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1. 发明申请

US20050009079A1 Monodisperse nanoparticle containing thin films via self-assembly 审中-公开
标题翻译：通过自组装的含有薄膜的单分散纳米粒子
公开(公告)号：US20050009079A1
公开(公告)日：2005-01-13
申请号：US10912266
申请日：2004-08-05
申请人： Simone Anders , Shouheng Sun
发明人： Simone Anders , Shouheng Sun
IPC分类号： G11B5/64 , B05D3/00 , C12Q1/68 , G01N33/53
CPC分类号： B82Y30/00 , G11B5/65 , Y10T428/2982
摘要： A method and structure that forms a multilayer nanoparticle thin film assembly begins by functionalizing a substrate with functional molecules. Next, the invention replaces a stabilizer on a bottom surface of the first nanoparticles with the functional molecules via surface ligand exchange to make a first nanoparticle layer on the substrate. The invention then replaces the stabilizer on a top surface of the first nanoparticle layer with functional molecules via surface ligand exchange. The invention replaces the stabilizer on a bottom surface of the second nanoparticles with the functional molecules via surface ligand exchange to make a second nanoparticle layer on the first nanoparticle layer. Lastly, the invention repeats the previous steps and forms additional nanoparticle layers.
摘要翻译：形成多层纳米颗粒薄膜组件的方法和结构开始于用功能分子官能化底物。接下来，本发明通过表面配体交换将第一纳米颗粒的底表面上的稳定剂与官能分子取代，以在衬底上形成第一纳米颗粒层。然后，本发明通过表面配体交换用功能分子替代第一纳米颗粒层的顶表面上的稳定剂。本发明通过表面配体交换将具有功能分子的第二纳米颗粒的底表面上的稳定剂替代为在第一纳米颗粒层上形成第二纳米颗粒层。最后，本发明重复前述步骤并形成额外的纳米颗粒层。

2. 发明授权

US5838522A Surface treatment of magnetic recording heads 失效
公开(公告)号：US5838522A
公开(公告)日：1998-11-17
申请号：US794672
申请日：1997-02-03
申请人： Kyriakos Komvopoulos , Ian G. Brown , Bo Wei , Simone Anders , Andre Anders , C. Singh Bhatia
发明人： Kyriakos Komvopoulos , Ian G. Brown , Bo Wei , Simone Anders , Andre Anders , C. Singh Bhatia
IPC分类号： C04B41/00 , C04B41/80 , C23C14/32 , C23C14/48 , G11B5/10 , G11B5/187 , G11B5/255 , G11B5/40 , G11B5/60 , G11B33/10
CPC分类号： C04B41/009 , C04B41/0027 , C04B41/0054 , C04B41/80 , C23C14/325 , C23C14/48 , G11B33/10 , G11B5/10 , G11B5/187 , G11B5/255 , G11B5/40 , G11B5/6005
摘要： Surface modification of magnetic recording heads using plasma immersion ion implantation and deposition is disclosed. This method may be carried out using a vacuum arc deposition system with a metallic or carbon cathode. By operating a plasma gun in a long-pulse mode and biasing the substrate holder with short pulses of a high negative voltage, direct ion implantation, recoil implantation, and surface deposition are combined to modify the near-surface regions of the head or substrate in processing times which may be less than 5 min. The modified regions are atomically mixed into the substrate. This surface modification improves the surface smoothness and hardness and enhances the tribological characteristics under conditions of contact-start-stop and continuous sliding. These results are obtained while maintaining original tolerances.

3. 发明授权

US6137231A Constricted glow discharge plasma source 失效
标题翻译：约束辉光放电等离子体源
公开(公告)号：US6137231A
公开(公告)日：2000-10-24
申请号：US711844
申请日：1996-09-10
申请人： Andre Anders , Simone Anders , Michael Dickinson , Michael Rubin , Nathan Newman
发明人： Andre Anders , Simone Anders , Michael Dickinson , Michael Rubin , Nathan Newman
IPC分类号： H01J37/32 , H05H1/24
CPC分类号： H01J37/32009 , H05H1/24
摘要： A constricted glow discharge chamber and method are disclosed. The polarity and geometry of the constricted glow discharge plasma source is set so that the contamination and energy of the ions discharged from the source are minimized. The several sources can be mounted in parallel and in series to provide a sustained ultra low source of ions in a plasma with contamination below practical detection limits. The source is suitable for applying films of nitrides such as gallium nitride and oxides such as tungsten oxide and for enriching other substances in material surfaces such as oxygen and water vapor, which are difficult process as plasma in any known devices and methods. The source can also be used to assist the deposition of films such as metal films by providing low-energy ions such as argon ions.
摘要翻译：公开了一种收缩辉光放电室和方法。缩小的辉光放电等离子体源的极性和几何形状被设定为使从源极排出的离子的污染物和能量最小化。可以并联并串联安装多个源，以在等离子体中提供持续的超低离子源，污染低于实际检测限。该源适合于施加诸如氮化镓的氮化物和氧化钨等氧化物的膜，并且用于富集诸如氧和水蒸气的材料表面中的其它物质，这在任何已知的装置和方法中作为等离子体是困难的过程。该源还可用于通过提供诸如氩离子的低能离子来辅助诸如金属膜的膜的沉积。

