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1. 发明专利

JP2016524689A 爆破システムおよび方法审中-公开
标题翻译：爆破系统及方法
公开(公告)号：JP2016524689A
公开(公告)日：2016-08-18
申请号：JP2016520197
申请日：2014-06-16
申请人：アレン・パークAllen PARK , アレン・パークAllen PARK
发明人：アレン・パーク
IPC分类号： F42D1/28 , F42D1/24
CPC分类号： F42D1/28 , F42D1/12
摘要：本発明の1つの好ましい形態において、高吸収性ポリマーで発破孔を填塞する方法が提供される。該方法は、発破孔中におけるゲル化長さとして高吸収性ポリマーを提供することを含む。ゲル化長さは、圧縮波反射ステムを提供し、火薬を発破孔中に置きつつ、爆破中の火薬の効率を増加させる。
摘要翻译：在本发明的一个优选形式，哈马的方法塞与超吸收性聚合物炮眼。该方法包括在炮眼提供超吸收性聚合物凝胶化的长度。胶凝长度提供了一个压缩波反射干，同时将火药在炮眼，增加爆破炸药的效率。

2. 发明专利

IL234345A Methods and systems for utilizing design data in combination with inspection data 未知
公开(公告)号：IL234345A
公开(公告)日：2016-11-30
申请号：IL23434514
申请日：2014-08-27
申请人： KLA-TENCOR TECH CORP , SAGAR KEKARE , ELLIS CHANG , ALLEN PARK , PETER ROSE , KHURRAM ZAFAR
发明人： SAGAR KEKARE , ELLIS CHANG , ALLEN PARK , PETER ROSE , KHURRAM ZAFAR
IPC分类号： G01N20060101 , G06K20060101 , G06T20060101
摘要： Various methods and systems for utilizing design data in combination with inspection data are provided. One computer-implemented method for binning defects detected on a wafer includes comparing portions of design data proximate positions of the defects in design data space. The method also includes determining if the design data in the portions is at least similar based on results of the comparing step. In addition, the method includes binning the defects in groups such that the portions of the design data proximate the positions of the defects in each of the groups are at least similar. The method further includes storing results of the binning step in a storage medium.

3. 发明专利

IL234344A Methods and systems for utilizing design data in combination with inspection data 未知
公开(公告)号：IL234344A
公开(公告)日：2016-11-30
申请号：IL23434414
申请日：2014-08-27
申请人： KLA-TENCOR TECH CORP , SAGAR KEKARE , ELLIS CHANG , ALLEN PARK , PETER ROSE , KHURRAM ZAFAR
发明人： SAGAR KEKARE , ELLIS CHANG , ALLEN PARK , PETER ROSE , KHURRAM ZAFAR
IPC分类号： G01N20060101 , G06K20060101 , G06T20060101
摘要： Various methods and systems for utilizing design data in combination with inspection data are provided. One computer-implemented method for binning defects detected on a wafer includes comparing portions of design data proximate positions of the defects in design data space. The method also includes determining if the design data in the portions is at least similar based on results of the comparing step. In addition, the method includes binning the defects in groups such that the portions of the design data proximate the positions of the defects in each of the groups are at least similar. The method further includes storing results of the binning step in a storage medium.

4. 发明专利

IL234343A Methods and systems for utilizing design data in combination with inspection data 未知
公开(公告)号：IL234343A
公开(公告)日：2016-11-30
申请号：IL23434314
申请日：2014-08-27
申请人： KLA-TENCOR TECH CORP , SAGAR KEKARE , ELLIS CHANG , ALLEN PARK , PETER ROSE , KHURRAM ZAFAR
发明人： SAGAR KEKARE , ELLIS CHANG , ALLEN PARK , PETER ROSE , KHURRAM ZAFAR
IPC分类号： G01N20060101 , G06K20060101 , G06T20060101
摘要： Various methods and systems for utilizing design data in combination with inspection data are provided. One computer-implemented method for binning defects detected on a wafer includes comparing portions of design data proximate positions of the defects in design data space. The method also includes determining if the design data in the portions is at least similar based on results of the comparing step. In addition, the method includes binning the defects in groups such that the portions of the design data proximate the positions of the defects in each of the groups are at least similar. The method further includes storing results of the binning step in a storage medium.

5. 发明专利

IL234289A Methods and systems for utilizing design data in combination with inspection data 未知
公开(公告)号：IL234289A
公开(公告)日：2016-10-31
申请号：IL23428914
申请日：2014-08-25
申请人： KLA-TENCOR TECH CORP , KHURRAM ZAFAR , SAGAR KEKARE , ELLIS CHANG , ALLEN PARK , PETER ROSE
发明人： KHURRAM ZAFAR , SAGAR KEKARE , ELLIS CHANG , ALLEN PARK , PETER ROSE
IPC分类号： G01N20060101 , G06K20060101 , G06T20060101
摘要： Various methods and systems for utilizing design data in combination with inspection data are provided. One computer-implemented method for binning defects detected on a wafer includes comparing portions of design data proximate positions of the defects in design data space. The method also includes determining if the design data in the portions is at least similar based on results of the comparing step. In addition, the method includes binning the defects in groups such that the portions of the design data proximate the positions of the defects in each of the groups are at least similar. The method further includes storing results of the binning step in a storage medium.

