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1. 发明申请

US20060235308A1 System for dark-field imaging of target areas below an object surface 审中-公开
标题翻译：用于对象表面以下目标区域的暗场成像系统
公开(公告)号：US20060235308A1
公开(公告)日：2006-10-19
申请号：US10567284
申请日：2004-07-29
申请人： Michael Van Beek , Frank Schuurmans
发明人： Michael Van Beek , Frank Schuurmans
IPC分类号： A61B6/00 , A61B5/00
CPC分类号： A61B5/0059 , G01N21/21 , G01N21/4795 , G01N2021/8822
摘要： A monitoring system for dark-field imaging of a target area (72) below a surface (70) of an object, e.g., capillary vessel under the surface of the skin of a patient, comprises an illumination optical system (31), an imaging system (35), and a selective optical interception system for suppressing illumination light returning from the region between the surface of the object and the target area. The interception system may comprise crossed polarizers (32, 37) in the illumination and imagining paths, respectively, and/or an aperture stop (51) arranged to intercept a central portion of the returning imaging beam. Alternatively, the illumination and imaging paths subtend an angle and the illumination focus and the imaging focus are displaced relative to each other. The monitoring system may be comprised in an analysis apparatus further comprising a spectroscopy system having an excitation system and a detection system.
摘要翻译：用于对象物表面（70）下方的目标区域（72）的暗场成像的监视系统，例如患者皮肤表面下的毛细血管，包括照明光学系统（31），成像系统（35），以及用于抑制从物体表面与目标区域之间的区域返回的照明光的选择性光学拦截系统。拦截系统可以包括分别在照明和想象路径中的交叉偏振器（32,37）和/或布置成拦截返回成像束的中心部分的孔径光阑（51）。或者，照明和成像路径对着一个角度，并且照明焦点和成像焦点相对于彼此移位。监视系统可以包括在还包括具有激励系统和检测系统的光谱系统的分析装置中。

2. 发明申请

US20060158734A1 Optical analysis system 失效
标题翻译：光学分析系统
公开(公告)号：US20060158734A1
公开(公告)日：2006-07-20
申请号：US10539540
申请日：2003-12-19
申请人： Frank Schuurmans , Michael Van Beek , Levinus Bakker , Wouter Rensen , Bernardus Hendrikus Hendriks , Robert Hendriks , Thomas Steffen
发明人： Frank Schuurmans , Michael Van Beek , Levinus Bakker , Wouter Rensen , Bernardus Hendrikus Hendriks , Robert Hendriks , Thomas Steffen
IPC分类号： G02B27/28
CPC分类号： G01J3/02 , G01J3/0205 , G01J3/021 , G01J3/10 , G01J3/28 , G01J3/36 , G01N21/274 , G01N21/31 , G01N2021/3196 , G01N2201/129
摘要： The optical analysis system (20) for determining an amplitude of a principal component of an optical signal comprises a multivariate optical element (10) for reflecting the optical signal and thereby weighing the optical signal by a spectral weighing function, and a detector (9, 9P, 9N) for detecting the weighed optical signal. The optical analysis system (20) may further comprise a dispersive element (2) for spectrally dispersing the optical signal, the multivariate optical element being arranged to receive the dispersed optical signal. The blood analysis system (40) comprises the optical analysis system (20) according to the invention.
摘要翻译：用于确定光信号的主分量的幅度的光学分析系统（20）包括用于反射光信号并由此通过光谱称重功能称重光信号的多元光学元件（10） 9 P，9 N），用于检测加权的光信号。光学分析系统（20）还可以包括用于光谱分散光学信号的色散元件（2），所述多元光学元件被布置成接收分散的光信号。血液分析系统（40）包括根据本发明的光学分析系统（20）。

