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1. 发明申请

US20120287425A1 INSPECTION APPARATUS AND INSPECTION METHOD 有权
标题翻译：检查装置和检查方法
公开(公告)号：US20120287425A1
公开(公告)日：2012-11-15
申请号：US13473314
申请日：2012-05-16
申请人： Masami OOYAMA , Masayuki HACHIYA , Rieko HACHIYA , Kimiko HACHIYA , Kazuhiro ZAMA , Keiichi NAGASAKI
发明人： Masami OOYAMA , Masayuki HACHIYA , Rieko HACHIYA , Kimiko HACHIYA , Kazuhiro ZAMA , Keiichi NAGASAKI
IPC分类号： G01N21/88 , G01N21/01
CPC分类号： G01N21/01 , G01B11/306 , G01N21/9501 , H01L21/68721 , H01L21/68735
摘要： An object mounting mechanism includes: a plate member on which an object is mounted. Bumps are arranged on an upper surface of the plate member which faces a reverse face of the object. In addition, the bumps are arranged sparsely in an area of a surrounding part of the plate member and densely toward an area of a center part of the plate member.
摘要翻译：物体安装机构包括：安装有物体的板构件。凸起布置在板构件的面对物体的反面的上表面上。此外，凸块在板构件的周围部分的区域中稀疏地排列，并且密集地朝向板构件的中心部分的区域。

2. 发明授权

US07894052B2 Optical defect inspection apparatus 有权
标题翻译：光学缺陷检查装置
公开(公告)号：US07894052B2
公开(公告)日：2011-02-22
申请号：US12705031
申请日：2010-02-12
申请人： Noriyuki Aizawa , Hiroyuki Kawakami , Kazuhiro Zama , Kazuo Takahashi , Yusuke Miyazaki , Shingo Tanaka
发明人： Noriyuki Aizawa , Hiroyuki Kawakami , Kazuhiro Zama , Kazuo Takahashi , Yusuke Miyazaki , Shingo Tanaka
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/94 , G01N2021/9513 , G01N2021/95676 , H01L22/12
摘要： A laser beam oscillated from a laser source is folded in its path by first and second plane mirrors and enters a beam expander. The surface of each plane mirror is deteriorated with illumination by the laser beam and the reflectance is reduced. To avoid a light quantity of the laser beam entering the beam expander from being reduced below a reference value, when the laser beam is illuminated over a certain time, a position on each of the first and second plane mirrors at which the laser beam is illuminated is changed by a structure for rotating and/or translating a reflecting surface of each plane mirror on a plane, which includes the plane mirror, while an optical axis is kept same. Thus, the useful life of each plane mirror can be prolonged without displacing the optical axis.
摘要翻译：从激光源振荡的激光束在其路径中被第一和第二平面镜折叠并进入光束扩展器。每个平面镜的表面由激光照射而劣化，反射率降低。为了避免进入光束扩展器的激光束的光量减小到低于参考值，当在一定时间内照射激光束时，激光束被照亮的第一和第二平面镜中的每一个上的位置通过用于在包括平面镜的平面上旋转和/或平移每个平面镜的反射表面的结构改变，同时光轴保持相同。因此，可以延长每个平面镜的使用寿命而不移动光轴。

3. 发明授权

US07723709B2 Substrate holding apparatus, and inspection or processing apparatus 有权
标题翻译：基板保持装置，检查或处理装置
公开(公告)号：US07723709B2
公开(公告)日：2010-05-25
申请号：US11896291
申请日：2007-08-30
申请人： Kazuhiro Zama , Koichi Asami , Yusuke Miyazaki
发明人： Kazuhiro Zama , Koichi Asami , Yusuke Miyazaki
IPC分类号： G01N21/86 , G01V8/00
CPC分类号： G01N21/9501 , G01N21/9506 , H01L21/68728
摘要： In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.
摘要翻译：为了实现基板的高精度定位和强压，本发明提供了一种基板保持装置，其包括：旋转台，其具有支撑基板的外周侧表面的下侧的倾斜面，该床在基板的法线与基板一起作为旋转轴; 位置限制单元，与旋转床一起旋转，并且在旋转之前通过在基板的外周侧表面的上侧按压圆周上的多个点将基板限制在旋转床上的预定位置; 以及与旋转床一起旋转的按压单元，并且通过在旋转期间按压基板的外周侧面的上侧的多个点，将基板压靠在倾斜面上。

