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1. 发明授权

US09053931B2 Nitride semiconductor wafer, nitride semiconductor device, and method for manufacturing nitride semiconductor wafer 有权
标题翻译：氮化物半导体晶片，氮化物半导体器件以及氮化物半导体晶片的制造方法
公开(公告)号：US09053931B2
公开(公告)日：2015-06-09
申请号：US13626265
申请日：2012-09-25
申请人： Hisashi Yoshida , Toshiki Hikosaka , Yoshiyuki Harada , Naoharu Sugiyama , Shinya Nunoue
发明人： Hisashi Yoshida , Toshiki Hikosaka , Yoshiyuki Harada , Naoharu Sugiyama , Shinya Nunoue
IPC分类号： H01L21/02 , H01L29/10 , H01L29/205 , H01L33/32 , H01L33/06
CPC分类号： H01L21/02381 , H01L21/02458 , H01L21/02505 , H01L21/0254 , H01L21/0262
摘要： According to one embodiment, a nitride semiconductor wafer includes: a silicon substrate; a buffer section provided on the silicon substrate; and a functional layer provided on the buffer section and contains nitride semiconductor. The buffer section includes first to n-th buffer layers (n being an integer of 4 or more) containing nitride semiconductor. An i-th buffer layer (i being an integer of 1 or more and less than n) of the first to n-th buffer layers has a lattice length Wi in a first direction parallel to a major surface of the first buffer layer. An (i+1)-th buffer layer provided on the i-th buffer layer has a lattice length W(i+1) in the first direction. In the first to n-th buffer layers the i-th buffer layer and the (i+1)-th buffer layer satisfy relation of (W(i+1)−Wi)/Wi≦0.008.
摘要翻译：根据一个实施例，氮化物半导体晶片包括：硅衬底; 设置在所述硅基板上的缓冲部; 以及设置在缓冲部上并包含氮化物半导体的功能层。缓冲部包括含有氮化物半导体的第一〜第n缓冲层（n为4以上的整数）。第一至第n缓冲层的第i个缓冲层（i为1以上且小于n的整数）在平行于第一缓冲层的主面的第一方向上具有晶格长度Wi。设置在第i个缓冲层上的第（i + 1）个缓冲层在第一方向上具有晶格长度W（i + 1）。在第一至第n缓冲层中，第i个缓冲层和第（i + 1）个缓冲层满足关系式（W（i + 1）-Wi）/ W i＆nlE; 0。008。

2. 发明授权

US08829544B2 Semiconductor light emitting device, nitride semiconductor layer, and method for forming nitride semiconductor layer 有权
标题翻译：半导体发光器件，氮化物半导体层和形成氮化物半导体层的方法
公开(公告)号：US08829544B2
公开(公告)日：2014-09-09
申请号：US13406770
申请日：2012-02-28
申请人： Toshiki Hikosaka , Yoshiyuki Harada , Maki Sugai , Shinya Nunoue
发明人： Toshiki Hikosaka , Yoshiyuki Harada , Maki Sugai , Shinya Nunoue
IPC分类号： H01L33/32 , H01L33/20 , H01L33/12
CPC分类号： H01L33/20 , H01L33/0075 , H01L33/12 , H01L33/32 , H01L33/48
摘要： According to an embodiment, a semiconductor light emitting device includes a foundation layer, a first semiconductor layer, a light emitting layer, and a second semiconductor layer. The foundation layer has an unevenness having recesses, side portions, and protrusions. A first major surface of the foundation layer has an overlay-region. The foundation layer has a plurality of dislocations including first dislocations whose one ends reaching the recess and second dislocations whose one ends reaching the protrusion. A proportion of a number of the second dislocations reaching the first major surface to a number of all of the second dislocations is smaller than a proportion of a number of the first dislocations reaching the first major surface to a number of all of the first dislocations. A number of the dislocations reaching the overlay-region of the first major surface is smaller than a number of all of the first dislocations.
摘要翻译：根据实施例，半导体发光器件包括基底层，第一半导体层，发光层和第二半导体层。基底层具有凹部，侧部和突起部的凹凸。基础层的第一主表面具有覆盖区域。基底层具有多个位错，其包括一端到达凹部的第一位错和一端到达突起的第二位错。到达第一主表面的第二位错的数量与所有第二位错的数量的比例小于到达第一主表面的第一位错的数量与所有第一位错的数量的比例。到达第一主表面的覆盖区域的多个位错小于所有第一位错的数量。

