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1. 发明授权

US06398373B1 Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems 失效
标题翻译：气动控制系统和用于在光刻投影系统中成形可变形反射镜的方法
公开(公告)号：US06398373B1
公开(公告)日：2002-06-04
申请号：US09635984
申请日：2000-08-09
申请人： Andrew J. Guzman , Carlo La Fiandra , Ronald P. Sidor , Jorge S. Ivaldi , Michael L. Nelson
发明人： Andrew J. Guzman , Carlo La Fiandra , Ronald P. Sidor , Jorge S. Ivaldi , Michael L. Nelson
IPC分类号： G02B508
CPC分类号： G03F7/70266 , G02B26/0825 , Y10S359/90
摘要： A system for adjusting a deformable mirror including a reaction plate, a plurality of pneumatic actuators coupled to the reaction plate, and a plurality of push-pull flexures coupled on a first end to the pneumatic actuators, and coupled on a second end to the non-reflective side the deformable mirror, the plurality of push-pull flexures being disposed at various locations on the back of the deformable mirror. The respective pairs of push-pull flexures and pneumatic actuators are operated to support and alter the shape of the deformable mirror to allow for correction of a plurality of optical aberrations.
摘要翻译：一种用于调节可变形反射镜的系统，包括反作用板，耦合到反作用板的多个气动致动器，以及耦合在气动致动器的第一端上的多个推挽式挠曲件，反射侧可变形反射镜，多个推挽弯曲件设置在可变形反射镜背面的各个位置。操作各对推挽挠曲和气动致动器以支撑和改变可变形反射镜的形状，以允许校正多个光学像差。

2. 发明授权

US06991416B2 System and method for reticle protection and transport 失效
公开(公告)号：US06991416B2
公开(公告)日：2006-01-31
申请号：US10216660
申请日：2002-08-12
申请人： Santiago E. del Puerto , Michael A. DeMarco , Glenn M. Friedman , Jorge S. Ivaldi , James A. McClay
发明人： Santiago E. del Puerto , Michael A. DeMarco , Glenn M. Friedman , Jorge S. Ivaldi , James A. McClay
IPC分类号： H01L21/68
CPC分类号： G03F7/70741 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/66 , G03F7/70808 , H01L21/67005 , H01L21/67751 , H01L21/67772 , H01L21/67778 , Y10S414/14
摘要： A substrate protection and transport system and method for transitioning a substrate from atomospheric pressure to vacuum in a lithography tool. The system includes one or more removable substrate transport cassettes. Each cassette has at least one vent and at least one filter. The system further includes an end effector coupled to a robotic arm to enable the substrate to be positioned within one of the cassettes, thereby forming a cassette-substrate arrangement. The system further includes a box having a base and a lid. The box holds one or more of the cassette-substrate arrangements. In this way, a box-cassette-substrate arrangement is provided. An out of vacuum storage rack having shelves for holding the box-cassette-substrate arrangement is also provided. Still further, an entry-exit module having a loadlock is provided for transitioning the cassette-substrate arrangement from atmospheric pressure to vacuum. To transport the substrate, the substrate is first loaded into a removable substrate transport cassette. Next, the cassette-substrate arrangement is loaded into the box. The box-cassette-substrate arrangement is then transported to a shelf of an out of vacuum storage rack. During further processing, the cassette-substrate arrangement is unloaded from the box-cassette-substrate arrangement. The cassette-substrate arrangement is then loaded into a loadlock where it can be transitioned from atmospheric pressure to vacuum. During transitioning, the filters and vents restrict particles within the loadlock from entering the cassette-substrate arrangement and reaching a surface of the substrate.

