专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08610898B2 Self-referencing interferometer, alignment system, and lithographic apparatus 有权
标题翻译：自参考干涉仪，对准系统和光刻设备
公开(公告)号：US08610898B2
公开(公告)日：2013-12-17
申请号：US13207097
申请日：2011-08-10
申请人： Laurent Khuat Duy
发明人： Laurent Khuat Duy
IPC分类号： G01B9/02
CPC分类号： G02B27/40 , G03F9/7049
摘要： A self-referencing interferometer includes an optical system to split an alignment beam to create a reference beam and a transformed beam. The optical system includes a beam splitter to combine the reference beam and the transformed beam so that the diffraction orders in the reference beam spatially overlap with their respective opposite orders in the transformed beam. A detector system receives the spatially overlapping reference beam and transformed beam from the optical system and determines a position signal. The detector system includes a polarizing system for manipulating the polarization of the beams so that they interfere, and for directing the interfering reference beam and transformed beam to a detector for determining a position signal from the variation of intensity of the interfering beams.
摘要翻译：自参考干涉仪包括用于分离对准光束以产生参考光束和变换光束的光学系统。光学系统包括分束器，以组合参考光束和变换光束，使得参考光束中的衍射级与其在转换光束中的各自相反的次序空间上重叠。检测器系统接收来自光学系统的空间重叠参考光束和变换光束并确定位置信号。检测器系统包括用于操纵光束的偏振的偏振系统，使得它们干涉并用于将干涉参考光束和变换光束引导到检测器，以根据干涉光束的强度变化来确定位置信号。

2. 发明授权

US08570487B2 Lithographic apparatus, device manufacturing method, and method of applying a pattern to a substrate 有权
标题翻译：光刻设备，器件制造方法以及将图案应用于衬底的方法
公开(公告)号：US08570487B2
公开(公告)日：2013-10-29
申请号：US13207123
申请日：2011-08-10
申请人： Laurent Khuat Duy , Noud Jan Gilissen
发明人： Laurent Khuat Duy , Noud Jan Gilissen
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G02B27/40 , G03F9/7049
摘要： A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate, in which a measuring subsystem includes one or (preferably) more alignment & level sensors (AS, LS) directed at the substrate near a patterning location of a patterning subsystem. The alignment sensor(s) is operable to recognize and measure alignment marks (P1) on the substrate passing by the sensor during relative motion of the substrate and patterning subsystem under control of the positioning subsystem. A processor combines measurements of relative locations of a plurality of said marks to provide measurement results with an accuracy sufficient for the positioning subsystem to position at least a first substrate portion at said patterning location relative to said alignment marks. A preliminary step obtains position relative to a known pattern (M1) on the patterning device. Measurements are taken and updated in real time during exposure of successive substrate portions.
摘要翻译：光刻设备被布置成将图案从图案形成装置转移到基板上，其中测量子系统包括在图案化子系统的图案化位置附近指向基板的一个或（优选地）更多的对准和电平传感器（AS，LS）。对准传感器可操作以在基板和构图子系统在定位子系统的控制下的相对运动期间识别和测量在传感器上通过的基板上的对准标记（P1）。处理器结合了多个所述标记的相对位置的测量结果，以提供具有足够的精度的测量结果，该精度足以使定位子系统相对于所述对准标记在所述图案化位置处至少定位第一衬底部分。预备步骤相对于图案形成装置上的已知图案（M1）获得位置。在连续的衬底部分的曝光期间实时地进行测量和更新。

