专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20050077833A1 Emitter for electron-beam projection lithography system, and method of manufacturing and operating the emitter 有权
标题翻译：用于电子束投影光刻系统的发射体，以及制造和操作发射极的方法
公开(公告)号：US20050077833A1
公开(公告)日：2005-04-14
申请号：US10962467
申请日：2004-10-13
申请人： In-kyeong Yoo , Chang-wook Moon , Chang-hoon Choi
发明人： In-kyeong Yoo , Chang-wook Moon , Chang-hoon Choi
IPC分类号： G03F7/20 , H01J1/312 , H01J9/02 , H01J37/073 , H01J37/305 , H01L21/027 , H01J7/24 , H05B31/26
CPC分类号： H01J37/073 , H01J2237/31779
摘要： An emitter for an electron-beam projection lithography system includes a photoconductor substrate, an insulating layer formed on a front surface of the photoconductor substrate, a gate electrode layer formed on the insulating layer, and a base electrode layer formed on a rear surface of the photoconductor substrate and formed of a transparent conductive material. In operation of the emitter, a voltage is applied between the base electrode and the gate electrode layer, light is projected onto a portion of the photoconductor substrate to convert the portion of the photoconductor substrate into a conductor such that electrons are emitted only from the partial portion where the light is projected. Since the emitter can partially emit electrons, partial correcting, patterning or repairing of a subject electron-resist can be realized.
摘要翻译：用于电子束投影光刻系统的发射器包括：感光体基板，形成于感光体基板前表面的绝缘层，形成在绝缘层上的栅极电极层，以及形成在绝缘层的背面上的基极层感光体基板并由透明导电材料形成。在发射极的工作中，在基极和栅极电极层之间施加电压，光被投射到光电导体基底的一部分上，以将感光体基底的一部分转换为导体，使电子仅从部分投射光的部分。由于发射体可以部分地发射电子，所以可以实现对象电子抗蚀剂的部分校正，图案化或修复。

2. 发明申请

US20070278425A1 Method of operating emitter for electron-beam projection lithography system 审中-公开
标题翻译：操作电子束投影光刻系统的发射器的方法
公开(公告)号：US20070278425A1
公开(公告)日：2007-12-06
申请号：US11882927
申请日：2007-08-07
申请人： In-kyeong Yoo , Chang-wook Moon , Chang-hoon Choi
发明人： In-kyeong Yoo , Chang-wook Moon , Chang-hoon Choi
IPC分类号： G21K5/04
CPC分类号： H01J37/073 , H01J2237/31779
摘要： An emitter for an electron-beam projection lithography system includes a photoconductor substrate, an insulating layer formed on a front surface of the photoconductor substrate, a gate electrode layer formed on the insulating layer, and a base electrode layer formed on a rear surface of the photoconductor substrate and formed of a transparent conductive material. In operation of the emitter, a voltage is applied between the base electrode and the gate electrode layer, light is projected onto a portion of the photoconductor substrate to convert the portion of the photoconductor substrate into a conductor such that electrons are emitted only from the partial portion where the light is projected. Since the emitter can partially emit electrons, partial correcting, patterning or repairing of a subject electron-resist can be realized.
摘要翻译：用于电子束投影光刻系统的发射器包括：感光体基板，形成于感光体基板前表面的绝缘层，形成在绝缘层上的栅极电极层，以及形成在绝缘层的背面上的基极层感光体基板并由透明导电材料形成。在发射极的工作中，在基极和栅极电极层之间施加电压，光被投射到光电导体基底的一部分上，以将感光体基底的一部分转换为导体，使电子仅从部分投射光的部分。由于发射体可以部分地发射电子，所以可以实现对象电子抗蚀剂的部分校正，图案化或修复。

