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1. 发明授权

US06440187B1 Alumina powder, process for producing the same and polishing composition 失效
标题翻译：氧化铝粉，其制造方法和抛光组合物
公开(公告)号：US06440187B1
公开(公告)日：2002-08-27
申请号：US09581084
申请日：2000-07-18
申请人： Toshio Kasai , Kiyomi Ema , Isao Ota , Tohru Nishimura
发明人： Toshio Kasai , Kiyomi Ema , Isao Ota , Tohru Nishimura
IPC分类号： C09K314
CPC分类号： B82Y30/00 , C01F7/02 , C01F7/448 , C01P2002/00 , C01P2004/10 , C01P2004/20 , C01P2004/30 , C01P2004/50 , C01P2004/54 , C01P2004/61 , C01P2004/62 , C01P2004/64 , C01P2006/12 , C01P2006/40 , C01P2006/90 , C09G1/02 , C09K3/1436 , C09K3/1463
摘要： Production of an alumina powder characterized by having a single or multiple crystal structure selected from the group consisting of &ggr;, &dgr; and &thgr;-forms, a primary particle size of 10 to 50 nm, a mean secondary particle size of 100 to 500 nm, and a granular primary particle shape, or an alumina powder characterized by having an a-form crystal structure, a primary particle size of 60 to 150 nm, a mean secondary particle size of 200 to 500 nm, and a granular primary particle shape, using as a raw material an alumina hydrate comprising rectangular plate-like primary particles having a boehmite structure and having a length of one side of 10 to 50 nm; and preparation of a polishing composition comprising the alumina powder, water and a polishing accelerator.
摘要翻译：其特征在于具有选自γ，δ和θ形式的一种或多种晶体结构，一次粒径为10-50nm，二次平均粒径为100-500nm的氧化铝粉末，以及颗粒状一次粒子形状或特征在于具有a型晶体结构，一次粒径为60〜150nm，平均二次粒径为200〜500nm的氧化铝粉末和粒状一次粒子形状，使用为原料为氧化铝水合物，其包含具有勃姆石结构且长度为10〜50nm的矩形板状一次粒子; 以及制备包含氧化铝粉末，水和抛光促进剂的抛光组合物。

2. 发明授权

US06398827B1 Polishing composition 失效
标题翻译：抛光组成
公开(公告)号：US06398827B1
公开(公告)日：2002-06-04
申请号：US09605542
申请日：2000-06-29
申请人： Isao Ota , Tohru Nishimura , Yoshitane Watanabe , Yoshiyuki Kashima , Kiyomi Ema , Yutaka Ohmori
发明人： Isao Ota , Tohru Nishimura , Yoshitane Watanabe , Yoshiyuki Kashima , Kiyomi Ema , Yutaka Ohmori
IPC分类号： C09K314
CPC分类号： C09K3/1463 , C09G1/02
摘要： The present invention relates to a polishing composition for polishing alumina disks, polishing substrates having silica surfaces and semiconductor wafers, comprising a stable aqueous silica sol containing moniliform colloidal silica particles having a ratio (D1/D2) of a particle diameter D1 nm (as measured by dynamic light scattering method) to a mean particle diameter D2 (as measured by nitrogen absorption method) of 3 or more, wherein D1 is between 50 to 800 nm and D2 is between 10 to 120 nm, said moniliform colloidal silica particles being composed of spherical colloidal silica particles and a metal oxide-containing silica bond which bonds these spherical colloidal silica particles together, wherein the spherical colloidal silica particles are linked together in rows in only one plane by observation through an electron microscope, and further wherein said polishing composition contains 0.5 to 50% by weight of said moniliform colloidal silica particles.
摘要翻译：本发明涉及一种用于抛光氧化铝盘的抛光组合物，具有二氧化硅表面的抛光衬底和半导体晶片，其包含稳定的含水二氧化硅溶胶，其含有粒径为D1nm（D1 / D2）的粒径为D1nm 通过动态光散射法）至平均粒径D2（通过氮吸收法测定）为3以上，其中D1为50〜800nm，D2为10〜120nm，所述观察胶体二氧化硅粒子为球形胶体二氧化硅颗粒和将这些球形胶体二氧化硅颗粒结合在一起的含金属氧化物的二氧化硅结合体，其中通过电子显微镜观察，球形胶体二氧化硅颗粒在一个平面内以行排列在一起，并且其中所述抛光组合物含有 0.5〜50重量％的所述念珠状胶体二氧化硅粒子。