3. 发明申请

US20100231881A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100231881A1
公开(公告)日：2010-09-16
申请号：US12722902
申请日：2010-03-12
申请人： Arie Jeffrey DEN BOEF , Laurent Khuat Duy , Dimitra Sarri
发明人： Arie Jeffrey DEN BOEF , Laurent Khuat Duy , Dimitra Sarri
IPC分类号： G03B27/54 , G01B11/14 , G01B11/24
CPC分类号： G01B11/0608 , G03F9/7034
摘要： The invention provides a level sensor configured to measure a height level of a substrate comprising: a projection unit to project a measurement beam on the substrate, a detection unit to receive the measurement beam after reflection on the substrate, a processing unit to calculate a height level on the basis of the reflected measurement beam received by the detection unit, wherein the level sensor further comprises a tilt measuring device, wherein the tilt measuring device is arranged to receive at least partially the reflected measurement beam, and configured to provide a tilt signal representative for a tilt of the substrate with respect to a nominal plane.
摘要翻译：本发明提供一种水平传感器，其被配置为测量基板的高度水平，包括：投影单元，用于将测量光束投影在基板上;检测单元，用于在基板上反射之后接收测量光束;处理单元，用于计算高度基于由所述检测单元接收的所述反射的测量光束的水平面，其中所述液位传感器还包括倾斜测量装置，其中所述倾斜测量装置被布置成至少部分地接收所述反射的测量光束，并且被配置为提供倾斜信号代表衬底相对于标称平面的倾斜。

4. 发明授权

US09081302B2 Inspection apparatus and method, lithographic apparatus and lithographic processing cell 有权
标题翻译：检验设备和方法，光刻设备和光刻处理单元
公开(公告)号：US09081302B2
公开(公告)日：2015-07-14
申请号：US13228810
申请日：2011-09-09
申请人： Arie Jeffrey Den Boef , Laurent Khuat Duy
发明人： Arie Jeffrey Den Boef , Laurent Khuat Duy
IPC分类号： G03B27/54 , G03B27/42 , G03F7/20 , G01N21/47 , G01N21/55
CPC分类号： G03F7/70616 , G01N21/47 , G01N21/55
摘要： An “angle-resolved” version of FD-OCT is used to measure reflectance properties. An inspection apparatus comprises an illumination source configured to provide an illumination beam, an interferometer configured to use the illumination beam to illuminate a target on a substrate at an incidence angle and to use radiation reflected from the substrate with a reference beam derived from the illumination beam to produce an output beam, a sampling device arranged to select a portion of the output beam, a spectrometer configured to receive the selected portion of the output beam and to measure a spectrum of the received selected portion of the output beam, and a processor configured to determine from the measured spectrum reflectance properties of the target such as raw spectrometer spectral data, the Fourier transformed data, the extracted intensity components or carrier phase or the calculated complex reflectance.
摘要翻译： FD-OCT的“角度分辨”版本用于测量反射特性。检查装置包括被配置为提供照明光束的照明源，配置成使用照明光束以入射角照射基板上的目标的干涉仪，并且使用从照明光束导出的参考光束来使用从基板反射的辐射以产生输出光束，被配置为选择所述输出光束的一部分的采样装置，被配置为接收所述输出光束的选定部分并且测量所述接收的所述输出光束的所选部分的光谱的光谱仪，以及配置根据原始光谱仪光谱数据，傅立叶变换数据，提取的强度分量或载波相位或计算的复反射率，测量目标的光谱反射率特性。

5. 发明授权

US08675210B2 Level sensor, lithographic apparatus, and substrate surface positioning method 有权
标题翻译：液位传感器，光刻设备和基板表面定位方法
公开(公告)号：US08675210B2
公开(公告)日：2014-03-18
申请号：US13603168
申请日：2012-09-04
申请人： Arie Jeffrey Den Boef , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Willem Jurrianus Venema , Lukasz Jerzy Macht , Laurent Khuat Duy , Dimitra Sarri
发明人： Arie Jeffrey Den Boef , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Willem Jurrianus Venema , Lukasz Jerzy Macht , Laurent Khuat Duy , Dimitra Sarri
IPC分类号： G01B11/14
CPC分类号： G03F9/7034 , G01B11/0625 , G03F9/7088
摘要： A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit.
摘要翻译：用于测量衬底表面的位置的电平传感器包括：投影单元，包括用于向衬底发射辐射束的发射器和包括测量光栅和孔的投影光栅，使得入射在投影光栅上的辐射束被分为测量辐射束和捕获辐射束。液位传感器还包括检测单元，其包括第一和第二测量检测器，第一和第二捕获检测器，检测光栅以及第一和第二光学单元。检测光栅包括具有多个规则的格状光栅，其经由第一和第二光学单元将辐射引向第一和第二测量检测器;以及捕获元件，经由第一和第二光学单元将辐射引向第一和第二捕获检测器。