3. 发明授权

US07256406B2 Emitter for electron-beam projection lithography system, and method of manufacturing and operating the emitter 有权
标题翻译：用于电子束投影光刻系统的发射体，以及制造和操作发射极的方法
公开(公告)号：US07256406B2
公开(公告)日：2007-08-14
申请号：US10962467
申请日：2004-10-13
申请人： In-kyeong Yoo , Chang-wook Moon , Chang-hoon Choi
发明人： In-kyeong Yoo , Chang-wook Moon , Chang-hoon Choi
IPC分类号： G21K5/10
CPC分类号： H01J37/073 , H01J2237/31779
摘要： An emitter for an electron-beam projection lithography system includes a photoconductor substrate, an insulating layer formed on a front surface of the photoconductor substrate, a gate electrode layer formed on the insulating layer, and a base electrode layer formed on a rear surface of the photoconductor substrate and formed of a transparent conductive material. In operation of the emitter, a voltage is applied between the base electrode and the gate electrode layer, light is projected onto a portion of the photoconductor substrate to convert the portion of the photoconductor substrate into a conductor such that electrons are emitted only from the partial portion where the light is projected. Since the emitter can partially emit electrons, partial correcting, patterning or repairing of a subject electron-resist can be realized.
摘要翻译：用于电子束投影光刻系统的发射器包括：感光体基板，形成于感光体基板前表面的绝缘层，形成在绝缘层上的栅极电极层，以及形成在绝缘层的背面上的基极层感光体基板并由透明导电材料形成。在发射极的工作中，在基极和栅极电极层之间施加电压，光被投射到光电导体基底的一部分上，以将感光体基底的一部分转换为导体，使电子仅从部分投射光的部分。由于发射体可以部分地发射电子，所以可以实现对象电子抗蚀剂的部分校正，图案化或修复。

4. 发明授权

US07189981B2 Electromagnetic focusing method for electron-beam lithography system 失效
标题翻译：电子束光刻系统的电磁聚焦方法
公开(公告)号：US07189981B2
公开(公告)日：2007-03-13
申请号：US11205148
申请日：2005-08-17
申请人： Chang-wook Moon , Sidorkin Vadim , Chang-hoon Choi
发明人： Chang-wook Moon , Sidorkin Vadim , Chang-hoon Choi
IPC分类号： H01J37/302 , H01J1/30
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31793
摘要： A method for projecting a predetermined pattern of an electron beam from an emitter to a wafer in a vacuum chamber of an electron-beam lithography system is provided. An initial condition for performing an electromagnetic focusing is first set and outspread phenomenon of the electron beam, which is caused by an initial emitting velocity difference and an initial emitting angle difference between electrons emitted from the emitter, is corrected. Then, a shift of the electron beam, which is caused when an electric field is not in parallel with a magnetic field, is corrected and a shift of the electron beam, which is caused by a gradient of the magnetic field, is corrected, after which an increase of a beam diameter of the electron beam, which is caused by Coulomb-interaction between the electrons emitted from the emitter, is corrected. Then, it is determined if a focusing error is within a range of an allowable error. When it is determined the focusing error is out of the range of the allowable error, the above operations are repeated.
摘要翻译：提供了一种在电子束光刻系统的真空室中将来自发射极的电子束的预定图案投影到晶片的方法。首先设置用于执行电磁聚焦的初始条件，并校正由初始发射速度差和从发射器发射的电子之间的初始发射角差引起的电子束的扩展现象。然后，校正当电场不与磁场平行时引起的电子束的偏移，并且由磁场的梯度引起的电子束的偏移被校正校正了从发射极发射的电子之间的库仑相互作用引起的电子束的光束直径的增加。然后，确定聚焦误差是否在允许误差的范围内。当确定聚焦误差在允许误差的范围之外时，重复上述操作。

5. 发明申请

US20060151720A1 Electromagnetic focusing method for electron-beam lithography system 失效
标题翻译：电子束光刻系统的电磁聚焦方法
公开(公告)号：US20060151720A1
公开(公告)日：2006-07-13
申请号：US11205148
申请日：2005-08-17
申请人： Chang-wook Moon , Sidorkin Vadim , Chang-hoon Choi
发明人： Chang-wook Moon , Sidorkin Vadim , Chang-hoon Choi
IPC分类号： H01J37/302
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/31793
摘要： A method for projecting a predetermined pattern of an electron beam from an emitter to a wafer in a vacuum chamber of an electron-beam lithography system is provided. An initial condition for performing an electromagnetic focusing is first set and outspread phenomenon of the electron beam, which is caused by an initial emitting velocity difference and an initial emitting angle difference between electrons emitted from the emitter, is corrected. Then, a shift of the electron beam, which is caused when an electric field is not in parallel with a magnetic field, is corrected and a shift of the electron beam, which is caused by a gradient of the magnetic field, is corrected, after which an increase of a beam diameter of the electron beam, which is caused by Coulomb-interaction between the electrons emitted from the emitter, is corrected. Then, it is determined if a focusing error is within a range of an allowable error. When it is determined the focusing error is out of the range of the allowable error, the above operations are repeated.
摘要翻译：提供了一种在电子束光刻系统的真空室中将来自发射极的电子束的预定图案投影到晶片的方法。首先设置用于执行电磁聚焦的初始条件，并校正由初始发射速度差和从发射器发射的电子之间的初始发射角差引起的电子束的扩展现象。然后，校正当电场不与磁场平行时引起的电子束的偏移，并且由磁场的梯度引起的电子束的偏移被校正校正了从发射极发射的电子之间的库仑相互作用引起的电子束的光束直径的增加。然后，确定聚焦误差是否在允许误差的范围内。当确定聚焦误差在允许误差的范围之外时，重复上述操作。

