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1. 发明授权

US08757823B2 Mountings for rotation of array of reflective elements and lithographic apparatus incorporating same 有权
标题翻译：用于旋转反射元件的阵列的安装和包含其的光刻设备
公开(公告)号：US08757823B2
公开(公告)日：2014-06-24
申请号：US13381317
申请日：2010-06-08
申请人： Edwin Johan Buis , Gosse Charles De Vries
发明人： Edwin Johan Buis , Gosse Charles De Vries
IPC分类号： G02B7/182
CPC分类号： G03F7/702 , G02B26/12 , G03F7/70075 , G03F7/70091
摘要： An array of reflective elements in which at least one of the reflective elements is mounted on a mounting which comprises a rod at least partially located within a sleeve. A first end of the rod is fixed to a first end of the sleeve and a second end of the rod is moveable, the sleeve including a first resiliently flexible portion which is configured to bend in order to allow the movement of the second end of the rod to take place, wherein the reflective element is mounted at the first end of the sleeve such that bending of the sleeve causes rotation of the reflective element.
摘要翻译：一组反射元件，其中至少一个反射元件安装在包括至少部分地位于套筒内的杆的安装件上。杆的第一端固定到套筒的第一端并且杆的第二端是可移动的，套筒包括第一弹性柔性部分，其被配置为弯曲以允许第二端部的运动杆，其中反射元件安装在套筒的第一端，使得套筒的弯曲导致反射元件的旋转。

2. 发明申请

US20120262689A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20120262689A1
公开(公告)日：2012-10-18
申请号：US13517480
申请日：2010-11-19
申请人： Koen Van Ingen Schenau , Jan Bernard Plechelmus Van Schoot , Gosse Charles De Vries
发明人： Koen Van Ingen Schenau , Jan Bernard Plechelmus Van Schoot , Gosse Charles De Vries
IPC分类号： G03B27/54
CPC分类号： G03F7/70116 , G03F7/70075
摘要： In a lithographic apparatus, an illumination mode is set using a field mirror that includes a plurality of movable facets to direct radiation to selectable positions on a pupil facet mirror. A base illumination mode is selected from a set of predetermined illumination modes and the movable facets are set to effect that mode. In order to adjust an imaging parameter, a fraction of the movable facets are set to different positions. The determination of which facets to set to different positions is based on summing the effects of setting each facet to a different position.
摘要翻译：在光刻设备中，使用包括多个可移动小面的场反射镜来设置照明模式，以将辐射引导到瞳孔面反射镜上的可选位置。从一组预定照明模式中选择基本照明模式，并且可移动小面被设置为实现该模式。为了调整成像参数，可移动小面的一部分被设定为不同的位置。确定哪些面设置到不同的位置是基于将每个方面设置为不同位置的效果的总和。

3. 发明申请

US20120262688A1 Optical Apparatus for Conditioning a Radiation Beam for Use by an Object, Lithography Apparatus and Method of Manufacturing Devices 有权
标题翻译：用于调节物体使用的放射线的光学装置，平版印刷装置和制造装置的方法
公开(公告)号：US20120262688A1
公开(公告)日：2012-10-18
申请号：US13433923
申请日：2012-03-29
申请人： Gosse Charles DE VRIES , Jan Bernard Plechelmus VAN SCHOOT , Franciscus Johannes Joseph JANSSEN , Nicolaas Aldegonda Jan Maria VAN AERLE
发明人： Gosse Charles DE VRIES , Jan Bernard Plechelmus VAN SCHOOT , Franciscus Johannes Joseph JANSSEN , Nicolaas Aldegonda Jan Maria VAN AERLE
IPC分类号： G03B27/54 , G02B5/08
CPC分类号： G03F7/70575 , G03F7/70075 , G03F7/70116 , G03F7/70158 , G03F7/70191
摘要： In an EUV (extreme ultraviolet) lithography apparatus, an illumination system includes a multifaceted field mirror and a multifaceted pupil mirror. A field facet mirror within mirror focuses EUV radiation onto a particular associated pupil facet mirror, from where it is directed to a target area. Each field facet mirror is modified to scatter unwanted DUV (deep ultraviolet) radiation into a range of directions. The majority of DUV falls onto neighboring pupil facet mirrors within the pupil mirrors, so that the amount of DUV radiation reaching target E is suppressed in comparison to the wanted EUV radiation. Because the distance between mirrors is much greater than the width of an individual pupil facet mirror, good DUV suppression can be achieved with only a narrow scattering angle. Absorption of EUV radiation in the scattering layer can be minimized.
摘要翻译：在EUV（极紫外）光刻设备中，照明系统包括多面镜场和多面瞳镜。镜子内的场面镜将EUV辐射聚焦到特定的相关瞳孔面反射镜上，从而将其引导到目标区域。修改每个场分面镜，以将不需要的DUV（深紫外）辐射散射到一系列方向。 DUV的大部分落在瞳孔镜内的相邻瞳孔面反射镜上，从而与所需的EUV辐射相比，达到目标E的DUV辐射量被抑制。因为镜子之间的距离远远大于单个瞳孔面反射镜的宽度，所以只有较窄的散射角才能实现良好的DUV抑制。可以使散射层中的EUV辐射的吸收最小化。

