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    • 2. 发明申请
    • RLINK-ON-DIE INTERCONNECT FEATURES TO ENABLE SIGNALING
    • RLINK-DIE互连功能使信令生效
    • WO2018009167A1
    • 2018-01-11
    • PCT/US2016/040907
    • 2016-07-02
    • INTEL CORPORATIONZHANG, Yu AmosAYGUN, Kemal
    • ZHANG, Yu AmosAYGUN, Kemal
    • H01L23/50H01L23/52H01L23/522H01L23/00H01L21/768
    • H01L21/76877H01L21/76898H01L23/50H01L23/522H01L23/5222H01L23/5227
    • Integrated circuit (IC) chip "on-die" interconnection features (and methods for their manufacture) may improve signal connections and transmission through a data signal communication channel from one chip, through semiconductor device packaging, and to another component, such as another chip. Such chip interconnection features may include (1) "last silicon metal level (LSML)" data signal "leadway (LDW) routing" traces isolated between LSLM isolation (e.g., power and/or ground) traces to: (2) add a length of the isolated data signal LDW traces to increase a total length of and tune data signal communication channels extending through a package between two communicating chips and (3) create switched buffer (SB) pairs of data signal channels that use the isolated data signal LDW traces to switch the locations of the pairs data signal circuitry and surface contacts for packaging connection bumps.
    • 集成电路(IC)芯片“片上”(on-die) 互连特征(以及用于其制造的方法)可以改善通过数据信号通信信道从一个芯片经过半导体器件封装到另一个组件(例如另一个芯片)的信号连接和传输。 这样的芯片互连特征可以包括(1)“最后硅金属层(LSML)” 数据信号“引线(LDW)路由” (2)添加一段长度的隔离数据信号LDW迹线,以增加延伸通过两个通信芯片之间的封装的数据信号通信信道的总长度和调谐数据信号通信信道 和(3)创建使用隔离数据信号LDW迹线的切换缓冲器(SB)对数据信号通道来切换数据信号电路和表面触点的位置以用于封装连接凸点。
    • 3. 发明申请
    • HIGH DENSITY INTERCONNECT STRUCTURES CONFIGURED FOR MANUFACTURING AND PERFORMANCE
    • 配置用于制造和性能的高密度互连结构
    • WO2018004619A1
    • 2018-01-04
    • PCT/US2016/040486
    • 2016-06-30
    • BRAUNISCH, HenningAYGUN, KemalJAIN, AjayQIAN, Zhiguo
    • BRAUNISCH, HenningAYGUN, KemalJAIN, AjayQIAN, Zhiguo
    • H01L23/48H01L23/00H01L23/495H01L23/498H01L23/522
    • Discussed generally herein are methods and devices including or providing a high density interconnect structure. A high density interconnect structure can include a stack of alternating dielectric layers and metallization layers comprising at least three metallization layers including conductive material with low k dielectric material between the conductive material, and at least two dielectric layers including first medium k dielectric material with one or more first vias extending therethrough, the at least two dielectric layers situated between two metallization layers of the at least three metallization layers, a second medium k dielectric material directly on a top surface of the stack, a second via extending through the second medium k dielectric material, the second via electrically connected to conductive material in a metallization layer of the three or more metallization layers, and a pad over the second medium k dielectric material and electrically connected to the second via.
    • 这里通常讨论的是包括或提供高密度互连结构的方法和设备。 高密度互连结构可以包括交替介电层和金属化层的叠层,所述金属化层包括至少三个金属化层,所述至少三个金属化层包括在导电材料之间具有低k介电材料的导电材料,以及至少两个介电层,包括第一介质k介电材料, 所述至少两个电介质层位于所述至少三个金属化层的两个金属化层之间,第二介质k电介质材料直接位于所述堆叠的顶表面上,第二通孔延伸穿过所述第二介质k电介质 所述第二通孔电连接到所述三个或更多个金属化层的金属化层中的导电材料,所述第二介质k电介质材料上方的焊盘并且电连接到所述第二通孔。