4. 发明授权

US5851475A Surface treatment of ceramic articles 失效
标题翻译：陶瓷制品的表面处理
公开(公告)号：US5851475A
公开(公告)日：1998-12-22
申请号：US667502
申请日：1996-06-21
申请人： Kyriakos Komvopoulos , Ian G. Brown , Bo Wei , Simone Anders , Andre Anders , C. Singh Bhatia
发明人： Kyriakos Komvopoulos , Ian G. Brown , Bo Wei , Simone Anders , Andre Anders , C. Singh Bhatia
IPC分类号： C04B41/00 , C04B41/80 , C23C14/32 , C23C14/48 , G11B5/10 , G11B5/187 , G11B5/255 , G11B5/40 , G11B5/60 , G11B33/10 , B29C71/00
CPC分类号： C04B41/009 , C04B41/0027 , C04B41/80 , C23C14/325 , C23C14/48 , G11B33/10 , G11B5/10 , G11B5/187 , G11B5/255 , G11B5/40 , G11B5/6005
摘要： A process for producing an article with improved ceramic surface properties including providing an article having a ceramic surface, and placing the article onto a conductive substrate holder in a hermetic enclosure. Thereafter a low pressure ambient is provided in the hermetic enclosure. A plasma including ions of solid materials is produced the ceramic surface of the article being at least partially immersed in a macroparticle free region of the plasma. While the article is immersed in the macroparticle free region, a bias of the substrate holder is biased between a low voltage at which material from the plasma condenses on the surface of the article and a high negative voltage at which ions from the plasma are implanted into the article.
摘要翻译：一种用于生产具有改进的陶瓷表面性质的制品的方法，包括提供具有陶瓷表面的制品，以及将制品放置在密封外壳中的导电衬底保持器上。此后，在密封外壳中设置低压环境。产生包括固体材料离子的等离子体，该制品的陶瓷表面至少部分地浸没在等离子体的无大颗粒区域中。当制品浸没在无大颗粒区域中时，衬底保持器的偏压被偏压在来自等离子体物质在物体表面上凝结的低电压和来自等离子体的离子注入到高负电压的低电压之间文章。

5. 发明授权

US5476691A Surface treatment of magnetic recording heads 失效
标题翻译：表面处理磁记录头
公开(公告)号：US5476691A
公开(公告)日：1995-12-19
申请号：US306750
申请日：1994-09-15
申请人： Kyriakos Komvopoulos , Ian G. Brown , Bo Wei , Simone Anders , Andre Anders , Singh C. Bhatia
发明人： Kyriakos Komvopoulos , Ian G. Brown , Bo Wei , Simone Anders , Andre Anders , Singh C. Bhatia
IPC分类号： C04B41/00 , C04B41/80 , C23C14/32 , C23C14/48 , G11B5/10 , G11B5/187 , G11B5/255 , G11B5/40 , G11B5/60 , G11B33/10 , B05D3/06
CPC分类号： C04B41/009 , C04B41/0027 , C04B41/0054 , C04B41/80 , C23C14/325 , C23C14/48 , G11B33/10 , G11B5/10 , G11B5/187 , G11B5/255 , G11B5/40 , G11B5/6005
摘要： Surface modification of magnetic recording heads using plasma immersion ion implantation and deposition is disclosed. This method may be carried out using a vacuum arc deposition system with a metallic or carbon cathode. By operating a plasma gun in a long-pulse mode and biasing the substrate holder with short pulses of a high negative voltage, direct ion implantation, recoil implantation, and surface deposition are combined to modify the near-surface regions of the head or substrate in processing times which may be less than 5 min. The modified regions are atomically mixed into the substrate. This surface modification improves the surface smoothness and hardness and enhances the tribological characteristics under conditions of contact-start-stop and continuous sliding. These results are obtained while maintaining original tolerances.
摘要翻译：公开了使用等离子体浸没离子注入和沉积的磁记录头的表面改性。该方法可以使用具有金属或碳阴极的真空电弧沉积系统进行。通过以长脉冲模式操作等离子体枪并且以短负载电压的短脉冲偏置衬底支架，组合直接离子注入，反冲注入和表面沉积以改变头部或衬底的近表面区域处理时间可能小于5分钟。改性区域原子混合到基材中。该表面改性改善了表面平滑度和硬度，并且在接触 - 停止和连续滑动的条件下提高了摩擦学特性。在保持原始公差的同时获得这些结果。

