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1. 发明公开

EP0831370A4 POSITIVE RESIST COMPOSITION 失效
标题翻译： POSITIV ARBEITENDE PHOTOLACKZUSAMMENSETZUNG
公开(公告)号：EP0831370A4
公开(公告)日：1999-08-18
申请号：EP96900700
申请日：1996-01-17
申请人： NIPPON ZEON CO , KAWATA SHOJI , HAYASHI HIROSHI , HIGASHI HIROKAZU , KATO TAKEYOSHI , NAKAMURA MASAHIRO
发明人： KAWATA SHOJI , HAYASHI HIROSHI , HIGASHI HIRIKAZU , KATO TAKEYOSHI , NAKAMURA MASAHIRO
IPC分类号： G03F7/022 , G03F7/023
CPC分类号： G03F7/0236 , G03F7/0226 , G03F7/0233
摘要： A positive resist composition having excellent sensitivity, percentage residual film, resolution, heat resistance, storage stability, exposure margin, focus margin and other properties and comprising (A) an alkali-soluble phenolic resin, (B) a quinonediazidosulfonic ester photosensitizer, and (C) a phenolic compound, characterized in that the phenolic compound as the component (C) is at least one phenolic compound selected from the group consisting of phenolic compounds (CX) having structural units represented by formula (I) and phenolic compounds (CD) represented by formula (II). In formula (I), R and R each independently represent hydrogen, hydroxy, halo, optionally substituted alkyl, optionally substituted cycloalkyl, optionally substituted alkenyl, optionally substituted alkoxy, or optionally substituted aryl group, R to R represent each independently hydrogen, optionally substituted alkyl, optionally substituted cycloalkyl, optionally substituted alkenyl, optionally substituted aryl, or optionally substituted alkoxy group, and n is a positive integer. In formula (II), R to R each independently represent hydrogen, hydroxy, halo, optionally substituted alkyl, optionally substituted cycloalkyl, optionally substituted alkenyl, optionally substituted alkoxy, or optionally substituted aryl group, provided at least one of R to R represents hydroxy and m is a positive integer.
摘要翻译：正性抗蚀剂组合物的灵敏度，显影后的薄膜损耗，分辨率，耐热流动性，保存稳定性，曝光余量和聚焦余量优异，并且包括（A）碱溶性酚醛树脂，（B）醌二叠氮化物类光敏剂和（C）酚类化合物，其中所述酚类化合物（C）为选自具有由下式（I）表示的结构单元的酚类化合物（CX）和酚类化合物（C）的至少一种酚类化合物 CD）具有由下式（II）表示的结构单元：其中R 1至R 3彼此独立地为氢原子，羟基，卤素原子，烷基可以被取代的，可被取代的环烷基，可被取代的烯基，可被取代的烷氧基或可被取代的芳基，R 4至R 11独立地是彼此啊可以被取代的烷基，可被取代的环烷基，可被取代的烯基，可被取代的芳基或可被取代的烷氧基，n是正整数 ; 和，其中R 12至R 15彼此独立地为氢原子，羟基，卤素原子，可被取代的烷基，可被取代的环烷基，可被取代的烯基，可被取代的烷氧基或可被取代的芳基，条件是R 12至R 15中的至少一个为羟基，m为正整数。

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