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1. 发明申请

WO2012102970A1 GROWTH OF III-V LED STACKS USING NANO MASKS 审中-公开
标题翻译：使用NANO MASKS的III-V LED堆叠的增长
公开(公告)号：WO2012102970A1
公开(公告)日：2012-08-02
申请号：PCT/US2012/022085
申请日：2012-01-20
申请人： APPLIED MATERIALS, INC. , KANG, Sang, Won , SU, Jie , NG, Tuoh-Bin , BOUR, David , HSU, Wei-Yung
发明人： KANG, Sang, Won , SU, Jie , NG, Tuoh-Bin , BOUR, David , HSU, Wei-Yung
IPC分类号： H01L33/12 , H01L33/30
CPC分类号： H01L33/007 , H01L21/0237 , H01L21/02458 , H01L21/0254 , H01L21/0262 , H01L21/02639 , H01L21/0265 , H01L33/02 , H01L33/20
摘要： Methods, semiconductor material stacks and equipment for manufacture of light emitting diodes (LEDs) with improve crystal quality. A growth stopper is deposited between nuclei for a group III-V material, such as GaN, to form a nano mask. The group III-V material is laterally overgrown from a region of the nuclei not covered by the nano mask to form a continuous material layer with reduced dislocation density in preparation for subsequent growth of n-type and p-type layers of the LED. The lateral overgrowth from the nuclei may further recover the surface morphology of the buffer layer despite the presence of the nano mask. Presence of the growth stopper may further result in void formation on a substrate side of an LED stack to improve light extraction efficiency.
摘要翻译：方法，用于制造具有改善晶体质量的发光二极管（LED）的半导体材料堆叠和设备。在诸如GaN的III-V族材料的核之间沉积生长塞，以形成纳米掩模。 III-V族材料从未被纳米掩模覆盖的核的区域横向长满，以形成具有降低的位错密度的连续材料层，以准备LED的n型和p型层的随后生长。即使存在纳米掩模，来自核的横向过度生长也可进一步恢复缓冲层的表面形态。生长停止剂的存在可能进一步导致在LED堆叠的衬底侧上的空隙形成以提高光提取效率。

2. 发明申请

WO2012040505A3 PROCESSING SYSTEMS AND APPARATUSES HAVING A SHAFT COVER 审中-公开
标题翻译：具有轴盖的加工系统和设备
公开(公告)号：WO2012040505A3
公开(公告)日：2012-06-14
申请号：PCT/US2011052823
申请日：2011-09-22
申请人： APPLIED MATERIALS INC , HUANG JUNO YU-TING , KANG SANG WON , QUACH DAVID H , HSU WEI-YUNG
发明人： HUANG JUNO YU-TING , KANG SANG WON , QUACH DAVID H , HSU WEI-YUNG
IPC分类号： H01L21/205 , H01L21/20
CPC分类号： C30B25/08 , C30B25/12 , C30B29/403
摘要： Apparatus and systems are disclosed for processing a substrate. In an embodiment, a system includes a processing chamber, which includes a substrate support to support the substrate. The chamber further includes a plate member positioned below the substrate support and designed to improve heating efficiency within the processing chamber. The processing chamber further includes a lower dome positioned below the plate member. The plate member is designed to prevent a coating from being deposited on the lower dome during processing conditions. The plate member is designed to prevent particles and debris from falling below the plate member. The plate member is designed to improve heating uniformity between the plate member and the substrate within the processing chamber.
摘要翻译：公开了用于处理基板的设备和系统。在一个实施例中，一种系统包括处理室，处理室包括用于支撑衬底的衬底支撑件。腔室还包括位于基板支撑件下方且设计成改善处理腔室内的加热效率的板构件。处理室还包括位于板构件下方的下部圆顶。板构件设计成防止涂层在加工条件下沉积在下圆顶上。板构件被设计成防止颗粒和碎屑落到板构件下方。板构件被设计成改善处理室内的板构件和基板之间的加热均匀性。