3. 发明授权

US06619903B2 System and method for reticle protection and transport 失效
标题翻译：用于掩模保护和运输的系统和方法
公开(公告)号：US06619903B2
公开(公告)日：2003-09-16
申请号：US09925722
申请日：2001-08-10
申请人： Glenn M. Friedman , Michael DeMarco , Jorge S. Ivaldi , James A. McClay
发明人： Glenn M. Friedman , Michael DeMarco , Jorge S. Ivaldi , James A. McClay
IPC分类号： B65G4907
CPC分类号： G03F7/70741 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/66 , G03F7/70808 , H01L21/67005 , H01L21/67751 , H01L21/67772 , H01L21/67778 , Y10S414/14
摘要： A reticle protection and transport system and method for a lithography tool. The system includes an indexer that stores a plurality of reticles and a removable reticle cassette. The removable reticle cassette is comprised of an inner chamber and an outer chamber. The system further includes an end effector coupled to a robotic arm. The end effector engages one of the plurality of reticles to enable the reticle to be positioned within the removable reticle cassette and thereafter transported. The system further includes a seal, coupled to the end effector and the robotic arm. To transport the reticle, the reticle is first loaded onto the end effector. Next, the end effector is used to create an arrangement wherein the reticle is loaded into the removable reticle cassette. Importantly, the reticle and removable reticle cassette do not come into contact with one another. The reticle and removable reticle cassette arrangement is then sealed and transported from the indexer to a mount for performing lithographic exposure. Once lithographic exposure is completed, the arrangement is returned to the indexer and the reticle is withdrawn from the removable reticle cassette.
摘要翻译：光刻工具的掩模版保护和输送系统及方法。该系统包括存储多个掩模版和可拆卸标线片盒的分度器。可移除的标线盒由内室和外室构成。该系统还包括耦合到机器臂的端部执行器。端部执行器与多个标线板中的一个接合，以使得标线片能够被定位在可移除的标线盒内并且之后传送。该系统还包括联接到末端执行器和机器臂的密封件。为了运输掩模版，首先将掩模版加载到末端执行器上。接下来，使用端部执行器来产生其中将光罩装载到可移除的标线盒中的布置。重要的是，标线和可拆卸的标线盒不会彼此接触。然后将掩模版和可去除的光罩盒装置密封并从分度器传送到用于进行光刻曝光的安装台。一旦光刻曝光完成，该布置返回到分度器，并将标线从可移除的标线片盒中取出。

4. 发明授权

US06411426B1 Apparatus, system, and method for active compensation of aberrations in an optical system 有权
公开(公告)号：US06411426B1
公开(公告)日：2002-06-25
申请号：US09702854
申请日：2000-11-01
申请人： Michael F. Meehan , David G. Taub , Jorge S. Ivaldi
发明人： Michael F. Meehan , David G. Taub , Jorge S. Ivaldi
IPC分类号： G02B2600
CPC分类号： G03F7/70233 , G02B7/1822 , G02B7/185 , G03F7/70258
摘要： Active compensation of aberrations in an optical system involves attaching first and second force bars to a mirror. The first force bar is bifurcated to form an opening near its longitudinal midpoint. This opening defines first and second opposed surfaces. A second force bar is substantially perpendicular to the first force bar and extends through the opening of the first force bar so that a medial portion of the second force bar is disposed in the opening of the first force bar. The second force bar is connected to the first surface by at least one actuator. Longitudinal movement of the actuator causes a displacement of the mirror. A support structure is used to support the weight of the force bars and actuator. The force bars are connected to the support structure by a plurality of flexures. A control module receives information from a sensing module and controls the actuator. Other embodiments use more than two force bars and are capable of more fully compensating for any aberrations in the optical system.

