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1. 发明申请

US20160334389A1 METHOD FOR SCREENING CANCER PREVENTION AGENT OR ANTICANCER AGENT USING MORPHOLOGICAL CHARACTERISTICS OF LUTERIAL 审中-公开
标题翻译：用于筛选癌症预防剂或抗原药物的方法，使用LUTERIAL的形态特征
公开(公告)号：US20160334389A1
公开(公告)日：2016-11-17
申请号：US15111183
申请日：2015-01-14
申请人： Won Cheol CHOI , Young Ah KWON , Suk Hoon CHOI , Chang Hoon CHOI
发明人： Won Cheol Choi , Young Ah Kwon , Sung Pil Kwon , Hyun Jung Jun , Suk Hoon Choi , Chang Hoon Choi
IPC分类号： G01N33/50 , G01N27/26
CPC分类号： G01N33/5026 , G01N27/26 , G01N33/5011 , G01N33/5044 , G01N33/5076 , G01N33/5097 , G01N33/5432 , G01N2500/10
摘要： The present invention relates to a method for screening an anticancer agent or a cancer preventive agent, comprising the steps of: (a) isolating mutant luterial or normal luterial from a body fluid extracted from a patient or a normal person; (b) treating the isolated mutant luterial with anticancer agent candidates or cancer preventive agent candidates; and (c) either selecting, as the anticancer agent, a candidate that reduces the size or changes the shape or increases the mobility of the mutant luterial, compared to the control mutant luterial upon treatment with the candidate, or selecting, as the cancer preventive agent, a candidate that suppresses the increase in size, minimizes the change in shape or maintains the mobility of luterial, compared to the control luterial, upon treatment with the candidate.
摘要翻译：本发明涉及一种抗癌剂或癌症防治剂的筛选方法，其特征在于，包括以下步骤：（a）从患者或正常人提取的体液中分离突变体镥或正常氘; （b）用抗癌剂候选物或癌症预防剂候选物处理分离的突变体镥; 或者选择作为抗癌药物的候选物，与候选物处理相比，与对照突变体氘代相比，选择减少突变体氘浓度的大小或改变形状或增加突变体的流动性的候选物，或选择作为预防癌症代理人，抑制大小增加的候选人，与候选人治疗相比，与控制遏制相比，可以最大限度地减少形式变化或保持怠惰的流动性。

2. 发明申请

US20160169870A1 METHOD FOR DIAGNOSIS OF DISEASES USING MORPHOLOGICAL CHARACTERISTICS OF LUTERIAL 审中-公开
标题翻译：使用牙齿形态学特征诊断疾病的方法
公开(公告)号：US20160169870A1
公开(公告)日：2016-06-16
申请号：US14904507
申请日：2014-01-14
申请人： Young Ah KWON , Won Cheol CHOI , Suk Hoon CHOI , Chang Hoon CHOI
发明人： Young Ah Kwon , Won Cheol Choi , Suk Hoon Choi , Chang Hoon Choi , Sung Pil Kwon , Hyun Jung Jun
IPC分类号： G01N33/50
CPC分类号： G01N33/5091 , A61K35/00 , C12N5/00 , G01N2800/50 , G01N2800/52 , G01N2800/7028
摘要： The present invention relates to a method for diagnosis of diseases using morphological characteristics of luterial which exists in blood. According to the present invention, morphological characteristics of luterial, such as the number, size or shape, and movement (nano-tracking speed) thereof change according to the kind and progress of a disease, and thus diagnosis and prognosis of a disease (particularly, cancer) can be effectively determined by observing and measuring the characteristics of luterial in the blood.
摘要翻译：本发明涉及使用存在于血液中的氘代形态学特征来诊断疾病的方法。根据本发明，根据疾病的种类和进展，诸如数量，大小或形状以及运动（纳米跟踪速度）的瞳孔的形态学特征因疾病的诊断和预后而变化（特别是，癌症）可以通过观察和测量血液中氘血的特征来有效地确定。

