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1. 发明专利

JP2008277698A Substrate carrying mechanism, and substrate processing apparatus having same 审中-公开
标题翻译：承载机构的基板，以及具有相同基板的基板处理装置
公开(公告)号：JP2008277698A
公开(公告)日：2008-11-13
申请号：JP2007122484
申请日：2007-05-07
申请人： Ebatekku:Kk , 株式会社エバテック
发明人： ISHIHARA SHINICHIRO , KAMIMURA NAOKI , KODAMA TAKUYA
IPC分类号： H01L21/677 , C23C16/44 , H01L21/205
摘要： PROBLEM TO BE SOLVED: To provide a substrate carrying mechanism that carries out inspection of the presence or non-presence of substrate defects and/or checking of completion of delivery thereof without causing significant cost increase, and to provide a substrate processing apparatus having same.
SOLUTION: The substrate carrying mechanism wherein the substrate received from the prior process is delivered for the post process includes a substrate holding means having a pair of support arms 61, 62 for holding two sides opposite a rectangular substrate 80, moving means 65-68 for moving the substrate holding means, and sensors 70a, b, which are mouunted at the ends of the support arms 61, 62, for detecting the substrate 80 to generate signals. Further, a deciding means for deciding the presence or non-presence of the substrate defects and/or the completion of delivery thereof based on the signal outputted from the sensors 70a, b is disposed on a side edge portion of the substrate 80 passing in front of the sensors 70a, b when receiving or delivering the substrate 80.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种基板承载机构，用于对基板缺陷的存在或不存在进行检查和/或检查其完成的传送而不引起显着的成本增加，并且提供一种基板处理装置有相同的解决方案：其中从现有方法接收的基板被输送用于后处理的基板承载机构包括：基板保持装置，具有一对支撑臂61,62，用于保持与矩形基板80相对的两侧;移动装置65 -68，以及用于检测基板80以产生信号的在支撑臂61,62的端部被修补的传感器70a，b。此外，基于从传感器70a，b输出的信号，确定基板缺陷的存在或不存在以及/或其传送完成的判定装置设置在前面通过的基板80的侧边缘部分上传感器70a，b在接收或传送基板80时。（C）版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2009094242A Substrate holding mechanism, substrate delivery mechanism, and substrate treating equipment 审中-公开
标题翻译：基板保持机构，基板输送机构和基板处理设备
公开(公告)号：JP2009094242A
公开(公告)日：2009-04-30
申请号：JP2007262545
申请日：2007-10-05
申请人： Ebatekku:Kk , 株式会社エバテック
发明人： ISHIHARA SHINICHIRO , ASHIDA HAJIME , WATANABE AKIRA
IPC分类号： H01L21/677
CPC分类号： H01L21/67236 , B65G49/063 , B65G49/064 , B65G49/067 , B65G2249/02 , H01L21/67706 , H01L21/67712 , H01L21/67718 , H01L21/67748 , H01L21/67751
摘要： PROBLEM TO BE SOLVED: To provide a substrate holding mechanism for securely holding and delivering a substrate.
SOLUTION: The substrate holding mechanism having a substrate holding part for holding the rectangular substrate W is provided with a plurality of substrate holding rollers 120 which are arranged in positions above the substrate holding part, which correspond to two confronted sides of the substrate W, and are rotatably pivoted by the substrate holding part and with roller driving means which rotationally drive the substrate holding rollers 120. The substrate holding roller 120 has a cylindrical part 121 and holding flanges 123a and 123b disposed in a part of an outer periphery at both end faces. The roller driving means turns the substrate holding rollers 120. Thus, holding and holding release of end edges of the substrate W by the holding flanges 123a and 123b can be switched in accordance with a turn angle.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供用于牢固地保持和输送基板的基板保持机构。解决方案：具有用于保持矩形基板W的基板保持部的基板保持机构设置有多个基板保持辊120，其布置在基板保持部上方的位置，该基板保持辊对应于基板的两个相对的侧面 W，并且由基板保持部可旋转地枢转，并且具有旋转地驱动基板保持辊120的辊驱动装置。基板保持辊120具有圆柱形部分121和设置在外周的一部分中的保持凸缘123a和123b 两个端面。辊驱动装置转动基板保持辊120.因此，可以根据转角来切换由保持凸缘123a和123b保持和保持基板W的端边缘。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2004131222A Conveyor 审中-公开
公开(公告)号：JP2004131222A
公开(公告)日：2004-04-30
申请号：JP2002296119
申请日：2002-10-09
申请人： Ebatekku:Kk , 株式会社エバテック
发明人： INO EIJI , WATANABE AKIRA , KAMIMURA NAOKI , SASAKI ASAE
IPC分类号： B65G43/00 , B65G13/04 , B65G13/11 , B65G49/07 , H01L21/677 , H01L21/68 , H02K7/08 , H02K7/14
摘要： PROBLEM TO BE SOLVED: To prevent generation of micro-powder due to friction or the like from a transmission element to transmit rotation of a motor to a roller, and unitize a roller way. SOLUTION: Both ends of each of a plurality of rollers to compose the roller way are journalled by fluid bearings, and an induction motor is directly coupled to each one shaft end to compose a conveyor unit. A frequency controllable power unit is provided at a place on the side of a supporting base to support the conveyor unit. The conveyor unit is composed to be mechanically and electrically installed/removed to/from the supporting base of the conveyor unit and the frequency controllable power unit. A plurality of motors can thus be rotated at synchronized speed. Speed is changeable by frequency change by the frequency controllable power unit. COPYRIGHT: (C)2004,JPO

