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1. 发明专利

JP2009117644A Substrate treatment device 审中-公开
标题翻译：基板处理装置
公开(公告)号：JP2009117644A
公开(公告)日：2009-05-28
申请号：JP2007289680
申请日：2007-11-07
申请人： Ebatekku:Kk , 株式会社エバテック
发明人： INO EIJI , ISHIHARA SHINICHIRO , HIRAI MASATO
IPC分类号： H01L21/205 , C23C16/44
摘要： PROBLEM TO BE SOLVED: To provide a substrate treatment device that can prevent the mixture of gas between treatment chambers without greatly increasing its cost.
SOLUTION: The substrate treatment device includes the plurality of treatment chambers 240 for applying predetermined treatment onto a substrate W, a preheating chamber 230 for preheating the substrate W, a cooling chamber 250 for cooling the substrate W, and a common carrying chamber 220 for carrying the substrate W between the chambers, the treatment chambers 240 being connected via a gate valve 241 to the common carrying chamber 220 in a communicative manner, the preheating chamber 230 and the cooling chamber 250 being connected to the common carrying chamber 220 in a consistently communicative state. Herein, purge gas introducing means 251, 282, 280 and exhaust means 231, 222, 401 are provided for introducing purge gas into the cooling chamber 250 and for passing the purge gas introduced into the cooling chamber 250, through the common carrying chamber 220 and then exhausting it to the outside, respectively.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：解决的问题：提供能够防止处理室之间的气体混合而不会大大增加其成本的基板处理装置。解决方案：基板处理装置包括用于对基板W施加预定处理的多个处理室240，用于预热基板W的预热室230，用于冷却基板W的冷却室250和公共承载室 220，用于在室之间承载基板W，处理室240以通信方式经由闸阀241连接到公共运输室220，预热室230和冷却室250连接到公共运输室220 一贯的交际状态这里，提供吹扫气体引入装置251,282,280和排气装置231,222,401，用于将净化气体引入冷却室250中，并将引入冷却室250的净化气体通过公共运输室220和然后分别将其排出到外面。版权所有（C）2009，JPO＆INPIT

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