3. 发明申请

WO2011159615A2 METHOD AND APPARATUS FOR INDUCING TURBULENT FLOW OF A PROCESSING CHAMBER CLEANING GAS 审中-公开
标题翻译：用于诱导加工室清洁气体的涡流的方法和装置
公开(公告)号：WO2011159615A2
公开(公告)日：2011-12-22
申请号：PCT/US2011/040197
申请日：2011-06-13
申请人： APPLIED MATERIALS, INC. , CHUNG, Hua , DONG, Xizi , MAUNG, Kyawwin , HANAWA, Hiroji , KANG, Sang Won , QUACH, David H. , OLGADO, Donald J.K. , BOUR, David , HSU, Wei-Yung , TAM, Alexander , CHANG, Anzhong , ACHARYA, Sumedh
发明人： CHUNG, Hua , DONG, Xizi , MAUNG, Kyawwin , HANAWA, Hiroji , KANG, Sang Won , QUACH, David H. , OLGADO, Donald J.K. , BOUR, David , HSU, Wei-Yung , TAM, Alexander , CHANG, Anzhong , ACHARYA, Sumedh
IPC分类号： H01L21/205 , H01L21/302
CPC分类号： B08B5/00 , C23C16/4405 , C23C16/45506 , C23C16/45591 , H01L21/02041 , H01L21/67115 , Y10S438/905
摘要： Embodiments of the invention generally relate to apparatus and methods for cleaning chamber components using a cleaning plate. The cleaning plate is adapted to be positioned on a substrate support during a cleaning process, and includes a plurality of turbulence-inducing structures. The turbulence-inducing structures induce a turbulent flow of cleaning gas while the cleaning plate is rotated during a cleaning process. The cleaning plate increases the retention time of the cleaning gas near the showerhead during cleaning. Additionally, the cleaning plate reduces concentration gradients within the cleaning plate to provide a more effective clean. The method includes positioning a cleaning plate adjacent to a showerhead, and introducing cleaning gas to the space between the showerhead and the cleaning plate. A material deposited on the surface of the showerhead is then heated and vaporized in the presence of the cleaning gas, and then exhausted from the processing chamber.
摘要翻译：本发明的实施例一般涉及使用清洁板清洁腔室部件的装置和方法。清洁板适于在清洁过程期间定位在基板支撑件上，并且包括多个湍流诱导结构。湍流诱导结构在清洁过程中清洁板旋转时引起清洁气体的湍流。在清洁过程中，清洁板增加了喷头附近清洁气体的停留时间。此外，清洁板减少清洁板内的浓度梯度以提供更有效的清洁。该方法包括将清洁板定位在与喷头相邻的位置，并将清洁气体引入到喷头和清洁板之间的空间。然后将沉积在喷头表面上的材料在清洁气体的存在下加热和蒸发，然后从处理室中排出。

4. 发明申请

WO2009116774A3 COMPOSITION FOR TREATMENT OR PREVENTION OF RESTENOSIS 审中-公开
标题翻译：治疗或预防再狭窄的组合物
公开(公告)号：WO2009116774A3
公开(公告)日：2009-11-26
申请号：PCT/KR2009001316
申请日：2009-03-17
申请人： UNIV EWHA IND COLLABORATION , BAE YUN SOO , LEE KEE-IN , KANG SANG WON , LEE JEE HYUN
发明人： BAE YUN SOO , LEE KEE-IN , KANG SANG WON , LEE JEE HYUN
IPC分类号： A61K31/4155 , A61P9/00
CPC分类号： A61K31/4155
摘要： The present invention relates to a composition for the treatment or the prevention of restenosis containing the compound of Formula 1 or Formula 2 and a pharmaceutically acceptable salt thereof. Further, the present invention relates to a method for removing stenosis of a blood vessel by injecting the composition into an individual, and a drug delivery device for local medication of the composition.
摘要翻译：本发明涉及用于治疗或预防再狭窄的组合物，其包含式1或式2的化合物及其药学上可接受的盐。此外，本发明涉及通过将组合物注入个体来去除血管狭窄的方法，以及用于局部用药的药物递送装置。

