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1. 发明授权

US09268236B2 Lithographic apparatus and device manufacturing method having heat pipe with fluid to cool substrate and/or substrate holder 有权
标题翻译：具有具有流体的热管以冷却衬底和/或衬底保持器的光刻设备和器件制造方法
公开(公告)号：US09268236B2
公开(公告)日：2016-02-23
申请号：US12814242
申请日：2010-06-11
申请人： Johannes Henricus Wilhelmus Jacobs , Igor Petrus Maria Bouchoms , Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Joost Jeroen Ottens , Martinus Cornelis Maria Verhagen , Yücel Kök , Johannes Van Es , Herman Boom , Franciscus Johannes Joseph Janssen
发明人： Johannes Henricus Wilhelmus Jacobs , Igor Petrus Maria Bouchoms , Nicolaas Rudolf Kemper , Nicolaas Ten Kate , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Joost Jeroen Ottens , Martinus Cornelis Maria Verhagen , Yücel Kök , Johannes Van Es , Herman Boom , Franciscus Johannes Joseph Janssen
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/70875
摘要： A lithographic apparatus configured to project a patterned radiation beam onto a target portion of a substrate held on a substrate holder in an indent on a substrate table, the apparatus includes a liquid supply system configured to at least partly fill a space between a projection system and the substrate with liquid; a barrier structure configured to substantially contain the liquid within the space; and a heat pipe supplied, in use, with a temperature conditioned fluid and configured to thermally condition the substrate and/or the substrate holder at locations where localized cooling is likely to occur.
摘要翻译：一种光刻设备，其被配置为将图案化的辐射束投影到保持在基板台上的凹槽中的基板保持器上的基板的目标部分上，该设备包括：液体供应系统，其构造成至少部分地填充投影系统和液体基体; 阻挡结构，其构造成在所述空间内基本上容纳所述液体; 以及在使用中供应有温度调节的流体并被配置为在可能发生局部冷却的位置处对基板和/或基板保持器进行热调节的热管。

2. 发明申请

US20120262688A1 Optical Apparatus for Conditioning a Radiation Beam for Use by an Object, Lithography Apparatus and Method of Manufacturing Devices 有权
标题翻译：用于调节物体使用的放射线的光学装置，平版印刷装置和制造装置的方法
公开(公告)号：US20120262688A1
公开(公告)日：2012-10-18
申请号：US13433923
申请日：2012-03-29
申请人： Gosse Charles DE VRIES , Jan Bernard Plechelmus VAN SCHOOT , Franciscus Johannes Joseph JANSSEN , Nicolaas Aldegonda Jan Maria VAN AERLE
发明人： Gosse Charles DE VRIES , Jan Bernard Plechelmus VAN SCHOOT , Franciscus Johannes Joseph JANSSEN , Nicolaas Aldegonda Jan Maria VAN AERLE
IPC分类号： G03B27/54 , G02B5/08
CPC分类号： G03F7/70575 , G03F7/70075 , G03F7/70116 , G03F7/70158 , G03F7/70191
摘要： In an EUV (extreme ultraviolet) lithography apparatus, an illumination system includes a multifaceted field mirror and a multifaceted pupil mirror. A field facet mirror within mirror focuses EUV radiation onto a particular associated pupil facet mirror, from where it is directed to a target area. Each field facet mirror is modified to scatter unwanted DUV (deep ultraviolet) radiation into a range of directions. The majority of DUV falls onto neighboring pupil facet mirrors within the pupil mirrors, so that the amount of DUV radiation reaching target E is suppressed in comparison to the wanted EUV radiation. Because the distance between mirrors is much greater than the width of an individual pupil facet mirror, good DUV suppression can be achieved with only a narrow scattering angle. Absorption of EUV radiation in the scattering layer can be minimized.
摘要翻译：在EUV（极紫外）光刻设备中，照明系统包括多面镜场和多面瞳镜。镜子内的场面镜将EUV辐射聚焦到特定的相关瞳孔面反射镜上，从而将其引导到目标区域。修改每个场分面镜，以将不需要的DUV（深紫外）辐射散射到一系列方向。 DUV的大部分落在瞳孔镜内的相邻瞳孔面反射镜上，从而与所需的EUV辐射相比，达到目标E的DUV辐射量被抑制。因为镜子之间的距离远远大于单个瞳孔面反射镜的宽度，所以只有较窄的散射角才能实现良好的DUV抑制。可以使散射层中的EUV辐射的吸收最小化。

