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    • 1. 发明申请
    • VERTICALLY TRANSLATABLE CHUCK ASSEMBLY AND METHOD FOR A PLASMA REACTOR SYSTEM
    • 垂直翻转卡盘组件及等离子体反应器系统的方法
    • WO2002059933A2
    • 2002-08-01
    • PCT/US2001/048851
    • 2001-12-20
    • TOKYO ELECTRON LIMITEDJOHNSON, Wayne, L.FINK, Steven, T.BROWNING, JeffJEVTIC, Jovan
    • JOHNSON, Wayne, L.FINK, Steven, T.BROWNING, JeffJEVTIC, Jovan
    • H01J37/00
    • H01L21/67069H01J37/32082H01J37/32174
    • A chuck assembly (110) for supporting a workpiece (116) within a plasma reactor chamber (60) having sidewalls (64) surrounding an interior region (65) capable of supporting a plasma. The assembly includes a chuck base (130) and a plurality of support arms (150A-150C) extending outwardly from the chuck base perimeter to the chamber sidewalls. The support arms are adapted to support the chuck base within the interior region, while also being adapted to provide a path for mechanically, electrically, pneumatically and/or fluidly communicating with the chuck assembly from outside the chamber. The chuck assembly includes a workpiece support member (160) arranged above the chuck base, capable of supporting the workpiece and serving as a chuck electrode. The workpiece support member is supported by one or more vertical translation member (168) arranged between and operatively connected to the chuck base and the workpiece support member. The chuck assembly includes a match network (180MN), wherein at least a portion of the match network is mounted directly to the workpiece support member. The use of the support arms allows for the positioning of a vacuum pump system (250) directly beneath the chuck assembly.
    • 一种用于在等离子体反应室(60)内支撑工件(116)的卡盘组件(110),其具有围绕能够支撑等离子体的内部区域(65)的侧壁(64)。 该组件包括卡盘基部(130)和从卡盘基部周边向腔室侧壁向外延伸的多个支撑臂(150A-150C)。 支撑臂适于在内部区域内支撑卡盘基座,同时还适于提供从腔室外部与卡盘组件机械地,电气地,气动地和/或流体地连通的路径。 卡盘组件包括布置在卡盘基座上方的工件支撑构件(160),其能够支撑工件并用作卡盘电极。 工件支撑构件由一个或多个垂直移动构件(168)支撑,垂直移动构件(168)布置在卡盘基部和工件支撑构件之间并且可操作地连接至卡盘基部和工件支撑构件 卡盘组件包括匹配网络(180MN),其中匹配网络的至少一部分直接安装到工件支撑构件。 支撑臂的使用允许将真空泵系统(250)定位在卡盘组件的正下方。
    • 2. 发明申请
    • INDUCTIVELY COUPLED HIGH-DENSITY PLASMA SOURCE
    • 感应耦合高密度等离子体源
    • WO2002097937A1
    • 2002-12-05
    • PCT/US2002/022080
    • 2002-03-25
    • TOKYO ELECTRON LIMITEDQUON, Bill, H.JEVTIC, JovanANTLEY, SamSTRANG, Eric, J.
    • QUON, Bill, H.JEVTIC, JovanANTLEY, SamSTRANG, Eric, J.
    • H01T23/00
    • H01J37/321H01J37/32357H01J37/3266
    • A high-density plasma source (100) is disclosed. The source includes an annular insulating body (300) with an annular cavity (316) formed within. An inductor coil (340) serving as an antenna is arranged within the annular cavity and is operable to generate a first magnetic field within a plasma duct (60) interior region (72) and inductively couple to the plasma when the annular body is arranged to surround a portion of the plasma duct. A grounded conductive housing (400) surrounds the annular insulating body. An electrostatic shield (360) is arranged adjacent the inner surface of the insulating body and is grounded to the conductive housing. Upper and lower magnet rings (422 and 424) are preferably arranged adjacent the upper and lower surfaces of the annular insulating body outside of the conductive housing. A T-match network is in electrical communication with said inductor coil and is adapted to provide for efficient transfer of RF power from an RF power source to the plasma. At least one plasma source can be used to form a high-density plasma suitable for plasma processing of a workpiece residing in a plasma chamber in communication with the at least one source.
    • 公开了一种高密度等离子体源(100)。 源包括环形绝缘体(300),其内部形成有环形空腔(316)。 用作天线的电感线圈(340)布置在环形空腔内,并且可操作以在等离子体管道(60)内部区域(72)内产生第一磁场,并且当环形体布置成 围绕等离子体管道的一部分。 接地导电壳体(400)围绕环形绝缘体。 静电屏蔽(360)被布置成邻近绝缘体的内表面并且被接地到导电壳体。 上,下磁环(422和424)优选地布置成邻近导电外壳外的环形绝缘体的上表面和下表面。 T匹配网络与所述电感器线圈电连通,并且适于提供从RF功率源到等离子体的RF功率的有效传输。 可以使用至少一个等离子体源来形成适于等离子体处理等离子体处理的等离子体处理,所述等离子体处理驻留在与所述至少一个源连通的等离子体室中。