6. 发明申请

US20120057171A1 SELF-REFERENCING INTERFEROMETER, ALIGNMENT SYSTEM, AND LITHOGRAPHIC APPARATUS 有权
标题翻译：自适应干涉仪，对准系统和平面设备
公开(公告)号：US20120057171A1
公开(公告)日：2012-03-08
申请号：US13207097
申请日：2011-08-10
申请人： Laurent KHUAT DUY
发明人： Laurent KHUAT DUY
IPC分类号： G01B9/02
CPC分类号： G02B27/40 , G03F9/7049
摘要： A self-referencing interferometer includes an optical system to split an alignment beam to create a reference beam and a transformed beam. The optical system includes a beam splitter to combine the reference beam and the transformed beam so that the diffraction orders in the reference beam spatially overlap with their respective opposite orders in the transformed beam. A detector system receives the spatially overlapping reference beam and transformed beam from the optical system and determines a position signal. The detector system includes a polarizing system for manipulating the polarization of the beams so that they interfere, and for directing the interfering reference beam and transformed beam to a detector for determining a position signal from the variation of intensity of the interfering beams.
摘要翻译：自参考干涉仪包括用于分离对准光束以产生参考光束和变换光束的光学系统。光学系统包括分束器，以组合参考光束和变换光束，使得参考光束中的衍射级与其在转换光束中的各自相反的次序空间上重叠。检测器系统接收来自光学系统的空间重叠参考光束和变换光束并确定位置信号。检测器系统包括用于操纵光束的偏振的偏振系统，使得它们干涉并用于将干涉参考光束和变换光束引导到检测器，以根据干涉光束的强度变化来确定位置信号。

7. 发明申请

US20130077079A1 LEVEL SENSOR, LITHOGRAPHIC APPARATUS, AND SUBSTRATE SURFACE POSITIONING METHOD 有权
标题翻译：水平传感器，光刻设备和基板表面定位方法
公开(公告)号：US20130077079A1
公开(公告)日：2013-03-28
申请号：US13603168
申请日：2012-09-04
申请人： Arie Jeffrey DEN BOEF , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Willem Jurrianus Venema , Lukasz Jerzy Macht , Laurent Khuat Duy , Dimitra Sarri
发明人： Arie Jeffrey DEN BOEF , Jozef Petrus Henricus Benschop , Ralph Brinkhof , Willem Jurrianus Venema , Lukasz Jerzy Macht , Laurent Khuat Duy , Dimitra Sarri
IPC分类号： G03F9/00 , G01B11/06
CPC分类号： G03F9/7034 , G01B11/0625 , G03F9/7088
摘要： A level sensor for measuring a position of a surface of a substrate includes a projection unit including an emitter for emitting a radiation beam towards the substrate and a projection grating including a measurement grating and an aperture, such that the radiation beam incident on the projection grating is divided into a measurement radiation beam and a capture radiation beam. The level sensor further includes a detection unit including a first and second measurement detector, a first and second capture detector, a detection grating, and a first and second optical unit. The detection grating includes a ruled grating with multiple rules, which direct radiation towards the first and second measurement detector via the first and second optical unit, and a capture element directing radiation towards the first and second capture detector via the first and second optical unit.
摘要翻译：用于测量衬底表面的位置的电平传感器包括：投影单元，包括用于向衬底发射辐射束的发射器和包括测量光栅和孔的投影光栅，使得入射在投影光栅上的辐射束被分为测量辐射束和捕获辐射束。液位传感器还包括检测单元，其包括第一和第二测量检测器，第一和第二捕获检测器，检测光栅以及第一和第二光学单元。检测光栅包括具有多个规则的格状光栅，其经由第一和第二光学单元将辐射引向第一和第二测量检测器;以及捕获元件，经由第一和第二光学单元将辐射引向第一和第二捕获检测器。

