专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US07410735B2 Method of characterization, method of characterizing a process operation, and device manufacturing method 有权
标题翻译：表征方法，表征工艺操作的方法以及器件制造方法
公开(公告)号：US07410735B2
公开(公告)日：2008-08-12
申请号：US10844572
申请日：2004-05-13
申请人： Maria Elisabeth Reuhman-Huisken , Christianus Gerardus Maria De Mol , Hoite Pieter Theodoor Tolsma
发明人： Maria Elisabeth Reuhman-Huisken , Christianus Gerardus Maria De Mol , Hoite Pieter Theodoor Tolsma
IPC分类号： G03F9/00 , G03C5/00
CPC分类号： G03F7/70616 , G03F7/70633 , G03F9/7003
摘要： A system in which deformation of a substrate wafer is monitored during processing of the wafer is disclosed. In one embodiment, the distortion in the substrate wafer is measured after each exposure and processing operation by comparing the position of a plurality of reference marks to values in a database.
摘要翻译：公开了在晶片的处理期间监测基板晶片的变形的系统。在一个实施例中，通过将多个参考标记的位置与数据库中的值进行比较，在每次曝光和处理操作之后测量衬底晶片中的失真。

2. 发明授权

US07916275B2 Methods of characterizing similarity or consistency in a set of entities 有权
标题翻译：表征一组实体的相似性或一致性的方法
公开(公告)号：US07916275B2
公开(公告)日：2011-03-29
申请号：US11902186
申请日：2007-09-19
申请人： Christianus Gerardus Maria De Mol , Maria Elisabeth Reuhman-Huisken
发明人： Christianus Gerardus Maria De Mol , Maria Elisabeth Reuhman-Huisken
IPC分类号： G03B27/42 , G03B27/58 , G03B27/32 , G01N21/00
CPC分类号： G03F9/7003 , G03F9/7034
摘要： A method of characterizing the similarity between entities in a set of entities, wherein an entity is selected from substrate layers, substrate fields and substrates. Including determining positions at a plurality of measurement points per entity for providing position data; computing a correlation coefficient for each of a plurality of combinations of entities from the entity set, the correlation coefficients being based on the position data and being representative of the correlation between the associated combination of entities; comparing the correlation coefficients to a threshold amount to determine the extent of similarity between the entities. The invention also relates to a similar method incorporating determining an average value of the computed correlation coefficients, the average value providing a measure of the consistency.
摘要翻译：表征一组实体中的实体之间的相似性的方法，其中从衬底层，衬底场和衬底中选择实体。包括在每个实体的多个测量点处确定位置以提供位置数据; 计算来自所述实体集合的多个实体组合中的每一个的相关系数，所述相关系数基于所述位置数据并且表示所述相关联的实体组合之间的相关性; 将相关系数与阈值进行比较，以确定实体之间的相似程度。本发明还涉及一种包括确定所计算的相关系数的平均值的类似方法，该平均值提供一致性的量度。

4. 发明授权

US07889318B2 Methods of characterizing similarity between measurements on entities, computer programs product and data carrier 有权
标题翻译：表征实体，计算机程序产品和数据载体上的测量之间的相似性的方法
公开(公告)号：US07889318B2
公开(公告)日：2011-02-15
申请号：US12233484
申请日：2008-09-18
申请人： Christianus Gerardus Maria De Mol , Maria Elisabeth Reuhman-Huisken
发明人： Christianus Gerardus Maria De Mol , Maria Elisabeth Reuhman-Huisken
IPC分类号： G03B27/53 , G03B27/32
CPC分类号： G06K9/32 , G03F7/705 , G03F7/70633 , G03F7/70783
摘要： A method for characterizing the similarity between measurements on a plurality of entities comprising a first entity and a second entity comprises receiving measurements taken at a plurality of measurement points per entity. A model is defined comprising a stochastic process and a model function having values which depend on a set of parameters and the measurement points. A set (β) of parameters is estimated by fitting the model function to the measurements. Residual data is determined for at least a part of the plurality of measurement points for the first entity and the second entity by subtracting the fitted function from the measurements. A correlation coefficient for the first entity (i′) and the second entity (i″) is estimated based on the determined residual data and the estimated correlation coefficient is used to characterize the similarity between the measurements. The model is defined such that the residual data is expected to have a deterministic component which depends on the measurement points and that dominates the estimate of the correlation coefficient. The correlation coefficient is estimated using an estimate for the entity average residue averaged over the measurement points of the first entity and using an estimate for the entity average residue averaged over the measurement points of the second entity.
摘要翻译：用于表征包括第一实体和第二实体的多个实体上的测量之间的相似性的方法包括接收在每个实体的多个测量点处进行的测量。定义的模型包括随机过程和具有取决于一组参数和测量点的值的模型函数。通过将模型函数拟合到测量中来估计参数的集合（＆bgr）。通过从测量中减去拟合函数，为第一实体和第二实体的多个测量点的至少一部分确定剩余数据。基于所确定的残差数据来估计第一实体（i'）和第二实体（i“）的相关系数，并且使用估计的相关系数来表征测量之间的相似性。定义模型，使得残差数据预期具有取决于测量点的确定性分量，并且支配相关系数的估计。使用对第一实体的测量点平均的实体平均残差的估计并使用在第二实体的测量点上平均的实体平均残差的估计来估计相关系数。

