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    • 2. 发明授权
    • Passive multi-band duplexer
    • 被动多频双工器
    • US08680947B1
    • 2014-03-25
    • US12843574
    • 2010-07-26
    • Julio CostaJoshua J. CaronTodd Gillenwater
    • Julio CostaJoshua J. CaronTodd Gillenwater
    • H03H7/01H03H9/46H01P1/20
    • H01P1/213H03H7/465H03H9/706H03H9/725H03H2210/012H03H2210/025H03H2210/026H03H2210/033H03H2210/036H03H2250/00
    • The present disclosure relates to a passive multi-band duplexer having a first bandpass filter and a second bandpass filter. The first bandpass filter includes a first group of sub-band bandpass filters, a first switching circuit, and a first tunable LC bandpass filter. Similarly, the second bandpass filter includes a second group of sub-band bandpass filters, a second switching circuit, and a second tunable LC bandpass filter. A first band of the passive multi-band duplexer, such as a transmit band, is chosen by selecting one of the first group of sub-band bandpass filters and tuning the first tunable LC bandpass filter to the first band. Similarly, a second band of the passive multi-band duplexer, such as a receive band, is chosen by selecting one of the second group of sub-band bandpass filters and tuning the second tunable LC bandpass filter to the second band.
    • 本公开涉及具有第一带通滤波器和第二带通滤波器的无源多频双工器。 第一带通滤波器包括第一组子带通滤波器,第一开关电路和第一可调谐LC带通滤波器。 类似地,第二带通滤波器包括第二组子带通滤波器,第二开关电路和第二可调谐LC带通滤波器。 通过选择第一组子带通滤波器之一并将第一可调谐LC带通滤波器调谐到第一频带来选择无源多频双工器的第一频带,例如发射频带。 类似地,通过选择第二组子带通滤波器之一并将第二可调谐LC带通滤波器调谐到第二频带来选择诸如接收频带的无源多频双工器的第二频带。
    • 3. 发明授权
    • Integrated lateral high-voltage diode and thyristor
    • 集成横向高压二极管和晶闸管
    • US08164110B1
    • 2012-04-24
    • US12949296
    • 2010-11-18
    • Daniel Charles KerrDavid C. DeningJulio Costa
    • Daniel Charles KerrDavid C. DeningJulio Costa
    • H01L29/74
    • H01L29/868H01L29/1045H01L29/42364H01L29/7436H01L29/7833H01L29/861H03K3/352
    • The present invention relates to integration of lateral high-voltage devices, such as a lateral high-voltage diode (LHVD) or a lateral high-voltage thyristor, with other circuitry on a semiconductor wafer, which may be fabricated using low-voltage foundry technology, such as a low-voltage complementary metal oxide semiconductor (LV-CMOS) process. The other circuitry may include low-voltage devices, such as switching transistors used in logic circuits, computer circuitry, or the like, or other high-voltage devices, such as a microelectromechanical system (MEMS) switch. The reverse breakdown voltage capability of the LHVD may be increased by using an intrinsic material between the anode and the cathode. Similarly, in a lateral high-voltage thyristor, such as a lateral high-voltage Silicon-controlled rectifier (LHV-SCR), the withstand voltage capability of the LHV-SCR may be increased by using an intrinsic material between the anode and the cathode.
    • 本发明涉及诸如横向高压二极管(LHVD)或横向高压晶闸管的横向高压器件与半导体晶片上的其它电路的集成,其可以使用低压铸造技术 ,例如低电压互补金属氧化物半导体(LV-CMOS)工艺。 另一电路可以包括诸如用于逻辑电路,计算机电路等的开关晶体管或诸如微机电系统(MEMS)开关的其他高电压器件的低电压器件。 可以通过在阳极和阴极之间使用本征材料来增加LHVD的反向击穿电压能力。 类似地,在横向高压晶闸管(例如横向高压可硅可控整流器(LHV-SCR))中,可以通过在阳极和阴极之间使用本征材料来增加LHV-SCR的耐受电压能力 。
    • 4. 发明申请
    • INSULATOR LAYER BASED MEMS DEVICES
    • 基于绝缘体层的MEMS器件
    • US20110204478A1
    • 2011-08-25
    • US13097989
    • 2011-04-29
    • Sangchae KimTony IvanovJulio Costa
    • Sangchae KimTony IvanovJulio Costa
    • H01L27/06H01L21/02
    • B81B7/02B81C1/0015H01L27/101H03H3/0072H03H9/02433H03H9/2405
    • The present invention relates to using an insulator layer between two metal layers of a semiconductor die to provide a micro-electromechanical systems (MEMS) device, such as an ohmic MEMS switch or a capacitive MEMS switch. In an ohmic MEMS switch, the insulator layer may be used to reduce metal undercutting during fabrication, to prevent electrical shorting of a MEMS actuator to a MEMS cantilever, or both. In a capacitive MEMS switch, the insulator layer may be used as a capacitive dielectric between capacitive plates, which are provided by the two metal layers. A fixed capacitive element may be provided by the insulator layer between the two metal layers. In one embodiment of the present invention, an ohmic MEMS switch, a capacitive MEMS switch, a fixed capacitive element, or any combination thereof may be integrated into a single semiconductor die.