8. 发明申请

US20120075601A1 Inspection Apparatus and Method, Lithographic Apparatus and Lithographic Processing Cell 有权
标题翻译：检验设备和方法，平版印刷设备和平版印刷加工单元
公开(公告)号：US20120075601A1
公开(公告)日：2012-03-29
申请号：US13228810
申请日：2011-09-09
申请人： Arie Jeffrey DEN BOEF , Laurent Khuat Duy
发明人： Arie Jeffrey DEN BOEF , Laurent Khuat Duy
IPC分类号： G03B27/54 , G01J3/28
CPC分类号： G03F7/70616 , G01N21/47 , G01N21/55
摘要： An “angle-resolved” version of FD-OCT is used to measure reflectance properties. An inspection apparatus comprises an illumination source configured to provide an illumination beam, an interferometer configured to use the illumination beam to illuminate a target on a substrate at an incidence angle and to use radiation reflected from the substrate with a reference beam derived from the illumination beam to produce an output beam, a sampling device arranged to select a portion of the output beam, a spectrometer configured to receive the selected portion of the output beam and to measure a spectrum of the received selected portion of the output beam, and a processor configured to determine from the measured spectrum reflectance properties of the target such as raw spectrometer spectral data, the Fourier transformed data, the extracted intensity components or carrier phase or the calculated complex reflectance.
摘要翻译： FD-OCT的“角度分辨”版本用于测量反射特性。检查装置包括被配置为提供照明光束的照明源，配置成使用照明光束以入射角照射基板上的目标的干涉仪，并且使用从照明光束导出的参考光束来使用从基板反射的辐射以产生输出光束，被配置为选择所述输出光束的一部分的采样装置，被配置为接收所述输出光束的选定部分并且测量所述接收的所述输出光束的所选部分的光谱的光谱仪，以及配置根据原始光谱仪光谱数据，傅立叶变换数据，提取的强度分量或载波相位或计算的复反射率，测量目标的光谱反射率特性。

9. 发明申请

US20120058434A1 LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF APPLYING A PATTERN TO A SUBSTRATE 有权
标题翻译：光刻设备，设备制造方法和将图案应用于基板的方法
公开(公告)号：US20120058434A1
公开(公告)日：2012-03-08
申请号：US13207123
申请日：2011-08-10
申请人： Laurent KHUAT DUY , Noud Jan Gilissen
发明人： Laurent KHUAT DUY , Noud Jan Gilissen
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G02B27/40 , G03F9/7049
摘要： A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate, in which a measuring subsystem comprises one or (preferably) more alignment & level sensors (AS, LS) directed at the substrate near a patterning location of a patterning subsystem. The alignment sensor(s) is operable to recognize and measure alignment marks (P1) on the substrate passing by the sensor during relative motion of the substrate and patterning subsystem under control of the positioning subsystem. A processor combines measurements of relative locations of a plurality of said marks to provide measurement results with an accuracy sufficient for the positioning subsystem to position at least a first substrate portion at said patterning location relative to said alignment marks. A preliminary step obtains position relative to a known pattern (M1) on the patterning device. Measurements are taken and updated in real time during exposure of successive substrate portions.
摘要翻译：光刻设备被布置成将图案从图案形成装置转移到基板上，其中测量子系统包括在图案化子系统的图案化位置附近指向基板的一个或（优选地）更多的对准和电平传感器（AS，LS）。对准传感器可操作以在基板和构图子系统在定位子系统的控制下的相对运动期间识别和测量在传感器上通过的基板上的对准标记（P1）。处理器结合了多个所述标记的相对位置的测量结果，以提供具有足够的精度的测量结果，该精度足以使定位子系统相对于所述对准标记在所述图案化位置处至少定位第一衬底部分。预备步骤相对于图案形成装置上的已知图案（M1）获得位置。在连续的衬底部分的曝光期间实时地进行测量和更新。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式