3. 发明申请

US20070293766A1 Transmission Based Imaging for Spectroscopic Analysis 审中-公开
标题翻译：基于透射的光谱分析成像
公开(公告)号：US20070293766A1
公开(公告)日：2007-12-20
申请号：US11574163
申请日：2005-08-24
申请人： Bernardus Bakker , Gerald Lucassen , Michael Van Beek , Marjolein Van Der Voort , Robert Hendriks , Frank Schuurmans
发明人： Bernardus Bakker , Gerald Lucassen , Michael Van Beek , Marjolein Van Der Voort , Robert Hendriks , Frank Schuurmans
IPC分类号： G01J3/28
CPC分类号： A61B5/489 , A61B5/0059 , A61B2562/0238 , G01J3/36 , G01J3/42 , G01N21/31 , G01N21/35 , G01N21/59
摘要： The present invention provides a spectroscopic system and a transmission based imaging system for a spectroscopic system as well as a probe head for a transmission based imaging system for a spectroscopic system and a corresponding transmission based imaging method. The spectroscopic system is preferably applicable to in vivo noninvasive blood analysis. Transmission based imaging makes use of a transmitted portion of an imaging or monitoring beam that has been transmitted through biological tissue. By means of transmission based imaging, a contrast decreasing impact of scattered radiation can be effectively reduced. Additionally, by arranging the imaging light source opposite to an objective lens of the spectroscopic system, unintended propagation of spectroscopic excitation radiation into free space can be effectively prevented.
摘要翻译：本发明提供了一种用于分光系统的光谱系统和基于透射的成像系统以及用于分光系统的基于透射的成像系统和相应的基于透射的成像方法的探针头。光谱系统优选适用于体内非侵入性血液分析。基于传输的成像利用已经通过生物组织传输的成像或监视光束的透射部分。通过基于传输的成像，可以有效降低散射辐射的对比度减小的影响。此外，通过将成像光源与分光系统的物镜相对设置，可以有效地防止光谱激发辐射的非预期传播进入自由空间。

4. 发明申请

US20070177240A1 Optical analysis system using multivariate optical elements 失效
标题翻译：光学分析系统采用多元光学元件
公开(公告)号：US20070177240A1
公开(公告)日：2007-08-02
申请号：US10596564
申请日：2004-12-16
申请人： Michael Van Beek , Frank Schuurmans , Levinus Bakker
发明人： Michael Van Beek , Frank Schuurmans , Levinus Bakker
IPC分类号： G02B26/08
CPC分类号： A61B5/1455 , A61B5/14532 , A61B5/14546 , A61B5/14552 , G01J3/36 , G01N21/65 , G01N33/49
摘要： The present invention provides an optical analysis system for determining an amplitude of a principal component of an optical signal. The principal component is indicative of the concentration of a particular compound or various compounds of a substance that is subject to spectroscopic analysis. The optical signal is subject to wavelength selective weighting and wavelength selective spatial separation specified by a weighting function. The optical signal is preferably separated into two parts that corresponding to a positive and negative spectral band of the weighting function, respectively. The separation provides separate detection of the separated parts of the optical signal without significant loss of intensity, thereby providing an improved signal to noise ratio of the determined principal component. Separation and weighting of the optical signal is realized by two multivariate optical elements.
摘要翻译：本发明提供了一种用于确定光信号的主分量的幅度的光学分析系统。主要成分指示特定化合物或受光谱分析的物质的各种化合物的浓度。光信号经受由加权函数指定的波长选择加权和波长选择性空间分离。光信号优选分为对应于加权函数的正和负光谱带的两部分。分离提供对光信号的分离部分的单独检测，而没有明显的强度损失，从而提供确定的主要分量的改善的信噪比。光信号的分离和加权由两个多元光学元件实现。

5. 发明申请

US20050098741A1 Lithographic projection apparatus, particle barrier for use therein, integrated structure manufacturing method, and device manufactured thereby 有权
标题翻译：平版印刷设备，其中使用的粒子屏障，一体化结构制造方法以及由此制造的器件
公开(公告)号：US20050098741A1
公开(公告)日：2005-05-12
申请号：US11000381
申请日：2004-12-01
申请人： Levinus Bakker , Frank Schuurmans , Vadim Banine
发明人： Levinus Bakker , Frank Schuurmans , Vadim Banine
IPC分类号： G03F7/20 , H01L21/027 , H01L21/425
CPC分类号： G03F7/70166 , G03F7/70058 , G03F7/708 , G03F7/70825 , G03F7/70916 , G03F7/70983
摘要： A lithographic projection apparatus for EUV lithography includes a foil trap, or channel barrier. The foil trap forms an open structure after the source to let the radiation pass unhindered. The foil trap is configured to be rotatable around an optical axis. By rotating the foil trap, an impulse transverse to the direction of propagation of the radiation can be transferred on debris present in the beam. This debris will not pass the foil trap. In this way, the amount of debris on the optical components downstream of the foil trap is reduced. The foil trap may be alternately rotated around the optical axis in a first direction and a second direction opposite the first direction.
摘要翻译：用于EUV光刻的光刻投影装置包括箔陷阱或通道屏障。箔夹在源之后形成开放结构，以使辐射不受阻碍地通过。箔捕获器被配置为围绕光轴可旋转。通过旋转箔捕获器，横向于辐射传播方向的脉冲可以转移到光束中存在的碎片上。这个碎片不会通过箔片陷阱。以这种方式，箔陷阱下游的光学部件上的碎屑的量减少。箔捕获器可以在与第一方向相反的第一方向和第二方向上围绕光轴交替旋转。

