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    • 8. 发明申请
    • THIN-FILM CAPACITOR
    • 薄膜电容器
    • US20090244808A1
    • 2009-10-01
    • US12410825
    • 2009-03-25
    • Takashi OHTSUKANobuyuki OKUZAWA
    • Takashi OHTSUKANobuyuki OKUZAWA
    • H01G4/06
    • H01G4/06H01G4/33
    • An object of the present invention is to restrain warpage in a thin-film trench capacitor. A thin-film capacitor includes a substrate, a dielectric film, and a pair of electrodes, and the dielectric film is provided along a concave-convex surface on which are formed a plurality of convex portions extending away from the substrate. The concave-convex surface forms a pattern having one or more divisions arranged in a plane parallel to the main plane of the substrate, and the convex portions are arranged in either parts of the divisions or other parts. At least some of the divisions have parts extending along the x axial direction, and two or more of the extending parts overlap each other and terminate at locations that are different from each other, as viewed from the y axial direction orthogonal to the x axial direction.
    • 本发明的目的是抑制薄膜沟槽电容器的翘曲。 薄膜电容器包括基板,电介质膜和一对电极,并且电介质膜沿着凹凸表面设置,在凸形表面上形成有远离基板延伸的多个凸部。 凹凸表面形成具有一个或多个分隔布置在平行于基板的主平面的平面中的图案,并且凸部布置在分割部分或其它部分的任一部分中。 至少一些分段具有沿x轴方向延伸的部分,并且两个或更多个延伸部分彼此重叠并且在从与x轴方向正交的y轴方向观察时终止于彼此不同的位置 。
    • 9. 发明授权
    • Non-volatile memory
    • 非易失性存储器
    • US07291857B2
    • 2007-11-06
    • US10967222
    • 2004-10-19
    • Hideyuki TanakaTakashi OhtsukaKiyoyuki MoritaKiyoshi Morimoto
    • Hideyuki TanakaTakashi OhtsukaKiyoyuki MoritaKiyoshi Morimoto
    • H01L47/00
    • H01L27/2463H01L45/06H01L45/1233H01L45/1273H01L45/144H01L45/16H01L45/1625
    • A non-volatile memory (1) which comprises an insulating substrate (11) having a plurality of first electrodes (15) extending therethrough from a front surface of the substrate to a rear surface thereof, a second electrode (12) formed on one surface side of the substrate (11), and a recording layer (14) held between the first electrodes (15) and the second electrode (12) and variable in resistance value by electric pulses applied across the first electrodes (15) and the second electrode (12), the plurality of first electrodes (15) being electrically connected to the recording layer (14) in a region constituting a single memory cell (MC). The non-volatile memory (1) can be reduced in power consumption and has great freedom of design and high reliability.
    • 一种非易失性存储器(1),其包括绝缘基板(11),所述绝缘基板具有从所述基板的前表面延伸穿过其延伸到其后表面的多个第一电极(15),形成在一个表面上的第二电极 基板(11)的一侧,以及保持在第一电极(15)和第二电极(12)之间的记录层(14),并且通过施加在第一电极(15)和第二电极 (12),所述多个第一电极(15)在构成单个存储单元(MC)的区域中与记录层(14)电连接。 非易失性存储器(1)可以降低功耗,并具有很大的设计自由度和高可靠性。
    • 10. 发明授权
    • Semiconductor device
    • 半导体器件
    • US07135736B2
    • 2006-11-14
    • US10616917
    • 2003-07-11
    • Takashi NishikawaTakashi Ohtsuka
    • Takashi NishikawaTakashi Ohtsuka
    • H01L29/788
    • H01L21/28291H01L21/28273H01L29/78391
    • This specification relates to a semiconductor device that comprises a semiconductor substrate 11, a source region 12 and a drain region 13, which are formed on the semiconductor substrate 11 with a channel region 14 therebetween; a floating gate electrode 152 that is formed on the channel region 14 with a gate insulator film 151 therebetween; a ferroelectric film 154 that is formed on the floating gate electrode 152; and a control gate electrode 156 that is formed on the ferroelectric film 154, wherein intermediate insulator films 153 and 155 are formed between at least one of the pairs consisting of the floating gate electrode 152 and the ferroelectric film 154, and the ferroelectric film 154 and the control gate electrode 156, and the intermediate insulator films 153 and 155 are made of hafnium oxide that contains nitrogen atoms.
    • 本说明书涉及半导体器件,其包括在半导体衬底11上形成有沟道区域14的半导体衬底11,源极区12和漏极区13; 在沟道区域14上形成有栅极绝缘膜151的浮栅电极152; 形成在浮栅电极152上的铁电体膜154; 以及形成在铁电体膜154上的控制栅极电极156,其中,在由浮置栅极电极152和铁电体膜154构成的至少一对之间形成中间绝缘膜153,155,以及强电介质膜154和 控制栅电极156和中间绝缘膜153,155由含有氮原子的氧化铪构成。