4. 发明申请

US20120154777A1 ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND METHOD OF ADJUSTING AN ILLUMINATION MODE 有权
标题翻译：照明系统，平面设备和调节照明模式的方法
公开(公告)号：US20120154777A1
公开(公告)日：2012-06-21
申请号：US13392022
申请日：2010-03-18
申请人： Gosse Charles De Vries , Edwin Johan Buis , Marinus Johannes Maria Vandam , Jan Bernard Plechelmus Van Schoot , Fidelus Adrianus Boon , Hermanus Johannes Maria Kreuwel
发明人： Gosse Charles De Vries , Edwin Johan Buis , Marinus Johannes Maria Vandam , Jan Bernard Plechelmus Van Schoot , Fidelus Adrianus Boon , Hermanus Johannes Maria Kreuwel
IPC分类号： G03B27/72 , G02B26/02
CPC分类号： G03F7/70116 , G03F7/70075
摘要： An illumination system is disclosed that had a plurality of moveable reflective elements and associated actuators which may be configured to form an illumination mode. One or more of the actuators is arranged to move between first, second and third positions, and so move an associated moveable reflective element between first, second and third orientations, the first and second orientations being such that radiation reflected from the moveable reflective element forms part of the illumination mode, and the third orientation being such that radiation reflected from the moveable reflective element does not form part of the illumination mode.
摘要翻译：公开了一种照明系统，其具有多个可移动反射元件和相关联的致动器，其可被配置为形成照明模式。一个或多个致动器布置成在第一，第二和第三位置之间移动，并且因此在第一，第二和第三取向之间移动相关联的可移动反射元件，第一和第二取向使得从可移动反射元件反射的辐射形成照明模式的一部分，并且第三取向使得从可移动反射元件反射的辐射不会形成照明模式的一部分。

5. 发明申请

US20120147345A1 OPTICAL APPARATUS, AND METHOD OF ORIENTING A REFLECTIVE ELEMENT 有权
标题翻译：光学装置和面向反射元件的方法
公开(公告)号：US20120147345A1
公开(公告)日：2012-06-14
申请号：US13392032
申请日：2010-04-09
申请人： Edwin Johan Buis , Gosse Charles De Vries , Fidelus Adrianus Boon
发明人： Edwin Johan Buis , Gosse Charles De Vries , Fidelus Adrianus Boon
IPC分类号： G03B27/70 , G02B26/08
CPC分类号： G03F7/70116 , G02B7/1821
摘要： An optical apparatus has a moveable reflective element and associated actuator. The actuator includes a first magnet which is connected to the moveable reflective element such that movement of the first magnet will cause the moveable reflective element to move, and a second magnet which is connected to a motor such that operation of the motor will cause the second magnet to move. The second magnet is positioned relative to the first magnet such that moving the second magnet will cause the first magnet to move.
摘要翻译：光学装置具有可移动的反射元件和相关联的致动器。致动器包括连接到可移动反射元件的第一磁体，使得第一磁体的移动将导致可移动的反射元件移动，以及连接到电动机的第二磁体，使得电动机的操作将导致第二磁体磁铁移动。第二磁体相对于第一磁体定位，使得移动第二磁体将使第一磁体移动。