5. 发明授权

US07249925B2 System and method for reticle protection and transport 失效
标题翻译：用于掩模保护和运输的系统和方法
公开(公告)号：US07249925B2
公开(公告)日：2007-07-31
申请号：US11282474
申请日：2005-11-21
申请人： Santiago E. del Puerto , Michael A. DeMarco , Glenn M. Friedman , Jorge S. Ivaldi , James A. McClay
发明人： Santiago E. del Puerto , Michael A. DeMarco , Glenn M. Friedman , Jorge S. Ivaldi , James A. McClay
IPC分类号： H01L21/68
CPC分类号： G03F7/70741 , B82Y10/00 , B82Y40/00 , G03F1/24 , G03F1/66 , G03F7/70808 , H01L21/67005 , H01L21/67751 , H01L21/67772 , H01L21/67778 , Y10S414/14
摘要： A substrate protection and transport system and method for transitioning a substrate from atmospheric pressure to vacuum in a lithography tool. The system includes one or more removable substrate transport cassettes that support a substrate. The cassette can include a base portion and top portion, and can include a seal. Each cassette has at least one vent and at least one filter. The system further includes a box having a base and lid. The box holds one or more cassette-substrate arrangements. A storage rack having shelves for holding the box-cassette-substrate arrangement is also provided. Further, an entry-exit module having a loadlock is provided for transitioning the cassette-substrate arrangement from atmospheric pressure to vacuum. The entry-exit module can include a shuttle and/or elevator for transporting the cassette-substrate arrangement. During transitioning, the filter(s) and vent(s) restrict particles within the loadlock from entering the cassette-substrate arrangement and reaching a surface of the substrate.
摘要翻译：一种用于在光刻工具中将基板从大气压转换成真空的衬底保护和输送系统和方法。该系统包括支撑衬底的一个或多个可移除的衬底输送盒。盒可以包括基部和顶部，并且可以包括密封。每个盒具有至少一个排气口和至少一个过滤器。该系统还包括具有底座和盖子的盒子。盒子保持一个或多个盒式衬底布置。还提供了一种具有用于保持盒 - 盒 - 衬底布置的搁架的存放架。此外，提供具有负载锁的入口模块，用于将盒式基板装置从大气压转换成真空。出入口模块可以包括用于运送盒式基板装置的梭和/或电梯。在过渡期间，过滤器和排气口限制负载锁中的颗粒进入盒 - 衬底布置并到达衬底的表面。

6. 发明授权

US06559922B2 Method and apparatus for a non-contact scavenging seal 有权
标题翻译：非接触式清除密封的方法和装置
公开(公告)号：US06559922B2
公开(公告)日：2003-05-06
申请号：US09846386
申请日：2001-05-02
申请人： Eric C. Hansell , Jose V. Herrera , Richard L. Huse , Jorge S. Ivaldi , Stephen G. Krehley , Thomas P. Shamaly
发明人： Eric C. Hansell , Jose V. Herrera , Richard L. Huse , Jorge S. Ivaldi , Stephen G. Krehley , Thomas P. Shamaly
IPC分类号： G03B2752
CPC分类号： G03F7/70933 , F16C29/025 , F16C32/0603 , G03F7/70808 , G03F7/70816 , G03F7/70841 , G03F7/70866 , G03F7/70916
摘要： A method and apparatus for providing a purged optical path between an optical source surface and an optical target surface and for permitting relative movement between the optical source surface and the optical target surface is described. The apparatus includes a body, a central cavity, at least one gas supply bore, and at least one gas removal bore. The body defines first and second opposing surfaces. The first opposing surface is configured for positioning closely adjacent to the optical target surface. The second opposing surface is configured to mate with the optical source surface. The central cavity is formed in the body for passing light through the body, the central cavity being open at the first and second opposing surfaces. The at least one gas supply bore is formed in the body for suppling a flow of a purge gas to the central cavity. The at least one gas removal bore is formed in the body at the first opposing surface to remove gas from a gap formed between the first opposing surface and the optical target surface.
摘要翻译：描述了一种用于在光源表面和光学目标表面之间提供净化的光路并且用于允许光学源表面和光学目标表面之间的相对移动的方法和装置。该装置包括主体，中心腔，至少一个气体供给孔和至少一个气体排出孔。主体限定第一和第二相对表面。第一相对表面构造成用于紧邻光学目标表面定位。第二相对表面被配置为与光源表面配合。中心腔形成在主体中，用于使光通过主体，中心腔在第一和第二相对表面处是敞开的。至少一个气体供应孔形成在主体中，用于向吹扫中心腔提供净化气体流。至少一个气体去除孔在第一相对表面的主体中形成，以从形成在第一相对表面和光学目标表面之间的间隙移除气体。

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