6. 发明申请

US20060012761A1 Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap 有权
标题翻译：平版印刷设备，辐射系统，污染物捕集阱，装置制造方法以及在污染物捕集器中捕获污染物的方法
公开(公告)号：US20060012761A1
公开(公告)日：2006-01-19
申请号：US10890404
申请日：2004-07-14
申请人： Levinus Bakker , Vadim Banine , Cornelis Petrus Luijkx , Frank Schuurmans
发明人： Levinus Bakker , Vadim Banine , Cornelis Petrus Luijkx , Frank Schuurmans
IPC分类号： G03B27/52
CPC分类号： G03F7/70908 , G03F7/70916 , G03F7/70933
摘要： A lithographic apparatus includes a radiation system that includes a source for producing a radiation beam, a contaminant trap arranged in a path of the radiation beam, and an illumination system configured to condition the radiation beam produced by the source, and a support for supporting a patterning device. The patterning device serves to impart the conditioned radiation beam with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, and a projection system for projecting the patterned radiation beam onto a target portion of the substrate. The contaminant trap includes a plurality of foils that define channels that are arranged substantially parallel to the direction of propagation of the radiation beam. The trap is provided with a gas supply system that is arranged to inject gas into at least one of the channels of the trap.
摘要翻译：光刻设备包括辐射系统，其包括用于产生辐射束的源，布置在辐射束的路径中的污染物阱，以及被配置为调节由源产生的辐射束的照明系统，以及用于支撑图案形成装置。图案形成装置用于使经调节的辐射束在其横截面上具有图案。该装置还包括用于保持基板的基板台和用于将图案化的辐射束投影到基板的目标部分上的投影系统。污染物捕集器包括限定基本上平行于辐射束的传播方向布置的通道的多个箔片。陷阱设置有气体供应系统，其被布置成将气体注入到阱的至少一个通道中。

7. 发明申请

US20060006350A1 Lithographic projection apparatus and reflector assembly for use therein 有权
标题翻译：平版印刷设备和用于其中的反射器组件
公开(公告)号：US20060006350A1
公开(公告)日：2006-01-12
申请号：US11224084
申请日：2005-09-13
申请人： Frank Schuurmans , Levinus Bakker
发明人： Frank Schuurmans , Levinus Bakker
IPC分类号： H01J37/00
CPC分类号： B82Y10/00 , G03F7/70166 , G03F7/70958
摘要： A lithographic projection apparatus includes a grazing incidence collector. The grazing incidence collector is made up of several reflectors. In order to reduce the amount of heat on the collector, the reflectors are coated. The reflector at the exterior of the collector has an infrared radiating layer on the outside. The inner reflectors are coated with an EUV reflective layer on the outside.
摘要翻译：光刻投影装置包括掠入射收集器。放射入射收集器由多个反射器组成。为了减少收集器上的热量，反射器被涂覆。收集器外部的反射器在外部具有红外辐射层。内部反射器在外部涂有EUV反射层。

8. 发明授权

US06596977B2 Average light sensing for PWM control of RGB LED based white light luminaries 有权
标题翻译：用于基于RGB LED的白光照明器的PWM控制的平均光感测
公开(公告)号：US06596977B2
公开(公告)日：2003-07-22
申请号：US09972111
申请日：2001-10-05
申请人： Subramanian Muthu , Frank Schuurmans
发明人： Subramanian Muthu , Frank Schuurmans
IPC分类号： G01J132
CPC分类号： H05B33/0818 , H05B33/0869 , H05B33/0872
摘要： An LED array is controlled by determining a constant relating the peak light output of an LED to the peak driving current of a PWM pulse driving the LED, and multiplying the average current of the PWM pulse by the constant to obtain a value of average light output for the LED. The constant may be determined by simultaneously measuring peak light output of the LED and peak current of a PWM pulse driving the LED. The constant is then calculated by dividing the peak light output by the peak current of the PWM pulse. By making the simultaneous measurements at a time during the duration of the PWM pulse where the pulse has reached its full magnitude, rise and fall times of the pulse do not affect the measurements. The average current of the PWM pulse may be determined by a variety of methods including integrating current in the PWM pulse over time, or passing the PWM current through a low pass filter configured for providing an average value of PWM current. Determining average current in this manner further reduces the effect of rise and fall time on determining the average light output of the LED.
摘要翻译：通过确定将LED的峰值光输出与驱动LED的PWM脉冲的峰值驱动电流相关联的常数来确定LED阵列，并将PWM脉冲的平均电流乘以常数以获得平均光输出的值为LED。该常数可以通过同时测量LED的峰值光输出和驱动LED的PWM脉冲的峰值电流来确定。然后通过将峰值光输出除以PWM脉冲的峰值电流来计算常数。通过在脉冲达到其全部幅度的PWM脉冲的持续时间期间进行同时测量，脉冲的上升和下降时间不会影响测量。 PWM脉冲的平均电流可以通过各种方法来确定，包括随时间积分PWM脉冲中的电流，或者通过配置成提供PWM电流的平均值的低通滤波器来传递PWM电流。以这种方式确定平均电流进一步降低了上升和下降时间对确定LED的平均光输出的影响。