3. 发明申请

US20140061693A1 NITRIDE SEMICONDUCTOR WAFER, NITRIDE SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING NITRIDE SEMICONDUCTOR WAFER 有权
标题翻译：氮化物半导体器件，氮化物半导体器件和制造氮化物半导体器件的方法
公开(公告)号：US20140061693A1
公开(公告)日：2014-03-06
申请号：US13626265
申请日：2012-09-25
申请人： Hisashi YOSHIDA , Toshiki Hikosaka , Yoshiyuki Harada , Naoharu Sugiyama , Shinya Nunoue
发明人： Hisashi YOSHIDA , Toshiki Hikosaka , Yoshiyuki Harada , Naoharu Sugiyama , Shinya Nunoue
IPC分类号： H01L31/0304 , H01L21/20 , H01L29/205
CPC分类号： H01L21/02381 , H01L21/02458 , H01L21/02505 , H01L21/0254 , H01L21/0262
摘要： According to one embodiment, a nitride semiconductor wafer includes: a silicon substrate; a buffer section provided on the silicon substrate; and a functional layer provided on the buffer section and contains nitride semiconductor. The buffer section includes first to n-th buffer layers (n being an integer of 4 or more) containing nitride semiconductor. An i-th buffer layer (i being an integer of 1 or more and less than n) of the first to n-th buffer layers has a lattice length Wi in a first direction parallel to a major surface of the first buffer layer. An (i+1)-th buffer layer provided on the i-th buffer layer has a lattice length W(i+1) in the first direction. In the first to n-th buffer layers the i-th buffer layer and the (i+1)-th buffer layer satisfy relation of (W(i+1)−Wi)/Wi≦0.008.
摘要翻译：根据一个实施例，氮化物半导体晶片包括：硅衬底; 设置在所述硅基板上的缓冲部; 以及设置在缓冲部上并包含氮化物半导体的功能层。缓冲部包括含有氮化物半导体的第一〜第n缓冲层（n为4以上的整数）。第一至第n缓冲层的第i个缓冲层（i为1以上且小于n的整数）在平行于第一缓冲层的主面的第一方向上具有晶格长度Wi。设置在第i个缓冲层上的第（i + 1）个缓冲层在第一方向上具有晶格长度W（i + 1）。在第一至第n缓冲层中，第i个缓冲层和第（i + 1）个缓冲层满足关系式（W（i + 1）-Wi）/ Wi0.008。

4. 发明授权

US08564006B2 Nitride semiconductor device and nitride semiconductor layer growth substrate 有权
标题翻译：氮化物半导体器件和氮化物半导体层生长衬底
公开(公告)号：US08564006B2
公开(公告)日：2013-10-22
申请号：US13405985
申请日：2012-02-27
申请人： Koichi Tachibana , Hisashi Yoshida , Hiroshi Ono , Hajime Nago , Yoshiyuki Harada , Toshiki Hikosaka , Maki Sugai , Toshiyuki Oka , Shinya Nunoue
发明人： Koichi Tachibana , Hisashi Yoshida , Hiroshi Ono , Hajime Nago , Yoshiyuki Harada , Toshiki Hikosaka , Maki Sugai , Toshiyuki Oka , Shinya Nunoue
IPC分类号： H01L33/00
CPC分类号： H01L33/20 , H01L29/045 , H01L29/2003 , H01L33/16 , H01L33/32
摘要： According to one embodiment, a nitride semiconductor device includes a substrate and a semiconductor functional layer. The substrate is a single crystal. The semiconductor functional layer is provided on a major surface of the substrate and includes a nitride semiconductor. The substrate includes a plurality of structural bodies disposed in the major surface. Each of the plurality of structural bodies is a protrusion provided on the major surface or a recess provided on the major surface. An absolute value of an angle between a nearest direction of an arrangement of the plurality of structural bodies and a nearest direction of a crystal lattice of the substrate in a plane parallel to the major surface is not less than 1 degree and not more than 10 degrees.
摘要翻译：根据一个实施例，氮化物半导体器件包括衬底和半导体功能层。衬底是单晶。半导体功能层设置在基板的主表面上并且包括氮化物半导体。基板包括设置在主表面中的多个结构体。多个结构体中的每一个是设置在主表面上的突起或设置在主表面上的凹部。多个结构体的排列的最近方向与平行于主表面的平面中的基板的晶格的最近方向之间的角度的绝对值不小于1度且不大于10度。

