电平来确定无约束等离子体的存在的检测器。该系统还可以包括用于耦合传感器和转换器以将电流从传感器传导到转换器的导体。该系统还可以包括用于封闭导体的至少一部分以至少降低由导体接收的电磁噪声的屏蔽。

9. 发明申请

WO2008151051A1 PLASMA PROCESSING SYSTEM ESC HIGH VOLTAGE CONTROL 审中-公开
标题翻译：等离子处理系统ESC高压控制
公开(公告)号：WO2008151051A1
公开(公告)日：2008-12-11
申请号：PCT/US2008/065369
申请日：2008-05-30
申请人： LAM RESEARCH CORPORATION , JAFARIAN-TEHRANI, Seyed Jafar , LU, Ralph Jan-Pin
发明人： JAFARIAN-TEHRANI, Seyed Jafar , LU, Ralph Jan-Pin
IPC分类号： H01L21/3065
CPC分类号： H01L21/6831 , H01L21/67069 , Y10T29/49998 , Y10T279/23
摘要： A plasma processing system is disclosed. The plasma processing system may include an electrostatic chuck (ESC) positioned inside a plasma processing chamber and configured to support a wafer. The ESC may include a positive terminal (+ESC) for providing a first force to the wafer and a negative terminal (-ESC) for providing a second force to the wafer. The plasma processing system may also include a first trans-impedance amplifier (TIA) and a second TIA configured to measure a first set of voltages for calculating a value of a positive load current applied to the positive terminal. The plasma processing system may also include a third TIA and a fourth TIA configured to measure a second set of voltages for calculating a value of a negative load current applied to the negative terminal.
摘要翻译：公开了一种等离子体处理系统。等离子体处理系统可以包括位于等离子体处理室内部并被配置为支撑晶片的静电卡盘（ESC）。 ESC可以包括用于向晶片提供第一力的正极端子（+ ESC）和用于向晶片提供第二力的负极端子（-ESC）。等离子体处理系统还可以包括第一跨阻抗放大器（TIA）和第二TIA，其被配置为测量用于计算施加到正极端子的正负载电流的值的第一组电压。等离子体处理系统还可以包括第三TIA和第四TIA，其被配置为测量用于计算施加到负端子的负负载电流的值的第二组电压。

10. 发明申请

WO2005054880A1 METHOD FOR TOOLMATCHING AND TROUBLESHOOTING A PLASMA PROCESSING SYSTEM 审中-公开
标题翻译：一种等离子体加工系统的工具化和故障排除方法
公开(公告)号：WO2005054880A1
公开(公告)日：2005-06-16
申请号：PCT/US2004/037408
申请日：2004-11-09
申请人： LAM RESEARCH CORPORATION , JAFARIAN-TEHRANI, Seyed, Jafar , AVOYAN, Armen
发明人： JAFARIAN-TEHRANI, Seyed, Jafar , AVOYAN, Armen
IPC分类号： G01R27/26
CPC分类号： H01J37/32174 , H01J37/32082 , H01J37/32935
摘要： A plasma processing system having a grounded chamber and an RF power feed connected to a bottom electrode is tested. A first capacitance between the bottom electrode and the grounded chamber is measured at atmosphere. Consumable hardware parts are installed in the chamber. A second capacitance between the bottom electrode and the grounded chamber is measured at vacuum with the grounded chamber including all of the installed consumable hardware parts. The first capacitance measurement and the second capacitance measurement are respectively compared with a first reference value and a second reference value to identify and determine any defects in the plasma processing system. The first and second reference value respectively are representative of the capacitance of a defect-free chamber at atmosphere and the capacitance of a defect-free chamber including all of the installed consumable hardware parts at vacuum.
摘要翻译：测试具有接地室和连接到底部电极的RF功率馈送的等离子体处理系统。在大气中测量底部电极和接地室之间的第一电容。消耗品硬件部件安装在室内。在真空下测量底部电极和接地室之间的第二电容，接地室包括所有安装的可消耗的硬件部件。第一电容测量和第二电容测量分别与第一参考值和第二参考值进行比较，以识别和确定等离子体处理系统中的任何缺陷。第一和第二参考值分别代表大气中无缺陷室的电容和包括所有在真空下安装的消耗性硬件部件的无缺陷室的电容。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式