3. 发明授权

US07652746B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07652746B2
公开(公告)日：2010-01-26
申请号：US11319217
申请日：2005-12-28
申请人： Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Franciscus Johannes Joseph Janssen
发明人： Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Franciscus Johannes Joseph Janssen
IPC分类号： G03B27/52 , G03B27/42 , G03B27/72 , G03B27/32
CPC分类号： G03F7/70341 , G03F7/70716 , G03F7/70875
摘要： Methods and apparatus for maintaining the thermal equilibrium of a substrate and an immersion lithographic apparatus are disclosed using or having a timetable comprising information regarding the position, speed and/or acceleration of the substrate; and an evaporation controller and/or condensation controller acting to decrease localized evaporation and/or increase localized condensation in response to the information in the timetable. Evaporation of liquid from the surface of the substrate cools it down, while condensing liquid on its bottom surface heats the substrate locally.
摘要翻译：使用或具有包括关于衬底的位置，速度和/或加速度的信息的时间表来公开用于维持衬底和浸没式光刻设备的热平衡的方法和设备; 以及响应于时间表中的信息，用于减少局部蒸发和/或增加局部冷凝的蒸发控制器和/或冷凝控制器。从基材表面蒸发液体将其冷却下来，同时在其底部表面上冷凝液体局部加热基材。

4. 发明授权

US07561250B2 Lithographic apparatus having parts with a coated film adhered thereto 有权
标题翻译：具有附着有涂膜的部件的平版印刷设备
公开(公告)号：US07561250B2
公开(公告)日：2009-07-14
申请号：US11812507
申请日：2007-06-19
申请人： Paulus Martinus Maria Liebregts , Menno Fien , Erik Roelof Loopstra , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens
发明人： Paulus Martinus Maria Liebregts , Menno Fien , Erik Roelof Loopstra , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Franciscus Johannes Joseph Janssen , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens
IPC分类号： G03B27/42 , G03B27/52 , G03B27/58 , G03B27/32
CPC分类号： G03F7/70958 , G03F7/70341 , G03F7/70866 , G03F7/70975 , G03F7/70983
摘要： A lithographic apparatus is disclosed having a removable adhesive film carrying a coating on at least a part of the apparatus. In an embodiment, a liquid supply system having a liquid confinement structure extending along at least part of a boundary of a space between a projection system and a substrate support is disclosed, wherein the film carrying the coating is on at least part of the liquid confinement structure.
摘要翻译：公开了一种光刻设备，其具有在设备的至少一部分上承载涂层的可移除的粘合剂膜。在一个实施例中，公开了一种液体供应系统，其具有沿着投影系统和基板支撑件之间的空间的边界的至少一部分的边界延伸的液体限制结构，其中承载涂层的膜位于液体限制的至少一部分结构体。