4. 发明授权

US07420668B2 Wafer surface inspection apparatus and wafer surface inspection method 有权
标题翻译：晶圆表面检查仪和晶圆表面检测方法
公开(公告)号：US07420668B2
公开(公告)日：2008-09-02
申请号：US11501922
申请日：2006-08-10
申请人： Kazuhiro Zama , Masayuki Hachiya
发明人： Kazuhiro Zama , Masayuki Hachiya
IPC分类号： G01N21/88 , H01J37/26 , B08B7/04
CPC分类号： G01N21/9501 , G01N21/94 , G01N2021/151
摘要： A wafer surface inspection method and apparatus of high sensitivity, and free from performance degradation in terms of cleanliness, coordinate repeatability of foreign particles and the like. Gas for cooling is sprayed onto a laser irradiation position on the wafer surface to prevent an increase in temperature of the foreign particles and to suppress break-down of the foreign particles.
摘要翻译：高灵敏度的晶片表面检查方法和装置，并且在清洁度方面没有性能下降，外来颗粒的坐标重复性等。将用于冷却的气体喷射到晶片表面上的激光照射位置，以防止异物的温度升高并且抑制异物的分解。

5. 发明授权

US07925390B2 Mini environment apparatus, inspection apparatus, manufacturing apparatus and cleaning method of space 有权
标题翻译：迷你环境仪器，检测仪器，制造设备及空间清洁方法
公开(公告)号：US07925390B2
公开(公告)日：2011-04-12
申请号：US11882063
申请日：2007-07-30
申请人： Takahiro Jingu , Yusuke Miyazaki , Kazuhiro Zama
发明人： Takahiro Jingu , Yusuke Miyazaki , Kazuhiro Zama
IPC分类号： B01L1/04 , G05D16/00
CPC分类号： F24F3/161 , F24F11/30 , F24F11/77 , F24F2110/00 , F24F2110/40
摘要： An outer dust collecting filter covers a casing an intake port and an outer fan flows air from an external environment into the casing via the outer dust collecting filter. A clean chamber has an intake port within the casing, an inner dust collecting filter for covering the intake port, and an inner fan for flowing the air within the casing. A control unit controls fan rotating speeds so that a measured pressure within the casing becomes higher at a set value than a measured pressure in the external environment, and a measured pressure within the clean chamber becomes higher at a set value than the measured pressure within the casing.
摘要翻译：外部集尘过滤器覆盖壳体进气口，外部风扇经由外部集尘过滤器将空气从外部环境流入外壳。清洁室具有壳体内的进气口，用于覆盖进气口的内部集尘过滤器和用于使空气在壳体内流动的内部风扇。控制单元控制风扇转速，使得壳体内的测量压力在外部环境中的测量压力的设定值以上变化，并且清洁室内的测量压力变得高于设定值内的测量压力套管。

6. 发明申请

US20100231900A1 OPTICAL DEFECT INSPECTION APPARATUS 有权
公开(公告)号：US20100231900A1
公开(公告)日：2010-09-16
申请号：US12785065
申请日：2010-05-21
申请人： Noriyuki AIZAWA , Hiroyuki KAWAKAMI , Kazuhiro ZAMA , Kazuo TAKAHASHI , Yusuke MIYAZAKI , Shingo TANAKA
发明人： Noriyuki AIZAWA , Hiroyuki KAWAKAMI , Kazuhiro ZAMA , Kazuo TAKAHASHI , Yusuke MIYAZAKI , Shingo TANAKA
IPC分类号： G01N21/00
CPC分类号： G01N21/9501 , G01N21/94 , G01N2021/9513 , G01N2021/95676 , H01L22/12
摘要： A laser beam oscillated from a laser source is folded in its path by first and second plane mirrors and enters a beam expander. The surface of each plane mirror is deteriorated with illumination by the laser beam and the reflectance is reduced. To avoid a light quantity of the laser beam entering the beam expander from being reduced below a reference value, when the laser beam is illuminated over a certain time, a position on each of the first and second plane mirrors at which the laser beam is illuminated is changed by a structure for rotating and/or translating a reflecting surface of each plane mirror on a plane, which includes the plane mirror, while an optical axis is kept same. Thus, the useful life of each plane mirror can be prolonged without displacing the optical axis.

