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    • 1. 发明授权
    • Nitride semiconductor-based light emitting devices
    • 氮化物半导体基发光器件
    • US07964882B2
    • 2011-06-21
    • US12446513
    • 2007-10-02
    • Kyu Seok LeeSung Bum Bae
    • Kyu Seok LeeSung Bum Bae
    • H01L33/00
    • H01L33/06H01L33/18H01L33/32
    • A nitride semiconductor-based light emitting device is provided. The nitride semiconductor-based light emitting device is formed of a nitride semiconductor having a wurtzite lattice structure with the Ga face. The device has a substrate, a buffer layer, a first p-type contact layer, a second p-type contact layer, a first hole diffusion layer, a second hole diffusion layer, a light emitting active region, a second electron diffusion layer, a first electron diffusion layer, a second n-type contact layer and a first n-type contact layer, which are sequentially stacked. Such a structure may effectively employ quasi-two-dimensional free electron and free hole gases formed at heterojunction interfaces due to the spontaneous polarization and the piezoelectric polarization in the wurtzite lattice structure with the Ga face, and thus enhances the emission uniformity and emission efficiency of the light emitting device.
    • 提供了一种基于氮化物半导体的发光器件。 基于氮化物半导体的发光器件由具有Ga面的纤锌矿晶格结构的氮化物半导体形成。 该器件具有衬底,缓冲层,第一p型接触层,第二p型接触层,第一孔扩散层,第二孔扩散层,发光有源区,第二电子扩散层, 第一电子扩散层,第二n型接触层和第一n型接触层。 这种结构可以由于自发极化和在具有Ga面的纤锌矿晶格结构中的压电极化而在异质界面处形成的准二维自由电子和自由空穴气体,从而提高了发射均匀性和发射效率 发光装置。
    • 4. 发明申请
    • NITRIDE SEMICONDUCTOR-BASED LIGHT EMITTING DEVICES
    • 基于氮化物半导体的发光器件
    • US20100187494A1
    • 2010-07-29
    • US12446513
    • 2007-10-02
    • Kyu Seok LeeSung Bum Bae
    • Kyu Seok LeeSung Bum Bae
    • H01L33/00
    • H01L33/06H01L33/18H01L33/32
    • A nitride semiconductor-based light emitting device is provided. The nitride semiconductor-based light emitting device is formed of a nitride semiconductor having a wurtzite lattice structure with the Ga face. The device has a substrate, a buffer layer, a first p-type contact layer, a second p-type contact layer, a first hole diffusion layer, a second hole diffusion layer, a light emitting active region, a second electron diffusion layer, a first electron a first n-type contact layer, which are sequentially stacked. Such a structure may effectively employ quasi-two-dimensional free electron and free hole gases formed at heterojunction interfaces due to the spontaneous polarization and the piezoelectric polarization in the wurtzite lattice structure with the Ga face, and thus enhances the emission uniformity and emission efficiency of the light emitting device.
    • 提供了一种基于氮化物半导体的发光器件。 基于氮化物半导体的发光器件由具有Ga面的纤锌矿晶格结构的氮化物半导体形成。 该器件具有衬底,缓冲层,第一p型接触层,第二p型接触层,第一孔扩散层,第二孔扩散层,发光有源区,第二电子扩散层, 第一电子,第一n型接触层,其顺序堆叠。 这种结构可以由于自发极化和在具有Ga面的纤锌矿晶格结构中的压电极化而在异质界面处形成的准二维自由电子和自由空穴气体,从而提高了发射均匀性和发射效率 发光装置。
    • 6. 发明授权
    • Nitride semiconductor field effect transistor (FET) and method of fabricating the same
    • 氮化物半导体场效应晶体管(FET)及其制造方法
    • US06864510B2
    • 2005-03-08
    • US10683328
    • 2003-10-09
    • Doo Hyeb YounKyu Seok Lee
    • Doo Hyeb YounKyu Seok Lee
    • H01L29/20H01L29/45H01L29/778H01L31/0256
    • H01L29/452H01L29/2003H01L29/7787
    • Provided are a nitride semiconductor field effect transistor (FET) and a method of fabricating the nitride semiconductor FET. The nitride semiconductor FET includes a first semiconductor layer, a second semiconductor layer, a two-dimensional electron gas layer, a T-shaped gate, and a source/drain ohmic electrode. The first semiconductor layer is formed on a substrate. The second semiconductor layer is formed on the first semiconductor layer and has a bandgap energy that is different from the bandgap energy of the first semiconductor layer. The two-dimensional electron gas layer is formed of a hetero-junction of the first semiconductor layer and the second semiconductor layer in an interfacial area between the first semiconductor layer and the second semiconductor layer. The T-shaped gate is formed on the second semiconductor layer and is connected to the second semiconductor layer. The source/drain ohmic electrode is formed by sequentially forming an Ni (or Cr) layer, an In layer, an Mo (or W) layer, and an Au layer at both sides of the second semiconductor layer and on the first semiconductor layer.
