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1. 发明授权

US06398373B1 Pneumatic control system and method for shaping deformable mirrors in lithographic projection systems 失效
标题翻译：气动控制系统和用于在光刻投影系统中成形可变形反射镜的方法
公开(公告)号：US06398373B1
公开(公告)日：2002-06-04
申请号：US09635984
申请日：2000-08-09
申请人： Andrew J. Guzman , Carlo La Fiandra , Ronald P. Sidor , Jorge S. Ivaldi , Michael L. Nelson
发明人： Andrew J. Guzman , Carlo La Fiandra , Ronald P. Sidor , Jorge S. Ivaldi , Michael L. Nelson
IPC分类号： G02B508
CPC分类号： G03F7/70266 , G02B26/0825 , Y10S359/90
摘要： A system for adjusting a deformable mirror including a reaction plate, a plurality of pneumatic actuators coupled to the reaction plate, and a plurality of push-pull flexures coupled on a first end to the pneumatic actuators, and coupled on a second end to the non-reflective side the deformable mirror, the plurality of push-pull flexures being disposed at various locations on the back of the deformable mirror. The respective pairs of push-pull flexures and pneumatic actuators are operated to support and alter the shape of the deformable mirror to allow for correction of a plurality of optical aberrations.
摘要翻译：一种用于调节可变形反射镜的系统，包括反作用板，耦合到反作用板的多个气动致动器，以及耦合在气动致动器的第一端上的多个推挽式挠曲件，反射侧可变形反射镜，多个推挽弯曲件设置在可变形反射镜背面的各个位置。操作各对推挽挠曲和气动致动器以支撑和改变可变形反射镜的形状，以允许校正多个光学像差。

2. 发明申请

US20120296993A1 Automatic Scheduling Tool 有权
公开(公告)号：US20120296993A1
公开(公告)日：2012-11-22
申请号：US13448595
申请日：2012-04-17
申请人： Jerrold M. Heyman , Kenton R. Milligan , Michael L. Nelson , Antonio Pirraglia , Andrew G. Tonkin
发明人： Jerrold M. Heyman , Kenton R. Milligan , Michael L. Nelson , Antonio Pirraglia , Andrew G. Tonkin
IPC分类号： G06F15/16
CPC分类号： G06Q10/06
摘要： Embodiments of the invention relate to a message based scheduling tool employed to function with an electronic calendar. As messages are transmitting between clients, a tool is employed to parse the messages to search for one or more string(s) of characters characteristic of a meeting. Based upon these characteristics and the parsing, the electronic calendars are searched to find an available time slot on both calendars in which a meeting can take place, and, if an available time is found, the meeting is scheduled and the clients are sent notification of the scheduling.

3. 发明授权

US07248336B2 Method and system for improving focus accuracy in a lithography system 有权
标题翻译：光刻系统中提高聚焦精度的方法和系统
公开(公告)号：US07248336B2
公开(公告)日：2007-07-24
申请号：US11408956
申请日：2006-04-24
申请人： Michael L. Nelson , Justin L. Kreuzer , Peter L. Filosi , Christopher J. Mason
发明人： Michael L. Nelson , Justin L. Kreuzer , Peter L. Filosi , Christopher J. Mason
IPC分类号： G03B27/72 , G03B27/42 , G03B27/32
CPC分类号： G03F9/7019 , D21H23/34 , G03F9/7011 , G03F9/7026 , G03F9/7088 , H04N21/41415
摘要： A focus system that includes a calibration subsystem and a control subsystem. The control subsystem, which includes a control sensor, is in close proximity to the exposing of an image. The calibration subsystem, which includes a calibration sensor and a control sensor, is located remotely from, or off-axis with respect to, the exposing of an image. By separating calibration and control functions, the functional requirements can be separated into two (or more) types of sensors.
摘要翻译：包括校准子系统和控制子系统的焦点系统。包括控制传感器的控制子系统非常接近图像的曝光。包括校准传感器和控制传感器的校准子系统相对于图像的曝光远离或离轴定位。通过分离校准和控制功能，功能要求可以分为两种（或更多种）传感器。