6. 发明授权

US09164401B2 Projection system and lithographic apparatus 有权
标题翻译：投影系统和光刻设备
公开(公告)号：US09164401B2
公开(公告)日：2015-10-20
申请号：US13061792
申请日：2009-07-17
申请人： Erik Roelof Loopstra , Wilhelmus Petrus De Boeij , Hans Butler , Robertus Johannes Marinus De Jongh , Jan Bernard Plechelmus Van Schoot , Timotheus Franciscus Sengers , Maurice Willem Jozef Etiënne Wijckmans , Franciscus Johannes Joseph Janssen
发明人： Erik Roelof Loopstra , Wilhelmus Petrus De Boeij , Hans Butler , Robertus Johannes Marinus De Jongh , Jan Bernard Plechelmus Van Schoot , Timotheus Franciscus Sengers , Maurice Willem Jozef Etiënne Wijckmans , Franciscus Johannes Joseph Janssen
IPC分类号： G03F7/20
CPC分类号： G03F7/70891 , G03F7/70258 , G03F7/70825
摘要： A projection system (PS) is provided which includes, in an embodiment, two frames. The optical elements of the projection system are mounted on a first frame (200). The position of the optical elements is measured relative to a second frame (300) using a first measurement system (910). A second measurement system (920) is used to measure a parameter associated with a deformation of the second frame. The measurement made by the second measurement system can be used to compensate for any errors in the position of the optical elements as measured by the first measurement system resulting from deformations of the second frame. Typically, deformations of the frames are due to resonant oscillation and thermal expansion. Having two frames enables the optical elements of the projection system to be positioned with a high degree of accuracy. Optionally, a temperature control system (780, 790) may be provided to drive the temperature of at least one of the frames back to a desired value after the lithographic apparatus has been taken off line.
摘要翻译：提供了一种投影系统（PS），在一个实施例中包括两个帧。投影系统的光学元件安装在第一框架（200）上。使用第一测量系统（910）相对于第二框架（300）测量光学元件的位置。第二测量系统（920）用于测量与第二帧的变形相关联的参数。由第二测量系统进行的测量可用于补偿由第二框架的变形引起的由第一测量系统测量的光学元件位置的任何误差。通常，框架的变形是由于共振振荡和热膨胀。具有两个框架使得投影系统的光学元件能够以高精确度定位。可选地，可以提供温度控制系统（780,790）以在光刻设备已经离线之后将至少一个框架的温度恢复到期望值。

7. 发明授权

US08970818B2 Lithographic apparatus and component with repeating structure having increased thermal accommodation coefficient 有权
标题翻译：具有重复结构的光刻设备和组件具有增加的热调节系数
公开(公告)号：US08970818B2
公开(公告)日：2015-03-03
申请号：US13478888
申请日：2012-05-23
申请人： Han-Kwang Nienhuys , Franciscus Johannes Joseph Janssen , Sven Pekelder , Roger Wilhelmus Antonius Henricus Schmitz , Alexander Marinus Arnoldus Huijberts , Paulus Albertus Maria Gasseling
发明人： Han-Kwang Nienhuys , Franciscus Johannes Joseph Janssen , Sven Pekelder , Roger Wilhelmus Antonius Henricus Schmitz , Alexander Marinus Arnoldus Huijberts , Paulus Albertus Maria Gasseling
IPC分类号： G03B27/52 , G03F7/20
CPC分类号： G03F7/70883
摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate, and a projection system configured to project a patterned radiation beam onto a target portion of the substrate. A surface of a component of the lithographic apparatus that is in a vacuum environment in use is provided with a repeating structure configured to increase the effective thermal accommodation coefficient of the surface.
摘要翻译：光刻设备包括构造成保持衬底的衬底台和被配置为将图案化的辐射束投影到衬底的目标部分上的投影系统。在使用中的真空环境中的光刻设备的部件的表面设置有重复结构，其被配置为增加表面的有效热调节系数。

8. 发明授权

US08817229B2 Method of cooling an optical element, lithographic apparatus and method for manufacturing a device 有权
标题翻译：冷却光学元件的方法，光刻设备及其制造方法
公开(公告)号：US08817229B2
公开(公告)日：2014-08-26
申请号：US13081190
申请日：2011-04-06
申请人： Franciscus Johannes Joseph Janssen , Erik Roelof Loopstra
发明人： Franciscus Johannes Joseph Janssen , Erik Roelof Loopstra
IPC分类号： G03B27/52 , G02B7/18 , G03F7/20 , F28D15/00
CPC分类号： G03B27/52 , F28D15/00 , G02B7/181 , G03F7/70825 , G03F7/70891 , G03F7/709
摘要： A method of thermally conditioning an optical element operating in a vacuum environment. The optical element includes a first body having at least one optical surface and at least one heat transfer surface. The first body is dynamically controlled in position and/or orientation. The method includes controlling a temperature of a second body to a desired temperature, the second body including a second heat transfer surface; positioning the second body adjacent the first body and dynamically controlling the second body in position and/or orientation so as to maintain the first and second heat transfer surfaces in a substantially constant arrangement without contact between the bodies; and delivering a gas as a heat transfer medium into a heat transfer space defined by the first and second heat transfer surfaces, while controlling the pressure of the gas in the heat transfer space to between about 30 Pa and about 300 Pa.
摘要翻译：一种对在真空环境中工作的光学元件进行热调节的方法。光学元件包括具有至少一个光学表面和至少一个传热表面的第一主体。第一个身体在位置和/或方向上动态控制。该方法包括将第二主体的温度控制到期望的温度，第二主体包括第二传热表面; 将所述第二主体定位在所述第一主体附近并且在位置和/或方向上动态地控制所述第二主体，以便将所述第一和第二传热表面保持为基本上恒定的布置，而不会在所述主体之间接触; 并且将作为传热介质的气体输送到由第一和第二传热表面限定的传热空间中，同时将传热空间中的气体的压力控制在约30Pa和约300Pa之间。

