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1. 发明授权

US08852845B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method using the same, and resin 有权
标题翻译：光敏感或辐射敏感性树脂组合物，抗蚀剂膜，使用其的图案形成方法和树脂
公开(公告)号：US08852845B2
公开(公告)日：2014-10-07
申请号：US12641877
申请日：2009-12-18
申请人： Hidenori Takahashi , Tomotaka Tsuchimura , Toru Tsuchihashi , Katsuhiro Yamashita , Hideaki Tsubaki
发明人： Hidenori Takahashi , Tomotaka Tsuchimura , Toru Tsuchihashi , Katsuhiro Yamashita , Hideaki Tsubaki
IPC分类号： G03F7/004 , G03F7/028 , G03F7/039
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0397 , Y10S430/122 , Y10S430/123
摘要： Provided is a actinic ray-sensitive or radiation-sensitive resin composition including (P) a resin containing (A) a repeating unit having an ionic structure moiety that contains a cation represented by formula (Ia) and is capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation: wherein each of R1a to R13a independently represents a hydrogen atom or a monovalent substituent and may combine together to form a ring, and Z represents a single bond or a divalent linking group.
摘要翻译：本发明提供一种光化学射线敏感性或辐射敏感性树脂组合物，其包含（P）含有（A）具有离子性结构部分的重复单元的树脂，所述重复单元含有式（Ia）所示的阳离子，并且能够在侧光在照射光化学射线或辐射时：其中R 1a至R 13a各自独立地表示氢原子或一价取代基，并且可以结合在一起形成环，Z表示单键或二价连接基团。

2. 发明授权

US08092978B2 Positive resist composition for electron beam, X-ray or EUV and pattern forming method using the same 有权
标题翻译：用于电子束，X射线或EUV的正性抗蚀剂组合物和使用其的图案形成方法
公开(公告)号：US08092978B2
公开(公告)日：2012-01-10
申请号：US12410881
申请日：2009-03-25
申请人： Katsuhiro Yamashita
发明人： Katsuhiro Yamashita
IPC分类号： G03F7/00 , G03F7/004 , G03F7/029
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0397 , Y10S430/114 , Y10S430/115 , Y10S430/146
摘要： Provided is a positive resist composition for an electron beam, an X-ray or EUV, including: (A) a resin capable of decomposing by the action of an acid to increase the dissolution rate in an aqueous alkali solution; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, represented by the following formula (ZI) or (ZII); (C) a basic compound; and (D) an organic solvent, wherein a concentration of all solid contents in said composition is from 1.0 to 4.5 mass %, and a total amount of the compound represented by formula (ZI) or (ZII) is 12 mass % or more based on all solid contents in said composition: wherein symbols in the formulae are defined in the specification.
摘要翻译：本发明提供一种用于电子束，X射线或EUV的正型抗蚀剂组合物，其包括：（A）能够通过酸的作用分解以提高碱性水溶液中的溶解速率的树脂; （B）由下式（ZI）或（ZII）表示的能够用光化射线或辐射照射后能够产生酸的化合物。（C）碱性化合物; 和（D）有机溶剂，其中所述组合物中所有固体含量的浓度为1.0〜4.5质量％，由式（ZI）或（ZII）表示的化合物的总量为12质量％以上所述组合物中所有固体含量：其中式中的符号在说明书中定义。

3. 发明申请

US20110159433A1 PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE COMPOSITION, AND RESIN USED IN THE COMPOSITION 有权
标题翻译：感光性组合物，使用该组合物的图案形成方法和在组合物中使用的树脂
公开(公告)号：US20110159433A1
公开(公告)日：2011-06-30
申请号：US13062285
申请日：2009-08-26
申请人： Hidenori Takahashi , Tomotaka Tsuchimura , Toru Tsuchihashi , Katsuhiro Yamashita , Naoyuki Nishikawa
发明人： Hidenori Takahashi , Tomotaka Tsuchimura , Toru Tsuchihashi , Katsuhiro Yamashita , Naoyuki Nishikawa
IPC分类号： G03F7/20 , C07C309/00 , C08F228/02 , G03F7/004 , C08F214/18 , C08F222/40
CPC分类号： G03F7/0392 , C08F12/20 , C08F12/22 , C08F12/30 , C08F12/32 , C09D125/18 , G03F7/0045 , G03F7/0046 , C08F212/14 , C08F222/36 , C08F212/32 , C08F2220/1883
摘要： Provided are a radiation-sensitive composition including a compound (P) having a partial structure (A) having an ionic structural site and capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid and a partial structure (B) having at least one phenolic hydroxyl group, a part or all of hydrogen atoms of the hydroxyl group or groups each being protected by a group capable of leaving by the action of an acid, wherein the ionic structural site of the partial structure (A) contained in the compound (P) is a structure capable of generating an acid anion in the compound (P) upon irradiation with an actinic ray or radiation; a pattern-forming method using the same; and a resin which is used in the composition.
摘要翻译：本发明提供一种辐射敏感性组合物，其包含具有离子结构位点的部分结构（A）的化合物（P），并且能够在用光化射线或辐射照射时分解以产生酸和部分结构（B）至少一个酚羟基，羟基的一部分或全部氢原子或各自被能够通过酸的作用离开的基团保护，其中部分结构（A）的离子结构位点包含在化合物（P）是在用光化射线或辐射照射时能够在化合物（P）中产生酸阴离子的结构; 使用其的图案形成方法; 和用于组合物中的树脂。