4. 发明授权

US5559601A Mask and wafer diffraction grating alignment system wherein the diffracted light beams return substantially along an incident angle 失效
$Mask and wafer diffraction grating alignment system wherein the diffracted light beams return substantially along an incident angle$
标题翻译：掩模和晶片衍射光栅对准系统，其中衍射光束基本上沿入射角返回
公开(公告)号：US5559601A
公开(公告)日：1996-09-24
申请号：US375636
申请日：1995-01-20
申请人： Gregg M. Gallatin , Justin L. Kreuzer , Michael L. Nelson
发明人： Gregg M. Gallatin , Justin L. Kreuzer , Michael L. Nelson
IPC分类号： G01B11/00 , G03F9/00 , H01L21/027 , G01B9/02
CPC分类号： G03F9/7049
摘要： The present invention provides a grating-grating interferometric wafer alignment system, sensor and method for microlithography. It includes: (1) an electromagnetic radiation source with collimating optics delivering a collimated beam of a coherent single or multiple discrete wavelengths or in some cases broadband electromagnetic radiation; (2) a detector of the intensity of the collimated return electromagnetic radiation; (3) x- and y-oriented independent linear gratings for the mask-mark; (3) a "checkerboard pattern" grating for the wafer-mark; and (4) software including an algorithm for determining alignment from the return electromagnetic radiation intensity measured as a function of the relative position of the wafer and mask grating, and a means such as a Fourier transform determining phase and amplitude of a known frequency component of the intensity. In one embodiment a laser diode is used and the backscatter from the mask and wafer gratings is returned to the laser diode creating a beat signal used to determine alignment of the mask and wafer. Alignment accuracy is increased and made more tolerant of processing variables such as wafer topography and coatings.
摘要翻译：本发明提供一种光栅光栅干涉测量晶片对准系统，用于微光刻的传感器和方法。它包括：（1）具有准直光学器件的电磁辐射源，其递送相干单个或多个离散波长的准直光束，或在某些情况下传送宽带电磁辐射; （2）准直返回电磁辐射强度的检测器; （3）用于掩模标记的x和y取向的独立线性光栅; （3）用于晶片标记的“棋盘图案”格栅; 以及（4）软件，其包括用于根据作为晶片和掩模光栅的相对位置的函数测量的返回电磁辐射强度来确定对准的算法，以及诸如傅立叶变换确定相位和幅度的装置，其中已知频率分量强度。在一个实施例中，使用激光二极管，并且来自掩模和晶片光栅的反向散射返回到激光二极管，产生用于确定掩模和晶片的对准的拍频信号。对准精度提高，并且能够更加容忍诸如晶片形貌和涂层的处理变量。

5. 发明授权

US09639832B2 Software license serving in a massively parallel processing environment 有权
公开(公告)号：US09639832B2
公开(公告)日：2017-05-02
申请号：US13427980
申请日：2012-03-23
申请人： Jerrold M. Heyman , Michael L. Nelson , Andrew G. Tonkin
发明人： Jerrold M. Heyman , Michael L. Nelson , Andrew G. Tonkin
IPC分类号： G06F21/00 , G06Q20/12 , G06F21/10
CPC分类号： G06Q20/1235 , G06F21/10
摘要： Techniques for implementing software licensing in a massive parallel processing environment on the basis of the actual use of licensed software instances are disclosed. In one embodiment, rather than using a license server or a node-locked license strategy, each use of a licensed software instance is monitored and correlated with a token. A store of tokens is maintained within the licensing system and a token is consumed after each instance successfully executes. Further, a disclosed embodiment also allows jobs that execute multiple software instances to complete execution, even if an adequate number of tokens does not exist for each remaining software instance. Once the license tokens are repurchased and replenished, any overage consumed from previous job executions may be reconciled. In this way, token-based licensing can be adapted to large scale computing environments that execute jobs of large and unpredictable sizes, while the cancellation of executing jobs may be avoided.

