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    • 3. 发明申请
    • Smart card and smart card reader
    • 智能卡和智能卡读卡器
    • US20090032593A1
    • 2009-02-05
    • US11918937
    • 2006-04-24
    • Henrik Ljungcrantz
    • Henrik Ljungcrantz
    • G06K7/06G06K19/06
    • H01R13/03C23C30/00G06K7/0021G06K19/07743H01R13/22
    • A smart card (1) has a card contact element (2) for establishing an electrical contact with a reader contact element of a smart card reader for reading the smart card (1). The card contact element (2) has a contact surface (3) coated with a contact layer, said contact surface (3) being arranged to be brought into contact with the reader contact element. The contact layer comprises a multiele-ment material that has a composition of at least one of a carbide or nitride described by the formula MqAyXz, where M is a transition metal or a combination of transition metals, A is a group A element or a combination of group A elements, X is carbon or nitrogen or both, and q, y and z are numbers above zero. The multi-element material further comprises at least one nanocomposite comprising single elements, binary phases, ternary phases, quaternary phases or higher order phases based on the atomic elements in the corresponding MqAyXz compound. A reader for reading a smart card (1) is also disclosed.
    • 智能卡(1)具有卡接触元件(2),用于与用于读取智能卡(1)的智能卡读卡器的读取器接触元件建立电接触。 卡接触元件(2)具有涂覆有接触层的接触表面(3),所述接触表面(3)被布置成与读取器接触元件接触。 接触层包括多层材料,其具有由式MqAyXz描述的碳化物或氮化物中的至少一种的组成,其中M是过渡金属或过渡金属的组合,A是A族元素或组合 的A族元素,X是碳或氮或两者,q,y和z是高于零的数字。 多元素材料还包括至少一种纳米复合材料,其包含基于相应MqAyXz化合物中的原子元素的单一元素,二元相,三元相,四元相或更高级的纳米复合材料。 还公开了读取智能卡(1)的读取器。
    • 4. 发明授权
    • Device for carrying out a surface treatment of substrates under vacuum
    • 用于在真空下进行基板的表面处理的装置
    • US07993456B2
    • 2011-08-09
    • US10534723
    • 2003-11-11
    • Henrik LjungcrantzTorsten Rosell
    • Henrik LjungcrantzTorsten Rosell
    • C23C16/00C23C14/00C23F1/00
    • H01L21/6719C23C14/566H01L21/67126H01L21/67201
    • The present invention relates to a device for carrying out a surface treatment of substrates under vacuum, which comprises a housing (1) comprising chambers (2-5) communicate with a vacuum source, at least one of which chambers serves as vacuum lock to the remaining chambers when surface treatment processes are in progress. The housing (1) is divided into an upper and a lower housing half (6, 7) of which at least one has symmetrically distributed recesses (8). Pivotally mounted between the housing halves (6, 7) is a revolver (9), which comprises recesses (10) in which substrate to be treated is placed. The housing halves (6, 7) are designed to be in two positions, in the first of which they are separated from the revolver (9) and in the second of which they are in contact therewith. In the first position the revolver (9) is designed to be turned to predefined rotational positions at which recesses in the housing halves (6, 7) and the revolver (9) coincide in the chambers (2-5). In the first position the vacuum lock can be opened and evacuated without disturbing the vacuum in other parts of the housing (1).