4. 发明授权

US07858289B2 Positive resist composition for electron beam, X-ray or EUV and pattern forming method using the same 有权
标题翻译：用于电子束，X射线或EUV的正性抗蚀剂组合物和使用其的图案形成方法
公开(公告)号：US07858289B2
公开(公告)日：2010-12-28
申请号：US12259056
申请日：2008-10-27
申请人： Katsuhiro Yamashita
发明人： Katsuhiro Yamashita
IPC分类号： G03F7/00 , G03F7/004 , G03F7/029 , C07C381/00
CPC分类号： G03F7/0045 , G03F7/0392 , G03F7/0397 , Y10S430/114
摘要： A positive resist composition for electron beam, X-ray or EUV includes a compound having a proton acceptor functional group and capable of producing an acid radical upon irradiation with an actinic ray or radiation to reduce or lose the acceptor property or to change the proton acceptor functional group to be acidic, wherein the positive resist composition has a solid content concentration of from 2.5 to 4.5 mass %.
摘要翻译：用于电子束，X射线或EUV的正性抗蚀剂组合物包括具有质子受体官能团的化合物，并且能够在用光化射线或辐射照射时产生酸基以降低或失去受体性质或改变质子受体官能团为酸性，其中正性抗蚀剂组合物的固体成分浓度为2.5〜4.5质量％。

5. 发明申请

US20090111053A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME 有权
标题翻译：正极性组合物和使用其的图案形成方法
公开(公告)号：US20090111053A1
公开(公告)日：2009-04-30
申请号：US12257646
申请日：2008-10-24
申请人： Katsuhiro YAMASHITA
发明人： Katsuhiro YAMASHITA
IPC分类号： G03F7/004 , G03F7/20
CPC分类号： G03F7/0392 , G03F7/0395 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A positive resist composition for electron beam, X-ray or EUV exposure, including (A) a resin capable of decomposing by the action of an acid to increase the solubility in an alkali developer; and (B) a compound capable of generating a sulfonic acid upon irradiation with an actinic ray or radiation, wherein the resin (A) is a resin having a phenolic hydroxyl group and having a weight average molecular weight of 1,500 to 3,500, the positive resist composition has a property of decomposing by the action of an acid and causing the dissolution rate in an aqueous 2.38 wt % tetramethylammonium hydroxide solution at 23° C. under normal pressure to increase in a range of 200 to 5,000 times, and the positive resist composition has a solid content concentration of from 2.5 to 4.5 mass %.
摘要翻译：一种用于电子束，X射线或EUV曝光的正型抗蚀剂组合物，包括（A）能够通过酸的作用分解以提高在碱性显影剂中的溶解度的树脂; 和（B）能够在用光化射线或辐射照射时能够产生磺酸的化合物，其中树脂（A）是具有酚羟基并且重均分子量为1,500至3,500的树脂，正性抗蚀剂组合物具有通过酸的作用分解的性质，并且在常压下在23℃下使2.38重量％四甲基氢氧化铵水溶液中的溶解速率增加到200-5000倍的范围，并且正性抗蚀剂组合物固体成分浓度为2.5〜4.5质量％。

6. 发明申请

US20060115973A1 Metal polishing composition and method of polishing using the same 失效
公开(公告)号：US20060115973A1
公开(公告)日：2006-06-01
申请号：US11287386
申请日：2005-11-28
申请人： Hiroyuki Seki , Katsuhiro Yamashita , Tomohiko Akatsuka , Tadashi Inaba
发明人： Hiroyuki Seki , Katsuhiro Yamashita , Tomohiko Akatsuka , Tadashi Inaba
IPC分类号： H01L21/44
CPC分类号： C09G1/02 , H01L21/3212
摘要： A metal polishing composition comprising at least one of the compound represented by formula (1) defined herein and the compound represented by formula (2) defined herein, and an oxidizing agent, and a chemical mechanical polishing method comprising bringing the metal polishing composition into contact with a surface to be polished and providing a relative movement between the surface to be polished and a polishing surface.

