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1. 发明授权

US08323753B2 Method for deposition using pulsed atmospheric pressure glow discharge 失效
标题翻译：使用脉冲大气压辉光放电的沉积方法
公开(公告)号：US08323753B2
公开(公告)日：2012-12-04
申请号：US12302635
申请日：2007-05-24
申请人： Hindrik Willem De Vries , Eugen Aldea , Serguei Alexandrovich Starostine , Mariadriana Creatore , Mauritius Cornelius Maria Van De Sanden
发明人： Hindrik Willem De Vries , Eugen Aldea , Serguei Alexandrovich Starostine , Mariadriana Creatore , Mauritius Cornelius Maria Van De Sanden
IPC分类号： H05H1/24
CPC分类号： C23C16/515 , C23C16/402 , H05H1/46 , H05H2001/466 , H05H2001/4682 , H05H2001/4697
摘要： Disclosed are methods for deposition of a chemical compound or element using an atmospheric pressure glow discharge plasma in a treatment space comprising two electrodes connected to a power supply for providing electrical power during an on-time (ton). The treatment space is filled with a gas composition of an active and an inert gas mixture, including a precursor of the chemical compound or element to be deposited. Dust formation is prevented by using Nitrogen in the gas composition, applying short pulses and using a predetermined residence time of the gas composition in the treatment space. Best results are obtained when using a stabilized plasma.
摘要翻译：公开了在处理空间中使用大气压辉光放电等离子体沉积化合物或元素的方法，该处理空间包括连接到电源的两个电极，用于在接通时间（ton）期间提供电力。处理空间填充有活性物质和惰性气体混合物的气体组合物，其包括待沉积的化合物或元素的前体。通过在气体组合物中使用氮气，施加短脉冲并且将气体组合物的预定停留时间用于处理空间来防止形成粉尘。使用稳定的等离子体时可获得最佳效果。

2. 发明申请

US20090238997A1 METHOD AND APPARATUS FOR DEPOSITION USING PULSED ATMOSPHERIC PRESSURE GLOW DISCHARGE 失效
标题翻译：使用脉冲大气压力放电的沉积方法和装置
公开(公告)号：US20090238997A1
公开(公告)日：2009-09-24
申请号：US12302635
申请日：2007-05-24
申请人： Hindrik Willem De Vries , Eugen Aldea , Serguei Alexandrovich Starostine , Mariadriana Creatore , Mauritius Cornelius Maria Van De Sander
发明人： Hindrik Willem De Vries , Eugen Aldea , Serguei Alexandrovich Starostine , Mariadriana Creatore , Mauritius Cornelius Maria Van De Sander
IPC分类号： C23C16/40 , H05H1/24 , C23C16/515
CPC分类号： C23C16/515 , C23C16/402 , H05H1/46 , H05H2001/466 , H05H2001/4682 , H05H2001/4697
摘要： Method and apparatus for deposition of a chemical compound or element using an atmospheric pressure glow discharge plasma in a treatment space (5) comprising two electrodes (2, 3) connected to a power supply (4) for providing electrical power during an on-time (ton), the treatment space is filled with a gas composition of an active and an inert gas mixture, including a precursor of the chemical compound or element to be deposited. Dust formation is prevented by using Nitrogen in the gas composition, applying short pulses and using a predetermined residence time of the gas composition in the treatment space. Best results are obtained when using a stabilized plasma.
摘要翻译：一种用于在处理空间（5）中使用大气压辉光放电等离子体沉积化合物或元件的方法和装置，包括连接到电源（4）的两个电极（2,3），用于在接通时间期间提供电力（吨），处理空间填充有活性和惰性气体混合物的气体组合物，其包括要沉积的化合物或元素的前体。通过在气体组合物中使用氮气，施加短脉冲并且将气体组合物的预定停留时间用于处理空间来防止形成粉尘。使用稳定的等离子体时可获得最佳效果。