3. 发明申请

US20130175445A1 MICROELECTRONIC SUBSTRATE INSPECTION EQUIPMENT USING HELIUM ION MICROSCOPY 有权
标题翻译：微电子基板检测设备使用HELIUM离子显微镜
公开(公告)号：US20130175445A1
公开(公告)日：2013-07-11
申请号：US13596644
申请日：2012-08-28
申请人： Min-Kook Kim , Woo-Seok Ko , Yu-Sin Yang , Sang-Kil Lee , Chang-Hoon Choi
发明人： Min-Kook Kim , Woo-Seok Ko , Yu-Sin Yang , Sang-Kil Lee , Chang-Hoon Choi
IPC分类号： H01J37/20
CPC分类号： H01J37/265 , H01J37/08 , H01J2237/002 , H01J2237/006 , H01J2237/0807
摘要： Microelectronic substrate inspection equipment includes a gas container which contains helium gas, a helium ion generator which is disposed in the gas container and converts the helium gas into helium ions and a wafer stage which is disposed under the gas container and on which a substrate to be inspected is placed. The equipment further includes a secondary electron detector which is disposed above the wafer stage and detects electrons generated from the substrate, a compressor which receives first gaseous nitrogen from a continuous nitrogen supply device and compresses the received first gaseous nitrogen into liquid nitrogen, a liquid nitrogen dewar which is connected to the compressor and stores the liquid nitrogen, and a cooling device that is coupled to the helium ion generator. The cooling device is disposed on the gas container, and cools the helium ion generator by vaporizing the liquid nitrogen. Related methods are also disclosed.
摘要翻译：微电子基板检查设备包括含有氦气的气体容器，设置在气体容器中并将氦气转换为氦离子的氦离子发生器和设置在气体容器下方的晶片载台，检查被放置。该设备还包括二次电子检测器，其设置在晶片台上方并检测从基板产生的电子;压缩机，其接收来自连续氮供应装置的第一气态氮并将接收到的第一气态氮压缩成液态氮;液氮连接到压缩机并储存液氮的杜瓦瓶，以及耦合到氦离子发生器的冷却装置。冷却装置设置在气体容器上，并通过蒸发液氮来冷却氦离子发生器。还公开了相关方法。

4. 发明授权

US07446555B2 Apparatus to inspect TFT substrate and method of inspecting TFT substrate 失效
标题翻译： TFT基板的检查装置及TFT基板的检查方法
公开(公告)号：US07446555B2
公开(公告)日：2008-11-04
申请号：US11478683
申请日：2006-07-03
申请人： Chang-hoon Choi , Hee-soo Pyun , Hwa-sub Shim , Ho-seok Choi , Dong-seok Baek
发明人： Chang-hoon Choi , Hee-soo Pyun , Hwa-sub Shim , Ho-seok Choi , Dong-seok Baek
IPC分类号： G01R31/00 , G01R31/305
CPC分类号： G09G3/006 , G09G3/3648
摘要： An apparatus to inspect a TFT substrate including a gate line, a data line crossed with the gate line and insulated from the gate line, a TFT disposed at an intersection of the gate line and the data line, and a pixel electrode connected to the TFT includes a vacuum chamber, a stage disposed in the vacuum chamber and on which the TFT substrate is settled, an electron beam generator disposed over the stage, a gate driving part to apply a gate-on voltage to the gate line to turn on the TFT, a signal detector connected to the data line and to sense an electric signal from the pixel electrode, and a controller to control the gate driving part and the electron beam generator so that a electron beam is irradiated to the pixel electrode while the TFT is turned on.
摘要翻译：一种用于检查TFT基板的装置，包括栅极线，与栅极线交叉并与栅极线绝缘的数据线，设置在栅极线和数据线的交叉点处的TFT以及连接到TFT的像素电极包括真空室，设置在真空室中并在其上沉积TFT基板的台，布置在载物台上的电子束发生器，栅极驱动部分，用于向栅极线施加栅极导通以导通TFT 连接到数据线并且感测来自像素电极的电信号的信号检测器，以及控制器，用于控制栅极驱动部分和电子束发生器，使得电子束在TFT转动时照射到像素电极上。

5. 发明申请

US20080149830A1 AMELIORATING CHARGE TRAP IN INSPECTING SAMPLES USING SCANNING ELECTRON MICROSCOPE 审中-公开
标题翻译：使用扫描电子显微镜检查样品中的电荷捕捉
公开(公告)号：US20080149830A1
公开(公告)日：2008-06-26
申请号：US11924673
申请日：2007-10-26
申请人： Dong Seok BAEK , Chang Hoon CHOI , Jeong Woo HYUN , Hee Soo PYUN , Sung Wook KANG
发明人： Dong Seok BAEK , Chang Hoon CHOI , Jeong Woo HYUN , Hee Soo PYUN , Sung Wook KANG
IPC分类号： G21K5/00
CPC分类号： H01J37/28 , H01J37/026 , H01J2237/0044
摘要： A sample inspection apparatus to inspect a sample using a scanning electron microscope irradiates the sample with electron beams. The sample inspection apparatus includes a charge collecting unit that collects charges generated from a surface of the sample due to irradiation thereof by the electron beams. The cost required for sample inspection is reduced, and an image having high quality is provided by the sample inspection apparatus.
摘要翻译：使用扫描电子显微镜检查样品的样品检查装置用电子束照射样品。样本检查装置包括：电荷收集单元，其收集由于电子束的照射而从样品的表面产生的电荷。样品检查所需的成本降低，并且由样品检查装置提供具有高质量的图像。

