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    • 4. 发明申请
    • Optimized trench power MOSFET with integrated schottky diode
    • 具有集成肖特基二极管的优化沟槽功率MOSFET
    • US20050199918A1
    • 2005-09-15
    • US10801499
    • 2004-03-15
    • Daniel CalafutChristopher Rexer
    • Daniel CalafutChristopher Rexer
    • H01L29/80
    • H01L29/7813H01L29/0696H01L29/407H01L29/7806H01L29/8725
    • In accordance with the present invention, a monolithically integrated structure combines a field effect transistor and a Schottky structure in an active area of a semiconductor substrate. The field effect transistor includes a first trench extending into the substrate and substantially filled by conductive material forming a gate electrode of the field effect transistor. A pair of doped source regions are positioned adjacent to and on opposite sides of the trench and inside a doped body region. The Schottky structure includes a pair of adjacent trenches extending into the substrate. Each of the pair of adjacent trenches is substantially filled by a conductive material which is separated from trench side-walls by a thin layer of dielectric. The Schottky structure consumes 2.5% to 5.0% of the active area, and the field effect transistor consumes the remaining portion of the active area.
    • 根据本发明,单片集成结构在半导体衬底的有源区域中组合场效应晶体管和肖特基结构。 场效应晶体管包括延伸到衬底中并且基本上由形成场效应晶体管的栅电极的导电材料填充的第一沟槽。 一对掺杂源极区域邻近沟槽的相对侧并且位于掺杂体区域的内侧。 肖特基结构包括延伸到衬底中的一对相邻沟槽。 一对相邻沟槽中的每一个基本上由导电材料填充,导电材料通过薄的电介质层与沟槽侧壁分离。 肖特基结构消耗有源面积的2.5%至5.0%,场效应晶体管消耗有源区的剩余部分。