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    • 3. 发明申请
    • DISPENSING VESSEL FOR CLOTHES DRYER
    • 用于衣服干燥器的配送容器
    • WO2010141041A1
    • 2010-12-09
    • PCT/US2009/067879
    • 2009-12-14
    • EDISON NATION , LLCHOWE, WilliamPAYNE, RicBROWNING, Jeff
    • HOWE, WilliamPAYNE, RicBROWNING, Jeff
    • D06F58/00B65D83/00A61L9/00F26B19/00
    • D06F58/203C11D17/047
    • A dispensing vessel for deodorizing articles in a clothes drying environment includes a core configured to at least temporarily retain a moistening substance therein; a cover substantially surrounding the core, the cover including a plurality of protuberances, each protuberance including a flattened tip at a distal end thereof, a fill opening defined therethrough, the fill opening providing access to an interior of the cover from an exterior of the cover, one or more dispensing openings, each dispensing opening being disposed proximate the flattened tip of a protuberance of the plurality of protuberances, and each dispensing opening providing access to an exterior of the cover from an interior of the cover; and a deodorizing substance retained within said core.
    • 用于在衣物干燥环境中对物品进行除臭的分配容器包括:至少暂时将润湿物质保留在其中的芯; 基本上围绕所述芯的盖,所述盖包括多个突起,每个突起在其远端包括扁平的末端,其中限定的填充开口,所述填充开口提供从所述盖的外部进入所述盖的内部 一个或多个分配开口,每个分配开口设置在多个突起的突起的平坦末端附近,并且每个分配开口提供从盖的内部进入盖的外部; 以及保留在所述芯内的除臭物质。
    • 4. 发明申请
    • VERTICALLY TRANSLATABLE CHUCK ASSEMBLY AND METHOD FOR A PLASMA REACTOR SYSTEM
    • 垂直翻转卡盘组件及等离子体反应器系统的方法
    • WO2002059933A2
    • 2002-08-01
    • PCT/US2001/048851
    • 2001-12-20
    • TOKYO ELECTRON LIMITEDJOHNSON, Wayne, L.FINK, Steven, T.BROWNING, JeffJEVTIC, Jovan
    • JOHNSON, Wayne, L.FINK, Steven, T.BROWNING, JeffJEVTIC, Jovan
    • H01J37/00
    • H01L21/67069H01J37/32082H01J37/32174
    • A chuck assembly (110) for supporting a workpiece (116) within a plasma reactor chamber (60) having sidewalls (64) surrounding an interior region (65) capable of supporting a plasma. The assembly includes a chuck base (130) and a plurality of support arms (150A-150C) extending outwardly from the chuck base perimeter to the chamber sidewalls. The support arms are adapted to support the chuck base within the interior region, while also being adapted to provide a path for mechanically, electrically, pneumatically and/or fluidly communicating with the chuck assembly from outside the chamber. The chuck assembly includes a workpiece support member (160) arranged above the chuck base, capable of supporting the workpiece and serving as a chuck electrode. The workpiece support member is supported by one or more vertical translation member (168) arranged between and operatively connected to the chuck base and the workpiece support member. The chuck assembly includes a match network (180MN), wherein at least a portion of the match network is mounted directly to the workpiece support member. The use of the support arms allows for the positioning of a vacuum pump system (250) directly beneath the chuck assembly.
    • 一种用于在等离子体反应室(60)内支撑工件(116)的卡盘组件(110),其具有围绕能够支撑等离子体的内部区域(65)的侧壁(64)。 该组件包括卡盘基部(130)和从卡盘基部周边向腔室侧壁向外延伸的多个支撑臂(150A-150C)。 支撑臂适于在内部区域内支撑卡盘基座,同时还适于提供从腔室外部与卡盘组件机械地,电气地,气动地和/或流体地连通的路径。 卡盘组件包括布置在卡盘基座上方的工件支撑构件(160),其能够支撑工件并用作卡盘电极。 工件支撑构件由一个或多个垂直移动构件(168)支撑,垂直移动构件(168)布置在卡盘基部和工件支撑构件之间并且可操作地连接至卡盘基部和工件支撑构件 卡盘组件包括匹配网络(180MN),其中匹配网络的至少一部分直接安装到工件支撑构件。 支撑臂的使用允许将真空泵系统(250)定位在卡盘组件的正下方。
    • 5. 发明申请
    • VERTICALLY TRANSLATABLE CHUCK ASSEMBLY AND METHOD FOR A PLASMA REACTOR SYSTEM
    • 用于等离子体反应器系统的垂直可翻转组件和方法
    • WO02059933A3
    • 2002-10-10
    • PCT/US0148851
    • 2001-12-20
    • TOKYO ELECTRON LTDJOHNSON WAYNE LFINK STEVEN TBROWNING JEFFJEVTIC JOVAN
    • JOHNSON WAYNE LFINK STEVEN TBROWNING JEFFJEVTIC JOVAN
    • H01J37/32H01L21/00
    • H01L21/67069H01J37/32082H01J37/32174
    • A chuck assembly (110) for supporting a workpiece (116) within a plasma reactor chamber (60) having sidewalls (64) surrounding an interior region (65) capable of supporting a plasma. The assembly includes a chuck base (130) and a plurality of support arms (150A-150C) extending outwardly from the chuck base perimeter to the chamber sidewalls. The support arms are adapted to support the chuck base within the interior region, while also being adapted to provide a path for mechanically, electrically, pneumatically and/or fluidly communicating with the chuck assembly from outside the chamber. The chuck assembly includes a workpiece support member (160) arranged above the chuck base, capable of supporting the workpiece and serving as a chuck electrode. The workpiece support member is supported by one or more vertical translation member (168) arranged between and operatively connected to the chuck base and the workpiece support member. The chuck assembly includes a match network (180MN), wherein at least a portion of the match network is mounted directly to the workpiece support member. The use of the support arms allows for the positioning of a vacuum pump system (250) directly beneath the chuck assembly.
    • 一种用于在具有围绕能够支撑等离子体的内部区域(65)的侧壁(64)的等离子体反应器室(60)内支撑工件(116)的卡盘组件(110)。 组件包括卡盘基座(130)和从卡盘基部周边向外延伸到腔室侧壁的多个支撑臂(150A-150C)。 所述支撑臂适于在所述内部区域内支撑所述卡盘基座,同时还适于提供用于从所述腔室外部与所述卡盘组件机械,电气,气动和/或流体连通的路径。 卡盘组件包括布置在卡盘基座上方的能够支撑工件并用作卡盘电极的工件支撑构件(160)。 工件支撑构件由一个或多个垂直平移构件(168)支撑,该垂直平移构件布置在卡盘基座和工件支撑构件之间并且可操作地连接到卡盘基座和工件支撑构件上。 卡盘组件包括匹配网络(180MN),其中匹配网络的至少一部分直接安装到工件支撑构件。 支撑臂的使用允许将真空泵系统(250)直接定位在卡盘组件的正下方。