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1. 发明授权

US07374636B2 Method and apparatus for providing uniform plasma in a magnetic field enhanced plasma reactor 失效
标题翻译：在磁场增强等离子体反应器中提供均匀等离子体的方法和装置
公开(公告)号：US07374636B2
公开(公告)日：2008-05-20
申请号：US10205870
申请日：2002-07-26
申请人： Keiji Horioka , Chun Yan , Taeho Shin , Roger Alan Lindley , Panyin Hughes , Douglas H. Burns , Evans Y. Lee , Bryan Y. Pu , Qi Li , Mahmoud Dahimene
发明人： Keiji Horioka , Chun Yan , Taeho Shin , Roger Alan Lindley , Panyin Hughes , Douglas H. Burns , Evans Y. Lee , Bryan Y. Pu , Qi Li , Mahmoud Dahimene
IPC分类号： H01L21/306 , C23C16/00
CPC分类号： H01J37/32623 , H01J37/3266
摘要： A method and apparatus for controlling a magnetic field gradient within a magnetically enhanced plasma reactor. The apparatus comprises a cathode pedestal supporting a wafer within an enclosure, a plurality of electromagnets positioned proximate the enclosure for producing a magnetic field in the enclosure and a magnetic field control element, positioned proximate the electromagnets, for controlling the magnetic field proximate a specific region of the wafer.
摘要翻译：一种用于控制磁增强等离子体反应器内的磁场梯度的方法和装置。该装置包括支撑外壳内的晶片的阴极基座，靠近外壳定位的多个电磁体，用于在外壳中产生磁场，并且磁场控制元件位于电磁体附近，用于控制靠近特定区域的磁场的晶片。

2. 发明授权

US08382939B2 Plasma processing chamber with enhanced gas delivery 有权
标题翻译：等离子处理室具有增强的气体输送
公开(公告)号：US08382939B2
公开(公告)日：2013-02-26
申请号：US12501885
申请日：2009-07-13
申请人： Michael Charles Kutney , Roger Alan Lindley
发明人： Michael Charles Kutney , Roger Alan Lindley
IPC分类号： C23C16/455 , C23F1/00 , H01L21/306 , C23C16/06 , C23C16/22 , C23C16/50 , C23C16/503 , C23C16/505 , C23C16/509
CPC分类号： H01J37/32834 , H01J37/3244 , H01J37/32449
摘要： A method and apparatus for providing flow into a processing chamber are provided. In one embodiment, a vacuum processing chamber is provided that includes a substrate support pedestal disposed in an interior volume of a chamber body, a lid enclosing the interior volume, a gas distribution plate positioned below the lid and above the substrate support pedestal, and a vortex inducing gas inlet oriented to induce a vortex of gas circulating in a plenum around a center line of the chamber body prior to the gas passing through the gas distribution plate.
摘要翻译：提供了一种用于提供流入处理室的方法和装置。在一个实施例中，提供真空处理室，其包括设置在室主体的内部容积中的基板支撑台座，封闭内部容积的盖子，位于盖子下方和基板支撑台架上方的气体分配板，以及在气体通过气体分布板之前，引导气体入口被引导以引起在室主体的中心线周围的增压室中循环的气体涡流。

3. 发明申请

US20120053719A1 METHOD AND APPARATUS FOR AUTOMATED VALIDATION OF SEMICONDUCTOR PROCESS RECIPES 有权
标题翻译：自动验证半导体工艺步骤的方法和装置
公开(公告)号：US20120053719A1
公开(公告)日：2012-03-01
申请号：US13044747
申请日：2011-03-10
申请人： CHARLES HARDY , ROGER ALAN LINDLEY
发明人： CHARLES HARDY , ROGER ALAN LINDLEY
IPC分类号： G06N5/02 , G06F19/00
CPC分类号： G06N5/025
摘要： Methods and apparatus for automated validation of semiconductor process steps are provided herein. In some examples, a method for validating a semiconductor process recipe includes: selecting a rule set describing an operating window for a semiconductor process tool; checking parameter values defined by steps in the semiconductor process recipe against limit-checking rules of the rule set to produce first results; determining step types from the steps in the semiconductor process recipe using step definition rules of the rule set to produce second results; checking transitions between the step types against step transition rules of the rule set to produce third results; and generating, using the computer, validation data for use of the semiconductor process recipe with the semiconductor process tool based on the first, the second, and the third results.
摘要翻译：本文提供了半导体工艺步骤的自动验证的方法和装置。在一些示例中，用于验证半导体处理配方的方法包括：选择描述半导体处理工具的操作窗口的规则集; 检查由半导体工艺配方中的步骤定义的参数值，以反映规则集的限制检查规则以产生第一个结果; 使用规则集的步骤定义规则从半导体工艺配方中的步骤确定步骤类型以产生第二结果; 检查步骤类型与规则集的步骤转换规则之间的转换，以产生第三个结果; 以及基于第一，第二和第三结果，使用计算机产生使用半导体处理工具的半导体工艺配方的验证数据。