3. 发明授权

US10400147B2 Method for producing purified active silicic acid solution and silica sol 有权
公开(公告)号：US10400147B2
公开(公告)日：2019-09-03
申请号：US13617453
申请日：2012-09-14
申请人： Kiyomi Ema , Noriyuki Takakuma , Tohru Nishimura , Naoki Kawashita , Kouji Yamaguchi
发明人： Kiyomi Ema , Noriyuki Takakuma , Tohru Nishimura , Naoki Kawashita , Kouji Yamaguchi
IPC分类号： C09K3/14 , C09K13/04 , C01B33/143 , C01B33/148 , C01B33/141
摘要： A method for producing an active silicic acid solution in which the existing amount of foreign matters as plate-like fine particles is reduced and a method for producing a silica sol in which such foreign matters are reduced. The method fulfills the following condition: the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm is measured to be 0% to 30% in accordance with measuring method A, the method including the steps of: preparing an active silicic acid solution by subjecting an alkali silicate aqueous solution having a silica concentration of 0.5% by mass to 10.0% by mass to cation-exchange to remove alkaline components; and filtering the active silicic acid solution through a filter whose removal rate of particles having a primary particle size of 1.0 μm is 50% or more.

4. 发明授权

US09108855B2 Method for producing purified alkali silicate aqueous solution and silica sol 有权
标题翻译：纯碱性硅酸盐水溶液和硅溶胶的制备方法
公开(公告)号：US09108855B2
公开(公告)日：2015-08-18
申请号：US13603715
申请日：2012-09-05
申请人： Kiyomi Ema , Noriyuki Takakuma , Tohru Nishimura , Naoki Kawashita , Kouji Yamaguchi
发明人： Kiyomi Ema , Noriyuki Takakuma , Tohru Nishimura , Naoki Kawashita , Kouji Yamaguchi
IPC分类号： B24D3/00 , B24D3/02 , B24D11/00 , B24D18/00 , C09K3/14 , C09C1/68 , C01B33/148 , C01B33/143 , B82Y30/00
CPC分类号： C01B33/1485 , B82Y30/00 , C01B33/1435 , C01P2004/64 , C09K3/1463
摘要： To provide a method for producing an alkali silicate aqueous solution containing a reduced amount of foreign substance of plate-like fine particles and a method for producing a silica sol containing a reduced amount of foreign substance of plate-like fine particles. A method for producing an alkali silicate aqueous solution fulfilling the following condition: the existing amount of plate-like fine particles having a length of one side of 0.2 to 4.0 μm and a thickness of 1 to 100 nm is determined to be 0 to 30%. The method for producing an alkali silicate aqueous solution includes the steps of adjusting a silica concentration of an alkali silicate aqueous solution to 0.5 to 10.0% by mass and filtering the alkali silicate aqueous solution through a filter having a removal rate of particles with a primary particle size of 1.0 μm of 50% or more.
摘要翻译：提供一种含有少量板状微粒的异物的碱金属硅酸盐水溶液的制造方法以及含有少量的板状微粒的异物的二氧化硅溶胶的制造方法。一种满足以下条件的碱金属硅酸盐水溶液的制造方法：将一边长度为0.2〜4.0μm，厚度为1〜100nm的板状微粒的存在量确定为0〜30％。碱土金属硅酸盐水溶液的制造方法包括将碱土金属硅酸盐水溶液的二氧化硅浓度调整为0.5〜10.0质量％的步骤，通过具有一次粒子的粒子去除率的过滤器过滤碱金属硅酸盐水溶液 1.0μm的尺寸为50％以上。

