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1. 发明授权

US06440187B1 Alumina powder, process for producing the same and polishing composition 失效
标题翻译：氧化铝粉，其制造方法和抛光组合物
公开(公告)号：US06440187B1
公开(公告)日：2002-08-27
申请号：US09581084
申请日：2000-07-18
申请人： Toshio Kasai , Kiyomi Ema , Isao Ota , Tohru Nishimura
发明人： Toshio Kasai , Kiyomi Ema , Isao Ota , Tohru Nishimura
IPC分类号： C09K314
CPC分类号： B82Y30/00 , C01F7/02 , C01F7/448 , C01P2002/00 , C01P2004/10 , C01P2004/20 , C01P2004/30 , C01P2004/50 , C01P2004/54 , C01P2004/61 , C01P2004/62 , C01P2004/64 , C01P2006/12 , C01P2006/40 , C01P2006/90 , C09G1/02 , C09K3/1436 , C09K3/1463
摘要： Production of an alumina powder characterized by having a single or multiple crystal structure selected from the group consisting of &ggr;, &dgr; and &thgr;-forms, a primary particle size of 10 to 50 nm, a mean secondary particle size of 100 to 500 nm, and a granular primary particle shape, or an alumina powder characterized by having an a-form crystal structure, a primary particle size of 60 to 150 nm, a mean secondary particle size of 200 to 500 nm, and a granular primary particle shape, using as a raw material an alumina hydrate comprising rectangular plate-like primary particles having a boehmite structure and having a length of one side of 10 to 50 nm; and preparation of a polishing composition comprising the alumina powder, water and a polishing accelerator.
摘要翻译：其特征在于具有选自γ，δ和θ形式的一种或多种晶体结构，一次粒径为10-50nm，二次平均粒径为100-500nm的氧化铝粉末，以及颗粒状一次粒子形状或特征在于具有a型晶体结构，一次粒径为60〜150nm，平均二次粒径为200〜500nm的氧化铝粉末和粒状一次粒子形状，使用为原料为氧化铝水合物，其包含具有勃姆石结构且长度为10〜50nm的矩形板状一次粒子; 以及制备包含氧化铝粉末，水和抛光促进剂的抛光组合物。

2. 发明授权

US10400147B2 Method for producing purified active silicic acid solution and silica sol 有权
公开(公告)号：US10400147B2
公开(公告)日：2019-09-03
申请号：US13617453
申请日：2012-09-14
申请人： Kiyomi Ema , Noriyuki Takakuma , Tohru Nishimura , Naoki Kawashita , Kouji Yamaguchi
发明人： Kiyomi Ema , Noriyuki Takakuma , Tohru Nishimura , Naoki Kawashita , Kouji Yamaguchi
IPC分类号： C09K3/14 , C09K13/04 , C01B33/143 , C01B33/148 , C01B33/141
摘要： A method for producing an active silicic acid solution in which the existing amount of foreign matters as plate-like fine particles is reduced and a method for producing a silica sol in which such foreign matters are reduced. The method fulfills the following condition: the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm is measured to be 0% to 30% in accordance with measuring method A, the method including the steps of: preparing an active silicic acid solution by subjecting an alkali silicate aqueous solution having a silica concentration of 0.5% by mass to 10.0% by mass to cation-exchange to remove alkaline components; and filtering the active silicic acid solution through a filter whose removal rate of particles having a primary particle size of 1.0 μm is 50% or more.

3. 发明授权

US5790220A Liquid crystal display and method of fabricating same with a black resin film covered an exposed portion of the wiring region on the outside of the sealing layer 失效
标题翻译：液晶显示器及其与黑色树脂膜的制造方法相比，覆盖了密封层外侧的布线区域的露出部分
公开(公告)号：US5790220A
公开(公告)日：1998-08-04
申请号：US724994
申请日：1996-10-03
申请人： Kazunori Sakamoto , Tohru Nishimura, deceased
发明人： Kazunori Sakamoto , Tohru Nishimura, deceased
IPC分类号： G02F1/1345 , G02F1/13 , H01L23/00 , G02F1/1333
CPC分类号： H01L23/564 , G02F1/13452 , H01L2224/16225
摘要： A liquid crystal display is constructed such that a black resin film is formed on the wiring region outside of the sealing compound that seals the liquid crystal between opposed substrates. This results in preventing corrosion of the leading fine wire between an OLB electrode and a pixel on the liquid crystal display panel and thereby prevents breaking of wires formed on the array substrate on the outside of the sealing compound and short-circuiting between the wires. The black resin film forms an excellent protective layer in place of the conventional silicon resin coating step designed for this purpose.
摘要翻译：液晶显示器被构造成使得在密封化合物之外的布线区域上形成黑色树脂膜，该密封化合物密封相对基板之间的液晶。这导致防止OLB电极和液晶显示面板上的像素之间的前导细线的腐蚀，从而防止在密封化合物的外侧上形成在阵列基板上的电线断裂和电线之间的短路。黑树脂膜代替为此目的设计的常规硅树脂涂层步骤而形成优异的保护层。