4. 发明授权

US07879186B2 Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor 失效
标题翻译：用于在磁场增强等离子体反应器中成形磁场的方法和装置
公开(公告)号：US07879186B2
公开(公告)日：2011-02-01
申请号：US12204408
申请日：2008-09-04
申请人： Roger Alan Lindley , Jingbao Liu , Bryan Y. Pu , Keiji Horioka
发明人： Roger Alan Lindley , Jingbao Liu , Bryan Y. Pu , Keiji Horioka
IPC分类号： C23F1/00 , C23C16/00 , H01L21/306
CPC分类号： H01J37/32623 , H01J37/3266 , H01J37/32688
摘要： A magnetic field generator which provides greater control over the magnetic field is provided. The magnetic field generator has a plurality of overlapping main magnetic coil sections for forming a magnetic field generally parallel to the top surface of the supporting member. In other embodiments, sub-magnetic coil sections are placed symmetrically around the main magnetic coil sections.
摘要翻译：提供了提供对磁场的更大控制的磁场发生器。磁场发生器具有多个重叠的主磁线圈段，用于形成大致平行于支撑构件的顶表面的磁场。在其他实施例中，副磁性线圈部分围绕主电磁线圈部分对称放置。

5. 发明授权

US07422654B2 Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor 失效
标题翻译：用于在磁场增强等离子体反应器中成形磁场的方法和装置
公开(公告)号：US07422654B2
公开(公告)日：2008-09-09
申请号：US10778933
申请日：2004-02-13
申请人： Roger Alan Lindley , Jingbao Liu , Bryan Y. Pu , Keiji Horioka
发明人： Roger Alan Lindley , Jingbao Liu , Bryan Y. Pu , Keiji Horioka
IPC分类号： C23F1/00 , H01L21/306 , C23C16/00
CPC分类号： H01J37/32623 , H01J37/3266 , H01J37/32688
摘要： A magnetic field generator which provides greater control over the magnetic field is provided. The magnetic field generator has a plurality of overlapping main magnetic coil sections for forming a magnetic field generally parallel to the top surface of the supporting member. In other embodiments, sub-magnetic coil sections are placed symmetrically around the main magnetic coil sections.
摘要翻译：提供了提供对磁场的更大控制的磁场发生器。磁场发生器具有多个重叠的主磁线圈段，用于形成大致平行于支撑构件的顶表面的磁场。在其他实施例中，副磁性线圈部分围绕主电磁线圈部分对称放置。

6. 发明申请

US20080257261A1 PLASMA PROCESSING APPARATUS 有权
标题翻译：等离子体加工设备
公开(公告)号：US20080257261A1
公开(公告)日：2008-10-23
申请号：US11738505
申请日：2007-04-22
申请人： Hiroji Hanawa , Andrew Nguyen , Keiji Horiaka , Kallol Bera , Kenneth S. Collins , Lawrence Wong , Martin Jeff Salinas , Roger Alan Lindley , Hong S. Yang
发明人： Hiroji Hanawa , Andrew Nguyen , Keiji Horiaka , Kallol Bera , Kenneth S. Collins , Lawrence Wong , Martin Jeff Salinas , Roger Alan Lindley , Hong S. Yang
IPC分类号： H05H1/00
CPC分类号： H01J37/3266 , H01J37/32623
摘要： Embodiments of the present invention relate to plasma processing apparatus and methods of use thereof. In some embodiments, a plasma control magnet assembly includes a plurality of magnets arranged in a predetermined pattern that generate a magnetic field having a strength greater than 10 Gauss in a region proximate the assembly and less than 10 Gauss in a region remote from the assembly.
摘要翻译：本发明的实施例涉及等离子体处理装置及其使用方法。在一些实施例中，等离子体控制磁体组件包括以预定图案布置的多个磁体，其在靠近组件的区域中产生强度大于10高斯的磁场，并且在远离组件的区域中小于10高斯。

7. 发明授权

US08936696B2 Method and apparatus for shaping a magnetic field in a magnetic field-enhanced plasma reactor 有权
标题翻译：用于在磁场增强等离子体反应器中成形磁场的方法和装置
公开(公告)号：US08936696B2
公开(公告)日：2015-01-20
申请号：US13011014
申请日：2011-01-21
申请人： Roger Alan Lindley , Jingbao Liu , Bryan Y. Pu , Keiji Horioka
发明人： Roger Alan Lindley , Jingbao Liu , Bryan Y. Pu , Keiji Horioka
IPC分类号： C23F1/00 , H01L21/306 , C23C16/00 , H01J37/32
CPC分类号： H01J37/32623 , H01J37/3266 , H01J37/32688
摘要： A magnetic field generator which provides greater control over the magnetic field is provided. The magnetic field generator has a plurality of overlapping main magnetic coil sections for forming a magnetic field generally parallel to the top surface of the supporting member. In other embodiments, sub-magnetic coil sections are placed symmetrically around the main magnetic coil sections.
摘要翻译：提供了提供对磁场的更大控制的磁场发生器。磁场发生器具有多个重叠的主磁线圈段，用于形成大致平行于支撑构件的顶表面的磁场。在其他实施例中，副磁性线圈部分围绕主电磁线圈部分对称放置。