5. 发明申请

WO2011159615A3 METHOD AND APPARATUS FOR INDUCING TURBULENT FLOW OF A PROCESSING CHAMBER CLEANING GAS 审中-公开
标题翻译：用于诱导加工室清洁气体的涡流的方法和装置
公开(公告)号：WO2011159615A3
公开(公告)日：2012-04-19
申请号：PCT/US2011040197
申请日：2011-06-13
申请人： APPLIED MATERIALS INC , CHUNG HUA , DONG XIZI , MAUNG KYAWWIN , HANAWA HIROJI , KANG SANG WON , QUACH DAVID H , OLGADO DONALD J K , BOUR DAVID , HSU WEI-YUNG , TAM ALEXANDER , CHANG ANZHONG , ACHARYA SUMEDH
发明人： CHUNG HUA , DONG XIZI , MAUNG KYAWWIN , HANAWA HIROJI , KANG SANG WON , QUACH DAVID H , OLGADO DONALD J K , BOUR DAVID , HSU WEI-YUNG , TAM ALEXANDER , CHANG ANZHONG , ACHARYA SUMEDH
IPC分类号： H01L21/205 , H01L21/302
CPC分类号： B08B5/00 , C23C16/4405 , C23C16/45506 , C23C16/45591 , H01L21/02041 , H01L21/67115 , Y10S438/905
摘要： Embodiments of the invention generally relate to apparatus and methods for cleaning chamber components using a cleaning plate. The cleaning plate is adapted to be positioned on a substrate support during a cleaning process, and includes a plurality of turbulence-inducing structures. The turbulence-inducing structures induce a turbulent flow of cleaning gas while the cleaning plate is rotated during a cleaning process. The cleaning plate increases the retention time of the cleaning gas near the showerhead during cleaning. Additionally, the cleaning plate reduces concentration gradients within the cleaning plate to provide a more effective clean. The method includes positioning a cleaning plate adjacent to a showerhead, and introducing cleaning gas to the space between the showerhead and the cleaning plate. A material deposited on the surface of the showerhead is then heated and vaporized in the presence of the cleaning gas, and then exhausted from the processing chamber.
摘要翻译：本发明的实施例一般涉及使用清洁板清洁腔室部件的设备和方法。清洁板适于在清洁过程期间定位在基板支撑件上，并且包括多个湍流诱导结构。湍流诱导结构在清洁过程中清洁板旋转时引起清洁气体的湍流。在清洁过程中，清洁板增加了喷头附近清洁气体的停留时间。此外，清洁板减少清洁板内的浓度梯度以提供更有效的清洁。该方法包括将清洁板定位在与喷头相邻的位置，并将清洁气体引入到喷头和清洁板之间的空间。然后将沉积在喷头表面上的材料在清洁气体的存在下加热和蒸发，然后从处理室中排出。

6. 发明申请

WO2012040505A2 PROCESSING SYSTEMS AND APPARATUSES HAVING A SHAFT COVER 审中-公开
标题翻译：加工系统和具有轴承盖的设备
公开(公告)号：WO2012040505A2
公开(公告)日：2012-03-29
申请号：PCT/US2011/052823
申请日：2011-09-22
申请人： APPLIED MATERIALS, INC. , HUANG, Juno Yu-Ting , KANG, Sang, Won , QUACH, David, H. , HSU, Wei-Yung
发明人： HUANG, Juno Yu-Ting , KANG, Sang, Won , QUACH, David, H. , HSU, Wei-Yung
IPC分类号： H01L21/205 , H01L21/20
CPC分类号： C30B25/08 , C30B25/12 , C30B29/403
摘要： Apparatus and systems are disclosed for processing a substrate. In an embodiment, a system includes a processing chamber, which includes a substrate support to support the substrate. The chamber further includes a plate member positioned below the substrate support and designed to improve heating efficiency within the processing chamber. The processing chamber further includes a lower dome positioned below the plate member. The plate member is designed to prevent a coating from being deposited on the lower dome during processing conditions. The plate member is designed to prevent particles and debris from falling below the plate member. The plate member is designed to improve heating uniformity between the plate member and the substrate within the processing chamber.
摘要翻译：公开了用于处理衬底的装置和系统。在一个实施例中，系统包括处理室，其包括用于支撑衬底的衬底支撑件。腔室还包括位于衬底支撑件下方并被设计成提高处理室内的加热效率的板构件。处理室还包括位于板构件下方的下拱顶。板构件设计成防止在加工条件下涂层沉积在下圆顶上。板构件被设计成防止颗粒和碎屑落在板构件下方。板构件被设计成改善处理室内的板构件和衬底之间的加热均匀性。