5. 发明申请

US20090073403A1 Methods of characterizing similarity or consistency in a set of entities 有权
标题翻译：表征一组实体的相似性或一致性的方法
公开(公告)号：US20090073403A1
公开(公告)日：2009-03-19
申请号：US11902186
申请日：2007-09-19
申请人： Christianus Gerardus Maria DE MOL , Maria Elisabeth REUHMAN-HUISKEN
发明人： Christianus Gerardus Maria DE MOL , Maria Elisabeth REUHMAN-HUISKEN
IPC分类号： G06F17/50 , G03B27/42
CPC分类号： G03F9/7003 , G03F9/7034
摘要： A method of characterizing the similarity between entities in a set of entities, wherein an entity is selected from substrate layers, substrate fields and substrates. Including determining positions at a plurality of measurement points per entity for providing position data; computing a correlation coefficient for each of a plurality of combinations of entities from the entity set, the correlation coefficients being based on the position data and being representative of the correlation between the associated combination of entities; comparing the correlation coefficients to a threshold amount to determine the extent of similarity between the entities. The invention also relates to a similar method incorporating determining an average value of the computed correlation coefficients, the average value providing a measure of the consistency.
摘要翻译：表征一组实体中的实体之间的相似性的方法，其中从衬底层，衬底场和衬底中选择实体。包括在每个实体的多个测量点处确定位置以提供位置数据; 计算来自所述实体集合的多个实体组合中的每一个的相关系数，所述相关系数基于所述位置数据并且表示所述相关联的实体组合之间的相关性; 将相关系数与阈值进行比较，以确定实体之间的相似程度。本发明还涉及一种包括确定所计算的相关系数的平均值的类似方法，该平均值提供一致性的量度。

6. 发明申请

US20120113402A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20120113402A1
公开(公告)日：2012-05-10
申请号：US13288831
申请日：2011-11-03
申请人： Theodorus Petrus Maria CADEE , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Comelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人： Theodorus Petrus Maria CADEE , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Comelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号： G03B27/52
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
摘要翻译：描述了一种光刻设备，其具有液体供应系统，该液体供应系统被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件，以及一个或多个元件以控制和/或补偿来自基底的液体的蒸发。

7. 发明授权

US07804575B2 Lithographic apparatus and device manufacturing method having liquid evaporation control 有权
标题翻译：具有液体蒸发控制的平版印刷设备和器件制造方法
公开(公告)号：US07804575B2
公开(公告)日：2010-09-28
申请号：US11205325
申请日：2005-08-17
申请人： Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
发明人： Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC分类号： G03B27/52
CPC分类号： G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
摘要： A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
摘要翻译：描述了一种光刻设备，其具有液体供应系统，该液体供应系统被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件，以及一个或多个元件以控制和/或补偿来自基底的液体的蒸发。

8. 发明申请

US20090076999A1 Methods of Characterizing Similarity Between Measurements on Entities, Computer Programs Product and Data Carrier 有权
标题翻译：表征实体测量相似性的方法，计算机程序产品和数据载体
公开(公告)号：US20090076999A1
公开(公告)日：2009-03-19
申请号：US12233484
申请日：2008-09-18
申请人： Christianus Gerardus Maria DE MOL , Maria Elisabeth Reuhman-Huisken
发明人： Christianus Gerardus Maria DE MOL , Maria Elisabeth Reuhman-Huisken
IPC分类号： G06N5/02
CPC分类号： G06K9/32 , G03F7/705 , G03F7/70633 , G03F7/70783
摘要： A method for characterizing the similarity between measurements on a plurality of entities comprising a first entity and a second entity comprises receiving measurements taken at a plurality of measurement points per entity. A model is defined comprising a stochastic process and a model function having values which depend on a set of parameters and the measurement points. A set (β) of parameters is estimated by fitting the model function to the measurements. Residual data is determined for at least a part of the plurality of measurement points for the first entity and the second entity by subtracting the fitted function from the measurements. A correlation coefficient for the first entity (i′) and the second entity (i″) is estimated based on the determined residual data and the estimated correlation coefficient is used to characterize the similarity between the measurements. The model is defined such that the residual data is expected to have a deterministic component which depends on the measurement points and that dominates the estimate of the correlation coefficient. The correlation coefficient is estimated using an estimate for the entity average residue averaged over the measurement points of the first entity and using an estimate for the entity average residue averaged over the measurement points of the second entity.
摘要翻译：用于表征包括第一实体和第二实体的多个实体上的测量之间的相似性的方法包括接收在每个实体的多个测量点处进行的测量。定义的模型包括随机过程和具有取决于一组参数和测量点的值的模型函数。通过将模型函数拟合到测量中来估计参数的集合（β）。通过从测量中减去拟合函数，为第一实体和第二实体的多个测量点的至少一部分确定剩余数据。基于所确定的残差数据来估计第一实体（i'）和第二实体（i“）的相关系数，并且使用估计的相关系数来表征测量之间的相似性。定义模型，使得残差数据预期具有取决于测量点的确定性分量，并且支配相关系数的估计。使用对第一实体的测量点平均的实体平均残差的估计并使用在第二实体的测量点上平均的实体平均残差的估计来估计相关系数。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式