6. 发明授权

US06805904B2 Process of forming a multilayer nanoparticle-containing thin film self-assembly 有权
标题翻译：形成含多层纳米颗粒的薄膜自组装工艺
公开(公告)号：US06805904B2
公开(公告)日：2004-10-19
申请号：US10080195
申请日：2002-02-20
申请人： Simone Anders , Shouheng Sun
发明人： Simone Anders , Shouheng Sun
IPC分类号： B05D138
CPC分类号： B82Y30/00 , G11B5/65 , Y10T428/2982
摘要： A method and structure that forms a multilayer nanoparticle thin film assembly begins by functionalizing a substrate with functional molecules. Next, the invention replaces a stabilizer on a bottom surface of the first nanoparticles with the functional molecules via surface ligand exchange to make a first nanoparticle layer on the substrate. The invention then replaces the stabilizer on a top surface of the first nanoparticle layer with functional molecules via surface ligand exchange. The invention replaces the stabilizer on a bottom surface of the second nanoparticles with the functional molecules via surface ligand exchange to make a second nanoparticle layer on the first nanoparticle layer. Lastly, the invention repeats the previous steps and forms additional nanoparticle layers.
摘要翻译：形成多层纳米颗粒薄膜组件的方法和结构开始于用功能分子官能化底物。接下来，本发明通过表面配体交换将第一纳米颗粒的底表面上的稳定剂与官能分子取代，以在衬底上形成第一纳米颗粒层。然后，本发明通过表面配体交换用功能分子替代第一纳米颗粒层的顶表面上的稳定剂。本发明通过表面配体交换将具有功能分子的第二纳米颗粒的底表面上的稳定剂替代为在第一纳米颗粒层上形成第二纳米颗粒层。最后，本发明重复前述步骤并形成额外的纳米颗粒层。

7. 发明授权

US5827580A Low temperature formation of electrode having electrically conductive metal oxide surface 失效
标题翻译：具有导电金属氧化物表面的电极的低温形成
公开(公告)号：US5827580A
公开(公告)日：1998-10-27
申请号：US625270
申请日：1996-03-27
申请人： Simone Anders , Andre Anders , Ian G. Brown , Frank R. McLarnon , Fanping Kong
发明人： Simone Anders , Andre Anders , Ian G. Brown , Frank R. McLarnon , Fanping Kong
IPC分类号： C23C14/00 , C23C14/08 , H01M4/26 , H01M4/32 , H01T14/00
CPC分类号： H01M4/32 , C23C14/0042 , C23C14/083 , H01M4/26
摘要： A low temperature process is disclosed for forming metal suboxides on substrates by cathodic arc deposition by either controlling the pressure of the oxygen present in the deposition chamber, or by controlling the density of the metal flux, or by a combination of such adjustments, to thereby control the ratio of oxide to metal in the deposited metal suboxide coating. The density of the metal flux may, in turn, be adjusted by controlling the discharge current of the arc, by adjusting the pulse length (duration of on cycle) of the arc, and by adjusting the frequency of the arc, or any combination of these parameters. In a preferred embodiment, a low temperature process is disclosed for forming an electrically conductive metal suboxide, such as, for example, an electrically conductive suboxide of titanium, on an electrode surface, such as the surface of a nickel oxide electrode, by such cathodic arc deposition and control of the deposition parameters. In the preferred embodiment, the process results in a titanium suboxide-coated nickel oxide electrode exhibiting reduced parasitic evolution of oxygen during charging of a cell made using such an electrode as the positive electrode, as well as exhibiting high oxygen overpotential, resulting in suppression of oxygen evolution at the electrode at full charge of the cell.
摘要翻译：公开了一种低温工艺，用于通过阴极电弧沉积在基板上形成金属低氧化物，方法是控制存在于沉积室中的氧气的压力，或通过控制金属熔剂的密度，或通过这些调节的组合，从而控制沉积的金属低氧化物涂层中氧化物与金属的比例。通过调整电弧的脉冲长度（周期的持续时间），并通过调整电弧的频率，或通过调整电弧的频率，可以通过控制电弧的放电电流来调整金属焊剂的密度这些参数。在优选实施例中，公开了一种低温工艺，用于在电极表面（例如氧化镍电极的表面）上形成导电金属低氧化物，例如钛的导电低氧化物，通过这种阴极电弧沉积和沉积参数的控制。在优选的实施方案中，该方法产生了一种低氧化钛涂层的氧化镍电极，其在使用如正极这样的电极制成的电池充电期间表现出减少的氧的寄生放电，并且表现出高的氧超电势，导致抑制在电池完全充电时电极的氧气释放。

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