9. 发明授权

US08730448B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US08730448B2
公开(公告)日：2014-05-20
申请号：US13409752
申请日：2012-03-01
申请人： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
发明人： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
IPC分类号： G03B27/52 , G03B27/42 , G03F7/20
CPC分类号： G03F7/70933 , G03F7/70875 , G03F7/70891
摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
摘要翻译：光刻设备包括被构造成保持基板的基板台，配置成将图案化的辐射束投射通过开口并到达基板的目标部分的投影系统，以及在开口中具有出口的导管。导管构造成将气体输送到开口。光刻设备还包括由控制系统控制的冷却装置。冷却装置构造成冷却气体，使得当气体入射到基板上时，从开口行进到基板的气体具有预定温度。

10. 发明授权

US08680493B2 Radiation conduit for radiation source 有权
标题翻译：辐射源辐射管
公开(公告)号：US08680493B2
公开(公告)日：2014-03-25
申请号：US13489096
申请日：2012-06-05
申请人： Maikel Adrianus Cornelis Schepers , Markus Franciscus Antonius Eurlings , Franciscus Johannes Joseph Janssen , Bernard Jacob Andries Stommen , Hrishikesh Patel , Hermanus Johannes Maria Kreuwel , Jacob Cohen , Pepijn Wijnand Jozef Janssen , Maarten Kees Jan Boon
发明人： Maikel Adrianus Cornelis Schepers , Markus Franciscus Antonius Eurlings , Franciscus Johannes Joseph Janssen , Bernard Jacob Andries Stommen , Hrishikesh Patel , Hermanus Johannes Maria Kreuwel , Jacob Cohen , Pepijn Wijnand Jozef Janssen , Maarten Kees Jan Boon
IPC分类号： G01J3/10
CPC分类号： G03F7/70575 , G03F7/70033 , G03F7/70891 , G21K1/02 , G21K1/067 , H05G2/003 , H05G2/008
摘要： A radiation source includes a fuel supply configured to deliver fuel to a plasma emission location for vaporization by a laser beam to form a plasma, and a collector configured to collect EUV radiation emitted by the plasma and direct the EUV radiation towards an intermediate focus. The collector includes a diffraction grating configured to diffract infrared radiation emitted by the plasma. The radiation source includes a radiation conduit located in between the collector and the intermediate focus. The radiation conduit includes an entrance aperture connected by an inwardly tapering body to an exit aperture. The radiation conduit includes an inner portion and an outer portion, the inner portion being closer to the intermediate focus than the outer portion. The inner portion is configured to reflect incident diffracted infrared radiation towards the outer portion.
摘要翻译：辐射源包括被配置为将燃料输送到等离子体发射位置用于由激光束蒸发以形成等离子体的燃料供应器，以及收集器，其被配置为收集由等离子体发射的EUV辐射并将EUV辐射引向中间焦点。集电体包括衍射光栅，其被配置为衍射由等离子体发射的红外辐射。辐射源包括位于收集器和中间焦点之间的辐射导管。辐射导管包括通过向内渐缩的主体连接到出口孔的入口孔。辐射导管包括内部部分和外部部分，内部部分比外部部分更接近中间焦点。内部部分被配置成将入射的衍射红外辐射反射到外部。

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