    • 提供了氮化物半导体场效应晶体管(FET)和制造氮化物半导体FET的方法。 氮化物半导体FET包括第一半导体层,第二半导体层,二维电子气体层,T形栅极和源极/漏极欧姆电极。 第一半导体层形成在基板上。 第二半导体层形成在第一半导体层上,并且具有与第一半导体层的带隙能不同的带隙能。 所述二维电子气体层由所述第一半导体层和所述第二半导体层的异质结在所述第一半导体层与所述第二半导体层之间的界面区域中形成。 T形栅极形成在第二半导体层上并连接到第二半导体层。 源极/漏极欧姆电极通过在第二半导体层的两侧和第一半导体层上依次形成Ni(或Cr)层,In层,Mo(或W)层和Au层而形成。
    • 8. 发明授权
    • Semiconductor laser device for pulse laser oscillation
    • 用于脉冲激光振荡的半导体激光器件
    • US5790579A
    • 1998-08-04
    • US708686
    • 1996-09-05
    • Kyu-Seok LeeJoon-Tae AhnEl-Hang Lee
    • Kyu-Seok LeeJoon-Tae AhnEl-Hang Lee
    • H01S3/098H01S5/06H01S5/0625H01S5/065H01S5/12H01S5/125H01S5/34H01S3/10
    • B82Y20/00H01S5/0625H01S5/125H01S5/34H01S3/1118H01S5/0601H01S5/0615H01S5/06256H01S5/0657H01S5/0658H01S5/1218H01S5/3408
    • A pulsed semiconductor laser has a lower threshold current and a more stable pulse train. The structure includes a saturable absorber section has a quantum well structure for laser oscillation, a gain section, a phase control section, and a super structure grating-distributed Bragg reflector section. It uses an improved construction for overcoming problems of conventional pulsed semiconductor lasers. The improved structure includes five quantum well layers having thicknesses with respective spontaneous emission peak wavelengths of ".lambda.-2.delta.", ".lambda.+.delta.", ".lambda.+2.delta.", ".lambda.", ".lambda.-.delta." at room temperature from their upper section. .lambda. denotes the mean wavelength of the oscillating pulse laser, and .delta. denotes a fixed value less than 12 nm. The super structure grating-distributed Bragg reflector section has five sampling sections, with each section having five kinds of different pitches arranged in order of thicknesses of 25 cycles, 5 cycles, 25 cycles, 5 cycles, and 25 cycles.
    • 脉冲半导体激光器具有较低的阈值电流和更稳定的脉冲串。 该结构包括具有用于激光振荡的量子阱结构的可饱和吸收部分,增益部分,相位控制部分和超结构光栅分布布拉格反射器部分。 它采用改进的结构来克服常规脉冲半导体激光器的问题。 改进的结构包括五个量子阱层,其具有在室温下具有相应的自发发射峰波长为“λ-2δ”,“λ+δ”,“λ+2δ”,“λ”,“λ-δ” 他们的上部。 λ表示振荡脉冲激光的平均波长,delta表示小于12nm的固定值。 超结构光栅分布布拉格反射器部分具有五个采样部分,每个部分具有按照25个周期,5个周期,25个周期,5个周期和25个周期的顺序排列的五种不同的间距。