7. 发明申请

US20100196127A1 SUBSTRATE HOLDING APPARATUS, AND INSPECTION OR PROCESSING APPARATUS 有权
标题翻译：基板控制装置，检查或处理装置
公开(公告)号：US20100196127A1
公开(公告)日：2010-08-05
申请号：US12754927
申请日：2010-04-06
申请人： Kazuhiro Zama , Koichi Asami , Yusuke Miyazaki
发明人： Kazuhiro Zama , Koichi Asami , Yusuke Miyazaki
IPC分类号： H01L21/68
CPC分类号： G01N21/9501 , G01N21/9506 , H01L21/68728
摘要： In order to enable high accuracy positioning and strong pressing of a substrate, the present invention provides a substrate holding apparatus including: a rotating bed having an inclined surface supporting a lower side of an outer circumferential side surface of the substrate, which bed rotates on a normal line of the substrate as the rotation axis together with the substrate; a position restriction unit rotating together with the rotating bed and restricting the substrate in a predetermined position on the rotating bed by pressing a plurality of points on the circumference on an upper side of the outer circumferential side surface of the substrate prior to the rotation; and a pressing unit rotating together with the rotating bed and pressing the substrate against the inclined surface by pressing a plurality of points on the upper side of the outer circumferential side surface of the substrate during the rotation.
摘要翻译：为了实现基板的高精度定位和强压，本发明提供了一种基板保持装置，其包括：旋转台，其具有支撑基板的外周侧表面的下侧的倾斜面，该床在基板的法线与基板一起作为旋转轴; 位置限制单元，与旋转床一起旋转，并且在旋转之前通过在基板的外周侧表面的上侧按压圆周上的多个点将基板限制在旋转床上的预定位置; 以及与旋转床一起旋转的按压单元，并且通过在旋转期间按压基板的外周侧面的上侧的多个点，将基板压靠在倾斜面上。

8. 发明申请

US20090187354A1 INSPECTION APPARATUS AND INSPECTION METHOD 有权
标题翻译：检查装置和检查方法
公开(公告)号：US20090187354A1
公开(公告)日：2009-07-23
申请号：US12350581
申请日：2009-01-08
申请人： Masami Ooyama , Masayuki Hachiya , Rieko Hachiya , Kimiko Hachiya , Kazuhiro Zama , Keiichi Nagasaki
发明人： Masami Ooyama , Masayuki Hachiya , Rieko Hachiya , Kimiko Hachiya , Kazuhiro Zama , Keiichi Nagasaki
IPC分类号： G01N21/88 , G06F15/00
CPC分类号： G01N21/01 , G01B11/306 , G01N21/9501 , H01L21/68721 , H01L21/68735
摘要： The invention is directed to detect a warp amount in a real-time manner in a wafer rotating at high speed under inspection. An inspection apparatus includes: a first light irradiating unit for irradiating an object to be inspected with light; a first detector for detecting scattered light from the object to be inspected; a second light irradiating unit for irradiating the object to be inspected with light; a second detector for detecting light reflected from the object to be inspected, of light of the second light irradiating unit; a stage for moving an object to be inspected, which moves the object to be inspected so as to change irradiation positions on the object to be inspected, of the light of the first light irradiating unit and the light of the second light irradiating unit; an inspection coordinate detector for outputting information of coordinates of a position irradiated with light; an elevation control circuit for outputting height information of the object to be inspected on the basis of a detection signal from the second detector; and a data processing unit for calculating a warp amount of the object to be inspected on the basis of the information of the position coordinates from the inspection coordinate detector and the height information from the elevation control circuit.
摘要翻译：本发明涉及在检查中以高速旋转的晶片中实时检测翘曲量。检查装置包括：第一光照射单元，用于用光照射被检查物体; 用于检测来自被检查物体的散射光的第一检测器; 第二光照射单元，用于用光照射被检查物体; 第二检测器，用于检测来自被检查物体的光的第二光照射单元的光; 用于使被检查物体移动以移动要检查的物体，以便改变第一光照射单元的光和第二光照射单元的光的待检查对象的照射位置的台阶; 用于输出用光照射的位置的坐标信息的检查坐标检测器; 高度控制电路，用于根据来自第二检测器的检测信号输出待检查物体的高度信息; 以及数据处理单元，用于根据来自检查坐标检测器的位置坐标的信息和来自仰角控制电路的高度信息来计算被检查物体的弯曲量。

