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1. 发明授权

US08867021B2 Illumination system, lithographic apparatus and method of adjusting an illumination mode 有权
标题翻译：照明系统，光刻设备和调节照明模式的方法
公开(公告)号：US08867021B2
公开(公告)日：2014-10-21
申请号：US13392022
申请日：2010-03-18
申请人： Gosse Charles De Vries , Edwin Johan Buis , Marinus Johannes Maria Van Dam , Jan Bernard Plechelmus Van Schoot , Fidelus Adrianus Boon , Hermanus Johannes Maria Kreuwel
发明人： Gosse Charles De Vries , Edwin Johan Buis , Marinus Johannes Maria Van Dam , Jan Bernard Plechelmus Van Schoot , Fidelus Adrianus Boon , Hermanus Johannes Maria Kreuwel
IPC分类号： G03B27/54 , G03B27/72 , G03F7/20
CPC分类号： G03F7/70116 , G03F7/70075
摘要： An illumination system is disclosed that had a plurality of moveable reflective elements and associated actuators which may be configured to form an illumination mode. One or more of the actuators is arranged to move between first, second and third positions, and so move an associated moveable reflective element between first, second and third orientations, the first and second orientations being such that radiation reflected from the moveable reflective element forms part of the illumination mode, and the third orientation being such that radiation reflected from the moveable reflective element does not form part of the illumination mode.
摘要翻译：公开了一种照明系统，其具有多个可移动反射元件和相关联的致动器，其可被配置为形成照明模式。一个或多个致动器布置成在第一，第二和第三位置之间移动，并且因此在第一，第二和第三取向之间移动相关联的可移动反射元件，第一和第二取向使得从可移动反射元件反射的辐射形成照明模式的一部分，并且第三取向使得从可移动反射元件反射的辐射不会形成照明模式的一部分。

2. 发明申请

US20140253894A1 Radiation Source 有权
标题翻译：辐射源
公开(公告)号：US20140253894A1
公开(公告)日：2014-09-11
申请号：US14346530
申请日：2012-08-23
申请人： Jan Bernard Plechelmus Van Schoot , Hermanus Johannes Maria Kreuwel , Vadim Yevgenyevich Banine , Andrei Mikhailovich Yakunin , Johannes Hubertus Josephina Moors , Olav Waldimir Frijns , Gerardus Hubertus Petrus Maria Swinkels , Ivo Vanderhallen , Uwe Bruno Heini Stamm
发明人： Jan Bernard Plechelmus Van Schoot , Hermanus Johannes Maria Kreuwel , Vadim Yevgenyevich Banine , Andrei Mikhailovich Yakunin , Johannes Hubertus Josephina Moors , Olav Waldimir Frijns , Gerardus Hubertus Petrus Maria Swinkels , Ivo Vanderhallen , Uwe Bruno Heini Stamm
IPC分类号： H05G2/00 , G03F7/20
CPC分类号： G03F7/70058 , G03F7/70033 , H05G2/005 , H05G2/008
摘要： A radiation source having a fuel stream generator (110) that generates and directs a fuel stream (102) along a trajectory towards a plasma formation location (104). A pre-pulse laser radiation assembly directs a first beam of laser radiation (100) at the fuel stream at the plasma formation location to generate a modified fuel target (106). A main pulse laser radiation assembly directs a second beam of laser radiation (108) at the modified fuel target at the plasma formation location to generate a radiation generating plasma (117). A collector (122) collects the radiation and directs it along an optical axis (105) of the radiation source. The first beam of laser radiation being directed toward the fuel stream substantially along the optical axis.
摘要翻译：一种具有燃料流发生器（110）的辐射源，其产生并引导燃料流（102）沿轨迹朝向等离子体形成位置（104）。预脉冲激光辐射组件将等离子体形成位置处的燃料流处的第一激光辐射束（100）引导以产生经修改的燃料靶（106）。主脉冲激光辐射组件在等离子体形成位置处引导在修改的燃料靶处的第二激光辐射束（108）以产生辐射产生等离子体（117）。收集器（122）收集辐射并沿辐射源的光轴（105）引导辐射。激光辐射的第一束基本上沿着光轴指向燃料流。

