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    • 7. 发明申请
    • ELECTRODE SECURING PLATENS AND ELECTRODE POLISHING ASSEMBLIES INCORPORATING THE SAME
    • 电极安装板和电极抛光组件
    • WO2012061362A2
    • 2012-05-10
    • PCT/US2011/058745
    • 2011-11-01
    • LAM RESEARCH CORPORATIONLA CROIX, CliffAVOYAN, ArmenOUTKA, DuaneZHOU, CatherineSHIH, Hong
    • LA CROIX, CliffAVOYAN, ArmenOUTKA, DuaneZHOU, CatherineSHIH, Hong
    • H01L21/304
    • B24B37/30B24B41/061
    • In one embodiment, an electrode polishing assembly may include an electrode securing platen, a plurality of electrode locating fasteners, and an electrode. Each of the electrode locating fasteners may include an electrode spacing shoulder, a variance cancelling shoulder extending from the electrode spacing shoulder, a threaded platen clamping portion extending from the variance cancelling shoulder, and a threaded nut that engages the threaded platen clamping portion. The electrode locating fasteners clamp the electrode securing platen between the threaded nut and the electrode spacing shoulder. The variance cancelling shoulder is at least partially within one of a plurality of variance cancelling passages of the electrode securing platen. A minimum position stack-up is equal to a minimum passage size minus a maximum shoulder size. A maximum position stack-up is equal to a maximum passage size minus a minimum shoulder size. The maximum position stack-up is greater than the minimum position stack-up.
    • 在一个实施例中,电极抛光组件可以包括电极固定压板,多个电极定位紧固件和电极。 每个电极定位紧固件可以包括电极间隔肩部,从电极间隔肩部延伸的方差消除肩部,从变形消除肩部延伸的螺纹压板夹持部分和与螺纹压板夹持部分接合的螺纹螺母。 电极定位紧固件将电极固定压板夹在螺母和电极间隔肩之间。 方差消除肩部至少部分地在电极固定台板的多个方差消除通路之一内。 最小位置叠加等于最小通道尺寸减去最大肩部尺寸。 最大位置叠加等于最大通道尺寸减去最小肩部尺寸。 最大位置叠加大于最小位置叠加。
    • 9. 发明申请
    • DUAL PHASE CLEANING CHAMBERS AND ASSEMBLIES COMPRISING THE SAME
    • 双相清洗器和包括该相机的组件
    • WO2013012693A1
    • 2013-01-24
    • PCT/US2012/046579
    • 2012-07-13
    • LAM RESEARCH CORPORATIONAVOYAN, ArmenLA CROIX, CliffSHIH, Hong
    • AVOYAN, ArmenLA CROIX, CliffSHIH, Hong
    • H05H1/34H01L21/3065C23C16/505
    • H01J37/32862B08B3/00B08B3/02H01J21/00H01J37/32532H01L21/00
    • In one embodiment, a dual phase cleaning chamber may include a turbulent mixing chamber, a fluid diffuser, an isostatic pressure chamber and a rupture mitigating nozzle. The turbulent mixing chamber may be in fluid communication with a first fluid inlet and a second fluid inlet. The fluid diffuser may be in fluid communication with the turbulent mixing chamber. The rupture mitigating nozzle may include a first fluid collecting offset, a second fluid collecting offset, and a displacement damping projection. The displacement damping projection may be disposed between the first and second fluid collecting offset and may be offset away from each of the first fluid collecting offset and the second fluid collecting offset, and towards the fluid diffuser. A pressurized cleaning fluid introduced from the first fluid inlet, the second fluid inlet, or both flows through the outlet passage of the first and second fluid collecting offset.
    • 在一个实施例中,双相清洗室可以包括湍流混合室,流体扩散器,等静压压力室和破裂缓冲喷嘴。 湍流混合室可以与第一流体入口和第二流体入口流体连通。 流体扩散器可以与湍流混合室流体连通。 破裂缓冲喷嘴可以包括第一流体收集偏移,第二流体收集偏移和位移阻尼突起。 位移阻尼突起可以设置在第一和第二流体收集偏移之间,并且可以偏离第一流体收集偏移和第二流体收集偏移中的每一个并且朝向流体扩散器偏移。 从第一流体入口,第二流体入口或二者引入的加压清洁流体流过第一和第二流体收集偏移的出口通道。