3. 发明申请

US20090324971A1 METHOD AND APPARATUS FOR ATOMIC LAYER DEPOSITION USING AN ATMOSPHERIC PRESSURE GLOW DISCHARGE PLASMA 审中-公开
标题翻译：使用大气压力放电等离子体进行原子层沉积的方法和装置
公开(公告)号：US20090324971A1
公开(公告)日：2009-12-31
申请号：US12304614
申请日：2007-06-07
申请人： Hindrik Willem De Vries , Mauritius Cornelius Maria Van De Sanden , Mariadriana Creatore , Wilhelmus Mathijs Marie Kessels
发明人： Hindrik Willem De Vries , Mauritius Cornelius Maria Van De Sanden , Mariadriana Creatore , Wilhelmus Mathijs Marie Kessels
IPC分类号： B32B27/00 , C23C16/513 , C23C16/455 , C23C16/509
CPC分类号： C23C16/45551 , C23C16/45542 , C23C16/45595 , C23C16/515
摘要： Apparatus and method for atomic layer deposition on a surface of a substrate (6) in a treatment space. A gas supply device (15, 16) is present for providing various gas mixtures to the treatment space. The gas supply device (15, 16) is arranged to provide a gas mixture with a precursor material to the treatment space for allowing reactive surface sites to react with precursor material molecules to give a surface covered by a monolayer of precursor molecules attached via the reactive sites to the surface of the substrate. Subsequently, a gas mixture comprising a reactive agent capable to convert the attached precursor molecules to active precursor sites is provided. A plasma generator (10) is present for generating an atmospheric pressure plasma in the gas mixture comprising the reactive agent.
摘要翻译：用于在处理空间中的基板（6）的表面上的原子层沉积的装置和方法。存在用于向处理空间提供各种气体混合物的气体供应装置（15,16）。气体供应装置（15,16）被布置成向处理空间提供具有前体材料的气体混合物，以允许反应性表面位点与前体材料分子反应，以产生由单层前体分子覆盖的表面，所述前体分子通过反应性位置到基底的表面。随后，提供包含能够将附着的前体分子转化成活性前体部位的反应剂的气体混合物。存在用于在包含反应剂的气体混合物中产生大气压等离子体的等离子体发生器（10）。

4. 发明授权

US07969095B2 Method of and arrangement for removing contaminants from a substrate surface using an atmospheric pressure glow plasma 有权
标题翻译：使用大气压发光等离子体从基板表面去除污染物的方法和装置
公开(公告)号：US07969095B2
公开(公告)日：2011-06-28
申请号：US10584075
申请日：2004-12-22
申请人： Hindrik Willem De Vries , Eugen Aldea , Jan Bastiaan Bouwstra , Mauritius Cornelius Maria Van De Sanden
发明人： Hindrik Willem De Vries , Eugen Aldea , Jan Bastiaan Bouwstra , Mauritius Cornelius Maria Van De Sanden
IPC分类号： H05B31/26
CPC分类号： H01J37/32935 , H01J37/32174 , H01J2237/335 , H01L51/5206 , H05H2240/00
摘要： The present invention relates to a method of and arrangement for removing contaminants from a surface of a substrate by subjecting said substrate surface to an atmospheric pressure glow plasma. Said plasma is generated in a discharge space comprising a plurality of electrodes, by applying an alternating plasma energizing voltage to said electrodes causing a plasma current and a displacement current. Said plasma is stabilised by controlling said displacement current during plasma generation such that modification of properties of said substrate surface is prevented.
摘要翻译：本发明涉及通过使所述衬底表面经受大气压发光等离子体从衬底表面去除污染物的方法和装置。所述等离子体通过对所述电极施加交替的等离子体激励电压而引起等离子体电流和位移电流而在包括多个电极的放电空间中产生。所述等离子体通过在等离子体生成期间控制所述位移电流来稳定，从而防止所述衬底表面的性质的改变。

5. 发明授权

US07491429B2 Method and arrangement for generating an atmospheric pressure glow discharge plasma (APG) 有权
标题翻译：用于产生大气压辉光放电等离子体（APG）的方法和装置
公开(公告)号：US07491429B2
公开(公告)日：2009-02-17
申请号：US10529786
申请日：2003-09-30
申请人： Hindrik Willem De Vries , Fuyuhiko Mori , Eugen Aldea , Mauritius Cornelius Maria Van De Sanden
发明人： Hindrik Willem De Vries , Fuyuhiko Mori , Eugen Aldea , Mauritius Cornelius Maria Van De Sanden
IPC分类号： H05H1/24
CPC分类号： H01J37/32825 , B05D1/62 , B05D3/141 , B05D2252/02 , C23C16/503 , C23C16/505 , H01J37/32036 , H01J37/32082 , H05H1/2406 , H05H2001/2412 , H05H2001/2431
摘要： Method and arrangement (1) for generating an atmospheric pressure glow plasma APG (7), where in a plurality of electrodes, (4, 5) are arranged defining a discharge space (10) for forming said plasma (7). The electrodes (4,5) are connected to a power supply (8) providing an AC-voltage having a frequency of at least 50 kHz to the electrodes (4,5). A gaseous substance (6) is provided in said discharge space and comprises t least one of a group of argon, nitrogen and air.
摘要翻译：用于产生大气压发光等离子体APG（7）的方法和装置（1），其中在多个电极（4,5）中布置有限定用于形成所述等离子体（7）的放电空间（10）的装置（4）。电极（4,5）连接到向电极（4,5）提供具有至少50kHz的频率的AC电压的电源（8）。气体物质（6）设置在所述放电空间中，并且包括一组氩，氮和空气中的至少一种。