6. 发明申请

US20070024294A1 Apparatus to inspect TFT substrate and method of inspecting TFT substrate 失效
标题翻译： TFT基板的检查装置及TFT基板的检查方法
公开(公告)号：US20070024294A1
公开(公告)日：2007-02-01
申请号：US11478683
申请日：2006-07-03
申请人： Chang-hoon Choi , Hee-soo Pyun , Hwa-sub Shim , Ho-seok Choi , Dong-seok Baek
发明人： Chang-hoon Choi , Hee-soo Pyun , Hwa-sub Shim , Ho-seok Choi , Dong-seok Baek
IPC分类号： G01R31/305
CPC分类号： G09G3/006 , G09G3/3648
摘要： An apparatus to inspect a TFT substrate including a gate line, a data line crossed with the gate line and insulated from the gate line, a TFT disposed at an intersection of the gate line and the data line, and a pixel electrode connected to the TFT includes a vacuum chamber, a stage disposed in the vacuum chamber and on which the TFT substrate is settled, an electron beam generator disposed over the stage, a gate driving part to apply a gate-on voltage to the gate line to turn on the TFT, a signal detector connected to the data line and to sense an electric signal from the pixel electrode, and a controller to control the gate driving part and the electron beam generator so that a electron beam is irradiated to the pixel electrode while the TFT is turned on.
摘要翻译：一种用于检查TFT基板的装置，包括栅极线，与栅极线交叉并与栅极线绝缘的数据线，设置在栅极线和数据线的交叉点处的TFT以及连接到TFT的像素电极包括真空室，设置在真空室中并在其上沉积TFT基板的台，布置在载物台上的电子束发生器，栅极驱动部分，用于向栅极线施加栅极导通以导通TFT 连接到数据线并且感测来自像素电极的电信号的信号检测器，以及控制器，用于控制栅极驱动部分和电子束发生器，使得电子束在TFT转动时照射到像素电极上。

7. 发明授权

US07446555B2 Apparatus to inspect TFT substrate and method of inspecting TFT substrate 失效
标题翻译： TFT基板的检查装置及TFT基板的检查方法
公开(公告)号：US07446555B2
公开(公告)日：2008-11-04
申请号：US11478683
申请日：2006-07-03
申请人： Chang-hoon Choi , Hee-soo Pyun , Hwa-sub Shim , Ho-seok Choi , Dong-seok Baek
发明人： Chang-hoon Choi , Hee-soo Pyun , Hwa-sub Shim , Ho-seok Choi , Dong-seok Baek
IPC分类号： G01R31/00 , G01R31/305
CPC分类号： G09G3/006 , G09G3/3648
摘要： An apparatus to inspect a TFT substrate including a gate line, a data line crossed with the gate line and insulated from the gate line, a TFT disposed at an intersection of the gate line and the data line, and a pixel electrode connected to the TFT includes a vacuum chamber, a stage disposed in the vacuum chamber and on which the TFT substrate is settled, an electron beam generator disposed over the stage, a gate driving part to apply a gate-on voltage to the gate line to turn on the TFT, a signal detector connected to the data line and to sense an electric signal from the pixel electrode, and a controller to control the gate driving part and the electron beam generator so that a electron beam is irradiated to the pixel electrode while the TFT is turned on.
摘要翻译：一种用于检查TFT基板的装置，包括栅极线，与栅极线交叉并与栅极线绝缘的数据线，设置在栅极线和数据线的交叉点处的TFT以及连接到TFT的像素电极包括真空室，设置在真空室中并在其上沉积TFT基板的台，布置在载物台上的电子束发生器，栅极驱动部分，用于向栅极线施加栅极导通以导通TFT 连接到数据线并且感测来自像素电极的电信号的信号检测器，以及控制器，用于控制栅极驱动部分和电子束发生器，使得电子束在TFT转动时照射到像素电极上。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式