6. 发明授权

US06641447B2 Method of manufacturing a display device 失效
标题翻译：制造显示装置的方法
公开(公告)号：US06641447B2
公开(公告)日：2003-11-04
申请号：US09729586
申请日：2000-12-04
申请人： Gosse Charles De Vries
发明人： Gosse Charles De Vries
IPC分类号： H01J2928
CPC分类号： H01J9/20 , H01J29/896 , H01J2229/875 , H01J2229/8913
摘要： A display device is manufactured having a display with an auxiliary plate. The display window (3) and the auxiliary plate (15) are oriented at an angle of tilt &agr;1, preferably substantially vertically, the volume in between the display window and auxiliary plate is filed up to a selected level height (h) with uncured resin, a seal (17) and an opening (18) being provided at or near the highest point. Thereafter the display window is reoriented to a more horizontal position (smaller angle of tilt &agr;2) the auxiliary plate being positioned on top of the display window inducing a flow v of curable material (16) towards the opening (18), and when the resin has reached the opening the resin near the opening is plugged, where after the angle of tilt is further reduced and the resin is fully cured.
摘要翻译：制造具有带辅助板的显示器的显示装置。显示窗（3）和辅助板（15）以倾斜角α1（优选地基本上垂直）定向，显示窗和辅助板之间的体积被提升到具有未固化树脂的选定水平高度（h），在最高点处或附近设置密封件（17）和开口（18）。此后，显示窗口被重新定位到更加水平的位置（较小的倾斜角α2），辅助板位于显示窗口的顶部，引起可向外的开口（18）的可固化材料（16）的流动v，当树脂已经到达开口处，开口附近的树脂被堵塞，其中倾斜角度进一步减小并且树脂完全固化。

7. 发明授权

US08817232B2 Optical apparatus, and method of orienting a reflective element 有权
标题翻译：光学装置和反射元件的取向方法
公开(公告)号：US08817232B2
公开(公告)日：2014-08-26
申请号：US13392032
申请日：2010-04-09
申请人： Edwin Johan Buis , Gosse Charles De Vries , Fidelus Adrianus Boon
发明人： Edwin Johan Buis , Gosse Charles De Vries , Fidelus Adrianus Boon
IPC分类号： G03B27/70 , G03F7/20
CPC分类号： G03F7/70116 , G02B7/1821
摘要： An optical apparatus has a moveable reflective element and associated actuator. The actuator includes a first magnet which is connected to the moveable reflective element such that movement of the first magnet will cause the moveable reflective element to move, and a second magnet which is connected to a motor such that operation of the motor will cause the second magnet to move. The second magnet is positioned relative to the first magnet such that moving the second magnet will cause the first magnet to move.
摘要翻译：光学装置具有可移动的反射元件和相关联的致动器。致动器包括连接到可移动反射元件的第一磁体，使得第一磁体的移动将导致可移动的反射元件移动，以及连接到电动机的第二磁体，使得电动机的操作将导致第二磁体磁铁移动。第二磁体相对于第一磁体定位，使得移动第二磁体将使第一磁体移动。

8. 发明授权

US08634062B2 Actuator system, lithographic apparatus, method of controlling the position of a component and device manufacturing method 失效
标题翻译：执行器系统，光刻设备，控制部件位置的方法和装置的制造方法
公开(公告)号：US08634062B2
公开(公告)日：2014-01-21
申请号：US12627776
申请日：2009-11-30
申请人： Gosse Charles De Vries , Edwin Johan Buis , Uwe Mickan
发明人： Gosse Charles De Vries , Edwin Johan Buis , Uwe Mickan
IPC分类号： G03B27/54
CPC分类号： G03F7/70825 , G03F7/70141
摘要： An actuator system is provided that is configured to move a component relative to a base of the actuator system. The actuator system may include first and second actuating elements, each including two sections of material that are joined to each other and have different coefficients of thermal expansion. The two actuating elements may be configured such that if the temperature of one is increased it applies a force on the component in a direction that is opposite to the force applied by the other actuating element if its temperature is increased. The actuator system may further include at least one power supply configured to provide independently controllable heating to the first and second actuating elements.
摘要翻译：提供致动器系统，其构造成相对于致动器系统的基座移动部件。致动器系统可以包括第一和第二致动元件，每个致动元件包括彼此连接并且具有不同的热膨胀系数的两部分材料。两个致动元件可被构造成使得如果一个温度升高，则如果其温度升高，则该部件在与另一致动元件施加的力相反的方向上施加力。致动器系统还可以包括被配置为向第一和第二致动元件提供独立可控加热的至少一个电源。