9. 发明申请

US20060250599A1 Lithographic projection apparatus, reflector assembly for use therein, and device manufacturing method 有权
标题翻译：光刻投影装置，其中使用的反射器组件和装置制造方法
公开(公告)号：US20060250599A1
公开(公告)日：2006-11-09
申请号：US11482147
申请日：2006-07-07
申请人： Levinus Bakker , Jeroen Jonkers , Frank Schuurmans , Hugo Visser
发明人： Levinus Bakker , Jeroen Jonkers , Frank Schuurmans , Hugo Visser
IPC分类号： G03B27/54
CPC分类号： B82Y10/00 , G02B17/004 , G02B17/006 , G02B27/0043 , G03F7/70166 , G03F7/70175 , G03F7/70891 , G03F7/70916
摘要： A lithographic projection apparatus includes a reflector assembly, the reflector assembly includes a first and a second reflector extending in a direction of an optical axis, the first and second reflector each having a reflective surface, a backing surface and an entry section at respectively a first and a second distance from the optical axis, the first distance being larger than the second distance, rays deriving from a point on the optical axis being cut off by the entry sections of the first and second reflectors and being reflected on the reflective surface of the first reflector and defining a high radiation intensity zone and a low radiation intensity zone between the reflectors; a radial support member configured to support the reflectors extending in the low radiation intensity zone, wherein the radial support member creates a shade in a downstream direction of the optical axis and a virtual shade in an upstream direction of the optical axis; and a structure placed in the virtual shade.
摘要翻译：光刻投影设备包括反射器组件，反射器组件包括沿光轴方向延伸的第一和第二反射器，第一和第二反射器各自具有反射表面，背衬表面和入口部分分别为第一并且与所述光轴的距离为第二距离，所述第一距离大于所述第二距离，从所述光轴上的点导出的光线被所述第一反射器和所述第二反射器的入射部分切断并且在所述光轴的反射表面上被反射第一反射器并且在反射器之间限定高辐射强度区域和低辐射强度区域; 径向支撑构件，构造成支撑在低辐射强度区域中延伸的反射器，其中径向支撑构件在光轴的下游方向上产生阴影，并在光轴的上游方向上产生虚拟阴影; 以及放置在虚拟阴影中的结构。

10. 发明申请

US20060138354A1 Method for the protection of an optical element, lithographic apparatus, and device manufacturing method 有权
标题翻译：保护光学元件的方法，光刻设备和器件制造方法
公开(公告)号：US20060138354A1
公开(公告)日：2006-06-29
申请号：US11024011
申请日：2004-12-29
申请人： Levinus Bakker , Frank Schuurmans
发明人： Levinus Bakker , Frank Schuurmans
IPC分类号： H01J37/08
CPC分类号： G03F7/70958 , G03F7/70033 , G03F7/70916
摘要： A method for the protection of an optical element of a lithographic apparatus including the optical element and a source of radiation includes providing a material including one or more elements selected from B, C, Si, Ge and/or Sn, and arranging the material such that the source, in use, causes removal of at least part of the material, thereby providing depositable material, and such that at least part of the depositable material deposits on the optical element.
摘要翻译：一种用于保护包括光学元件和辐射源的光刻设备的光学元件的方法包括提供包括选自B，C，Si，Ge和/或Sn中的一种或多种元素的材料，并且将材料使用中的源使得至少部分材料的去除，从而提供可沉积材料，并且使得至少部分可沉积材料沉积在光学元件上。

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