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1. 发明专利

BR9604720A 未知
公开(公告)号：BR9604720A
公开(公告)日：1998-09-01
申请号：BR9604720
申请日：1996-12-19
申请人： TEH SHIH HONG
发明人： TEH SHIH HONG
IPC分类号： H04Q5/00

2. 发明专利

BR9700291A 未知
公开(公告)号：BR9700291A
公开(公告)日：1998-06-23
申请号：BR9700291
申请日：1997-02-25
申请人： TEH SHIH HONG
发明人： TEH SHIH HONG
IPC分类号： H01H9/14 , H01T4/00

3. 发明申请

WO2011084127A3 METHODOLOGY FOR CLEANING OF SURFACE METAL CONTAMINATION FROM AN UPPER ELECTRODE USED IN A PLASMA CHAMBER 审中-公开
标题翻译：用于在等离子室中使用上电极清洁表面金属污染的方法
公开(公告)号：WO2011084127A3
公开(公告)日：2011-10-13
申请号：PCT/US2010003092
申请日：2010-12-06
申请人： LAM RES CORP , SHIH HONG , AVOYAN ARMEN , DESHMUKH SHASHANK C , CARMAN DAVID
发明人： SHIH HONG , AVOYAN ARMEN , DESHMUKH SHASHANK C , CARMAN DAVID
IPC分类号： H01L21/205 , H01L21/3065
CPC分类号： B08B3/08
摘要： A method for cleaning metallic contaminants from an upper electrode used in a plasma chamber. The method comprises a step of soaking the upper electrode in a cleaning solution of concentrated ammonium hydroxide, hydrogen peroxide and water. The cleaning solution is free of hydrofluoric acid and hydrochloric acid. The method further comprises an optional step of soaking the upper electrode in dilute nitric acid and rinsing the cleaned upper electrode.
摘要翻译：一种用于从等离子体室中使用的上电极清除金属污染物的方法。该方法包括将上电极浸泡在浓氢氧化铵，过氧化氢和水的清洁溶液中的步骤。清洁液不含氢氟酸和盐酸。该方法还包括将上电极浸泡在稀硝酸中并冲洗清洁后的上电极的可选步骤。

4. 发明申请

WO2010042907A3 METHOD OF REFURBISHING BIPOLAR ELECTROSTATIC CHUCK 审中-公开
标题翻译：改造双极性静电卡车的方法
公开(公告)号：WO2010042907A3
公开(公告)日：2010-07-15
申请号：PCT/US2009060289
申请日：2009-10-10
申请人： LAM RES CORP , SHIH HONG
发明人： SHIH HONG
IPC分类号： H01L21/683 , H01L21/687
CPC分类号： H01L21/6833 , H02N13/00 , Y10T29/49004 , Y10T29/49155 , Y10T29/49718 , Y10T29/49719 , Y10T29/49746
摘要： A bipolar electrostatic chuck refurbishing process in accordance with an aspect of the present invention does not require physical separation of the two electrodes of the electrostatic chuck. One aspect of the present invention is drawn to method of treating a bipolar electrostatic chuck having a front surface and a back surface and comprising a first electrode disposed at the front surface, a second electrode at the front surface and an anodized layer disposed on the front surface, the first electrode and the second electrode. The method comprises measuring a first parameter of the electrostatic chuck, discarding the electrostatic chuck if the first measured parameter is not within a first predetermined range, cleaning the electrostatic chuck if the first measured parameter is within the first predetermined range, sealing gaps between the first electrode and the second electrode at the front surface with a sealant, without displacing the first electrode relative to the second electrode, eliminating the anodized layer; and disposing a new anodized layer onto the front surface, the first electrode and the second electrode.
摘要翻译：根据本发明的一个方面的双极静电卡盘翻新工艺不需要静电卡盘的两个电极的物理分离。本发明的一个方面涉及一种处理具有前表面和后表面的双极静电卡盘的方法，所述双极性静电卡盘包括位于前表面处的第一电极，在前表面处的第二电极和设置在前表面上的阳极氧化层表面，第一电极和第二电极。该方法包括测量静电卡盘的第一参数，如果第一测量参数不在第一预定范围内，则将静电卡盘丢弃;如果第一测量参数在第一预定范围内，则清洁静电卡盘;密封第一测量参数之间的间隙电极和第二电极在前表面具有密封剂，而不相对于第二电极移动第一电极，消除阳极氧化层; 以及在所述前表面，所述第一电极和所述第二电极上设置新的阳极氧化层。