    • 本发明涉及一种用于在真空下执行基板的表面处理的装置,其包括壳体(1),壳体(1)包括与真空源连通的室(2-5),其中至少一个室用作真空锁定 当表面处理工艺进行时,剩余的室。 壳体(1)被分成上壳体和下壳体半部(6,7),其中至少一个具有对称分布的凹部(8)。 枢轴安装在壳体半部(6,7)之间的是左轮手枪(9),其包括其中放置有待处理的基底的凹部(10)。 外壳半部(6,7)被设计成两个位置,其中第一个与左轮手枪(9)分离,第二个与第二个位置接触。 在第一位置,左轮手枪(9)被设计成转动到预定的转动位置,在该转动位置,壳体半部(6,7)和转轮(9)中的凹部在腔室(2-5)中重合。 在第一位置,真空锁可以打开和抽真空而不干扰外壳(1)的其它部分的真空。
    • 5. 发明申请
    • Method for making a ferroelectric memory cell in a ferroelectric memory device, and a ferroelectric memory device
    • 在铁电存储器件中制造铁电存储单元的方法和铁电存储器件
    • US20060073658A1
    • 2006-04-06
    • US11294392
    • 2005-12-06
    • Henrik LjungcrantzNiclas EdvardssonJohan CarlssonGoran Gustafsson
    • Henrik LjungcrantzNiclas EdvardssonJohan CarlssonGoran Gustafsson
    • H01L21/8242H01L21/20H01L21/00
    • H01L21/32051H01L27/11502
    • In a method for making ferroelectric memory cells in a ferroelectric memory device a first electrode comprising at least one metal layer and optionally at least one metal oxide layer is formed on a silicon substrate which has an optional insulating layer of silicon dioxide. A ferroelectric layer consisting of a thin film of ferroelectric polymer is formed on the top of the first electrode layer and at least a second electrode comprising at least one metal layer and at least one metal oxide layer is formed on the ferroelectric layer. The second electrode is deposited by thermal evaporation of a high-purity evaporation source from an effusion cell onto the ferroelectric layer in a vacuum chamber filled with a gas or a gas mixture. A ferroelectric memory device wherein the memory cell has been made with the above method, comprises at least a first and a second set of respectively parallel electrodes, wherein the electrodes in a set are provided orthogonally to the electrodes of a nearest following set and with memory cells formed in a ferroelectric layer provided between successive electrode sets, such that memory cells are defined in the crossings between the electrodes which contact the ferroelectric layer on each side thereof.
    • 在铁电存储器件中制造铁电存储单元的方法中,在具有任选的二氧化硅绝缘层的硅衬底上形成包括至少一个金属层和任选的至少一个金属氧化物层的第一电极。 在第一电极层的顶部形成由铁电聚合物薄膜构成的铁电层,并且在铁电层上形成至少包含至少一个金属层和至少一个金属氧化物层的第二电极。 通过在填充有气体或气体混合物的真空室中将高纯度蒸发源从渗出室热蒸发到铁电层上来沉积第二电极。 具有上述方法制造存储单元的铁电存储器件包括至少第一组和第二组分别平行的电极,其中一组中的电极与最接近的组的电极和记忆体正交地设置 形成在连续的电极组之间的铁电体层中形成的单元,使得存储单元被限定在与其每一侧接触铁电体层的电极之间的交叉中。
    • 8. 发明申请
    • Device for carrying out a surface treatment of substrates under vacuum
    • 用于在真空下进行基板的表面处理的装置
    • US20070084401A1
    • 2007-04-19
    • US10534723
    • 2003-11-11
    • Henrik LjungcrantzTorsten Rosell
    • Henrik LjungcrantzTorsten Rosell
    • C23C14/00C23C16/00
    • H01L21/6719C23C14/566H01L21/67126H01L21/67201
    • The present invention relates to a device for carrying out a surface treatment of substrates under vacuum, which comprises a housing (1) comprising chambers (2-5) communicate with a vacuum source, at least one of which chambers serves as vacuum lock to the remaining chambers when surface treatment processes are in progress. The housing (1) is divided into an upper and a lower housing half (6, 7) of which at least one has symmetrically distributed recesses (8). Pivotally mounted between the housing halves (6, 7) is a revolver (9), which comprises recesses (10) in which substrate to be treated is placed. The housing halves (6, 7) are designed to be in two positions, in the first of which they are separated from the revolver (9) and in the second of which they are in contact therewith. In the first position the revolver (9) is designed to be turned to predefined rotational positions at which recesses in the housing halves (6, 7) and the revolver (9) coincide in the chambers (2-5). In the first position the vacuum lock can be opened and evacuated without disturbing the vacuum in other parts of the housing (1).
    • 本发明涉及一种用于在真空下执行基板的表面处理的装置,其包括壳体(1),壳体(1)包括与真空源连通的室(2-5),其中至少一个室用作真空锁定 当表面处理工艺进行时,剩余的室。 壳体(1)被分成上壳体和下壳体半部(6,7),其中至少一个具有对称分布的凹部(8)。 枢轴安装在壳体半部(6,7)之间的是左轮手枪(9),其包括其中放置有待处理的基底的凹部(10)。 外壳半部(6,7)被设计成两个位置,其中第一个与左轮手枪(9)分离,第二个与第二个位置接触。 在第一位置,左轮手枪(9)被设计成转动到壳体半部(6,7)中的凹部和旋转轮(9)在腔室(2-5)中重合的预定转动位置。 在第一位置,真空锁可以打开和抽真空而不干扰外壳(1)的其它部分的真空。