6. 发明授权

US08776058B2 Dynamic generation of VM instance at time of invocation 失效
标题翻译：在调用时动态生成VM实例
公开(公告)号：US08776058B2
公开(公告)日：2014-07-08
申请号：US13316524
申请日：2011-12-11
申请人： Jerrold M. Heyman , Michael L. Nelson , Andrew G. Tonkin , Kent R. Milligan , Antonio N. Pirraglia
发明人： Jerrold M. Heyman , Michael L. Nelson , Andrew G. Tonkin , Kent R. Milligan , Antonio N. Pirraglia
IPC分类号： G06F9/455
CPC分类号： G06F9/45558 , G06F2009/45562
摘要： Responsive to a request to invoke a given virtual machine (VM) instance, a base VM instance corresponding to a number of VM instances, including the given VM instance, is retrieved. A VM change file particular to just the given VM instance is also retrieved. The VM change file indicates how the given VM instance varies from the base VM instance. The VM change file is applied to the base VM instance to dynamically generate the given VM instance, and the given VM instance is then invoked. Responsive to a request to subsequently shutdown the given VM instance, the VM change file is updated to reflect how the given VM instance varies from the base VM instance. The given VM instance is then shutdown and deleted.
摘要翻译：响应于调用给定虚拟机（VM）实例的请求，检索与包括给定VM实例的VM数量相对应的基本VM实例。还会检索到特定于VM给定VM实例的虚拟机更改文件。 VM更改文件指示给定的VM实例与基本VM实例的不同之处。将VM更改文件应用于基本VM实例以动态生成给定的VM实例，然后调用给定的VM实例。响应于随后关闭给定VM实例的请求，VM更改文件将被更新，以反映给定VM实例与基本VM实例的不同之处。然后关闭并删除给定的VM实例。

7. 发明申请

US20110296402A1 SOFTWARE LICENSE SERVING IN A MASSIVELY PARALLEL PROCESSING ENVIRONMENT 有权
标题翻译：软件许可证服务于大规模并行处理环境
公开(公告)号：US20110296402A1
公开(公告)日：2011-12-01
申请号：US12788926
申请日：2010-05-27
申请人： Jerrold M. Heyman , Michael L. Nelson , Andrew G. Tonkin
发明人： Jerrold M. Heyman , Michael L. Nelson , Andrew G. Tonkin
IPC分类号： G06F9/445 , G06F17/30
CPC分类号： G06Q20/1235 , G06F21/10
摘要： Techniques for implementing software licensing in a massive parallel processing environment on the basis of the actual use of licensed software instances are disclosed. In one embodiment, rather than using a license server or a node-locked license strategy, each use of a licensed software instance is monitored and correlated with a token. A store of tokens is maintained within the licensing system and a token is consumed after each instance successfully executes. Further, a disclosed embodiment also allows jobs that execute multiple software instances to complete execution, even if an adequate number of tokens does not exist for each remaining software instance. Once the license tokens are repurchased and replenished, any overage consumed from previous job executions may be reconciled. In this way, token-based licensing can be adapted to large scale computing environments that execute jobs of large and unpredictable sizes, while the cancellation of executing jobs may be avoided.
摘要翻译：公开了在大量并行处理环境中基于许可软件实例的实际使用来实现软件许可的技术。在一个实施例中，不是使用许可证服务器或节点锁定许可策略，每个使用许可的软件实例被监视并与令牌相关联。一个令牌存储在许可证系统内，令牌在每个实例成功执行后被消耗。此外，所公开的实施例还允许执行多个软件实例的作业完成执行，即使每个剩余软件实例不存在足够数量的令牌。一旦许可证令牌被回购和补充，从以前的工作执行中消耗的任何高估可能会被调和。以这种方式，基于令牌的许可可以适应于执行大型和不可预测尺寸的作业的大规模计算环境，同时可以避免执行作业的取消。

8. 发明申请

US20110116068A1 EUV Reticle Substrates With High Thermal Conductivity 有权
标题翻译：具有高导热性的EUV掩模基板
公开(公告)号：US20110116068A1
公开(公告)日：2011-05-19
申请号：US13054008
申请日：2009-07-29
申请人： Ronald A. Wilklow , Michael L. Nelson , Michael Perry
发明人： Ronald A. Wilklow , Michael L. Nelson , Michael Perry
IPC分类号： G03B27/54 , G03F1/00
CPC分类号： G03F1/24 , B82Y10/00 , B82Y40/00 , G03F7/70891
摘要： A reflective reticle substantially reduces or eliminates pattern distortion that results from the absorption of EUV radiation while maintaining a reticle thickness consistent with industry standards. The reflective reticle includes a layer of ultra-low expansion (ULE) glass and a substrate of Cordierite having a thermal conductivity substantially larger than that of ULE glass. An aluminum layer is disposed onto a first surface of the ULE glass and a second surface of the ULE glass is polished to be substantially flat and defect-free. The Cordierite substrate can be directly bonded to the aluminum layer using anodic bonding to form the reflective reticle. Alternatively, a first surface of an intermediate Zerodur layer can be bonded to the aluminum layer, and a second aluminum layer can be used to anodically bond the Cordierite substrate to a second surface of the Zerodur layer, thereby forming the reflective reticle.
摘要翻译：反射型掩模版基本上减少或消除由于EUV辐射的吸收而导致的图案变形，同时保持与行业标准一致的光罩厚度。反射型掩模版包括一层超低膨胀（ULE）玻璃和堇青石的基底，其导热率基本上大于ULE玻璃的热导率。将铝层设置在ULE玻璃的第一表面上，并将ULE玻璃的第二表面抛光成基本平坦且无缺陷。堇青石基材可以使用阳极结合直接结合到铝层上以形成反射型掩模版。或者，中间Zerodur层的第一表面可以结合到铝层，并且可以使用第二铝层将堇青石基板阳极结合到Zerodur层的第二表面，从而形成反射掩模版。