6. 发明申请

US20080271748A1 Method of and Arrangement for Removing Contaminants from a Substrate Surface Using an Atmospheric Pressure Glow Plasma 有权
标题翻译：使用大气压发光等离子体从基板表面去除污染物的方法和装置
公开(公告)号：US20080271748A1
公开(公告)日：2008-11-06
申请号：US10584075
申请日：2004-12-22
申请人： Hindrik Willem De Vries , Eugen Aldea , Jan Bastiaan Bouwstra , Mauritius Cornelius Maria Van De Sanden
发明人： Hindrik Willem De Vries , Eugen Aldea , Jan Bastiaan Bouwstra , Mauritius Cornelius Maria Van De Sanden
IPC分类号： C25F1/00 , B08B6/00
CPC分类号： H01J37/32935 , H01J37/32174 , H01J2237/335 , H01L51/5206 , H05H2240/00
摘要： The present invention relates to a method of and arrangement for removing contaminants from a surface of a substrate by subjecting said substrate surface to an atmospheric pressure glow plasma. Said plasma is generated in a discharge space comprising a plurality of electrodes, by applying an alternating plasma energizing voltage to said electrodes causing a plasma current and a displacement current. Said plasma is stabilised by controlling said displacement current during plasma generation such that modification of properties of said substrate surface is prevented.
摘要翻译：本发明涉及通过使所述衬底表面经受大气压发光等离子体从衬底表面去除污染物的方法和装置。所述等离子体通过对所述电极施加交替的等离子体激励电压而引起等离子体电流和位移电流而在包括多个电极的放电空间中产生。所述等离子体通过在等离子体生成期间控制所述位移电流来稳定，从而防止所述衬底表面的性质的改变。

7. 发明授权

US07791281B2 Method and apparatus for stabilizing a glow discharge plasma under atmospheric conditions 有权
标题翻译：用于在大气条件下稳定辉光放电等离子体的方法和装置
公开(公告)号：US07791281B2
公开(公告)日：2010-09-07
申请号：US10584145
申请日：2004-12-22
申请人： Eugen Aldea , Jan Bastiaan Bouwstra , Mauritius Cornelius Maria Van De Sanden , Hindrik Willem De Vries
发明人： Eugen Aldea , Jan Bastiaan Bouwstra , Mauritius Cornelius Maria Van De Sanden , Hindrik Willem De Vries
IPC分类号： H05B31/26
CPC分类号： H01J37/32935 , H01J37/32174 , H05H1/46 , H05H2001/4652 , H05H2001/4682 , H05H2001/4697
摘要： Method and apparatus for generating and sustaining a glow discharge plasma in a plasma discharge space comprising at least two spaced electrodes. The method and apparatus are arranged for performing the steps of introducing in the discharge space a gas or gas mixture under atmospheric pressure conditions, energizing the electrodes by applying an AC energizing voltage (Va) to the electrodes, and controlling the energizing voltage (Va) such that at plasma generation a sharp relative decrease of displacement current is provided.
摘要翻译：用于在包括至少两个间隔开的电极的等离子体放电空间中产生和维持辉光放电等离子体的方法和装置。该方法和装置用于执行在大气压力条件下在放电空间中引入气体或气体混合物的步骤，通过向电极施加交流激励电压（Va）来激励电极，并且控制激励电压（Va）使得在等离子体产生时提供了位移电流的明显的相对减小。