5. 发明授权

US5998090A High optical density ultra thin organic black matrix system 失效
标题翻译：高光密度超薄有机黑色矩阵系统
公开(公告)号：US5998090A
公开(公告)日：1999-12-07
申请号：US982233
申请日：1997-12-01
申请人： Ram W. Sabnis , Terry L. Brewer , Robert E. Nichols , Edith G. Hays , Michael D. Stroder , Akira Yanagimoto , Yasuhisa Sone , Yoshitane Watanabe , Kiyomi Ema
发明人： Ram W. Sabnis , Terry L. Brewer , Robert E. Nichols , Edith G. Hays , Michael D. Stroder , Akira Yanagimoto , Yasuhisa Sone , Yoshitane Watanabe , Kiyomi Ema
IPC分类号： G03F7/004 , C09D179/08 , G02B5/00 , G02B5/20 , G02F1/1335 , G03F7/00 , G03F7/11 , C08K3/04
CPC分类号： G03F7/0007 , G02F1/133512
摘要： A high optical density, i.e., .gtoreq.3.0, at 1 micron or less film thickness, black matrix is disclosed having improved stability and shelf life as a consequence of admixing Pigment Black 7 and organic dye or dye mixtures on a polyimide polymer vehicle.
摘要翻译：公开了由于将颜料黑7和有机染料或染料混合物混合在聚酰亚胺聚合物载体上而具有改进的稳定性和保质期的高光密度，即> 1微米或更小膜厚度的> / = 3.0。

6. 发明授权

US07892343B2 Method for manufacturing slurry and mold for precision casting 有权
标题翻译：制造精密铸造用浆料和模具的方法
公开(公告)号：US07892343B2
公开(公告)日：2011-02-22
申请号：US11922777
申请日：2006-06-21
申请人： Kiyomi Ema , Yutaka Ohmori , Hirokazu Kato , Kenji Yamaguchi
发明人： Kiyomi Ema , Yutaka Ohmori , Hirokazu Kato , Kenji Yamaguchi
IPC分类号： C23C16/40
CPC分类号： B22C1/08 , B82Y30/00 , C04B35/481 , C04B35/486 , C04B35/624 , C04B35/6263 , C04B35/6303 , C04B35/634 , C04B2235/3208 , C04B2235/3217 , C04B2235/3244 , C04B2235/3246 , C04B2235/3248 , C04B2235/3463 , C04B2235/442 , C04B2235/5427 , C04B2235/5454 , C04B2235/6028 , C04B2235/606 , C04B2235/6567
摘要： A manufacturing method for a slurry for the production of a precision casting mold that includes a zirconia sol and a refractory powder, and a manufacturing method for a precision casting mold that uses the slurry is provided. The present invention relates to a manufacturing method for a slurry for the production of a precision casting mold for a metal that includes a step in which an alkaline zirconia sol (A1) and a refractory powder (D) are mixed, the alkaline zirconia sol (A1) being obtained by a manufacturing method that includes a step (i), in which a zirconium salt (B1) is heated at 60 to 110° C. in an aqueous medium that includes a carbonate of quaternary ammonium, and a step (ii), in which a hydrothermal treatment is carried out at 100 to 250° C. In addition, the present invention relates to a manufacturing method for a slurry for the production of a precision casting mold for a metal that includes a step in which an acidic zirconia sol (C3) and a refractory powder (D) are mixed, the acidic zirconia sol (C3) being obtained by a manufacturing method that includes a step (I), in which an alkaline zirconia sol (A3) and a zirconium salt (B3) are mixed, and a step II, in which the obtained liquid mixture is caused to react at 80 to 250° C.
摘要翻译：提供了一种用于生产包括氧化锆溶胶和耐火材料粉末的精密铸造模具的浆料的制造方法，以及使用该浆料的精密铸造模具的制造方法。本发明涉及一种用于生产金属精密铸造模具的浆料的制造方法，其包括将碱性氧化锆溶胶（A1）和耐火材料粉末（D）混合的步骤，所述碱性氧化锆溶胶（ A1）通过包括步骤（i）的制备方法获得，其中锆盐（B1）在包含季铵盐的碳酸盐的水性介质中在60至110℃下加热，和步骤（ii）），其中在100〜250℃下进行水热处理。此外，本发明涉及一种用于制造金属精密铸造模具的浆料的制造方法，其包括以下步骤：将酸性氧化锆溶胶（C3）和耐火粉末（D）混合，所述酸性氧化锆溶胶（C3）通过包括步骤（I）的制备方法获得，其中碱性氧化锆溶胶（A3）和锆盐（ B3）混合，和步骤II，其中所获得的液体混合 e在80〜250℃下反应

