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    • 5. 发明申请
    • APPARATUS FOR-PLASMA TREATMENT OF CONTINUOUS MATERIAL
    • 装置用于等离子体处理连续材料
    • WO1991017561A1
    • 1991-11-14
    • PCT/US1991003229
    • 1991-05-09
    • KODAK (AUSTRALASIA) PTY. LTD.EASTMAN KODAK COMPANYBROWN, Robert, WinstonCOOPES, Ian, HenryFUSCA, JosephGIFKINS, Kenneth, JohnIRVIN, John, Andrew
    • KODAK (AUSTRALASIA) PTY. LTD.EASTMAN KODAK COMPANY
    • H01J37/20
    • H01J37/20B29C59/14F16J15/168G03C1/915
    • An apparatus (1) for continuous treatment of a material (M) of continuous length with a low temperature plasma of a plasma gas (G) under vacuum. The apparatus (1) includes a plasma treatment chamber (3) having a chamber wall (4) and, in the wall (4), an entrance zone (6) and an exit zone (7) for receiving and discharging the continuous material (M). Evacuating means (48) is operable to establish a vacuum in the chamber (3). Support means (9) advances the continuous material (M) along a path (8) through the chamber (3) and also maintains a vacuum seal at the entrance and exit zones (6, 7). The support means (9) includes a backing roller (10) mounted adjacent the entrance and exit zones (6, 7), an entrance sealing roller (11) positioned adjacent the entrance zone (6) and an exit sealing roller (13) positioned adjacent the exit zone (7). The backing roller (10) forms with each sealing roller (11, 13) a respective nip (12, 14) at the entrance and exit zones (6, 7) through which the continuous material (m) passes into and out of the treatment chamber (3). A plasma generating head (53) is posi tioned within the treatment chamber (3) adjacent the path (8) for generating a low temperature plasma which contacts the continuous material (M) while it is advanced through the treatment chamber (3).
    • 一种用于在真空下用等离子体气体(G)的低温等离子体连续处理连续长度的材料(M)的装置(1)。 装置(1)包括具有室壁(4)和在壁(4)中的等离子体处理室(3),入口区(6)和出口区(7),用于接收和排出连续材料 M)。 抽气装置(48)可操作以在室(3)中建立真空。 支撑装置(9)使连续材料(M)沿着路径(8)前进通过腔室(3),并且还在入口和出口区域(6,7)处保持真空密封。 支撑装置(9)包括邻近入口和出口区域(6,7)安装的背衬辊(10),邻近入口区域(6)定位的入口密封辊(11)和定位的出口密封辊(13) 邻近出口区域(7)。 背衬辊(10)在入口和出口区(6,7)处与每个密封辊(11,13)形成相应的辊隙(12,14),连续材料(m)通过该压区进入和离开处理 室(3)。 等离子体产生头(53)位于与路径(8)相邻的处理室(3)内,用于产生在连续材料(M)进入处理室(3)期间接触连续材料(M)的低温等离子体。
    • 7. 发明专利
    • Production of photographic support
    • 制作摄影支持
    • JPS61128245A
    • 1986-06-16
    • JP25126184
    • 1984-11-27
    • Konishiroku Photo Ind Co Ltd
    • YAMAZAKI TOSHIAKIWADA YOSHIHIRO
    • G03C1/79G03C1/91G03C1/87
    • G03C1/79G03C1/915
    • PURPOSE:To improve the sharpness of a photographic image, the surface smoothness of a support and the adhesive property of a coating layer to a base material without considerably increasing fog by using a compound having terminal reactive groups capable of causing a curing reaction under electron beams by >=6.5X10 equiv./g and by carrying out curing with 0.1- =6.4X10 equiv./g. In case of equiv./g, the resulting cured film is not well adhered to the base material. The curing composition is cured with 0.1-
    • 目的:为了提高摄影图像的清晰度,通过使用具有能够在电子束下引起固化反应的具有末端反应性基团的化合物,支撑体的表面平滑度和涂层对基材的粘合性而不会显着增加雾 通过> = 6.5×10 -3当量/ g,并通过在吸收线中用0.1- <2.0Mrad进行固化。 的电子束。 构成:用于载体的基材的至少一面涂覆有电子束固化组合物,并且用电子束固化组合物以制造照相载体。 电子束固化组合物含有电子束固化化合物,其电子束固化化合物具有能够在电子束下引起固化反应的末端反应基团> = 6.4×10 -3当量/ g。 在<6.4×10 -3当量/ g的情况下,所得到的固化膜不能很好地粘附到基材上。 固化组合物用0.1- <2.0Mrad电子束固化。 此时,从发送功率的观点出发,使用具有50〜750kV,优选为100〜300kV的电子束加速器。