9. 发明申请

US20120262690A1 ILLUMINATION SYSTEM, LITHOGRAPHIC APPARATUS AND ILLUMINATION METHOD 审中-公开
标题翻译：照明系统，光刻设备和照明方法
公开(公告)号：US20120262690A1
公开(公告)日：2012-10-18
申请号：US13518301
申请日：2010-11-29
申请人： Wilhelmus Petrus De Boeij , Erik Roelof Loopstra , Uwe Mickan , Jan Bernard Plechelmus Van Schoot , Gosse Charles De Vries
发明人： Wilhelmus Petrus De Boeij , Erik Roelof Loopstra , Uwe Mickan , Jan Bernard Plechelmus Van Schoot , Gosse Charles De Vries
IPC分类号： G03B27/54
CPC分类号： G03F7/70116 , G03F7/70075
摘要： An illumination system includes a field-facet mirror-device and a pupil mirror configured to condition a beam of radiation incident on the field-facet mirror-device. The field-facet mirror-device includes reflective field facets movable between first and second orientations relative to the incident beam. The field facets in their first orientations are effective to reflect the incident radiation towards respective reflective pupil facets so as to form part of a conditioned beam reflected from the pupil-facet mirror-device. The field facets in their second orientations are effective to reflect the incident radiation onto respective areas of the pupil-facet mirror-device designated as beam dump areas. The areas are arranged to prevent radiation incident on the areas from forming part of the conditioned beam and are arranged between the limits of an annular area on the pupil-facet mirror-device effective to define the inner and outer regions of the conditioned beam reflected from the pupil-facet mirror-device.
摘要翻译：照明系统包括场分面镜装置和配置成调节入射在场面镜装置上的辐射束的光瞳镜。场面反射镜装置包括相对于入射光束在第一和第二取向之间移动的反射场面。其第一取向中的场小面有效地将入射辐射反射到各个反射光瞳面，以便形成从瞳孔面反射镜装置反射的条件光束的一部分。其第二取向中的场面有效地将入射的辐射反射到被指定为光束聚集区域的瞳孔面反射镜装置的相应区域上。这些区域被布置成防止入射到区域上的辐射形成调节梁的一部分，并且被布置在瞳孔面反射镜装置上的环形区域的极限之间，有效地限定条件束的内部和外部区域从瞳孔面反射镜。

10. 发明申请

US20100149506A1 Actuator System, Lithographic Apparatus, Method of Controlling the Position of a Component and Device Manufacturing Method 失效
标题翻译：执行器系统，光刻设备，控制部件位置的方法和装置制造方法
公开(公告)号：US20100149506A1
公开(公告)日：2010-06-17
申请号：US12627776
申请日：2009-11-30
申请人： Gosse Charles DE VRIES , Edwin Johan Buis , Uwe Mickan
发明人： Gosse Charles DE VRIES , Edwin Johan Buis , Uwe Mickan
IPC分类号： G03B27/54 , H02N10/00
CPC分类号： G03F7/70825 , G03F7/70141
摘要： An actuator system is provided that is configured to move a component relative to a base of the actuator system. The actuator system may include first and second actuating elements, each including two sections of material that are joined to each other and have different coefficients of thermal expansion. The two actuating elements may be configured such that if the temperature of one is increased it applies a force on the component in a direction that is opposite to the force applied by the other actuating element if its temperature is increased. The actuator system may further include at least one power supply configured to provide independently controllable heating to the first and second actuating elements.
摘要翻译：提供致动器系统，其构造成相对于致动器系统的基座移动部件。致动器系统可以包括第一和第二致动元件，每个致动元件包括彼此连接并且具有不同的热膨胀系数的两部分材料。两个致动元件可被构造成使得如果一个温度升高，则如果其温度升高，则该部件在与另一致动元件施加的力相反的方向上施加力。致动器系统还可以包括被配置为向第一和第二致动元件提供独立可控加热的至少一个电源。

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