专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US08609203B2 Method and apparatus for plasma surface treatment of moving substrate 有权
标题翻译：移动基板等离子体表面处理方法和装置
公开(公告)号：US08609203B2
公开(公告)日：2013-12-17
申请号：US12996339
申请日：2009-02-19
申请人： Bruno Alexander Korngold , Hindrik Willem De Vries , Eugen Aldea
发明人： Bruno Alexander Korngold , Hindrik Willem De Vries , Eugen Aldea
IPC分类号： H05H1/24 , H05H1/00 , C23C16/00
CPC分类号： H01J37/32825 , B29C59/14 , B29C2059/145 , H01J37/32009 , H01J37/32366 , H01J37/32532 , H05H1/2406 , H05H2001/2412 , H05H2001/485 , H05H2240/10
摘要： A method and apparatus for treatment of a substrate surface using an atmospheric pressure plasma is disclosed. The method comprises providing an atmospheric pressure plasma in a treatment space between a first electrode and a second electrode, providing a substrate in contact with the first electrode in the treatment space, and applying a plasma generating power to the first and second electrodes. The first electrode has a predefined structure of insulating areas and conductive areas for plasma treatment of surface areas of the substrate corresponding to the areas in contact with the conductive areas of the first electrode.
摘要翻译：公开了一种使用大气压等离子体处理衬底表面的方法和设备。该方法包括在第一电极和第二电极之间的处理空间中提供大气压等离子体，提供与处理空间中的第一电极接触的基板，以及向第一和第二电极施加等离子体发生电力。第一电极具有绝缘区域和导电区域的预定结构，用于对应于与第一电极的导电区域接触的区域的衬底的表面区域进行等离子体处理。

2. 发明授权

US08338307B2 Substrate plasma treatment using magnetic mask device 有权
标题翻译：基板等离子体处理采用磁屏蔽装置
公开(公告)号：US08338307B2
公开(公告)日：2012-12-25
申请号：US12526944
申请日：2008-02-01
申请人： Hindrik Willem De Vries , Bruno Alexander Korngold
发明人： Hindrik Willem De Vries , Bruno Alexander Korngold
IPC分类号： H01L21/302 , H01L21/461
CPC分类号： H01J37/32559 , H01J37/3266
摘要： Plasma treatment apparatus and method for treatment of a surface of a substrate. A dielectric barrier discharge electrode structure is provided having a treatment space (5) and comprising a first electrode (2) and a second electrode (3), and a power supply (11) connected to the first electrode (2) and the second electrode (3) for generating an atmospheric pressure plasma in the treatment space (5). The plasma treatment apparatus further comprises a magnetic layer (6) provided on a surface of at least the first electrode (2). The first electrode (2) is arranged to receive, in operation, the substrate (1) to be treated and a mask device (7) in contact with the substrate (1), the mask device (7) interacting with the magnetic layer (6).
摘要翻译：用于处理基材表面的等离子体处理装置和方法。提供具有处理空间（5）并且包括第一电极（2）和第二电极（3）的电介质阻挡放电电极结构，以及连接到第一电极（2）和第二电极（3），用于在处理空间（5）中产生大气压等离子体。等离子体处理装置还包括设置在至少第一电极（2）的表面上的磁性层（6）。第一电极（2）被布置成在操作中接收待处理的基板（1）和与基板（1）接触的掩模装置（7），掩模装置（7）与磁性层 6）。

3. 发明申请

US20110049491A1 METHOD FOR MANUFACTURING A MULTI-LAYER STACK STRUCTURE WITH IMPROVED WVTR BARRIER PROPERTY 有权
标题翻译：用于制造具有改进的WVTR障碍物的多层堆叠结构的方法
公开(公告)号：US20110049491A1
公开(公告)日：2011-03-03
申请号：US12866704
申请日：2009-01-22
申请人： Hindrik Willem De Vries , Mauritius Cornelius Maria Van De Sanden
发明人： Hindrik Willem De Vries , Mauritius Cornelius Maria Van De Sanden
IPC分类号： H01L51/50 , H01L51/56 , H01L21/64 , C23C16/00 , B32B38/00
CPC分类号： H05H1/48 , H01L51/5253 , H01L2251/5338 , H05H2001/485 , H05H2240/10
摘要： A method and apparatus for manufacturing a multi-layer stack structure (12), the structure (12) comprising in order: a substrate (6a) a barrier layer (14) an adhesive layer (15) a barrier layer (14) a substrate (6b). The method comprises: a) providing two substrates (6a, 6b) in a single treatment space (5), the treatment space (5) comprising at least two electrodes (2, 3) for generating an atmospheric pressure glow discharge plasma in the treatment space (5); b) treating the facing surfaces of the two substrates (6a, 6b) simultaneously in the single treatment space (5); c) laminating the two treated substrates (6a, 6b) with an adhesive layer (15) in between the facing surfaces to obtain the multi-layer stack structure (12).
摘要翻译：一种用于制造多层堆叠结构（12）的方法和装置，所述结构（12）依次包括：衬底（6a），阻挡层（14），粘合层（15），阻挡层（14），衬底（6b）。该方法包括：a）在单个处理空间（5）中提供两个基板（6a，6b），所述处理空间（5）包括用于在所述处理中产生大气压辉光放电等离子体的至少两个电极（2,3）空间（5）; b）在单个处理空间（5）中同时处理两个基板（6a，6b）的相对表面; c）将两个经处理的基板（6a，6b）与相对表面之间的粘合剂层（15）层压，以获得多层堆叠结构（12）。