4. 发明专利

JP2004076122A Plasma surface treatment method and apparatus for the same 有权
标题翻译：等离子体表面处理方法及其设备
公开(公告)号：JP2004076122A
公开(公告)日：2004-03-11
申请号：JP2002240314
申请日：2002-08-21
申请人： E Square:Kk , Ebatekku:Kk , 株式会社イー・スクエア , 株式会社エバテック
发明人： INOUE KENJI
IPC分类号： H05H1/46 , C23C16/505
摘要： PROBLEM TO BE SOLVED: To perform surface treatment, such as reforming, of a substrate to be treated without damaging the substrate by generating a uniform plasma free of microarcs under pressure approximate to the atmosphere pressure. SOLUTION: Reactive gases are jetted and supplied so as to be confined in a spacing between counter electrodes 2, through which spacing, the substrate 5 to be treated passes, from both of gas jet ports 11 and 11 disposed on the introducing side and discharging side of the substrate 5 to be treated toward the spacing. Further, the oscillation frequency of a high-frequency oscillation machine 12 for supplying a sinusoidal high-frequency voltage to the counter electrodes 2 is made to follow up the resonance frequency of a load side resonance circuit by a PLL (Phase Locked Loop) circuit 15 to prevent the distortion of the supply voltage and to suppress the generation of the microarcs by a steep noise component, thereby continuously forming the stable plasma. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：通过在近似于大气压力的压力下产生不含微孔的均匀等离子体，在不损坏基板的情况下进行待处理基板的表面处理，例如重整处理。解决方案：反应气体被喷射和供给以被限制在相对电极2之间的间隔中，待处理的基板5通过该间隔从设置在引入侧的气体喷射口11和11两者间隔开和待处理的基板5的排出侧。此外，通过PLL（锁相环）电路15使用于向对置电极2提供正弦高频电压的高频振荡器12的振荡频率跟随负载侧谐振电路的谐振频率以防止电源电压的变形，并通过陡峭的噪声成分抑制微弧的产生，从而连续地形成稳定的等离子体。版权所有（C）2004，JPO