6. 发明申请

US20070278425A1 Method of operating emitter for electron-beam projection lithography system 审中-公开
标题翻译：操作电子束投影光刻系统的发射器的方法
公开(公告)号：US20070278425A1
公开(公告)日：2007-12-06
申请号：US11882927
申请日：2007-08-07
申请人： In-kyeong Yoo , Chang-wook Moon , Chang-hoon Choi
发明人： In-kyeong Yoo , Chang-wook Moon , Chang-hoon Choi
IPC分类号： G21K5/04
CPC分类号： H01J37/073 , H01J2237/31779
摘要： An emitter for an electron-beam projection lithography system includes a photoconductor substrate, an insulating layer formed on a front surface of the photoconductor substrate, a gate electrode layer formed on the insulating layer, and a base electrode layer formed on a rear surface of the photoconductor substrate and formed of a transparent conductive material. In operation of the emitter, a voltage is applied between the base electrode and the gate electrode layer, light is projected onto a portion of the photoconductor substrate to convert the portion of the photoconductor substrate into a conductor such that electrons are emitted only from the partial portion where the light is projected. Since the emitter can partially emit electrons, partial correcting, patterning or repairing of a subject electron-resist can be realized.
摘要翻译：用于电子束投影光刻系统的发射器包括：感光体基板，形成于感光体基板前表面的绝缘层，形成在绝缘层上的栅极电极层，以及形成在绝缘层的背面上的基极层感光体基板并由透明导电材料形成。在发射极的工作中，在基极和栅极电极层之间施加电压，光被投射到光电导体基底的一部分上，以将感光体基底的一部分转换为导体，使电子仅从部分投射光的部分。由于发射体可以部分地发射电子，所以可以实现对象电子抗蚀剂的部分校正，图案化或修复。

7. 发明授权

US07256406B2 Emitter for electron-beam projection lithography system, and method of manufacturing and operating the emitter 有权
标题翻译：用于电子束投影光刻系统的发射体，以及制造和操作发射极的方法
公开(公告)号：US07256406B2
公开(公告)日：2007-08-14
申请号：US10962467
申请日：2004-10-13
申请人： In-kyeong Yoo , Chang-wook Moon , Chang-hoon Choi
发明人： In-kyeong Yoo , Chang-wook Moon , Chang-hoon Choi
IPC分类号： G21K5/10
CPC分类号： H01J37/073 , H01J2237/31779
摘要： An emitter for an electron-beam projection lithography system includes a photoconductor substrate, an insulating layer formed on a front surface of the photoconductor substrate, a gate electrode layer formed on the insulating layer, and a base electrode layer formed on a rear surface of the photoconductor substrate and formed of a transparent conductive material. In operation of the emitter, a voltage is applied between the base electrode and the gate electrode layer, light is projected onto a portion of the photoconductor substrate to convert the portion of the photoconductor substrate into a conductor such that electrons are emitted only from the partial portion where the light is projected. Since the emitter can partially emit electrons, partial correcting, patterning or repairing of a subject electron-resist can be realized.
摘要翻译：用于电子束投影光刻系统的发射器包括：感光体基板，形成于感光体基板前表面的绝缘层，形成在绝缘层上的栅极电极层，以及形成在绝缘层的背面上的基极层感光体基板并由透明导电材料形成。在发射极的工作中，在基极和栅极电极层之间施加电压，光被投射到光电导体基底的一部分上，以将感光体基底的一部分转换为导体，使电子仅从部分投射光的部分。由于发射体可以部分地发射电子，所以可以实现对象电子抗蚀剂的部分校正，图案化或修复。

8. 发明授权

US07189981B2 Electromagnetic focusing method for electron-beam lithography system 失效
标题翻译：电子束光刻系统的电磁聚焦方法
公开(公告)号：US07189981B2
公开(公告)日：2007-03-13
申请号：US11205148
申请日：2005-08-17
申请人： Chang-wook Moon , Sidorkin Vadim , Chang-hoon Choi
发明人： Chang-wook Moon , Sidorkin Vadim , Chang-hoon Choi
IPC分类号： H01J37/302 , H01J1/30
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31793
摘要： A method for projecting a predetermined pattern of an electron beam from an emitter to a wafer in a vacuum chamber of an electron-beam lithography system is provided. An initial condition for performing an electromagnetic focusing is first set and outspread phenomenon of the electron beam, which is caused by an initial emitting velocity difference and an initial emitting angle difference between electrons emitted from the emitter, is corrected. Then, a shift of the electron beam, which is caused when an electric field is not in parallel with a magnetic field, is corrected and a shift of the electron beam, which is caused by a gradient of the magnetic field, is corrected, after which an increase of a beam diameter of the electron beam, which is caused by Coulomb-interaction between the electrons emitted from the emitter, is corrected. Then, it is determined if a focusing error is within a range of an allowable error. When it is determined the focusing error is out of the range of the allowable error, the above operations are repeated.
摘要翻译：提供了一种在电子束光刻系统的真空室中将来自发射极的电子束的预定图案投影到晶片的方法。首先设置用于执行电磁聚焦的初始条件，并校正由初始发射速度差和从发射器发射的电子之间的初始发射角差引起的电子束的扩展现象。然后，校正当电场不与磁场平行时引起的电子束的偏移，并且由磁场的梯度引起的电子束的偏移被校正校正了从发射极发射的电子之间的库仑相互作用引起的电子束的光束直径的增加。然后，确定聚焦误差是否在允许误差的范围内。当确定聚焦误差在允许误差的范围之外时，重复上述操作。