5. 发明申请

US20130237036A1 METHOD FOR MANUFACTURING NITRIDE SEMICONDUCTOR LAYER 有权
标题翻译：制备氮化物半导体层的方法
公开(公告)号：US20130237036A1
公开(公告)日：2013-09-12
申请号：US13604183
申请日：2012-09-05
申请人： Toshiki HIKOSAKA , Yoshiyuki HARADA , Hisashi YOSHIDA , Naoharu SUGIYAMA , Shinya NUNOUE
发明人： Toshiki HIKOSAKA , Yoshiyuki HARADA , Hisashi YOSHIDA , Naoharu SUGIYAMA , Shinya NUNOUE
IPC分类号： H01L21/02
CPC分类号： H01L21/02389 , H01L21/02381 , H01L21/02458 , H01L21/0254 , H01L33/007 , H01L33/12
摘要： According to one embodiment, a method for manufacturing a nitride semiconductor layer is disclosed. The method can include forming a first lower layer on a major surface of a substrate and forming a first upper layer on the first lower layer. The first lower layer has a first lattice spacing along a first axis parallel to the major surface. The first upper layer has a second lattice spacing along the first axis larger than the first lattice spacing. At least a part of the first upper layer has compressive strain. A ratio of a difference between the first and second lattice spacing to the first lattice spacing is not less than 0.005 and not more than 0.019. A growth rate of the first upper layer in a direction parallel to the major surface is larger than that in a direction perpendicular to the major surface.
摘要翻译：根据一个实施例，公开了一种用于制造氮化物半导体层的方法。该方法可以包括在基底的主表面上形成第一下层，并在第一下层上形成第一上层。第一下层沿着平行于主表面的第一轴线具有第一格子间距。第一上层具有沿着第一轴线的第二格子间距大于第一格子间距。第一上层的至少一部分具有压缩应变。第一和第二格子间隔之间的差与第一格子间隔的比率不小于0.005且不大于0.019。第一上层在与主表面平行的方向上的生长速率大于垂直于主表面的方向的生长速率。

6. 发明授权

US08525203B2 Semiconductor light emitting device 有权
标题翻译：半导体发光器件
公开(公告)号：US08525203B2
公开(公告)日：2013-09-03
申请号：US12874510
申请日：2010-09-02
申请人： Koichi Tachibana , Hajime Nago , Toshiki Hikosaka , Shigeya Kimura , Shinya Nunoue
发明人： Koichi Tachibana , Hajime Nago , Toshiki Hikosaka , Shigeya Kimura , Shinya Nunoue
IPC分类号： H01L33/00
CPC分类号： H01L33/145 , B82Y20/00 , H01L33/06 , H01L33/32 , H01S5/34333
摘要： According to one embodiment, a semiconductor light emitting device includes an n-type semiconductor layer, a p-type semiconductor layer, a light emitting portion, a first layer, a second layer, and an intermediate layer. The semiconductor layers include nitride semiconductor. The light emitting portion is provided between the n-type semiconductor layer and the p-type semiconductor layer and includes a quantum well layer. The first layer is provided between the light emitting portion and the p-type semiconductor layer and includes AlX1Ga1-x1N having first Al composition ratio x1. The second layer is provided between the first layer and the p-type semiconductor layer and includes Alx2Ga1-x2N having second Al composition ratio x2 higher than the first Al composition ratio x1. The intermediate layer is provided between the first layer and the light emitting portion and has a thickness not smaller than 3 nanometers and not larger than 8 nanometers and includes Inz1Ga1-z1N (0≦z1
摘要翻译：根据一个实施例，半导体发光器件包括n型半导体层，p型半导体层，发光部分，第一层，第二层和中间层。半导体层包括氮化物半导体。发光部分设置在n型半导体层和p型半导体层之间，并且包括量子阱层。第一层设置在发光部和p型半导体层之间，并且包括具有第一Al组成比x1的AlX1Ga1-x1N。第二层设置在第一层和p型半导体层之间，并且包括具有比第一Al组成比x1高的第二Al组成比x2的Al x2 Ga1-x2N。中间层设置在第一层和发光部之间，并且具有不小于3纳米且不大于8纳米的厚度，并且包括Inz1Ga1-z1N（0 @ z1 <1）。