3. 发明申请

US20110273691A1 RADIATION SOURCE, METHOD OF CONTROLLING A RADIATION SOURCE, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANUFACTURING A DEVICE 审中-公开
标题翻译：辐射源，控制辐射源的方法，光刻设备及其制造方法
公开(公告)号：US20110273691A1
公开(公告)日：2011-11-10
申请号：US13101795
申请日：2011-05-05
申请人： Erik Petrus BUURMAN , Nicolaas Antonius Allegondu Johannes VAN ASTEN , Hermanus Johannes Maria KREUWEL
发明人： Erik Petrus BUURMAN , Nicolaas Antonius Allegondu Johannes VAN ASTEN , Hermanus Johannes Maria KREUWEL
IPC分类号： G03B27/54 , H05G2/00
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/008
摘要： An EUV radiation source in the form of a plasma is focused at a virtual source point so as to pass through an exit aperture of a source collector module in an EUV lithographic apparatus. Plasma position is controlled in three directions, X, Y and Z using monitoring signals. By exploiting the photoacoustic effect, the monitoring is accomplished in a non-intrusive manner using acoustic sensors coupled to material of a cone which surrounds the exit aperture. Different angular positions of the radiation beam can be deduced by discriminating signals from the different sensors on the basis of relative arrival time or phase, and/or by comparing the amplitude/intensity of the signals. A sequencer function can be used to introduce a sequence of deliberate offsets in the beam position. This allows acoustic signals to be generated and detected for measurement purposes, when the beam would otherwise not impinge on the material.
摘要翻译：等离子体形式的EUV辐射源聚焦在虚拟源点，以便通过EUV光刻设备中的源极收集器模块的出口孔。使用监控信号，在三个方向控制等离子位置X，Y和Z。通过利用光声效应，使用耦合到围绕出射孔的锥体的材料的声学传感器以非侵入式的方式实现监视。可以通过基于相对到达时间或相位来区分来自不同传感器的信号和/或通过比较信号的幅度/强度来推导辐射束的不同角位置。定序器功能可用于在光束位置中引入有序偏移序列。这样当波束否则不会碰撞在材料上时，可以产生和检测声信号用于测量目的。

4. 发明授权

US08647858B2 Automated system for the lysis of microorganisms present in a sample, for extraction and for purification of the nucleic acids of said microorganisms for purposes of analysis 有权
标题翻译：用于溶解样品中存在的微生物的自动化系统，用于提取和纯化所述微生物的核酸用于分析目的
公开(公告)号：US08647858B2
公开(公告)日：2014-02-11
申请号：US13129997
申请日：2009-12-09
申请人： Patrick Broyer , Agnes Dupontfilliard , Massimo Galdiero , Michel Guy , Hermanus Johannes Maria Kreuwel , Emiliano Maione , Emiel Gerebern Maria Verwimp
发明人： Patrick Broyer , Agnes Dupontfilliard , Massimo Galdiero , Michel Guy , Hermanus Johannes Maria Kreuwel , Emiliano Maione , Emiel Gerebern Maria Verwimp
IPC分类号： C12M1/34 , C12M3/00 , C12Q1/68 , C12P19/34 , G01N15/06 , G01N33/00 , G01N33/48
CPC分类号： C12M47/10 , C12M47/06
摘要： The present invention relates to, among other things, a device for collecting airborne microorganisms, said device having: an air collecting module, comprising: i. an upper element having an air admission duct permitting entry of an air stream into said module, said duct being provided, at its base, with means for disturbance of the air stream, ii. a lower element having air evacuating means permitting the air stream created to exit and said upper and lower elements can be made integral with one another so that the air stream can be created within said air collecting module; a cartridge, of roughly cylindrical shape, having a microorganism retention zone, said retention zone having means for lysis of the microorganisms, said cartridge being positioned within said air collecting module.
摘要翻译：本发明尤其涉及一种用于收集空气微生物的装置，所述装置具有：空气收集模块，包括：i。上部元件具有允许空气流进入所述模块的进气管道，所述管道在其底部设置有用于干扰气流的装置，ii。下部元件具有允许产生的空气流出口的空气排出装置，并且所述上部和下部元件可以彼此成一体，使得可以在所述空气收集模块内产生气流; 大致圆筒形的筒，具有微生物保留区，所述保留区具有用于微生物裂解的装置，所述盒位于所述空气收集模块内。