9. 发明申请

US20080260897A1 Method of Treating Dehydration in Large Mammals 审中-公开
标题翻译：治疗大型哺乳动物脱水的方法
公开(公告)号：US20080260897A1
公开(公告)日：2008-10-23
申请号：US12136248
申请日：2008-06-10
申请人： Peter H. Franz , Martin J. Nelson , Michael L. Nelson
发明人： Peter H. Franz , Martin J. Nelson , Michael L. Nelson
IPC分类号： A23K1/18
CPC分类号： A23K50/10 , A23K10/30 , A23K10/33 , A23K10/37 , A23K20/10 , A23K20/158 , A23K20/163 , A23K20/28 , A23K40/20 , A23K40/25 , A23K40/30 , A23V2002/00 , Y02P60/871 , Y02P60/877 , Y10S426/807 , A23V2200/30 , A23V2250/1614 , A23V2250/16 , A23V2250/1578 , A23V2250/161 , A23V2250/628 , A23V2250/612
摘要： A re-hydration supplement composition particularly suitable to counteract dehydration stresses in mature bovine mammals in the form of a pelletized feed supplement is disclosed which includes relatively large fractions of carbohydrates including saccharides, cationic and anionic electrolytes and a minor amount of betaine osmolyte. A process for pelleting is also disclosed.
摘要翻译：公开了特别适合于以成粒牛饲料添加剂形式的成熟牛哺乳动物抵抗脱水应激的再水合补充剂组合物，其包括相对大量的碳水化合物，包括糖，阳离子和阴离子电解质和少量的甜菜碱渗透液。还公开了一种造粒方法。

10. 发明授权

US09041903B2 Mask inspection with fourier filtering and image compare 有权
标题翻译：面罩检查与傅立叶滤镜和图像比较
公开(公告)号：US09041903B2
公开(公告)日：2015-05-26
申请号：US13256372
申请日：2010-03-18
申请人： Michael L. Nelson , Harry Sewell , Eric Brian Catey
发明人： Michael L. Nelson , Harry Sewell , Eric Brian Catey
IPC分类号： G03B27/52 , G03B27/68 , G03F1/84
CPC分类号： G03F1/84
摘要： A mask inspection system with Fourier filtering and image compare can include a first detector, a dynamic Fourier filter, a controller, and a second detector. The first detector can be located at a Fourier plane of the inspection system and can detect a first portion of patterned light produced by an area of a mask. The dynamic Fourier filter can be controlled by the controller based on the detected first portion of the patterned light. The second detector can detect a second portion of the patterned light produced by the section of the mask and transmitted through the dynamic Fourier filter. Further, the mask inspection system can include a data analysis device to compare the second portion of patterned light with another patterned light. Consequently, the mask inspection system is able to detect any possible defects on the area of the mask more accurately and with higher resolution.
摘要翻译：具有傅立叶滤波和图像比较的掩模检查系统可以包括第一检测器，动态傅立叶滤波器，控制器和第二检测器。第一检测器可以位于检查系统的傅立叶平面处，并且可以检测由掩模的区域产生的图案化光的第一部分。动态傅立叶滤波器可以由控制器基于检测到的图案化光的第一部分来控制。第二检测器可以检测由掩模的部分产生并通过动态傅立叶滤波器传输的图案化光的第二部分。此外，掩模检查系统可以包括数据分析装置，以将图案化的光的第二部分与另一图案化的光进行比较。因此，掩模检查系统能够更精确地并且以更高的分辨率检测掩模区域上的任何可能的缺陷。

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