7. 发明授权

US08461611B2 Semiconductor light emitting device and method for manufacturing the same 有权
标题翻译：半导体发光器件及其制造方法
公开(公告)号：US08461611B2
公开(公告)日：2013-06-11
申请号：US13208658
申请日：2011-08-12
申请人： Hiroshi Ono , Toshiki Hikosaka , Tomoko Morioka , Toshiyuki Oka , Shinya Nunoue
发明人： Hiroshi Ono , Toshiki Hikosaka , Tomoko Morioka , Toshiyuki Oka , Shinya Nunoue
IPC分类号： H01L33/22
CPC分类号： H01L33/22 , H01L21/0243 , H01L21/02458 , H01L21/0254 , H01L33/007 , H01L33/06 , H01L33/20
摘要： According to one embodiment, a semiconductor light emitting device includes a first semiconductor layer, a second semiconductor layer and a light emitting part. The first semiconductor layer includes an n-type semiconductor layer. The second semiconductor layer includes a p-type semiconductor layer. The light emitting part is provided between the first semiconductor layer and the second semiconductor layer, and includes a plurality of barrier layers and a well layer provided between the plurality of barrier layers. The first semiconductor layer has a first irregularity and a second irregularity. The first irregularity is provided on a first major surface of the first semiconductor layer on an opposite side to the light emitting part. The second irregularity is provided on a bottom face and a top face of the first irregularity, and has a level difference smaller than a level difference between the bottom face and the top face.
摘要翻译：根据一个实施例，半导体发光器件包括第一半导体层，第二半导体层和发光部分。第一半导体层包括n型半导体层。第二半导体层包括p型半导体层。发光部分设置在第一半导体层和第二半导体层之间，并且包括多个势垒层和设置在多个势垒层之间的阱层。第一半导体层具有第一不规则性和第二不规则性。第一不规则性设置在第一半导体层的与发光部相反的一侧的第一主表面上。第二不规则性设置在第一凹凸的底面和顶面上，并且具有小于底面与顶面之间的水平差的水平差。

8. 发明申请

US20120298952A1 SEMICONDUCTOR LIGHT EMITTING DEVICE, NITRIDE SEMICONDUCTOR LAYER, AND METHOD FOR FORMING NITRIDE SEMICONDUCTOR LAYER 有权
标题翻译：半导体发光器件，氮化物半导体层和形成氮化物半导体层的方法
公开(公告)号：US20120298952A1
公开(公告)日：2012-11-29
申请号：US13406770
申请日：2012-02-28
申请人： Toshiki HIKOSAKA , Yoshiyuki HARADA , Maki SUGAI , Shinya NUNOUE
发明人： Toshiki HIKOSAKA , Yoshiyuki HARADA , Maki SUGAI , Shinya NUNOUE
IPC分类号： H01L33/06 , H01L21/20 , H01L29/38
CPC分类号： H01L33/20 , H01L33/0075 , H01L33/12 , H01L33/32 , H01L33/48
摘要： According to an embodiment, a semiconductor light emitting device includes a foundation layer, a first semiconductor layer, a light emitting layer, and a second semiconductor layer. The foundation layer has an unevenness having recesses, side portions, and protrusions. A first major surface of the foundation layer has an overlay-region. The foundation layer has a plurality of dislocations including first dislocations whose one ends reaching the recess and second dislocations whose one ends reaching the protrusion. A proportion of a number of the second dislocations reaching the first major surface to a number of all of the second dislocations is smaller than a proportion of a number of the first dislocations reaching the first major surface to a number of all of the first dislocations. A number of the dislocations reaching the overlay-region of the first major surface is smaller than a number of all of the first dislocations.
摘要翻译：根据实施例，半导体发光器件包括基底层，第一半导体层，发光层和第二半导体层。基底层具有凹部，侧部和突起部的凹凸。基础层的第一主表面具有覆盖区域。基底层具有多个位错，其包括一端到达凹部的第一位错和一端到达突起的第二位错。到达第一主表面的第二位错的数量与所有第二位错的数量的比例小于到达第一主表面的第一位错的数量与所有第一位错的数量的比例。到达第一主表面的覆盖区域的多个位错小于所有第一位错的数量。