7. 发明申请

WO2011096756A3 PHARMACEUTICAL COMPOSITION FOR INHIBITING ABNORMAL PROLIFERATION OF CELLS 审中-公开
标题翻译：用于抑制细胞异常增殖的药物组合物
公开(公告)号：WO2011096756A3
公开(公告)日：2011-12-15
申请号：PCT/KR2011000768
申请日：2011-02-07
申请人： UNIV EWHA IND COLLABORATION , KANG SANG WON , LEE SOO YOUNG
发明人： KANG SANG WON , LEE SOO YOUNG
IPC分类号： A61K38/16 , A61P35/00 , C12N15/11 , G01N33/15
CPC分类号： C12N15/1135 , A61K39/00 , C12N2310/11
摘要： The present invention relates to a pharmaceutical composition for preventing or treating diseases related to abnormal proliferation of cells, comprising a cytoplasmic heat shock protein (Hsp)60 kDa inhibitor as an active ingredient, and to a screening method and a kit using the composition. According to the present invention, substances which inhibit expression of cytoplasmic Hsp 60 genes or inhibit activity of cytoplasmic Hsp 60 or inhibit binding between cytoplasmic Hsp 60 and IKK protein prevent interaction between cytoplasmic Hsp 60 and IKK complexes to make NF- ?B path inactive, and thus induce apoptosis. Therefore, the substances can be valuably used in preventing or treating diseases related to abnormal proliferation of cells, such as cancer, inflammatory diseases or hyperproliferative vascular diseases.
摘要翻译：本发明涉及用于预防或治疗与细胞异常增殖有关的疾病的药物组合物，其包含细胞质热休克蛋白（Hsp）60kDa抑制剂作为活性成分，以及使用该组合物的筛选方法和试剂盒。根据本发明，抑制细胞质Hsp 60基因表达或抑制细胞质Hsp60活性或抑制细胞质Hsp60与IKK蛋白之间结合的物质可防止细胞质Hsp60与IKK复合体之间的相互作用，使NF-κB通路无活性，从而诱导凋亡。因此，这些物质可以有效地用于预防或治疗与癌症，炎性疾病或过度增生性血管疾病等细胞的异常增殖有关的疾病。

8. 发明申请

WO2011096756A2 PHARMACEUTICAL COMPOSITION FOR INHIBITING ABNORMAL PROLIFERATION OF CELLS 审中-公开
标题翻译：用于抑制细胞异常增殖的药物组合物
公开(公告)号：WO2011096756A2
公开(公告)日：2011-08-11
申请号：PCT/KR2011000768
申请日：2011-02-07
申请人： UNIV EWHA IND COLLABORATION , KANG SANG WON , LEE SOO YOUNG
发明人： KANG SANG WON , LEE SOO YOUNG
IPC分类号： A61K38/16 , A61P35/00 , C12N15/11 , G01N33/15
CPC分类号： C12N15/1135 , A61K39/00 , C12N2310/11
摘要： The present invention relates to a pharmaceutical composition for preventing or treating diseases related to abnormal proliferation of cells, comprising a cytoplasmic heat shock protein (Hsp)60 kDa inhibitor as an active ingredient, and to a screening method and a kit using the composition. According to the present invention, substances which inhibit expression of cytoplasmic Hsp 60 genes or inhibit activity of cytoplasmic Hsp 60 or inhibit binding between cytoplasmic Hsp 60 and IKK protein prevent interaction between cytoplasmic Hsp 60 and IKK complexes to make NF- ?B path inactive, and thus induce apoptosis. Therefore, the substances can be valuably used in preventing or treating diseases related to abnormal proliferation of cells, such as cancer, inflammatory diseases or hyperproliferative vascular diseases.
摘要翻译：本发明涉及用于预防或治疗与细胞异常增殖有关的疾病的药物组合物，其包含作为活性成分的细胞质热休克蛋白（Hsp）60kDa抑制剂，以及使用该组合物的筛选方法和试剂盒。根据本发明，抑制细胞质热休克蛋白60基因表达或抑制细胞质热休克蛋白60活性或抑制细胞质热休克蛋白60和IKK蛋白之间结合的物质防止细胞质热休克蛋白60和IKK复合物之间的相互作用，使NF-κB途径失活，并由此诱导细胞凋亡。因此，这些物质可以有价值地用于预防或治疗与细胞异常增殖相关的疾病，例如癌症，炎性疾病或过度增殖性血管疾病。