5. 发明申请

WO2010042907A2 METHOD OF REFURBISHING BIPOLAR ELECTROSTATIC CHUCK 审中-公开
标题翻译：翻新双极静电卡盘的方法
公开(公告)号：WO2010042907A2
公开(公告)日：2010-04-15
申请号：PCT/US2009/060289
申请日：2009-10-10
申请人： LAM RESEARCH CORPORATION , SHIH, Hong
发明人： SHIH, Hong
IPC分类号： H01L21/683 , H01L21/687
CPC分类号： H01L21/6833 , H02N13/00 , Y10T29/49004 , Y10T29/49155 , Y10T29/49718 , Y10T29/49719 , Y10T29/49746
摘要： A bipolar electrostatic chuck refurbishing process in accordance with an aspect of the present invention does not require physical separation of the two electrodes of the electrostatic chuck. One aspect of the present invention is drawn to method of treating a bipolar electrostatic chuck having a front surface and a back surface and comprising a first electrode disposed at the front surface, a second electrode at the front surface and an anodized layer disposed on the front surface, the first electrode and the second electrode. The method comprises measuring a first parameter of the electrostatic chuck, discarding the electrostatic chuck if the first measured parameter is not within a first predetermined range, cleaning the electrostatic chuck if the first measured parameter is within the first predetermined range, sealing gaps between the first electrode and the second electrode at the front surface with a sealant, without displacing the first electrode relative to the second electrode, eliminating the anodized layer; and disposing a new anodized layer onto the front surface, the first electrode and the second electrode.
摘要翻译：根据本发明的一个方面的双极静电卡盘翻新工艺不需要静电卡盘的两个电极的物理分离。本发明的一个方面涉及处理具有前表面和后表面的双极静电吸盘的方法，该双极静电吸盘包括设置在前表面处的第一电极，设置在前表面处的第二电极和设置在前表面上的阳极氧化层表面，第一电极和第二电极。该方法包括测量静电吸盘的第一参数，如果第一测量参数不在第一预定范围内，则丢弃静电吸盘，如果第一测量参数在第一预定范围内，则清洁静电吸盘，密封第一第一电极和第二电极在密封剂的前表面上，而不使第一电极相对于第二电极发生位移，从而消除阳极氧化层; 以及在前表面，第一电极和第二电极上设置新的阳极氧化层。

6. 发明申请

WO2010002724A2 PERIPHERALLY ENGAGING ELECTRODE CARRIERS AND ASSEMBLIES INCORPORATING THE SAME 审中-公开
标题翻译：外围接触电极载体和组装体
公开(公告)号：WO2010002724A2
公开(公告)日：2010-01-07
申请号：PCT/US2009048797
申请日：2009-06-26
申请人： LAM RES CORP , AUGUSTINO JASON , AVOYAN ARMEN , FANG YAN , OUTKA DUANE , SHIH HONG , WHITTEN STEPHEN
发明人： AUGUSTINO JASON , AVOYAN ARMEN , FANG YAN , OUTKA DUANE , SHIH HONG , WHITTEN STEPHEN
IPC分类号： H05H1/34
CPC分类号： H01J37/32541 , H01J37/32009 , H01J37/32605 , H01L21/67069
摘要： In accordance with one embodiment of the present disclosure, an assembly is provided comprising a multi-component electrode and a peripherally engaging electrode carrier. The peripherally engaging electrode carrier comprises a carrier frame and a plurality of reciprocating electrode supports. The multi-component electrode is positioned in the electrode accommodating aperture of the carrier frame. The backing plate of the electrode comprises a plurality of mounting recesses formed about its periphery. The reciprocating electrode supports can be reciprocated into and out of the mounting recesses. Additional embodiments of broader and narrower scope are contemplated.
摘要翻译：根据本公开的一个实施例，提供了包括多组分电极和外围接合电极载体的组件。外围接合电极载体包括载体框架和多个往复电极支撑件。多组分电极位于载体框架的电极容纳孔中。电极的背板包括围绕其周边形成的多个安装凹部。往复式电极支撑件可以往复运动进入和离开安装凹槽。考虑到更广泛和更窄范围的另外的实施例。

7. 发明申请

WO2005123282A3 METHODS FOR WET CLEANING QUARTZ SURFACES OF COMPONENTS FOR PLASMA PROCESSING CHAMBERS 审中-公开
公开(公告)号：WO2005123282A3
公开(公告)日：2005-12-29
申请号：PCT/US2005/019466
申请日：2005-06-03
申请人： LAM RESEARCH CORPORATION , SHIH, Hong , HUANG, Tuochuan , OUTKA, Duane , KUO, Jack , LIU, Shenjian , MOREL, Bruno , CHEN, Anthony
发明人： SHIH, Hong , HUANG, Tuochuan , OUTKA, Duane , KUO, Jack , LIU, Shenjian , MOREL, Bruno , CHEN, Anthony
IPC分类号： C23G1/02 , B08B3/00 , B08B3/04 , B08B3/14
摘要： Methods for wet cleaning quartz surfaces of components for plasma processing chambers in which semiconductor substrates are processed, such as etch chambers and resist stripping chambers, include contacting the quartz surface with at least one organic solvent, a basic solution and different acid solutions, so as to remove organic and metallic contaminants from the quartz surface. The quartz surface is preferably contacted with one of the acid solutions at least two times.