9. 发明申请

US20120295377A1 METHOD FOR MANUFACTURING NITRIDE SEMICONDUCTOR DEVICE 有权
标题翻译：制造氮化物半导体器件的方法
公开(公告)号：US20120295377A1
公开(公告)日：2012-11-22
申请号：US13222238
申请日：2011-08-31
申请人： Taisuke SATO , Naoharu SUGIYAMA , Tomonari SHIODA , Toshiki HIKOSAKA , Shinya NUNOUE
发明人： Taisuke SATO , Naoharu SUGIYAMA , Tomonari SHIODA , Toshiki HIKOSAKA , Shinya NUNOUE
IPC分类号： H01L33/60
CPC分类号： H01L33/0079 , H01L33/22
摘要： According to one embodiment, a method is disclosed for manufacturing a nitride semiconductor device. The method can include removing a growth substrate from a structure body by using a first treatment material. The structure body has the growth substrate, a buffer layer formed on the growth substrate, and the nitride semiconductor layer formed on the buffer layer. A support substrate is bonded to the nitride semiconductor layer. The method can include reducing thicknesses of the buffer layer and the nitride semiconductor layer by using a second treatment material different from the first treatment material after removing the growth substrate.
摘要翻译：根据一个实施例，公开了一种用于制造氮化物半导体器件的方法。该方法可以包括通过使用第一处理材料从结构体移除生长衬底。结构体具有生长衬底，形成在生长衬底上的缓冲层和形成在缓冲层上的氮化物半导体层。支撑基板结合到氮化物半导体层。该方法可以包括在除去生长衬底之后使用与第一处理材料不同的第二处理材料来减小缓冲层和氮化物半导体层的厚度。

10. 发明授权

US08310145B2 Light emitting device including first and second red phosphors and a green phosphor 有权
标题翻译：包括第一和第二红色荧光体和绿色荧光体的发光器件
公开(公告)号：US08310145B2
公开(公告)日：2012-11-13
申请号：US13034120
申请日：2011-02-24
申请人： Iwao Mitsuishi , Shinya Nunoue , Takahiro Sato , Yumi Fukuda , Aoi Okada , Naotoshi Matsuda , Toshiki Hikosaka
发明人： Iwao Mitsuishi , Shinya Nunoue , Takahiro Sato , Yumi Fukuda , Aoi Okada , Naotoshi Matsuda , Toshiki Hikosaka
IPC分类号： H01J1/62 , H01L33/50
CPC分类号： C09K11/7734 , C09K11/0883 , H01L33/502 , H01L33/504 , H01L33/505 , H01L2224/45144 , H01L2224/48091 , H01L2924/00014 , H01L2924/00
摘要： A light emitting device according to one embodiment includes a light emitting element that emits light having a wavelength of 380 nm to 470 nm; a CASN first red phosphor that is disposed on the light emitting element; a sialon second red phosphor that is disposed on the light emitting element; and a sialon green phosphor that is disposed on the light emitting element.
摘要翻译：根据一个实施例的发光器件包括发射波长为380nm至470nm的光的发光元件; 设置在发光元件上的CASN第一红色荧光体; 设置在发光元件上的赛隆第二红色磷光体; 以及设置在发光元件上的赛隆绿荧光体。

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