4. 发明申请

US20110042347A1 METHOD AND APPARATUS FOR PLASMA SURFACE TREATMENT OF A MOVING SUBSTRATE 有权
标题翻译：用于移动基板的等离子体表面处理的方法和装置
公开(公告)号：US20110042347A1
公开(公告)日：2011-02-24
申请号：US12865710
申请日：2009-01-29
申请人： Bruno Alexander Korngold , Hindrik Willem De Vries , Eugen Aldea
发明人： Bruno Alexander Korngold , Hindrik Willem De Vries , Eugen Aldea
IPC分类号： C23F1/04 , C23F1/08 , H05H1/24
CPC分类号： H05K3/125 , C23C14/042 , C23C14/562 , C23C16/042 , C23C16/545 , H01J37/3277 , H01J37/32825 , H05H1/2406 , H05H2001/2412 , H05H2001/485 , H05H2240/10 , H05K1/0393 , H05K3/1208 , H05K3/381 , H05K2203/013 , H05K2203/0557 , H05K2203/095 , H05K2203/104 , H05K2203/1173 , H05K2203/1545
摘要： Method and plasma treatment apparatus for treatment of a substrate surface (1) using an atmospheric pressure plasma. An atmospheric pressure plasma is provided in a treatment space (5) between a first electrode (2) and a second electrode (3). Furthermore, a substrate (1) and a mask web (7) in contact with the substrate (1) are provided. A plasma generating power is applied to the first and second electrode (2, 3) for treatment of surface areas of the substrate (1) exposed by the mask web (7), in which the substrate (1) and mask web (7) are moved synchronously through the treatment space (5).
摘要翻译：使用大气压等离子体处理基板表面（1）的方法和等离子体处理装置。大气压等离子体设置在第一电极（2）和第二电极（3）之间的处理空间（5）中。此外，提供与基板（1）接触的基板（1）和掩模网（7）。等离子体发生功率施加到第一和第二电极（2,3），用于处理由掩模幅材（7）暴露的基板（1）的表面区域，其中基板（1）和掩模网（7）通过处理空间（5）同步移动。

5. 发明申请

US20090324971A1 METHOD AND APPARATUS FOR ATOMIC LAYER DEPOSITION USING AN ATMOSPHERIC PRESSURE GLOW DISCHARGE PLASMA 审中-公开
标题翻译：使用大气压力放电等离子体进行原子层沉积的方法和装置
公开(公告)号：US20090324971A1
公开(公告)日：2009-12-31
申请号：US12304614
申请日：2007-06-07
申请人： Hindrik Willem De Vries , Mauritius Cornelius Maria Van De Sanden , Mariadriana Creatore , Wilhelmus Mathijs Marie Kessels
发明人： Hindrik Willem De Vries , Mauritius Cornelius Maria Van De Sanden , Mariadriana Creatore , Wilhelmus Mathijs Marie Kessels
IPC分类号： B32B27/00 , C23C16/513 , C23C16/455 , C23C16/509
CPC分类号： C23C16/45551 , C23C16/45542 , C23C16/45595 , C23C16/515
摘要： Apparatus and method for atomic layer deposition on a surface of a substrate (6) in a treatment space. A gas supply device (15, 16) is present for providing various gas mixtures to the treatment space. The gas supply device (15, 16) is arranged to provide a gas mixture with a precursor material to the treatment space for allowing reactive surface sites to react with precursor material molecules to give a surface covered by a monolayer of precursor molecules attached via the reactive sites to the surface of the substrate. Subsequently, a gas mixture comprising a reactive agent capable to convert the attached precursor molecules to active precursor sites is provided. A plasma generator (10) is present for generating an atmospheric pressure plasma in the gas mixture comprising the reactive agent.
摘要翻译：用于在处理空间中的基板（6）的表面上的原子层沉积的装置和方法。存在用于向处理空间提供各种气体混合物的气体供应装置（15,16）。气体供应装置（15,16）被布置成向处理空间提供具有前体材料的气体混合物，以允许反应性表面位点与前体材料分子反应，以产生由单层前体分子覆盖的表面，所述前体分子通过反应性位置到基底的表面。随后，提供包含能够将附着的前体分子转化成活性前体部位的反应剂的气体混合物。存在用于在包含反应剂的气体混合物中产生大气压等离子体的等离子体发生器（10）。