4. 发明授权

US09108855B2 Method for producing purified alkali silicate aqueous solution and silica sol 有权
标题翻译：纯碱性硅酸盐水溶液和硅溶胶的制备方法
公开(公告)号：US09108855B2
公开(公告)日：2015-08-18
申请号：US13603715
申请日：2012-09-05
申请人： Kiyomi Ema , Noriyuki Takakuma , Tohru Nishimura , Naoki Kawashita , Kouji Yamaguchi
发明人： Kiyomi Ema , Noriyuki Takakuma , Tohru Nishimura , Naoki Kawashita , Kouji Yamaguchi
IPC分类号： B24D3/00 , B24D3/02 , B24D11/00 , B24D18/00 , C09K3/14 , C09C1/68 , C01B33/148 , C01B33/143 , B82Y30/00
CPC分类号： C01B33/1485 , B82Y30/00 , C01B33/1435 , C01P2004/64 , C09K3/1463
摘要： To provide a method for producing an alkali silicate aqueous solution containing a reduced amount of foreign substance of plate-like fine particles and a method for producing a silica sol containing a reduced amount of foreign substance of plate-like fine particles. A method for producing an alkali silicate aqueous solution fulfilling the following condition: the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm is determined to be 0 to 30%. The method for producing an alkali silicate aqueous solution includes the steps of adjusting a silica concentration of an alkali silicate aqueous solution to 0.5 to 10.0% by mass and filtering the alkali silicate aqueous solution through a filter having a removal rate of particles with a primary particle size of 1.0 μm of 50% or more.
摘要翻译：提供一种含有少量板状微粒的异物的碱金属硅酸盐水溶液的制造方法以及含有少量的板状微粒的异物的二氧化硅溶胶的制造方法。一种满足以下条件的碱金属硅酸盐水溶液的制造方法：将一边长度为0.2〜4.0μm，厚度为1〜100nm的板状微粒的存在量确定为0〜30％。碱土金属硅酸盐水溶液的制造方法包括将碱土金属硅酸盐水溶液的二氧化硅浓度调整为0.5〜10.0质量％的步骤，通过具有一次粒子的粒子去除率的过滤器过滤碱金属硅酸盐水溶液 1.0μm的尺寸为50％以上。

5. 发明授权

US07887714B2 Cerium oxide sol and abrasive 失效
标题翻译：氧化铈溶胶和磨料
公开(公告)号：US07887714B2
公开(公告)日：2011-02-15
申请号：US10015675
申请日：2001-12-17
申请人： Isao Ota , Kenji Tanimoto , Tohru Nishimura
发明人： Isao Ota , Kenji Tanimoto , Tohru Nishimura
IPC分类号： C09K13/00
CPC分类号： B82Y30/00 , C01F17/0043 , C01P2002/01 , C01P2002/72 , C01P2004/10 , C01P2004/61 , C01P2004/62 , C01P2004/64 , C01P2006/12 , C09G1/02 , C09K3/1472
摘要： There is provided an abrasive used for polishing a substrate which comprises silica as a main component, for example a rock crystal, a quartz glass for photomask, for CMP of an organic film, Inter Layer Dielectric (ILD) and shallow trench isolation of a semiconductor device, or for polishing a hard disk made of glass.A sol which particles are dispersed in a medium, wherein the particles have a particle size of 0.005 to 1 μm and comprise as a main component crystalline cerium oxide of the cubic system and as an additional component a lanthanum compound, a neodymium compound or a combination thereof, wherein the additional component is contained in X/(Ce+X) molar ratio of 0.001 to 0.5 in which X is lanthanum atoms, neodymium atoms or a combination thereof.The sol is prepared by reacting an aqueous solution which a cerium (III) salt is mixed with a lanthanum (III) salt and/or a neodymium (III) salt, with an alkaline substance to give a suspension in which cerium (III) hydroxide is homogeneously mixed with lanthanum (III) hydroxide and/or neodymium (III) hydroxide, and blowing oxygen or a gas containing oxygen into the suspension.
摘要翻译：提供了用于抛光基底的磨料，其包括二氧化硅作为主要成分，例如岩石晶体，用于光掩模的石英玻璃，用于有机膜的CMP，层间介电（ILD）和半导体的浅沟槽隔离装置或用于抛光由玻璃制成的硬盘。一种溶胶，其中颗粒分散在介质中，其中颗粒的粒度为0.005至1μm，并且包含作为立方体系的结晶二氧化铈的主要组分，并且作为附加组分的镧化合物，钕化合物或组合其中所述附加成分以X =（Ce + X）摩尔比为0.001〜0.5，X为镧原子，钕原子或其组合。通过使铈（III）盐与镧（III）盐和/或钕（III）盐混合的水溶液与碱性物质反应制备溶胶，得到悬浮液，其中氢氧化铈（III）与氢氧化镧（III）和/或氢氧化钕（III）均匀混合，并将氧气或含有氧的气体吹入悬浮液中。