9. 发明申请

US20090147246A1 OPTICAL DEFECT INSPECTION APPARATUS 有权
标题翻译：光学缺陷检测装置
公开(公告)号：US20090147246A1
公开(公告)日：2009-06-11
申请号：US12275746
申请日：2008-11-21
申请人： Noriyuki AIZAWA , Hiroyuki Kawakami , Kazuhiro Zama , Kazuo Takahashi , Yusuke Miyazaki , Shingo Tanaka
发明人： Noriyuki AIZAWA , Hiroyuki Kawakami , Kazuhiro Zama , Kazuo Takahashi , Yusuke Miyazaki , Shingo Tanaka
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/94 , G01N2021/9513 , G01N2021/95676 , H01L22/12
摘要： A laser beam oscillated from a laser source is folded in its path by first and second plane mirrors and enters a beam expander. The surface of each plane mirror is deteriorated with illumination by the laser beam and the reflectance is reduced. To avoid a light quantity of the laser beam entering the beam expander from being reduced below a reference value, when the laser beam is illuminated over a certain time, a position on each of the first and second plane mirrors at which the laser beam is illuminated is changed by a structure for rotating and/or translating a reflecting surface of each plane mirror on a plane, which includes the plane mirror, while an optical axis is kept same. Thus the useful life of each plane mirror can be prolonged without displacing the optical axis.
摘要翻译：从激光源振荡的激光束在其路径中被第一和第二平面镜折叠并进入光束扩展器。每个平面镜的表面由激光照射而劣化，反射率降低。为了避免进入光束扩展器的激光束的光量减小到低于参考值，当在一定时间内照射激光束时，激光束被照亮的第一和第二平面镜中的每一个上的位置通过用于在包括平面镜的平面上旋转和/或平移每个平面镜的反射表面的结构改变，同时光轴保持相同。因此，可以在不移动光轴的情况下延长每个平面镜的使用寿命。

10. 发明申请

US20080297782A1 WAFER SURFACE INSPECTION APPARATUS AND WAFER SURFACE INSPECTION METHOD 审中-公开
标题翻译： WAFER表面检查装置和WAFER表面检查方法
公开(公告)号：US20080297782A1
公开(公告)日：2008-12-04
申请号：US12187060
申请日：2008-08-06
申请人： Kazuhiro Zama , Masayuki Hachiya
发明人： Kazuhiro Zama , Masayuki Hachiya
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/94 , G01N2021/151
摘要： A wafer surface inspection method and apparatus of high sensitivity, and free from performance degradation in terms of cleanliness, coordinate repeatability of foreign particles and the like. Gas for cooling is sprayed onto a laser irradiation position on the wafer surface to prevent an increase in temperature of the foreign particles and to suppress break-down of the foreign particles.
摘要翻译：高灵敏度的晶片表面检查方法和装置，并且在清洁度方面没有性能下降，外来颗粒的坐标重复性等。将用于冷却的气体喷射到晶片表面上的激光照射位置，以防止异物的温度升高并且抑制异物的分解。

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