9. 发明申请

US20060151720A1 Electromagnetic focusing method for electron-beam lithography system 失效
标题翻译：电子束光刻系统的电磁聚焦方法
公开(公告)号：US20060151720A1
公开(公告)日：2006-07-13
申请号：US11205148
申请日：2005-08-17
申请人： Chang-wook Moon , Sidorkin Vadim , Chang-hoon Choi
发明人： Chang-wook Moon , Sidorkin Vadim , Chang-hoon Choi
IPC分类号： H01J37/302
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31793
摘要： A method for projecting a predetermined pattern of an electron beam from an emitter to a wafer in a vacuum chamber of an electron-beam lithography system is provided. An initial condition for performing an electromagnetic focusing is first set and outspread phenomenon of the electron beam, which is caused by an initial emitting velocity difference and an initial emitting angle difference between electrons emitted from the emitter, is corrected. Then, a shift of the electron beam, which is caused when an electric field is not in parallel with a magnetic field, is corrected and a shift of the electron beam, which is caused by a gradient of the magnetic field, is corrected, after which an increase of a beam diameter of the electron beam, which is caused by Coulomb-interaction between the electrons emitted from the emitter, is corrected. Then, it is determined if a focusing error is within a range of an allowable error. When it is determined the focusing error is out of the range of the allowable error, the above operations are repeated.
摘要翻译：提供了一种在电子束光刻系统的真空室中将来自发射极的电子束的预定图案投影到晶片的方法。首先设置用于执行电磁聚焦的初始条件，并校正由初始发射速度差和从发射器发射的电子之间的初始发射角差引起的电子束的扩展现象。然后，校正当电场不与磁场平行时引起的电子束的偏移，并且由磁场的梯度引起的电子束的偏移被校正校正了从发射极发射的电子之间的库仑相互作用引起的电子束的光束直径的增加。然后，确定聚焦误差是否在允许误差的范围内。当确定聚焦误差在允许误差的范围之外时，重复上述操作。

10. 发明授权

US06425994B1 Process chamber including stage having improved base and substrate mounting member 失效
标题翻译：处理室包括具有改进的基底和基底安装构件的台阶
公开(公告)号：US06425994B1
公开(公告)日：2002-07-30
申请号：US09433631
申请日：1999-11-03
申请人： Chang-Hoon Choi , Man-Jong Park , In-Won Lee
发明人： Chang-Hoon Choi , Man-Jong Park , In-Won Lee
IPC分类号： C23C1434
CPC分类号： H01L21/67103 , C23C14/50 , C23C16/4583 , H01J2237/2001
摘要： A process chamber for processing a substrate by conducting plasma enhanced chemical vapor deposition or sputtering includes a stage. The stage has a main base member that is constructed to have projections and a recessed portion between the projections, and a substrate mounting member which is constructred to fit between the projections of the main base member and such that the a portion of the substrate mounting member is located within the recessed portion and a portion of the substrate mounting member protrudes from the main base member. The substrate mounting member is easily removed from the main base member while also being reliably fixed and positioned in the main base member by the projections. As a result of this construction, the substrate mounting member can be removed from the process chamber independently of the main base member and in a manner similar to how the substrate is removed after processing.
摘要翻译：用于通过等离子体增强化学气相沉积或溅射处理衬底的处理室包括阶段。台架具有构造成在突起之间具有突出部和凹部的主基部构件，以及基板安装构件，其构造成配合在主基底构件的突起之间，使得基板安装构件的一部分位于凹部内，并且基板安装部件的一部分从主基部件突出。基板安装部件也可以从主基体部件被容易地移除，同时通过突起可靠地固定并定位在主基体部件中。作为这种结构的结果，基板安装构件可以独立于主基底构件从处理室移除，并且以类似于处理之后的基板被去除的方式。

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