6. 发明授权

US07578862B2 Abrasive compound for glass hard disk platter 有权
标题翻译：玻璃硬盘拼盘
公开(公告)号：US07578862B2
公开(公告)日：2009-08-25
申请号：US10678093
申请日：2003-10-06
申请人： Isao Ota , Tohru Nishimura , Kenji Tanimoto
发明人： Isao Ota , Tohru Nishimura , Kenji Tanimoto
IPC分类号： C09K3/14 , C03C19/00 , B24B37/00
CPC分类号： C09G1/02 , C01F17/0043 , C01P2002/72 , C01P2004/61 , C01P2006/12 , C03C19/00 , C09K3/1463
摘要： The present invention provides an abrasive compound suitable for polishing the surface of a glass substrate for an optical disk platter or a magnetic disk platter. More specifically, the present invention provides an abrasive compound for a glass hard disk platter, characterized as comprising a stable slurry having water and, dispersed therein as an abrasive, cerium(IV) oxide particles having an average secondary particle size of 0.1 to 0.5 μm and containing CeO2 in a concentration of 0.2 to 30 wt %. Preferably, the present invention provides the above abrasive compound in which cerium amounts for 95% or more in terms of oxides of the total amount of rare earth elements in the abrasive.
摘要翻译：本发明提供一种适用于抛光用于光盘盘或磁盘盘的玻璃基板的表面的磨料化合物。更具体地说，本发明提供了一种用于玻璃硬盘盘的磨料化合物，其特征在于包括一种具有水的稳定的浆料，并在其中分散为研磨剂，其平均二次粒径为0.1-0.5μm的氧化铈（IV）颗粒并含有浓度为0.2〜30重量％的CeO 2。优选地，本发明提供了上述磨料化合物，其中铈以磨料中稀土元素总量的氧化物计为95％以上。

7. 发明授权

US06719819B2 Polishing composition 失效
标题翻译：抛光组成
公开(公告)号：US06719819B2
公开(公告)日：2004-04-13
申请号：US10281104
申请日：2002-10-28
申请人： Isao Ota , Tohru Nishimura , Gen Yamada
发明人： Isao Ota , Tohru Nishimura , Gen Yamada
IPC分类号： C09G102
CPC分类号： G11B5/8404 , B24B37/044 , C09G1/02 , C09K3/1409 , G11B5/84
摘要： For aluminum disks and glass-made hard disks, those disks having a mean waviness of less than 3 Å are being desired in order to increase the density of memory capacity. The present invention provides polishing compositions that can give smoothly polished surfaces for the disks. The polishing compositions are polishing compositions for aluminum disks or substrates having silica on the surface thereof, which contain colloidal silica particle groups having different particle size distributions and have a SiO2 concentration of 0.5 to 50% by weight.
摘要翻译：对于铝盘和玻璃制硬盘，希望具有小于3的平均波纹的那些盘以增加存储容量的密度。本发明提供了能给光盘平滑抛光的表面的抛光组合物。抛光组合物是用于铝盘或其表面上具有二氧化硅的基材的抛光组合物，其含有具有不同粒度分布且SiO 2浓度为0.5至50重量％的胶体二氧化硅颗粒基团。

