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    • 2. 发明授权
    • Reconfigurable RF switch die
    • 可重构RF开关管芯
    • US08718572B2
    • 2014-05-06
    • US12961039
    • 2010-12-06
    • Daniel Charles KerrAli TombakChristian Rye Iversen
    • Daniel Charles KerrAli TombakChristian Rye Iversen
    • H04B1/44
    • H04B1/48H01L2224/14H01L2224/16225H04B1/006Y10T307/76
    • A radio frequency (RF) switch die which includes an antenna port, a plurality of RF ports, a switch fabric for selectively coupling one or more of the RF ports to the antenna port, and control circuitry that is adapted to, in a first mode, direct the switch fabric to couple any one of the plurality of RF ports individually to the antenna port, and in a second mode, couple a selected group of the RF ports to the antenna port. The RF switch die may include M number of RF ports, and be relatively easily reconfigured to provide N number of RF ports, wherein N is less than M. Groups of RF ports may be coupled together to form coupled RF ports that offer different electrical characteristics than non-coupled RF ports.
    • 一种射频(RF)开关管芯,包括天线端口,多个RF端口,用于选择性地将一个或多个RF端口耦合到天线端口的开关结构,以及适于以第一模式 引导交换结构将多个RF端口中的任何一个单独地耦合到天线端口,并且在第二模式中,将所选择的一组RF端口耦合到天线端口。 RF开关管芯可以包括M个RF端口,并且相对容易地重新配置以提供N个数量的RF端口,其中N小于M.RF端口组可以耦合在一起以形成提供不同电特性的耦合RF端口 比非耦合RF端口。
    • 4. 发明授权
    • Remote gate protection diode for field effect transistors
    • 用于场效应晶体管的远程栅极保护二极管
    • US09356144B1
    • 2016-05-31
    • US12854563
    • 2010-08-11
    • Philip MasonDaniel Charles KerrMichael Carroll
    • Philip MasonDaniel Charles KerrMichael Carroll
    • H01L23/62H01L29/78
    • H01L29/7841H01L27/0255
    • The present disclosure relates to gate oxide protection circuits, which are used to protect the gate oxides of field effect transistor (FET) elements from over voltage conditions, particularly during situations in which the gate oxides are particularly vulnerable, such as during certain manufacturing stages. Each gate oxide protection circuit may be coupled to a corresponding FET element through corresponding first and second resistive elements, which are coupled to a corresponding gate connection node and a corresponding first connection node, respectively, of the FET element. The gate connection node and the first connection node are electrically adjacent to opposite sides of the gate oxide of the FET element. Each gate oxide protection circuit may protect its corresponding FET element by limiting a voltage between the gate connection node and the first connection node.
    • 本公开涉及栅极氧化物保护电路,其用于保护场效应晶体管(FET)元件的栅极氧化物免受过电压条件,特别是在栅极氧化物特别容易受到影响的情况下,例如在某些制造阶段。 每个栅极氧化物保护电路可以通过对应的第一和第二电阻元件耦合到对应的FET元件,该第一和第二电阻元件分别耦合到FET元件的对应的栅极连接节点和相应的第一连接节点。 栅极连接节点和第一连接节点与FET元件的栅极氧化物的相对侧电气相邻。 每个栅极氧化物保护电路可以通过限制栅极连接节点和第一连接节点之间的电压来保护其对应的FET元件。
    • 5. 发明授权
    • Voltage equalization for stacked FETs in RF switches
    • RF开关中层叠FET的电压均衡
    • US09484973B1
    • 2016-11-01
    • US12944212
    • 2010-11-11
    • Michael CarrollDaniel Charles KerrAli TombakPhilip Mason
    • Michael CarrollDaniel Charles KerrAli TombakPhilip Mason
    • H04B1/28H04B1/52
    • H04B1/28H03K17/102H03K17/693H04B1/52
    • A switch branch that improves voltage uniformity across a series stack of an n-number of transistors is disclosed. A first one of the n-number of transistors is coupled to an input terminal, and an nth one of the n-number of transistors is coupled to an output terminal, where n is a positive integer greater than one. Predetermined parasitic capacitances associated with each of the n-number of transistors are adjustable with respect to capacitance value by predetermined amounts by dimensioning and arranging at least one metal layer element in proximity to the series stack of the n-number of transistors. Capacitance values for the predetermined parasitic capacitances are selected such that a voltage across the series stack of the n-number of transistors is uniformly distributed. In this way, the n-number of transistors can be reduced without risking a transistor breakdown within the series stack of the n-number of transistors.
    • 公开了一种提高n个晶体管的串联堆叠电压均匀性的开关支路。 n个晶体管中的第一个耦合到输入端子,并且n个晶体管中的第n个耦合到输出端子,其中n是大于1的正整数。 与n个晶体管中的每一个相关联的预定的寄生电容通过将n个晶体管的串联堆叠中的至少一个金属层元件的尺寸设置和布置而相对于电容值可调节预定量。 选择预定寄生电容的电容值,使得n个晶体管的串联堆叠上的电压均匀分布。 以这种方式,可以减少n个晶体管,而不会在n个晶体管的串联堆叠内的晶体管击穿的风险。
    • 7. 发明授权
    • Integrated lateral high-voltage diode and thyristor
    • 集成横向高压二极管和晶闸管
    • US08164110B1
    • 2012-04-24
    • US12949296
    • 2010-11-18
    • Daniel Charles KerrDavid C. DeningJulio Costa
    • Daniel Charles KerrDavid C. DeningJulio Costa
    • H01L29/74
    • H01L29/868H01L29/1045H01L29/42364H01L29/7436H01L29/7833H01L29/861H03K3/352
    • The present invention relates to integration of lateral high-voltage devices, such as a lateral high-voltage diode (LHVD) or a lateral high-voltage thyristor, with other circuitry on a semiconductor wafer, which may be fabricated using low-voltage foundry technology, such as a low-voltage complementary metal oxide semiconductor (LV-CMOS) process. The other circuitry may include low-voltage devices, such as switching transistors used in logic circuits, computer circuitry, or the like, or other high-voltage devices, such as a microelectromechanical system (MEMS) switch. The reverse breakdown voltage capability of the LHVD may be increased by using an intrinsic material between the anode and the cathode. Similarly, in a lateral high-voltage thyristor, such as a lateral high-voltage Silicon-controlled rectifier (LHV-SCR), the withstand voltage capability of the LHV-SCR may be increased by using an intrinsic material between the anode and the cathode.