8. 发明申请

WO2010002724A3 PERIPHERALLY ENGAGING ELECTRODE CARRIERS AND ASSEMBLIES INCORPORATING THE SAME 审中-公开
公开(公告)号：WO2010002724A3
公开(公告)日：2010-01-07
申请号：PCT/US2009/048797
申请日：2009-06-26
申请人： LAM RESEARCH CORPORATION , AUGUSTINO, Jason , AVOYAN, Armen , FANG, Yan , OUTKA, Duane , SHIH, Hong , WHITTEN, Stephen
发明人： AUGUSTINO, Jason , AVOYAN, Armen , FANG, Yan , OUTKA, Duane , SHIH, Hong , WHITTEN, Stephen
IPC分类号： H05H1/34
摘要： In accordance with one embodiment of the present disclosure, an assembly is provided comprising a multi-component electrode and a peripherally engaging electrode carrier. The peripherally engaging electrode carrier comprises a carrier frame and a plurality of reciprocating electrode supports. The multi-component electrode is positioned in the electrode accommodating aperture of the carrier frame. The backing plate of the electrode comprises a plurality of mounting recesses formed about its periphery. The reciprocating electrode supports can be reciprocated into and out of the mounting recesses. Additional embodiments of broader and narrower scope are contemplated.

9. 发明申请

WO2007037955A3 ACTIVELY HEATED ALUMINUM BAFFLE COMPONENT HAVING IMPROVED PARTICLE PERFORMANCE AND METHODS OF USE AND MANUFACTURE THEREOF 审中-公开
标题翻译：具有改进颗粒性能的活性加热铝粉组分及其使用和制备方法
公开(公告)号：WO2007037955A3
公开(公告)日：2007-12-06
申请号：PCT/US2006035238
申请日：2006-09-11
申请人： LAM RES CORP , SHIH HONG , PENG G GRANT , REN DAXING
发明人： SHIH HONG , PENG G GRANT , REN DAXING
IPC分类号： H01L21/306 , C23C16/00 , C23C16/455 , C23C16/50 , C25D5/00 , C25D5/44
CPC分类号： H01L21/3065 , C23C16/4401 , C25D11/04 , H01J37/32623 , H01J37/32633 , H01L21/02041 , H01L21/67069
摘要： An actively heated aluminum baffle component such as a thermal control plate (101) or baffle ring (120) of a showerhead electrode assembly (100) of a plasma processing chamber has an exposed outer aluminum oxide layer which is formed by an electropolishing procedure. The exposed outer aluminum oxide layer minimizes defects and particles generated as a result of differential thermal stresses experienced by the aluminum component and outer aluminum oxide layer dupng plasma processing compared to an identically shaped component having a Type III anodized surface.
摘要翻译：诸如等离子体处理室的喷头电极组件（100）的热控制板（101）或挡板环（120）的主动加热的铝挡板部件具有通过电抛光工艺形成的露出的外部氧化铝层。暴露的外部氧化铝层与由具有III型阳极氧化表面的相同形状的部件相比，由于铝部件和外部氧化铝层复制等离子体处理所经受的差异热应力而产生的缺陷和颗粒最小化。

10. 发明申请

WO2006071544A3 METHODS FOR SILICON ELECTRODE ASSEMBLY ETCH RATE AND ETCH UNIFORMITY RECOVERY 审中-公开
标题翻译：用于硅电极组装蚀刻速率和蚀刻均匀性恢复的方法
公开(公告)号：WO2006071544A3
公开(公告)日：2007-08-16
申请号：PCT/US2005045361
申请日：2005-12-15
申请人： LAM RES CORP , HUANG TUOCHUAN , REN DAXING , SHIH HONG , ZHOU CATHERINE , YAN CHUN , MAGNI ENRICO , YEN BI MING , HUBACEK JEROME , LIM DAE J , SUNG DOUGYONG
发明人： HUANG TUOCHUAN , REN DAXING , SHIH HONG , ZHOU CATHERINE , YAN CHUN , MAGNI ENRICO , YEN BI MING , HUBACEK JEROME , LIM DAE J , SUNG DOUGYONG
IPC分类号： B24B1/00
CPC分类号： H01L21/67069 , B08B3/10 , B08B3/12 , B24C1/003 , H01J37/32605
摘要： Methods for cleaning an electrode assembly, which can be used for etching a dielectric material in a plasma etching chamber after the cleaning, comprise polishing a silicon surface of the electrode assembly, preferably to remove black silicon contamination therefrom.
摘要翻译：用于清洁电极组件的方法，其可用于在清洁之后蚀刻等离子体蚀刻室中的电介质材料，包括抛光电极组件的硅表面，优选从其中去除黑色硅污染物。

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