8. 发明授权

US06706082B2 Crystalline ceric oxide sol and process for producing the same 失效
标题翻译：结晶氧化铈溶胶及其制备方法
公开(公告)号：US06706082B2
公开(公告)日：2004-03-16
申请号：US10076500
申请日：2002-02-19
申请人： Isao Ota , Tohru Nishimura , Kenji Tanimoto
发明人： Isao Ota , Tohru Nishimura , Kenji Tanimoto
IPC分类号： C01P1700
CPC分类号： C09G1/02 , B82Y30/00 , C01F17/0043 , C01P2004/53 , C01P2004/64 , C01P2006/12 , C01P2006/40 , C09K3/1436 , C09K3/1463
摘要： Substantially monodisperse crystalline ceric oxide sols and processes for producing such sols are provided. Sols include crystalline ceric oxide particles having a particle size I (particle size converted from specific surface area by gas absorption method) ranging from 10 nm to 200 nm and a ratio of particle size II (particle size measured by dynamic light scattering method) to particle size I ranging from 2 to 6. Sols can be prepared by reacting a cerium (III) salt with an alkaline substance in an aqueous medium under an inert gas atmosphere to obtain a suspension of cerium (III) hydroxide, immediately blowing oxygen or a gas containing oxygen into the suspension to obtain a sol comprising crystalline ceric oxide particles, and wet grinding the resulting sol. Sols are also prepared by calcining cerium carbonate at a temperature of 300 to 1100° C. to give cerium oxide particles, and wet-grinding the resulting particles.
摘要翻译：提供了基本上单分散的结晶二氧化铈溶胶和制备这种溶胶的方法。熔体包括10nm至200nm范围内的粒径I（通过气体吸收法从比表面积转化的粒径）和粒径II（通过动态光散射法测量的粒径）与粒子的比例的结晶二氧化铈粒子尺寸I范围为2至6.可以通过在惰性气体气氛下在水性介质中使铈（III）盐与碱性物质反应制备，以获得氢氧化铈（III）的悬浮液，立即吹入氧气或气体将氧气加入到悬浮液中以获得包含结晶二氧化铈颗粒的溶胶，并湿法研磨所得溶胶。还可以通过在300〜1100℃的温度下煅烧碳酸铈以制备氧化铈颗粒并湿磨研磨所得的颗粒来制备。

9. 发明授权

US06522872B1 Up/Down tuner 失效
标题翻译：上/下调谐器
公开(公告)号：US06522872B1
公开(公告)日：2003-02-18
申请号：US09179968
申请日：1998-10-28
申请人： Tohru Nishimura , Masanori Kitaguchi
发明人： Tohru Nishimura , Masanori Kitaguchi
IPC分类号： H04B144
CPC分类号： H05K9/006 , H04B15/06
摘要： An up-converter section and a down-converter section are contained in separate respective chassis. The up-converter section and the down-converter section are linked by an IF link section having a coaxial shielding structure. As such, a high-quality Up/Down tuner can be provided which is able to reduce the mutual influence of up-converter and down-converter local oscillator circuits and the entry of external noise, without increasing the size of the Up/Down tuner.
摘要翻译：上转换器部分和下变频器部分包含在单独的相应机箱中。上变换器部分和下变频器部分由具有同轴屏蔽结构的IF链路部分链接。因此，可以提供高质量的向上/向下调谐器，其能够减小上变频器和下变频器本地振荡器电路的相互影响以及外部噪声的进入，而不增加上/下调谐器的尺寸。

10. 发明授权

US5962343A Process for producing crystalline ceric oxide particles and abrasive 失效
标题翻译：生产结晶二氧化铈颗粒和磨料的方法
公开(公告)号：US5962343A
公开(公告)日：1999-10-05
申请号：US899796
申请日：1997-07-24
申请人： Toshio Kasai , Isao Ota , Takao Kaga , Tohru Nishimura , Kenji Tanimoto
发明人： Toshio Kasai , Isao Ota , Takao Kaga , Tohru Nishimura , Kenji Tanimoto
IPC分类号： C01F17/00 , C09K3/14 , H01L21/3105 , B24D3/34
CPC分类号： B82Y30/00 , C01F17/0043 , C09K3/1409 , C09K3/1463 , H01L21/31053 , C01P2002/72 , C01P2002/76 , C01P2004/61 , C01P2004/62 , C01P2004/64 , C01P2006/12
摘要： According to the present invention, a process is provided for producing crystalline ceric oxide particles having a particle diameter of 0.005 to 5 .mu.m, which comprises the steps of reacting a cerium (III) salt with an alkaline substance in an (OH)/(Ce.sup.3+) molar ratio of 3 to 30 in an aqueous medium in an inert gas atmosphere to produce a suspension of cerium (III) hydroxide, and blowing oxygen or a gas containing oxygen into the suspension at a temperature of 10 to 95.degree. C. and at an atmospheric pressure.
摘要翻译：根据本发明，提供了一种制备粒径为0.005至5μm的结晶氧化铈颗粒的方法，其包括以下步骤：使铈（III）盐与（OH）/（ Ce 3+）摩尔比为3〜30，在惰性气体气氛中在水性介质中产生氢氧化铈（III）的悬浮液，并在10〜95℃的温度下向该悬浮液中吹入氧气或含氧气体，在大气压下。

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