5. 发明专利

JP2013051372A Thin film solar cell module and manufacturing method of the same 审中-公开
标题翻译：薄膜太阳能电池模块及其制造方法
公开(公告)号：JP2013051372A
公开(公告)日：2013-03-14
申请号：JP2011189747
申请日：2011-08-31
申请人： Ebatekku:Kk , 株式会社エバテック
发明人： SHOJI HIROSHI , KATAOKA RYOSUKE , INO MASAHIRO
IPC分类号： H01L31/042 , H01L31/04
CPC分类号： Y02B10/12 , Y02E10/50
摘要： PROBLEM TO BE SOLVED: To provide a thin film solar cell module in which each solar cell can have an appearance of an improved design by provision of openings having various sizes and operate around the maximum power point, and provide a manufacturing method of the thin film solar cell module.SOLUTION: A thin film solar cell module 1 comprises a plurality of solar cells 2 each formed by division of a power generation layer including a photoelectric conversion layer 13 and a back electrode layer 14 which are laminated on a translucent insulation substrate 11. At least one solar cell 2 includes one or more number of openings 4 penetrating the photoelectric conversion layer 13 and the back electrode layer 14. An area obtained by subtraction of an area of the one or more number of openings 4 from an area of the power generation layer is equal to each other among all the solar cells. And a manufacturing method of the thin film solar cell module 1 is provided.
摘要翻译：要解决的问题：提供一种薄膜太阳能电池模块，其中每个太阳能电池可以通过提供具有各种尺寸的开口具有改进设计的外观并围绕最大功率点操作，并且提供一种制造方法薄膜太阳能电池模块。解决方案：薄膜太阳能电池模块1包括多个太阳能电池2，每个太阳能电池2通过分开层叠在半透明绝缘基板11上的包括光电转换层13和背面电极层14的发电层而形成。至少一个太阳能电池2包括穿透光电转换层13和背面电极层14的一个或多个开口4.通过从电力区域中减去一个或多个开口4的面积而获得的面积所有太阳能电池中的发电层彼此相等。并且提供薄膜太阳能电池模块1的制造方法。版权所有（C）2013，JPO＆INPIT

6. 发明专利

JP2009267260A Thin film manufacturing apparatus, and thin film solar cell manufacturing apparatus 审中-公开
标题翻译：薄膜制造设备和薄膜太阳能电池制造设备
公开(公告)号：JP2009267260A
公开(公告)日：2009-11-12
申请号：JP2008117732
申请日：2008-04-28
申请人： Ebatekku:Kk , 株式会社エバテック
发明人： SETSUHARA YUICHI , INO EIJI , ISHIHARA SHUNICHI , WATANABE AKIRA
IPC分类号： H01L21/205 , C23C16/44 , C23C16/54 , H01L31/04
CPC分类号： Y02E10/50
摘要： PROBLEM TO BE SOLVED: To provide a thin film manufacturing apparatus that eliminates the need to attach/detach a substrate during transportation between chambers. SOLUTION: The apparatus which manufactures a plurality of thin films laminated on the substrate includes a plurality of film forming chambers 131 to 136 having openings, a substrate holding mechanism 30B having a plate-shaped member 33 mounted on an opening to close the opening and a substrate fixing mechanism 34 fixing the substrate to a surface of the plate-shaped member positioned in the film forming chamber during mounting, and a moving mechanism 30A moving the substrate holding mechanism 30B between the openings of the plurality of film forming chambers 131 to 136. The apparatus can move the film forming chambers in order in the state the substrate is held by the substrate holding mechanism 30B, so the substrate need not be attached/detached during the transportation. Consequently, the manufacturing efficiency is improved and faults of the apparatus are decreased as much as possible. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种在室之间运输期间不需要附着/拆卸基板的薄膜制造装置。＆lt; P＆gt;解决方案：制造层叠在基板上的多个薄膜的装置包括具有开口的多个成膜室131〜136，具有安装在开口上的板状部件33的基板保持机构30B，开口部以及在安装时将基板固定在位于成膜室的板状部件的表面的基板固定机构34以及将基板保持机构30B移动到多个成膜室131的开口之间的移动机构30A 该装置可以在基板被基板保持机构30B保持的状态下依次移动成膜室，因此在运输期间不需要附接/拆卸基板。因此，制造效率提高，装置的故障尽可能地减少。版权所有（C）2010，JPO＆INPIT