    • 本发明涉及诸如横向高压二极管(LHVD)或横向高压晶闸管的横向高压器件与半导体晶片上的其它电路的集成,其可以使用低压铸造技术 ,例如低电压互补金属氧化物半导体(LV-CMOS)工艺。 另一电路可以包括诸如用于逻辑电路,计算机电路等的开关晶体管或诸如微机电系统(MEMS)开关的其他高电压器件的低电压器件。 可以通过在阳极和阴极之间使用本征材料来增加LHVD的反向击穿电压能力。 类似地,在横向高压晶闸管(例如横向高压可硅可控整流器(LHV-SCR))中,可以通过在阳极和阴极之间使用本征材料来增加LHV-SCR的耐受电压能力 。
    • 8. 发明授权
    • Integrated lateral high-voltage diode and thyristor
    • 集成横向高压二极管和晶闸管
    • US07859009B1
    • 2010-12-28
    • US12140504
    • 2008-06-17
    • Daniel Charles KerrDavid C. DeningJulio Costa
    • Daniel Charles KerrDavid C. DeningJulio Costa
    • H01L29/74
    • H01L29/868H01L29/1045H01L29/42364H01L29/7436H01L29/7833H01L29/861H03K3/352
    • The present invention relates to integration of lateral high-voltage devices, such as a lateral high-voltage diode (LHVD) or a lateral high-voltage thyristor, with other circuitry on a semiconductor wafer, which may be fabricated using low-voltage foundry technology, such as a low-voltage complementary metal oxide semiconductor (LV-CMOS) process. The other circuitry may include low-voltage devices, such as switching transistors used in logic circuits, computer circuitry, or the like, or other high-voltage devices, such as a microelectromechanical system (MEMS) switch. The reverse breakdown voltage capability of the LHVD may be increased by using an intrinsic material between the anode and the cathode. Similarly, in a lateral high-voltage thyristor, such as a lateral high-voltage Silicon-controlled rectifier (LHV-SCR), the withstand voltage capability of the LHV-SCR may be increased by using an intrinsic material between the anode and the cathode.
    • 本发明涉及诸如横向高压二极管(LHVD)或横向高压晶闸管的横向高压器件与半导体晶片上的其它电路的集成,其可以使用低压铸造技术 ,例如低电压互补金属氧化物半导体(LV-CMOS)工艺。 另一电路可以包括诸如用于逻辑电路,计算机电路等的开关晶体管或诸如微机电系统(MEMS)开关的其他高电压器件的低电压器件。 可以通过在阳极和阴极之间使用本征材料来增加LHVD的反向击穿电压能力。 类似地,在横向高压晶闸管(例如横向高压可硅可控整流器(LHV-SCR))中,可以通过在阳极和阴极之间使用本征材料来增加LHV-SCR的耐受电压能力 。
    • 9. 发明授权
    • Integrated lateral high-voltage metal oxide semiconductor field effect transistor
    • 集成横向高压金属氧化物半导体场效应晶体管
    • US07989889B1
    • 2011-08-02
    • US12140491
    • 2008-06-17
    • Daniel Charles KerrDavid C. DeningJulio Costa
    • Daniel Charles KerrDavid C. DeningJulio Costa
    • H01L29/66
    • H01L29/868H01L29/1045H01L29/66659H01L29/7436H01L29/7835H03F3/213
    • The present invention relates to integration of a lateral high-voltage metal oxide semiconductor field effect transistor (LHV-MOSFET) with other circuitry on a semiconductor wafer, which may be fabricated using low-voltage foundry technology, such as a low-voltage complementary metal oxide semiconductor (LV-CMOS) process. The other circuitry may include low-voltage devices, such as switching transistors used in logic circuits, computer circuitry, and the like, or other high-voltage devices, such as a microelectromechanical system (MEMS) switch. The source to drain voltage capability of the LHV-MOSFET may be increased by using an intrinsic material between the source and the drain. The gate voltage capability of the LHV-MOSFET may be increased by using an insulator material, such as a thick oxide, between the gate and the channel of the LHV-MOSFET.
    • 本发明涉及横向高压金属氧化物半导体场效应晶体管(LHV-MOSFET)与半导体晶片上的其它电路的集成,其可以使用低压铸造技术制造,例如低电压互补金属 氧化物半导体(LV-CMOS)工艺。 另一电路可以包括诸如用于逻辑电路,计算机电路等的开关晶体管或诸如微机电系统(MEMS)开关的其他高电压器件的低电压器件。 可以通过在源极和漏极之间使用本征材料来增加LHV-MOSFET的漏极电压能力源。 可以通过在LHV-MOSFET的栅极和沟道之间使用诸如厚氧化物的绝缘体材料来增加LHV-MOSFET的栅极电压能力。