6. 发明申请

US20110311808A1 Two Layer Barrier on Polymeric Substrate 审中-公开
标题翻译：聚合物基质上的两层屏障
公开(公告)号：US20110311808A1
公开(公告)日：2011-12-22
申请号：US13201219
申请日：2010-02-10
申请人： Hindrik Willem De Vries , Mauritius Cornelius Maria Van De Sanden
发明人： Hindrik Willem De Vries , Mauritius Cornelius Maria Van De Sanden
IPC分类号： B32B9/04 , C23C16/50 , C23C16/52 , B32B7/02
CPC分类号： C23C16/0272 , C23C16/401 , Y10T428/265
摘要： Plasma treatment apparatus and method for producing a polymeric substrate using an atmospheric pressure glow discharge plasma in a treatment space formed between two or more opposing electrodes connected to a power supply using a gas composition in the treatment space comprising a precursor and oxygen. A first layer of inorganic material is deposited on a polymeric substrate with a largest thickness (d3) of at least 100% of an Rt-value being defined as the maximum peak to valley height of the profile of the polymeric substrate measured substantially perpendicular to the surface of the polymeric substrate. A second layer of inorganic material is deposited on the first layer, wherein in the treatment space the oxygen has a concentration of 3% or higher, and the power supply is controlled to provide an energy across a gap between the two or more opposing electrodes of 40 J/cm2 or higher.
摘要翻译：一种等离子体处理装置和使用大气压辉光放电等离子体的聚合物基板的制造方法，该处理空间形成在使用包含前体和氧气的处理空间中的气体组合物与电源连接的两个或更多个相对电极之间。第一层无机材料沉积在聚合物基材上，其最大厚度（d3）至少为Rt值的100％，其定义为聚合物基材的轮廓的最大峰谷高度基本上垂直于聚合物基材的表面。第二层无机材料沉积在第一层上，其中在处理空间中氧气具有3％或更高的浓度，并且控制电源以在两个或更多个相对电极之间的间隙上提供能量 40J / cm 2以上。

7. 发明授权

US07969095B2 Method of and arrangement for removing contaminants from a substrate surface using an atmospheric pressure glow plasma 有权
标题翻译：使用大气压发光等离子体从基板表面去除污染物的方法和装置
公开(公告)号：US07969095B2
公开(公告)日：2011-06-28
申请号：US10584075
申请日：2004-12-22
申请人： Hindrik Willem De Vries , Eugen Aldea , Jan Bastiaan Bouwstra , Mauritius Cornelius Maria Van De Sanden
发明人： Hindrik Willem De Vries , Eugen Aldea , Jan Bastiaan Bouwstra , Mauritius Cornelius Maria Van De Sanden
IPC分类号： H05B31/26
CPC分类号： H01J37/32935 , H01J37/32174 , H01J2237/335 , H01L51/5206 , H05H2240/00
摘要： The present invention relates to a method of and arrangement for removing contaminants from a surface of a substrate by subjecting said substrate surface to an atmospheric pressure glow plasma. Said plasma is generated in a discharge space comprising a plurality of electrodes, by applying an alternating plasma energizing voltage to said electrodes causing a plasma current and a displacement current. Said plasma is stabilised by controlling said displacement current during plasma generation such that modification of properties of said substrate surface is prevented.
摘要翻译：本发明涉及通过使所述衬底表面经受大气压发光等离子体从衬底表面去除污染物的方法和装置。所述等离子体通过对所述电极施加交替的等离子体激励电压而引起等离子体电流和位移电流而在包括多个电极的放电空间中产生。所述等离子体通过在等离子体生成期间控制所述位移电流来稳定，从而防止所述衬底表面的性质的改变。