7. 发明专利

JP2009123906A Plasma treatment equipment 有权
标题翻译：等离子体处理设备
公开(公告)号：JP2009123906A
公开(公告)日：2009-06-04
申请号：JP2007296118
申请日：2007-11-14
申请人： Ebatekku:Kk , Emd:Kk , 株式会社イー・エム・ディー , 株式会社エバテック
发明人： SETSUHARA YUICHI , EBE AKINORI , INO EIJI , ISHIHARA SHINICHIRO , ASHIDA HAJIME , WATANABE AKIRA
IPC分类号： H01L21/205 , C23C16/509 , H05H1/46
CPC分类号： C23C16/503 , C03C17/22 , C03C2217/28 , C03C2218/153 , C23C16/24 , C23C16/509 , H01J37/321 , H01J37/3211 , H01J37/32715
摘要： PROBLEM TO BE SOLVED: To provide plasma treatment equipment having the excellent utilization efficiency and uniformity of plasma and having high productivity in the equipment plasma-treating a plane-shaped base body to be treated. SOLUTION: The plasma treatment equipment has a vacuum vessel 11, one or a plurality of antenna supporting sections (plasma-generating means supporting sections) 12 fitted so as to be projected into the internal space 111 of the vacuum vessel 11 and high-frequency antennas (plasma-generating means) 13 fitted to each of the antenna supporting sections 12. The plasma treatment equipment further has a pair of base-body holding sections 16 being fitted while holding the antenna supporting sections 12 in the vacuum vessel 11 and holding the plane-shaped base bodies 21 to be treated. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供具有优异的等离子体利用效率和均匀性并且在等离子体处理要处理的平面状基体的设备中具有高生产率的等离子体处理设备。解决方案：等离子体处理设备具有真空容器11，一个或多个天线支撑部分（等离子体产生装置支撑部分）12，其被安装成突出到真空容器11的内部空间111中并具有高的固定在每个天线支撑部分12上的等离子体天线（等离子体产生装置）13。等离子体处理设备还具有一对基体保持部分16，同时将天线支撑部分12保持在真空容器11中，保持待处理的平面状基体21。版权所有（C）2009，JPO＆INPIT

8. 发明专利

JP2009272506A Membrane manufacturing device, solar cell manufacturing device, membrane manufacturing method and solar cell manufacturing method 审中-公开
标题翻译：膜制造装置，太阳能电池制造装置，膜制造方法和太阳能电池制造方法
公开(公告)号：JP2009272506A
公开(公告)日：2009-11-19
申请号：JP2008122898
申请日：2008-05-09
申请人： Ebatekku:Kk , 株式会社エバテック
发明人： SETSUHARA YUICHI , INO EIJI , ISHIHARA SHUNICHI , WATANABE AKIRA
IPC分类号： H01L21/205 , C23C16/44 , C23C16/50 , H01L21/677 , H01L31/04
CPC分类号： Y02E10/50
摘要： PROBLEM TO BE SOLVED: To provide a membrane manufacturing device capable of preventing each of layers of a membrane laminate from being contaminated by material of the other layers. SOLUTION: A membrane manufacturing device includes: a capacitive coupling plasma film forming chamber 11 for generating plasma according to a capacitive coupling system; an inductive coupling plasma film forming chamber 12 for generating plasma according to an inductive coupling system; a substrate feeding chamber 15 internally including a substrate feeding means 152 for feeding a substrate S between the capacitive coupling plasma film forming chamber 11 and the inductive coupling plasma film forming means 12; and a feeding pressure switching means (pressure adjustment gas supply port 144 and exhaustion device 155) for switching pressure inside the substrate feeding chamber 15, wherein pressure inside the substrate feeding chamber 15 is set to a value close to pressure in capacitive coupling plasma generation when feeding in or feeding out the substrate between the capacitive coupling plasma film forming chamber 11 and the substrate feeding chamber 15, and is set to a value close to pressure in inductive coupling plasma generation when feeding in or feeding out the substrate between the inductive coupling plasma film forming chamber 12 and the substrate feeding chamber 15. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供能够防止膜层压体的各层被其他层的材料污染的膜制造装置。解决方案：膜制造装置包括：用于根据电容耦合系统产生等离子体的电容耦合等离子体膜形成室11; 用于根据电感耦合系统产生等离子体的电感耦合等离子体膜形成室12; 内部包括用于在电容耦合等离子体膜形成室11和感应耦合等离子体膜形成装置12之间馈送基板S的基板馈送装置152的基板馈送室15; 以及用于切换基板供给室15内部的压力的供给压力切换装置（压力调节气体供给口144和排气装置155），其中，在电容耦合等离子体产生时，将基板供给室15内的压力设定为接近压力的值，在电容耦合等离子体膜形成室11和基板供给室15之间馈送或馈送基板，并且在感应耦合等离子体产生期间被设置为接近压力的值，当在感应耦合等离子体成膜室12和基板供给室15.版权所有（C）2010，JPO＆INPIT

