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    • 3. 发明申请
    • Spectroscopic analysis apparatus and method with excitation system and focus monitoring system
    • 光谱分析装置及方法与激励系统和焦点监测系统
    • US20060258942A1
    • 2006-11-16
    • US10547971
    • 2004-03-01
    • Michael Van BeekPeter Greve
    • Michael Van BeekPeter Greve
    • A61B6/00A61B5/00
    • A61B5/0059A61B5/0068G01J3/44G01N21/65G02B21/241
    • The present invention relates to an analysis apparatus, in particular a spectroscopic analysis apparatus, for analyzing an object, such as blood of a patient, and a corresponding analysis method. To aim the confocal detection volume inside a blood vessel orthogonal polarized spectral imaging (OPSI) is used to locate blood capillaries in the skin. An imaging system (img) with slightly shifted imaging planes (i1, i2) for OPS imaging of blood vessels is proposed to provide auto-focusing. The confocal Raman detection plane (dp) is located in between these two imaging planes (i1, i2). Based on measured amount of defocus for the imaging planes (i1, i2), the focusing of the imaging system (img), the excitation system (exs) for exciting the target region and the detection system (dsy) are adjusted such that the difference of the amount of defocus equals a predetermined amount so that the confocal detection plane (dp) is located inside the blood vessel (V). Thus, continuous auto-focusing with high accuracy can be achieved. The invention relates also to an optical tracking system for continuously tracking a point of a moving object (obj).
    • 本发明涉及用于分析患者血液等物体的分析装置,特别是光谱分析装置以及相应的分析方法。 为了瞄准血管内的共焦检测体积,使用正交偏振光谱成像(OPSI)来定位皮肤中的毛细血管。 提出了一种具有稍微偏移的成像平面(i 1,i 2)用于血管的OPS成像的成像系统(img),以提供自动聚焦。 共焦拉曼检测平面(dp)位于这两个成像平面(i 1,i 2)之间。 基于测量的成像平面(i 1,i 2)的散焦量,调整成像系统(img)的聚焦,用于激发目标区域的激发系统(exs)和检测系统(dsy),使得 散焦量的差别等于预定量,使得共焦检测平面(dp)位于血管(V)内。 因此,可以实现高精度的连续自动聚焦。 本发明还涉及用于连续跟踪移动物体(obj)的点的光学跟踪系统。
    • 4. 发明申请
    • System for dark-field imaging of target areas below an object surface
    • 用于对象表面以下目标区域的暗场成像系统
    • US20060235308A1
    • 2006-10-19
    • US10567284
    • 2004-07-29
    • Michael Van BeekFrank Schuurmans
    • Michael Van BeekFrank Schuurmans
    • A61B6/00A61B5/00
    • A61B5/0059G01N21/21G01N21/4795G01N2021/8822
    • A monitoring system for dark-field imaging of a target area (72) below a surface (70) of an object, e.g., capillary vessel under the surface of the skin of a patient, comprises an illumination optical system (31), an imaging system (35), and a selective optical interception system for suppressing illumination light returning from the region between the surface of the object and the target area. The interception system may comprise crossed polarizers (32, 37) in the illumination and imagining paths, respectively, and/or an aperture stop (51) arranged to intercept a central portion of the returning imaging beam. Alternatively, the illumination and imaging paths subtend an angle and the illumination focus and the imaging focus are displaced relative to each other. The monitoring system may be comprised in an analysis apparatus further comprising a spectroscopy system having an excitation system and a detection system.
    • 用于对象物表面(70)下方的目标区域(72)的暗场成像的监视系统,例如患者皮肤表面下的毛细血管,包括照明光学系统(31),成像 系统(35),以及用于抑制从物体表面与目标区域之间的区域返回的照明光的选择性光学拦截系统。 拦截系统可以包括分别在照明和想象路径中的交叉偏振器(32,37)和/或布置成拦截返回成像束的中心部分的孔径光阑(51)。 或者,照明和成像路径对着一个角度,并且照明焦点和成像焦点相对于彼此移位。 监视系统可以包括在还包括具有激励系统和检测系统的光谱系统的分析装置中。
    • 9. 发明申请
    • Lithographic apparatus and device manufacturing method
    • 平版印刷设备和器件制造方法
    • US20060215132A1
    • 2006-09-28
    • US11373503
    • 2006-03-13
    • Mark KroonMichael Van BeekPeter DirksenRalph KurtCassandra Owen
    • Mark KroonMichael Van BeekPeter DirksenRalph KurtCassandra Owen
    • G03B27/52
    • G03F7/70983G03F7/70808G03F7/70916G03F7/70933
    • A lithographic apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a fluid cleaning system that cleans a fluid to be introduced into a region in between the optical element and the substrate. The fluid cleaning system includes a fluid inlet, a fluid outlet, and a cleaning zone disposed between the inlet and outlet. The cleaning zone includes a nucleated surface provided with a plurality of nucleation sites.
    • 光刻设备包括提供辐射束的辐射系统和支撑图案化结构的支撑结构。 图形结构被配置为根据期望的图案对辐射束进行图案化。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 投影系统包括光学元件,该光学元件具有通过图案化光束通过的每一个的光束出射区域。 该装置还包括清洁被引入到光学元件和基板之间的区域中的流体的流体清洁系统。 流体清洁系统包括流体入口,流体出口和布置在入口和出口之间的清洁区域。 清洁区包括具有多个成核位点的成核表面。