5. 发明申请

US20130001442A1 RADIATION SOURCE AND LITHOGRAPHIC APPARATUS 有权
标题翻译：辐射源和光刻设备
公开(公告)号：US20130001442A1
公开(公告)日：2013-01-03
申请号：US13489096
申请日：2012-06-05
申请人： Maikel Adrianus Cornelis Schepers , Markus Franciscus Antonius Eurlings , Franciscus Johannes Joseph Janssen , Bernard Jacob Andries Stommen , Hrishikesh Patel , Hermanus Johannes Maria Kreuwel , Jacob Cohen , Pepijn Wijnand Jozef Janssen , Maarten Kees Jan Boon
发明人： Maikel Adrianus Cornelis Schepers , Markus Franciscus Antonius Eurlings , Franciscus Johannes Joseph Janssen , Bernard Jacob Andries Stommen , Hrishikesh Patel , Hermanus Johannes Maria Kreuwel , Jacob Cohen , Pepijn Wijnand Jozef Janssen , Maarten Kees Jan Boon
IPC分类号： G21K5/04 , G21K5/10
CPC分类号： G03F7/70575 , G03F7/70033 , G03F7/70891 , G21K1/02 , G21K1/067 , H05G2/003 , H05G2/008
摘要： A radiation source includes a fuel supply configured to deliver fuel to a plasma emission location for vaporization by a laser beam to form a plasma, and a collector configured to collect EUV radiation emitted by the plasma and direct the EUV radiation towards an intermediate focus. The collector includes a diffraction grating configured to diffract infrared radiation emitted by the plasma. The radiation source includes a radiation conduit located in between the collector and the intermediate focus. The radiation conduit includes an entrance aperture connected by an inwardly tapering body to an exit aperture. The radiation conduit includes an inner portion and an outer portion, the inner portion being closer to the intermediate focus than the outer portion. The inner portion is configured to reflect incident diffracted infrared radiation towards the outer portion.
摘要翻译：辐射源包括被配置为将燃料输送到等离子体发射位置用于由激光束蒸发以形成等离子体的燃料供应器，以及收集器，其被配置为收集由等离子体发射的EUV辐射并将EUV辐射引向中间焦点。集电体包括衍射光栅，其被配置为衍射由等离子体发射的红外辐射。辐射源包括位于收集器和中间焦点之间的辐射导管。辐射导管包括通过向内渐缩的主体连接到出口孔的入口孔。辐射导管包括内部部分和外部部分，内部部分比外部部分更接近中间焦点。内部部分被配置成将入射的衍射红外辐射反射到外部。