9. 发明申请

WO2011081465A2 PHARMACEUTICAL COMPOSITION FOR SUPPRESSION OF VASCULARIZATION 审中-公开
标题翻译：用于抑制血管化的药物组合物
公开(公告)号：WO2011081465A2
公开(公告)日：2011-07-07
申请号：PCT/KR2010009540
申请日：2010-12-29
申请人： UNIV EWHA IND COLLABORATION , KANG SANG WON , KANG DONG HOON , LEE DOO JAE
发明人： KANG SANG WON , KANG DONG HOON , LEE DOO JAE
IPC分类号： A61K38/16 , A61P29/00 , A61P35/00
CPC分类号： A61K31/713 , G01N33/5023
摘要： The present invention relates to a composition for suppression of vascularization including peroxy redoxine II (prx II) suppressants and the screening method and kit of vasculization suppressants using prx II. According to the present invention, the suppression of prx II gene expression or the suppression of prx II protein activation increases oxidative deactivation of VEGF receptor tyrosine kinase, RTK, and decreases VEGF signal transmission, and using this property, it is able to screen new suppressants for vascularization. Thus, the composition and method of the present invention can be used to prevent and treat a variety of diseases or conditions related to vascularization.
摘要翻译：本发明涉及一种用于抑制血管形成的组合物，包括过氧氧化还原II（prx II）抑制剂以及使用prx II的血管抑制剂的筛选方法和试剂盒。根据本发明，抑制prx II基因表达或抑制prx II蛋白激活增加VEGF受体酪氨酸激酶，RTK的氧化失活，并减少VEGF信号传递，并且使用该性质可以筛选新的抑制剂用于血管化。因此，本发明的组合物和方法可用于预防和治疗与血管形成相关的各种疾病或病症。

10. 发明申请

WO2009116750A2 COMPOSITION FOR THE COATING OF STENT FOR PREVENTING RESTENOSIS AND STENT MANUFACTURED USING SAME 审中-公开
标题翻译：用于防止再狭窄和用相同方法制造的支架涂层的组合物
公开(公告)号：WO2009116750A2
公开(公告)日：2009-09-24
申请号：PCT/KR2009001257
申请日：2009-03-13
申请人： UNIV EWHA IND COLLABORATION , KANG SANG WON , CHOI CHULHEE , KWON KIHWAN , KANG DONGHOON
发明人： KANG SANG WON , CHOI CHULHEE , KWON KIHWAN , KANG DONGHOON
IPC分类号： A61F2/82
CPC分类号： A61F2/82 , A61F2250/0067
摘要： The present invention provides a composition for the coating of a stent for preventing restenosis including a selective siRNA and a transfection reagent to the gene causing restenosis. The present invention provides a stent coated with the composition, a manufacturing method for same, and a method for preventing restenosis including the step of enabling direct intravascular application of the stent. The composition of the present invention coats the stent, and introduces siRNA to cells in an efficient and stable manner in a local region, preventing restenosis without virulence.
摘要翻译：本发明提供了一种用于涂覆支架的组合物，所述支架用于防止再狭窄，所述组合物包括对导致再狭窄的基因的选择性siRNA和转染试剂。本发明提供了涂布有该组合物的支架，其制造方法和防止再狭窄的方法，其包括能够直接血管内施用支架的步骤。本发明的组合物包覆支架，并且以有效和稳定的方式将siRNA引入局部区域，防止无毒性的再狭窄。

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