7. 发明授权

US5989515A Process for producing an acidic aqueous alumina sol 失效
标题翻译：酸性水性氧化铝溶胶的制造方法
公开(公告)号：US5989515A
公开(公告)日：1999-11-23
申请号：US897084
申请日：1997-07-18
申请人： Yoshitane Watanabe , Yoshiyuki Kashima , Kiyomi Ema
发明人： Yoshitane Watanabe , Yoshiyuki Kashima , Kiyomi Ema
IPC分类号： C01F7/02 , C01F7/44 , B01J20/00 , C04B35/10
CPC分类号： B82Y30/00 , C01F7/02 , C01F7/448 , C01P2002/72 , C01P2004/10 , C01P2004/20 , C01P2004/51 , C01P2004/54 , C01P2004/64 , C01P2006/22 , C01P2006/40 , C01P2006/80
摘要： A process for producing a stable acidic aqueous alumina sol containing 50 to 300 nm of elongate secondary particles which are elongated in only one plane and formed by edge-to-edge coagulation of rectangular plate-like primary particles having a length of one side of 10 to 30 nm when observed through an electron microscope, the process comprises the steps of:(A) adding an alkali to an aqueous alumina sol containing fibrous colloidal particles of an amorphous alumina hydrate to produce a reaction mixture having a pH of 9 to 12,(B) subjecting the reaction mixture obtained in the step (A) to a hydrothermal treatment at a temperature of 110 to 250.degree. C. to produce an aqueous suspension containing an alumina hydrate having a boehmite structure, and(C) desalting the aqueous suspension obtained in the step (B) by adding water and an acid by ultrafiltration to form an acidic aqueous alumina sol having a pH of 3 to 6.
摘要翻译：一种制造含有50〜300nm的细长二次粒子的稳定的酸性水溶性氧化铝溶胶的方法，所述细长二次粒子仅在一个平面上伸长，并且通过一边长度为10的矩形板状一次粒子的边缘到边缘凝固而形成至30nm，该方法包括以下步骤：（A）向含有无定形氧化铝水合物的纤维状胶体颗粒的含水氧化铝溶胶中加入碱以产生pH为9至12的反应混合物，（B）将在步骤（A）中获得的反应混合物在110-250℃的温度下进行水热处理，以制备含有勃姆石结构的水合氧化铝的水性悬浮液，和（C）将含水悬浮液在步骤（B）中通过超滤加入水和酸，形成pH为3至6的酸性水性氧化铝溶胶。

8. 发明申请

US20060128817A1 Process for producing acidic aqueous alumina sol 失效
公开(公告)号：US20060128817A1
公开(公告)日：2006-06-15
申请号：US10546912
申请日：2004-03-11
申请人： Kiyomi Ema , Takaichi Sugiyama
发明人： Kiyomi Ema , Takaichi Sugiyama
IPC分类号： B01F17/00 , C09K3/00
CPC分类号： B82Y30/00 , B01J13/0008 , C01F7/142 , C01P2002/60 , C01P2004/24 , C01P2004/62 , C01P2004/64 , C01P2006/12 , Y02P20/142 , Y10S516/922 , Y10S516/928
摘要： A process for producing a stable acidic aqueous alumina sol containing columnar secondary particles having a length of 50 to 400 nm which are formed by face-to-face coagulation of rectangular plate-like primary particles having a length of one side of 10 to 40 nm and a thickness of 2.5 to 10 nm when observed through an electron microscope, by use of an aqueous alkali aluminate solution and liquid or gaseous carbon dioxide as starting materials. The obtained acidic aqueous alumina sol has a low viscosity and is stable for salts. The dried gel obtained from the sol is characterized in that the gel structure thereof is rigid even though it is porous.