6. 发明授权

US06635493B2 Device for performing an assay, a method for manufacturing said device, and use of a membrane in the manufacture of said device 失效
公开(公告)号：US06635493B2
公开(公告)日：2003-10-21
申请号：US09843929
申请日：2001-04-30
申请人： Hendrik Sibolt van Damme , Hermanus Johannes Maria Kreuwel
发明人： Hendrik Sibolt van Damme , Hermanus Johannes Maria Kreuwel
IPC分类号： G01N33551
CPC分类号： B01L3/5025 , B01J19/0046 , B01J2219/00378 , B01J2219/00497 , B01J2219/00511 , B01J2219/00527 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00612 , B01J2219/00619 , B01J2219/00621 , B01J2219/00626 , B01J2219/0063 , B01J2219/00637 , B01J2219/00641 , B01J2219/00659 , B01J2219/00722 , C12Q1/6834 , C12Q1/6837 , C12Q1/703 , C40B40/06 , C40B60/14 , G01N33/551 , Y10S435/81
摘要： The present invention relates to a device for performing an assay, which device comprises a substrate having oriented through-going channels, said channels opening out on a surface for sample application, the channels in at least one area of the surface for sample application being provided with a first binding substance capable of binding to an analyte. The object of the present invention is to provide a substrate having both a high channel density and a high porosity, allowing high density arrays comprising different first binding substances to be applied to the surface for sample application. More in particular, the object of the present invention is to provide a device comprising a relatively cheap substrate that does not require the use of any typical microfabrication technology and, that offers an improved control over the liquid distribution over the surface of the substrate. The above objects are achieved with a device as mentioned above wherein the porous substrate is an electrochemically manufactured metal oxide membrane.

7. 发明授权

US10119114B2 Device for the lysis of microorganisms present in an environmental or clinical sample and the extraction of nucleic acids from said microorganisms for analysis 有权
公开(公告)号：US10119114B2
公开(公告)日：2018-11-06
申请号：US12451486
申请日：2008-06-06
申请人： Hermanus Johannes Maria Kreuwel , Emiel Gerebern Maria Verwimp
发明人： Hermanus Johannes Maria Kreuwel , Emiel Gerebern Maria Verwimp
IPC分类号： C12Q1/68 , C12M1/00 , C12M1/12
摘要： A cartridge that can be positioned inside an air collection component and receive a component for recovering nucleic acids is described, the cartridge being substantially cylindrical and containing a microorganism retaining zone, the retaining zone containing a microorganism lysis mechanism. Also described is a device for collecting microorganisms contained in the air and a device for microorganism lysis.

8. 发明授权

US08680493B2 Radiation conduit for radiation source 有权
标题翻译：辐射源辐射管
公开(公告)号：US08680493B2
公开(公告)日：2014-03-25
申请号：US13489096
申请日：2012-06-05
申请人： Maikel Adrianus Cornelis Schepers , Markus Franciscus Antonius Eurlings , Franciscus Johannes Joseph Janssen , Bernard Jacob Andries Stommen , Hrishikesh Patel , Hermanus Johannes Maria Kreuwel , Jacob Cohen , Pepijn Wijnand Jozef Janssen , Maarten Kees Jan Boon
发明人： Maikel Adrianus Cornelis Schepers , Markus Franciscus Antonius Eurlings , Franciscus Johannes Joseph Janssen , Bernard Jacob Andries Stommen , Hrishikesh Patel , Hermanus Johannes Maria Kreuwel , Jacob Cohen , Pepijn Wijnand Jozef Janssen , Maarten Kees Jan Boon
IPC分类号： G01J3/10
CPC分类号： G03F7/70575 , G03F7/70033 , G03F7/70891 , G21K1/02 , G21K1/067 , H05G2/003 , H05G2/008
摘要： A radiation source includes a fuel supply configured to deliver fuel to a plasma emission location for vaporization by a laser beam to form a plasma, and a collector configured to collect EUV radiation emitted by the plasma and direct the EUV radiation towards an intermediate focus. The collector includes a diffraction grating configured to diffract infrared radiation emitted by the plasma. The radiation source includes a radiation conduit located in between the collector and the intermediate focus. The radiation conduit includes an entrance aperture connected by an inwardly tapering body to an exit aperture. The radiation conduit includes an inner portion and an outer portion, the inner portion being closer to the intermediate focus than the outer portion. The inner portion is configured to reflect incident diffracted infrared radiation towards the outer portion.
摘要翻译：辐射源包括被配置为将燃料输送到等离子体发射位置用于由激光束蒸发以形成等离子体的燃料供应器，以及收集器，其被配置为收集由等离子体发射的EUV辐射并将EUV辐射引向中间焦点。集电体包括衍射光栅，其被配置为衍射由等离子体发射的红外辐射。辐射源包括位于收集器和中间焦点之间的辐射导管。辐射导管包括通过向内渐缩的主体连接到出口孔的入口孔。辐射导管包括内部部分和外部部分，内部部分比外部部分更接近中间焦点。内部部分被配置成将入射的衍射红外辐射反射到外部。