8. 发明授权

US06270632B1 Process for atmospheric pressure glow discharge treatment of a photographic support 失效
标题翻译：大气压辉光放电处理摄影支架的过程
公开(公告)号：US06270632B1
公开(公告)日：2001-08-07
申请号：US09416227
申请日：1999-10-12
申请人： Hindrik Willem de Vries
发明人： Hindrik Willem de Vries
IPC分类号： B01J1908
CPC分类号： G03C1/915 , B05D3/142
摘要： The invention is directed to a process for treating a photographic support in the form of a web, said process comprising providing a first grounded drum shaped electrically conductive electrode and at least one electrically conductive wire electrode of which the diameter varies between 60 and 1500 &mgr;m facing said drum shaped electrode, establishing an AC voltage with a frequency range between 100 Hz to 300 kHz over said electrodes, moving the web at atmospheric pressure along said drum shaped electrode, thereby exposing it to atmospheric pressure glow discharge established between the said drum shaped and wire electrode.
摘要翻译：本发明涉及一种用于处理幅材形式的照相支撑体的方法，所述方法包括提供第一接地鼓形导电电极和至少一个导电线电极，其直径在60和1500μm之间变化，面对所述鼓形电极，在所述电极上建立频率范围为100Hz至300kHz之间的交流电压，沿着所述鼓形电极在大气压下移动幅材，从而将其暴露于所述鼓形和线电极。

9. 发明授权

US08323753B2 Method for deposition using pulsed atmospheric pressure glow discharge 失效
标题翻译：使用脉冲大气压辉光放电的沉积方法
公开(公告)号：US08323753B2
公开(公告)日：2012-12-04
申请号：US12302635
申请日：2007-05-24
申请人： Hindrik Willem De Vries , Eugen Aldea , Serguei Alexandrovich Starostine , Mariadriana Creatore , Mauritius Cornelius Maria Van De Sanden
发明人： Hindrik Willem De Vries , Eugen Aldea , Serguei Alexandrovich Starostine , Mariadriana Creatore , Mauritius Cornelius Maria Van De Sanden
IPC分类号： H05H1/24
CPC分类号： C23C16/515 , C23C16/402 , H05H1/46 , H05H2001/466 , H05H2001/4682 , H05H2001/4697
摘要： Disclosed are methods for deposition of a chemical compound or element using an atmospheric pressure glow discharge plasma in a treatment space comprising two electrodes connected to a power supply for providing electrical power during an on-time (ton). The treatment space is filled with a gas composition of an active and an inert gas mixture, including a precursor of the chemical compound or element to be deposited. Dust formation is prevented by using Nitrogen in the gas composition, applying short pulses and using a predetermined residence time of the gas composition in the treatment space. Best results are obtained when using a stabilized plasma.
摘要翻译：公开了在处理空间中使用大气压辉光放电等离子体沉积化合物或元素的方法，该处理空间包括连接到电源的两个电极，用于在接通时间（ton）期间提供电力。处理空间填充有活性物质和惰性气体混合物的气体组合物，其包括待沉积的化合物或元素的前体。通过在气体组合物中使用氮气，施加短脉冲并且将气体组合物的预定停留时间用于处理空间来防止形成粉尘。使用稳定的等离子体时可获得最佳效果。

10. 发明申请

US20100255625A1 METHOD AND APPARATUS FOR ATOMIC LAYER DEPOSITION USING AN ATMOSPHERIC PRESSURE GLOW DISCHARGE PLASMA 审中-公开
标题翻译：使用大气压力放电等离子体进行原子层沉积的方法和装置
公开(公告)号：US20100255625A1
公开(公告)日：2010-10-07
申请号：US12676877
申请日：2008-08-20
申请人： Hindrik Willem De Vries
发明人： Hindrik Willem De Vries
IPC分类号： H01L31/18 , C23C16/448 , C23C16/00
CPC分类号： C23C16/452 , C23C16/0245 , C23C16/4554
摘要： Apparatus and method for atomic layer deposition on a surface of a substrate (6) in a treatment space. A gas supply device (15, 16) is present for providing various gas mixtures to the treatment space (1, 2). The gas supply device (15, 16) is arranged to provide a gas mixture with a precursor material to the treatment space for allowing reactive surface sites to react with precursor material molecules to give a surface covered by a monolayer of precursor molecules attached via the reactive sites to the surface of the substrate. Subsequently, a gas mixture comprising a reactive agent capable to convert the attached precursor molecules to active precursor sites is provided. A plasma generator (10) is present for generating an atmospheric pressure plasma in the gas mixture comprising the reactive agent, the plasma generator being arranged remote from the treatment space (1, 2).
摘要翻译：用于在处理空间中的基板（6）的表面上的原子层沉积的装置和方法。存在用于向处理空间（1,2）提供各种气体混合物的气体供应装置（15,16）。气体供应装置（15,16）被布置成向处理空间提供具有前体材料的气体混合物，以允许反应性表面位点与前体材料分子反应，以产生由单层前体分子覆盖的表面，所述前体分子通过反应性位置到基底的表面。随后，提供包含能够将附着的前体分子转化成活性前体部位的反应剂的气体混合物。存在等离子体发生器（10），用于在包括反应剂的气体混合物中产生大气压等离子体，等离子体发生器远离处理空间（1,2）布置。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式