8. 发明授权

US08527081B2 Method and apparatus for automated validation of semiconductor process recipes 有权
标题翻译：用于半导体工艺配方自动验证的方法和装置
公开(公告)号：US08527081B2
公开(公告)日：2013-09-03
申请号：US13044747
申请日：2011-03-10
申请人： Charles Hardy , Roger Alan Lindley
发明人： Charles Hardy , Roger Alan Lindley
IPC分类号： G06F19/00
CPC分类号： G06N5/025
摘要： Methods and apparatus for automated validation of semiconductor process steps are provided herein. In some examples, a method for validating a semiconductor process recipe includes: selecting a rule set describing an operating window for a semiconductor process tool; checking parameter values defined by steps in the semiconductor process recipe against limit-checking rules of the rule set to produce first results; determining step types from the steps in the semiconductor process recipe using step definition rules of the rule set to produce second results; checking transitions between the step types against step transition rules of the rule set to produce third results; and generating, using the computer, validation data for use of the semiconductor process recipe with the semiconductor process tool based on the first, the second, and the third results.
摘要翻译：本文提供了半导体工艺步骤的自动验证的方法和装置。在一些示例中，用于验证半导体处理配方的方法包括：选择描述半导体处理工具的操作窗口的规则集; 检查由半导体工艺配方中的步骤定义的参数值，以反映规则集的限制检查规则以产生第一个结果; 使用规则集的步骤定义规则从半导体工艺配方中的步骤确定步骤类型以产生第二结果; 检查步骤类型与规则集的步骤转换规则之间的转换，以产生第三个结果; 以及基于第一，第二和第三结果，使用计算机产生使用半导体处理工具的半导体工艺配方的验证数据。

9. 发明申请

US20110115589A1 METHOD AND APPARATUS FOR SHAPING A MAGNETIC FIELD IN A MAGNETIC FIELD-ENHANCED PLASMA REACTOR 有权
标题翻译：在磁场增强等离子体反应器中形成磁场的方法和装置
公开(公告)号：US20110115589A1
公开(公告)日：2011-05-19
申请号：US13011014
申请日：2011-01-21
申请人： ROGER ALAN LINDLEY , JINGBAO LIU , BRYAN Y. PU , KEIJI HORIOKA
发明人： ROGER ALAN LINDLEY , JINGBAO LIU , BRYAN Y. PU , KEIJI HORIOKA
IPC分类号： H01F5/00
CPC分类号： H01J37/32623 , H01J37/3266 , H01J37/32688
摘要： A magnetic field generator which provides greater control over the magnetic field is provided. The magnetic field generator has a plurality of overlapping main magnetic coil sections for forming a magnetic field generally parallel to the top surface of the supporting member. In other embodiments, sub-magnetic coil sections are placed symmetrically around the main magnetic coil sections.
摘要翻译：提供了提供对磁场的更大控制的磁场发生器。磁场发生器具有多个重叠的主磁线圈段，用于形成大致平行于支撑构件的顶表面的磁场。在其他实施例中，副磁性线圈部分围绕主电磁线圈部分对称放置。

10. 发明申请

US20110006038A1 PLASMA PROCESSING CHAMBER WITH ENHANCED GAS DELIVERY 有权
标题翻译：具有增强气体输送的等离子体加工室
公开(公告)号：US20110006038A1
公开(公告)日：2011-01-13
申请号：US12501885
申请日：2009-07-13
申请人： Michael Charles Kutney , Roger Alan Lindley
发明人： Michael Charles Kutney , Roger Alan Lindley
IPC分类号： C23F1/00 , C23F1/08
CPC分类号： H01J37/32834 , H01J37/3244 , H01J37/32449
摘要： A method and apparatus for providing flow into a processing chamber are provided. In one embodiment, a vacuum processing chamber is provided that includes a substrate support pedestal disposed in an interior volume of a chamber body, a lid enclosing the interior volume, a gas distribution plate positioned below the lid and above the substrate support pedestal, and a vortex inducing gas inlet oriented to induce a vortex of gas circulating in a plenum around a center line of the chamber body prior to the gas passing through the gas distribution plate.
摘要翻译：提供了一种用于提供流入处理室的方法和装置。在一个实施例中，提供真空处理室，其包括设置在室主体的内部容积中的基板支撑台座，封闭内部容积的盖子，位于盖子下方和基板支撑台架上方的气体分配板，以及在气体通过气体分布板之前，引导气体入口被引导以引起在室主体的中心线周围的增压室中循环的气体涡流。

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