9. 发明申请

US20120038898A1 Lithographic Apparatus and Alignment Method 有权
标题翻译：平版印刷设备和对准方法
公开(公告)号：US20120038898A1
公开(公告)日：2012-02-16
申请号：US13186028
申请日：2011-07-19
申请人： Michel François Hubert KLAASSEN , Hermanus Johannes Maria KREUWEL
发明人： Michel François Hubert KLAASSEN , Hermanus Johannes Maria KREUWEL
IPC分类号： G03B27/72 , G03B27/34
CPC分类号： G03F7/70133 , G03F7/70141 , G03F7/702
摘要： A lithographic apparatus comprising a source collector module including a collector, configured to collect radiation from a radiation source; an illuminator configured to condition the radiation collected by the collector and to provide a radiation beam; and a detector arrangement comprising a reflector arrangement disposed in a fixed positional relationship with respect to the illuminator, the reflector arrangement being arranged to reflect radiation from the source collector module; and a sensor arrangement disposed in a fixed positional relationship with respect to the reflector arrangement, the sensor arrangement being configured to measure at least one property of radiation reflected by the reflector, the detector arrangement being configured to determine the location of a far field position of the radiation as a function of at least one property of the radiation reflected by the reflector and measured by the sensor arrangement.
摘要翻译：一种光刻设备，包括：源极收集器模块，其包括收集器，其被配置为收集来自辐射源的辐射; 照明器，被配置为调节由所述收集器收集的辐射并提供辐射束; 以及检测器装置，其包括相对于所述照明器以固定位置关系设置的反射器布置，所述反射器布置被布置成反射来自所述源极收集器模块的辐射; 以及传感器装置，其相对于所述反射器装置以固定的位置关系设置，所述传感器装置被配置成测量由所述反射器反射的辐射的至少一个特性，所述检测器装置被配置为确定所述反射器的远场位置的位置辐射是由反射器反射并由传感器装置测量的辐射的至少一个性质的函数。

10. 发明授权

US06225131B1 Device for performing an assay, a method for manufacturing said device, and use of a membrane in the manufacture of said device 有权
标题翻译：用于进行测定的装置，制造所述装置的方法以及在制造所述装置中使用膜
公开(公告)号：US06225131B1
公开(公告)日：2001-05-01
申请号：US09403559
申请日：1999-10-25
申请人： Hendrik Sibolt van Damme , Hermanus Johannes Maria Kreuwel
发明人： Hendrik Sibolt van Damme , Hermanus Johannes Maria Kreuwel
IPC分类号： G01N33551
CPC分类号： B01L3/5025 , B01J19/0046 , B01J2219/00378 , B01J2219/00497 , B01J2219/00511 , B01J2219/00527 , B01J2219/0059 , B01J2219/00596 , B01J2219/00605 , B01J2219/00612 , B01J2219/00619 , B01J2219/00621 , B01J2219/00626 , B01J2219/0063 , B01J2219/00637 , B01J2219/00641 , B01J2219/00659 , B01J2219/00722 , C12Q1/6834 , C12Q1/6837 , C12Q1/703 , C40B40/06 , C40B60/14 , G01N33/551 , Y10S435/81
摘要： A device for performing an assay comprising a substrate having through-going channels that open out onto a surface for sample application, the channels being provided in at least one cross-sectional area with a first binding substance capable of binding a particular analyte, the substrate being an electrochemically manufactured metal oxide membrane and containing the first binding substance within the through-going channels.
摘要翻译：一种用于执行测定的装置，其包括具有开放到表面上的用于样品施加的贯穿通道的基底，所述通道在至少一个横截面区域中提供有能够结合特定分析物的第一结合物质，所述基底作为电化学制造的金属氧化物膜并且在通过通道内容纳第一结合物质。

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