7. 发明授权

US06875562B2 Silver halide photographic emulsion and silver halide photographic material containing said silver halide photographic emulsion 失效
标题翻译：含有卤化银照相乳剂的卤化银照相乳剂和卤化银照相材料
公开(公告)号：US06875562B2
公开(公告)日：2005-04-05
申请号：US10352106
申请日：2003-01-28
申请人： Katsuhiro Yamashita , Katsumi Kobayashi
发明人： Katsuhiro Yamashita , Katsumi Kobayashi
IPC分类号： G03C1/005 , G03C1/14 , G03C1/29 , G03C7/30 , G03C1/46
CPC分类号： G03C1/005 , G03C1/0051 , G03C1/14 , G03C1/29 , G03C5/50 , G03C7/30 , G03C2001/0055 , G03C2200/19
摘要： A silver halide photographic emulsion which contains silver halide grains having light absorption strength of 100 or more.
摘要翻译：含有卤化银颗粒的卤化银照相乳剂，其吸光强度为100以上。

8. 发明授权

US06767391B2 Air filter 有权
标题翻译：空气过滤器
公开(公告)号：US06767391B2
公开(公告)日：2004-07-27
申请号：US10190534
申请日：2002-07-09
申请人： Minoru Tanaka , Jun Shimada , Katsuhiro Yamashita , Haruko Sasaki
发明人： Minoru Tanaka , Jun Shimada , Katsuhiro Yamashita , Haruko Sasaki
IPC分类号： B01D5306
CPC分类号： F24F3/1423 , B01D53/0454 , B01D53/06 , B01D53/261 , B01D53/40 , B01D53/42 , B01D53/44 , B01D2253/102 , B01D2253/25 , B01D2253/3425 , B01D2257/70 , B01D2257/80 , B01D2258/0216 , B01D2259/40081 , B01D2259/4009 , F24F2203/1004 , F24F2203/1032 , F24F2203/1056 , F24F2203/1068 , F24F2203/1084
摘要： An air filter includes a honeycomb rotor which carries a porous adsorbent and can be rotated in a circumferential direction, a drive means for rotating the honeycomb rotor, a first partition member provided with a first gas introduction section and a second gas exhaust section and a second partition member provided with a first gas exhaust section and a second gas introduction section, the first and second partition members being disposed on both sides of the honeycomb rotor respectively to allow two gases to flow in counter current to each other and to pass through different conduits respectively, a heater disposed at the inlet port of the first gas introduction section, a drive controller for controlling the drive means such that the honeycomb rotor can rotate intermittently by every part of a regenerative/purge-zone facing the first gas introduction section among the surface of the filter of the honeycomb rotor.
摘要翻译：空气过滤器包括：携带多孔吸附剂的蜂窝状转子，能够沿圆周方向旋转;旋转蜂窝转子的驱动机构;设置有第一气体导入部和第二排气部的第一分隔部件，分隔构件设置有第一排气部和第二气体导入部，第一隔壁构件和第二分隔构件分别设置在蜂窝状转子的两侧，以允许两个气体彼此逆流地流动并穿过不同的导管分别设置在第一气体导入部的入口处的加热器，用于控制驱动装置的驱动控制器，使得蜂窝转子可以在面向第一气体导入部的再生/吹扫区域的每一部分间歇地旋转蜂窝转子过滤器的表面。

9. 发明授权

US06537742B2 Silver halide photographic emulsion and silver halide photographic material containing said silver halide photographic emulsion 失效
公开(公告)号：US06537742B2
公开(公告)日：2003-03-25
申请号：US09987373
申请日：2001-11-14
申请人： Katsuhiro Yamashita , Katsumi Kobayashi
发明人： Katsuhiro Yamashita , Katsumi Kobayashi
IPC分类号： G03C100
CPC分类号： G03C1/005 , G03C1/0051 , G03C1/14 , G03C1/29 , G03C5/50 , G03C7/30 , G03C2001/0055 , G03C2200/19
摘要： A silver halide photographic emulsion which contains silver halide grains having light absorption strength of 100 or more.

10. 发明授权

US06521401B1 Silver halide photographic emulsion and silver halide photographic material 有权
标题翻译：卤化银照相乳剂和卤化银照相材料
公开(公告)号：US06521401B1
公开(公告)日：2003-02-18
申请号：US09631994
申请日：2000-08-03
申请人： Katsuhiro Yamashita , Katsumi Kobayashi
发明人： Katsuhiro Yamashita , Katsumi Kobayashi
IPC分类号： G03C1005
CPC分类号： G03C1/14 , G03C7/3041
摘要： A silver halide photographic emulsion which contains silver halide grains having a spectral absorption maximum wavelength of less than 500 nm and a light absorption strength of 60 or more, or a spectral absorption maximum wavelength of 500 nm or more and a light absorption strength of 100 or more, wherein at least one of the sensitizing dyes which are used for spectrally sensitizing the emulsion does not have an electric charge in the molecule at all, or forms an inner salt and the molecule does not have an electric charge as a whole and has at least one aromatic ring in the molecule.
摘要翻译：一种卤化银照相乳剂，其含有光谱吸收最大波长小于500nm，光吸收强度为60以上，或光谱吸收最大波长为500nm以上，光吸收强度为100的卤化银粒子其中，用于光谱敏化乳液的增感染料中的至少一种完全不具有分子中的电荷，或形成内盐，并且分子整体上不具有电荷，并且具有分子中至少有一个芳香环。

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