    • 本发明涉及在半导体管芯的两个金属层之间使用绝缘体层来提供诸如欧姆MEMS开关或电容式MEMS开关的微机电系统(MEMS)器件。 在欧姆MEMS开关中,绝缘体层可用于在制造过程中减少金属底切,以防止MEMS致动器对MEMS悬臂的电短路,或两者兼而有之。 在电容MEMS开关中,绝缘体层可以用作由两个金属层提供的电容板之间的电容电介质。 固定的电容元件可以由两个金属层之间的绝缘体层提供。 在本发明的一个实施例中,欧姆MEMS开关,电容MEMS开关,固定电容元件或其任何组合可以集成到单个半导体管芯中。
    • 6. 发明授权
    • Integrated lateral high-voltage diode and thyristor
    • 集成横向高压二极管和晶闸管
    • US07859009B1
    • 2010-12-28
    • US12140504
    • 2008-06-17
    • Daniel Charles KerrDavid C. DeningJulio Costa
    • Daniel Charles KerrDavid C. DeningJulio Costa
    • H01L29/74
    • H01L29/868H01L29/1045H01L29/42364H01L29/7436H01L29/7833H01L29/861H03K3/352
    • The present invention relates to integration of lateral high-voltage devices, such as a lateral high-voltage diode (LHVD) or a lateral high-voltage thyristor, with other circuitry on a semiconductor wafer, which may be fabricated using low-voltage foundry technology, such as a low-voltage complementary metal oxide semiconductor (LV-CMOS) process. The other circuitry may include low-voltage devices, such as switching transistors used in logic circuits, computer circuitry, or the like, or other high-voltage devices, such as a microelectromechanical system (MEMS) switch. The reverse breakdown voltage capability of the LHVD may be increased by using an intrinsic material between the anode and the cathode. Similarly, in a lateral high-voltage thyristor, such as a lateral high-voltage Silicon-controlled rectifier (LHV-SCR), the withstand voltage capability of the LHV-SCR may be increased by using an intrinsic material between the anode and the cathode.
    • 本发明涉及诸如横向高压二极管(LHVD)或横向高压晶闸管的横向高压器件与半导体晶片上的其它电路的集成,其可以使用低压铸造技术 ,例如低电压互补金属氧化物半导体(LV-CMOS)工艺。 另一电路可以包括诸如用于逻辑电路,计算机电路等的开关晶体管或诸如微机电系统(MEMS)开关的其他高电压器件的低电压器件。 可以通过在阳极和阴极之间使用本征材料来增加LHVD的反向击穿电压能力。 类似地,在横向高压晶闸管(例如横向高压可硅可控整流器(LHV-SCR))中,可以通过在阳极和阴极之间使用本征材料来增加LHV-SCR的耐受电压能力 。
    • 7. 发明授权
    • Integrated MEMS switch
    • 集成MEMS开关
    • US07745892B1
    • 2010-06-29
    • US11955918
    • 2007-12-13
    • Tony IvanovJulio CostaJonathan Hale Hammond
    • Tony IvanovJulio CostaJonathan Hale Hammond
    • H01L29/84
    • B81C1/00246B81B2201/014H01H59/0009
    • The present invention provides a MEMS switch that is formed on, not merely placed on, a semiconductor substrate of a semiconductor device. The basic semiconductor substrate includes a handle wafer, an insulator layer over the handle wafer, and a device layer over the insulator layer. The device layer is one in which active semiconductor devices, such as transistors and diodes, may be formed. The MEMS switch is formed over the device layer during fabrication of the semiconductor device. Additional layers, such as connecting layers, passivation layers, and dielectric layers, may be inserted among or between any of these various layers without departing from the essence of the invention. As such, the present invention avoids the need to fabricate MEMS switches apart from the devices that contain circuitry to be associated with the MEMS switches, and to subsequently mount the MEMS switches to modules that circuitry.
    • 本发明提供一种MEMS开关,其形成在半导体器件的半导体衬底上,而不仅仅放置在其上。 基本半导体衬底包括处理晶片,处理晶片上方的绝缘体层以及绝缘体层上方的器件层。 器件层是其中可以形成诸如晶体管和二极管的有源半导体器件的器件层。 在半导体器件的制造期间,MEMS开关形成在器件层上。 在不脱离本发明的实质的情况下,可以在这些各层之间或之间插入附加层,例如连接层,钝化层和电介质层。 因此,本发明避免了制造除了与MEMS开关相关联的电路的器件之外的MEMS开关以及随后将MEMS开关安装到该电路的模块的需要。