9. 发明专利

JP2009267261A Thin film manufacturing apparatus, thin film manufacturing method, thin film solar cell manufacturing apparatus, and thin film solar cell manufacturing method 审中-公开
标题翻译：薄膜制造设备，薄膜制造方法，薄膜太阳能电池制造设备和薄膜太阳能电池制造方法
公开(公告)号：JP2009267261A
公开(公告)日：2009-11-12
申请号：JP2008117733
申请日：2008-04-28
申请人： Ebatekku:Kk , Yuichi Setsuhara , 株式会社エバテック , 裕一節原
发明人： SETSUHARA YUICHI , INO EIJI , ISHIHARA SHUNICHI , WATANABE AKIRA
IPC分类号： H01L21/205 , C23C16/455 , C23C16/509 , H01L31/04
CPC分类号： Y02E10/50
摘要： PROBLEM TO BE SOLVED: To provide a thin film manufacturing apparatus capable of suppressing mixing of an undesired impurity. SOLUTION: The thin film manufacturing apparatus includes a vacuum container 11, a high-frequency antenna 13 provided in the vacuum container 11, a substrate holding unit 19 provided in the vacuum container 11 apart from the high frequency antenna 13, a plasma generating gas supply port 14 provided nearby the high frequency antenna 13, a main material gas supply port 15 provided between the plasma generating gas supply port 14 and substrate S, and doping gas supply ports 16 and 17 provided between the plasma generating gas supply port 14 and substrate S and between the main material gas supply port 15 and substrate S. The doping gas supply ports 16 and 17 are closest to the substrate S and then a doping gas is prevented from flowing backward to the antenna side, so a doping atom is prevented from sticking on the antenna etc. Consequently, the mixing of an undesired doping material as an impurity is suppressed. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供能够抑制不期望的杂质的混合的薄膜制造装置。解决方案：薄膜制造装置包括真空容器11，设置在真空容器11中的高频天线13，设置在远离高频天线13的真空容器11中的基板保持单元19，等离子体设置在高频天线13附近的发生气体供给口14，设置在等离子体产生气体供给口14和基板S之间的主材料气体供给口15以及设置在等离子体产生气体供给口14之间的掺杂气体供给口16,17 基板S和主材料气体供给口15与基板S之间。掺杂气体供给口16,17最靠近基板S，然后防止掺杂气体向后流向天线侧，因此掺杂原子为防止粘附在天线等上。因此，抑制了作为杂质的不需要的掺杂材料的混合。版权所有（C）2010，JPO＆INPIT

10. 发明专利

JP2009117644A Substrate treatment device 审中-公开
标题翻译：基板处理装置
公开(公告)号：JP2009117644A
公开(公告)日：2009-05-28
申请号：JP2007289680
申请日：2007-11-07
申请人： Ebatekku:Kk , 株式会社エバテック
发明人： INO EIJI , ISHIHARA SHINICHIRO , HIRAI MASATO
IPC分类号： H01L21/205 , C23C16/44
摘要： PROBLEM TO BE SOLVED: To provide a substrate treatment device that can prevent the mixture of gas between treatment chambers without greatly increasing its cost.
SOLUTION: The substrate treatment device includes the plurality of treatment chambers 240 for applying predetermined treatment onto a substrate W, a preheating chamber 230 for preheating the substrate W, a cooling chamber 250 for cooling the substrate W, and a common carrying chamber 220 for carrying the substrate W between the chambers, the treatment chambers 240 being connected via a gate valve 241 to the common carrying chamber 220 in a communicative manner, the preheating chamber 230 and the cooling chamber 250 being connected to the common carrying chamber 220 in a consistently communicative state. Herein, purge gas introducing means 251, 282, 280 and exhaust means 231, 222, 401 are provided for introducing purge gas into the cooling chamber 250 and for passing the purge gas introduced into the cooling chamber 250, through the common carrying chamber 220 and then exhausting it to the outside, respectively.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：解决的问题：提供能够防止处理室之间的气体混合而不会大大增加其成本的基板处理装置。解决方案：基板处理装置包括用于对基板W施加预定处理的多个处理室240，用于预热基板W的预热室230，用于冷却基板W的冷却室250和公共承载室 220，用于在室之间承载基板W，处理室240以通信方式经由闸阀241连接到公共运输室220，预热室230和冷却室250连接到公共运输室220 一贯的交际状态这里，提供吹扫气体引入装置251,282,280和排气装置231,222,401，用于将净化气体引入冷却室250中，并将引入冷却室250的净化气体通过公共运输室220和然后分别将其排出到外面。版权所有（C）2009，JPO＆INPIT

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