8. 发明申请

US20090304949A1 SHORT PULSE ATMOSPHERIC PRESSURE GLOW DISCHARGE METHOD AND APPARATUS 审中-公开
标题翻译：短脉冲大气压力放电方法和装置
公开(公告)号：US20090304949A1
公开(公告)日：2009-12-10
申请号：US12278905
申请日：2007-02-09
申请人： Hindrik Willem De Vries , Eugen Aldea , Mauritius Cornelius Maria Van De Sanden
发明人： Hindrik Willem De Vries , Eugen Aldea , Mauritius Cornelius Maria Van De Sanden
IPC分类号： C23C16/513 , H05H1/24 , C23C16/00
CPC分类号： H01J37/32018 , H01J37/32825
摘要： Method and plasma generating apparatus for generating an atmospheric pressure glow discharge plasma in a treatment space (5) filled with a gas composition. Two electrodes (2, 3) are connected to a power supply (4) for providing electrical power during an on-time (ton). The power supply (4) is arranged to provide a periodic signal with an on-time (ton) which is shorter than a predetermined time period, the predetermined time period corresponding substantially to the time necessary for a dust coagulation center from the gas composition to become a cluster in the treatment space (5). This method and apparatus may be used for depositing a layer of material on a substrate (6) in the treatment space (5).
摘要翻译：一种用于在填充有气体组合物的处理空间（5）中产生大气压辉光放电等离子体的方法和等离子体产生装置。两个电极（2,3）连接到电源（4），用于在接通时间（ton）期间提供电力。电源（4）被布置成提供周期性信号，其具有比预定时间段短的接通时间（ton），该预定时间段基本上对应于灰尘凝结中心从气体组成到成为治疗空间的集群（5）。该方法和装置可用于在处理空间（5）中的衬底（6）上沉积材料层。

9. 发明授权

US07288204B2 Method and arrangement for treating a substrate with an atmospheric pressure glow plasma (APG) 有权
标题翻译：用大气压发光等离子体（APG）处理衬底的方法和装置
公开(公告)号：US07288204B2
公开(公告)日：2007-10-30
申请号：US10198740
申请日：2002-07-19
申请人： Hindrik Willem De Vries , Fuyuhiko Mori , Eugen Aldea , Mauritius Cornelius Maria Van De Sanden
发明人： Hindrik Willem De Vries , Fuyuhiko Mori , Eugen Aldea , Mauritius Cornelius Maria Van De Sanden
IPC分类号： B44C1/22 , H01L21/00
CPC分类号： H01J37/32825 , H01J37/32009 , H01J37/32348 , H05H1/2406 , H05H2001/2412
摘要： Method for generating an atmospheric pressure glow plasma (APG), wherein said plasma is generated in a discharge space between a plurality of electrodes. A dielectric is present on at least one of said electrodes, said dielectric having a boundary surface with said plasma enabling interactions between said plasma and said surface. Said dielectric is arranged for releasing electrons contributing to said plasma from said surface by said interactions.
摘要翻译：用于产生大气压发光等离子体（APG）的方法，其中所述等离子体在多个电极之间的放电空间中产生。电介质存在于至少一个所述电极上，所述电介质具有与所述等离子体的边界面，从而能够在所述等离子体和所述表面之间进行相互作用。所述电介质被布置用于通过所述相互作用从所述表面释放对所述等离子体有贡献的电子。

10. 发明申请

US20110311808A1 Two Layer Barrier on Polymeric Substrate 审中-公开
标题翻译：聚合物基质上的两层屏障
公开(公告)号：US20110311808A1
公开(公告)日：2011-12-22
申请号：US13201219
申请日：2010-02-10
申请人： Hindrik Willem De Vries , Mauritius Cornelius Maria Van De Sanden
发明人： Hindrik Willem De Vries , Mauritius Cornelius Maria Van De Sanden
IPC分类号： B32B9/04 , C23C16/50 , C23C16/52 , B32B7/02
CPC分类号： C23C16/0272 , C23C16/401 , Y10T428/265
摘要： Plasma treatment apparatus and method for producing a polymeric substrate using an atmospheric pressure glow discharge plasma in a treatment space formed between two or more opposing electrodes connected to a power supply using a gas composition in the treatment space comprising a precursor and oxygen. A first layer of inorganic material is deposited on a polymeric substrate with a largest thickness (d3) of at least 100% of an Rt-value being defined as the maximum peak to valley height of the profile of the polymeric substrate measured substantially perpendicular to the surface of the polymeric substrate. A second layer of inorganic material is deposited on the first layer, wherein in the treatment space the oxygen has a concentration of 3% or higher, and the power supply is controlled to provide an energy across a gap between the two or more opposing electrodes of 40 J/cm2 or higher.
摘要翻译：一种等离子体处理装置和使用大气压辉光放电等离子体的聚合物基板的制造方法，该处理空间形成在使用包含前体和氧气的处理空间中的气体组合物与电源连接的两个或更多个相对电极之间。第一层无机材料沉积在聚合物基材上，其最大厚度（d3）至少为Rt值的100％，其定义为聚合物基材的轮廓的最大峰谷高度基本上垂直于聚合物基材的表面。第二层无机材料沉积在第一层上，其中在处理空间中氧气具有3％或更高的浓度，并且控制电源以在两个或更多个相对电极之间的间隙上提供能量 40J / cm 2以上。

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