9. 发明授权

US06254996B1 Antistatic polyester film and process for producing the same 失效
标题翻译：抗静电聚酯薄膜及其制造方法
公开(公告)号：US06254996B1
公开(公告)日：2001-07-03
申请号：US09325845
申请日：1999-06-04
申请人： Masayuki Fukuda , Hideaki Watanabe , Osamu Tanegashima , Kiyomi Ema
发明人： Masayuki Fukuda , Hideaki Watanabe , Osamu Tanegashima , Kiyomi Ema
IPC分类号： B32B2706
CPC分类号： C08J7/047 , C08J2367/02 , C08J2481/00 , Y10T428/31786
摘要： An antistatic polyester film having the excellent antistatic property and improved appearance of a coating layer, and a process for producing the same are disclosed. The antistatic polyester film comprises a polyester film having formed on at least one surface thereof an antistatic coating layer obtained by coating a coating liquid containing an organic-inorganic composite conductive sol (A) comprising colloidal particles of conductive oxide, having a primary particle size of 5 to 50 nm, and colloidal particles of a conductive polymer. This antistatic polyester film has excellent antistatic property, particularly excellent antistatic property under the low humidity environment, and therefore is useful in magnetic cards, magnetic disks, printing materials, graphic materials, photosensitive materials and the like.
摘要翻译：公开了具有优异的抗静电性和涂层外观的抗静电聚酯膜及其制造方法。抗静电聚酯膜包括在其至少一个表面上形成有抗静电涂层的抗静电涂层，所述抗静电涂层通过涂布包含含有导电氧化物的胶体粒子的有机 - 无机复合导电溶胶（A）的涂布液而获得， 5〜50nm，以及导电性聚合物的胶体粒子。该抗静电聚酯薄膜在低湿度环境下具有优异的抗静电性，特别优异的抗静电性，因此可用于磁卡，磁盘，印刷材料，图形材料，感光材料等。

10. 发明授权

US5780201A Ultra thin photolithographically imageable organic black matrix coating material 失效
标题翻译：超薄光刻成像有机黑色基质涂料
公开(公告)号：US5780201A
公开(公告)日：1998-07-14
申请号：US721841
申请日：1996-09-27
申请人： Ram W. Sabnis , Jonathan W. Mayo , Edith G. Hays , Terry L. Brewer , Michael D. Stroder , Akira Yanagimoto , Yasuhisa Sone , Yoshitane Watanabe , Kiyomi Ema
发明人： Ram W. Sabnis , Jonathan W. Mayo , Edith G. Hays , Terry L. Brewer , Michael D. Stroder , Akira Yanagimoto , Yasuhisa Sone , Yoshitane Watanabe , Kiyomi Ema
IPC分类号： G02B5/00 , C09D179/08 , G02B5/20 , G02F1/1335 , G03C1/73 , G03F7/00 , G09F9/30 , G03F7/004
CPC分类号： G02F1/133512 , G03F7/0007
摘要： An organic black matrix having high resistivity (.gtoreq.10.sup.11 ohm/square), high optical density (.gtoreq.2.0) at ultra thin film thicknesses (.ltoreq.1.0 microns) for improved STN and TFT pixel display applications is made possible by combining polyimide/dye solutions and mixed metal oxide pigment dispersions at a weight/weight ratio of dye to pigment of 1:15 to 3:15. The need for low resistivity carbon black, as a replacement for sputtered chrome, is negated.
摘要翻译：对于改进的STN和TFT像素显示应用，超薄膜厚度（ / = 1011欧姆/平方），高光密度（> / = 2.0））的有机黑色矩阵是可以通过将聚酰亚胺/染料溶液和混合金属氧化物颜料分散体以1:15至3:15的染料与颜料的重量/重量比组合。需要低电阻率炭黑作为溅射铬的替代品被否定。

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