6. 发明专利

BR112015031776A2 sistemas e métodos de detonação de explosivos 未知
公开(公告)号：BR112015031776A2
公开(公告)日：2017-07-25
申请号：BR112015031776
申请日：2014-06-16
申请人： ALLEN PARK
发明人： ALLEN PARK
IPC分类号： F42D1/28
摘要： resumo “sistemas e métodos de detonação de explosivos” em uma forma preferencial da presente invenção é fornecido um método de tamponar um furo de detonação de explosivos com um polímero superabsorvente. o método inclui fornecer uma substância de polímero superabsorvente como um comprimento gelificado no furo de detonação de explosivos. o comprimento gelificado fornece um tampão refletor de onda de pressão, para elevar a eficiência de um explosivo durante a detonação de explosivos, sendo que o explosivo é localizado no furo de detonação de explosivos.

7. 发明专利

IL234319A Methods and systems for utilizing design data in combination with inspection data 未知
公开(公告)号：IL234319A
公开(公告)日：2016-10-31
申请号：IL23431914
申请日：2014-08-26
申请人： KLA-TENCOR TECH CORP , SAGAR KEKARE , ELLIS CHANG , ALLEN PARK , PETER ROSE , KHURRAM ZAFAR
发明人： SAGAR KEKARE , ELLIS CHANG , ALLEN PARK , PETER ROSE , KHURRAM ZAFAR
IPC分类号： G01N20060101 , G06K20060101 , G06T20060101
摘要： Various methods and systems for utilizing design data in combination with inspection data are provided. One computer-implemented method for binning defects detected on a wafer includes comparing portions of design data proximate positions of the defects in design data space. The method also includes determining if the design data in the portions is at least similar based on results of the comparing step. In addition, the method includes binning the defects in groups such that the portions of the design data proximate the positions of the defects in each of the groups are at least similar. The method further includes storing results of the binning step in a storage medium.

8. 发明专利

BR112015031776B1 disposição, sistemas e métodos de detonação de explosivos 未知
公开(公告)号：BR112015031776B1
公开(公告)日：2021-01-05
申请号：BR112015031776
申请日：2014-06-16
申请人： ALLEN PARK
发明人： ALLEN PARK
IPC分类号： F42D1/28
摘要： sistemas e métodos de detonação de explosivos. em uma forma preferencial da presente invenção é fornecido um método de tamponar um furo de detonação de explosivos com um polímero superabsorvente. o método inclui fornecer uma substância de polímero superabsorvente como um comprimento gelificado no furo de detonação de explosivos. o comprimento gelificado fornece um tampão refletor de onda de pressão, para elevar a eficiência de um explosivo durante a detonação de explosivos, sendo que o explosivo é localizado no furo de detonação de explosivos.

9. 发明授权

US09087367B2 Determining design coordinates for wafer defects 有权
标题翻译：确定晶圆缺陷的设计坐标
公开(公告)号：US09087367B2
公开(公告)日：2015-07-21
申请号：US13601891
申请日：2012-08-31
申请人： Ellis Chang , Michael J. Van Riet , Allen Park , Khurram Zafar , Santosh Bhattacharyya
发明人： Ellis Chang , Michael J. Van Riet , Allen Park , Khurram Zafar , Santosh Bhattacharyya
IPC分类号： G06K9/62 , G06T7/00
CPC分类号： G06T7/001 , G06T7/74 , G06T2207/30148
摘要： Methods and systems for determining design coordinates for defects detected on a wafer are provided. One method includes aligning a design for a wafer to defect review tool images for defects detected in multiple swaths on the wafer by an inspection tool, determining a position of each of the defects in design coordinates based on results of the aligning, separately determining a defect position offset for each of the multiple swaths based on the swath in which each of the defects was detected (swath correction factor), the design coordinates for each of the defects, and a position for each of the defects determined by the inspection tool, and determining design coordinates for the other defects detected in the multiple swaths by the inspection tool by applying the appropriate swath correction factor to those defects.
摘要翻译：提供了用于确定在晶片上检测到的缺陷的设计坐标的方法和系统。一种方法包括对准晶片的设计以通过检查工具对晶片上的多个条带中检测到的缺陷来检查工具图像，基于对准的结果确定每个缺陷在设计坐标中的位置，分别确定缺陷基于检测到每个缺陷的条带（条纹校正因子），每个缺陷的设计坐标以及由检查工具确定的每个缺陷的位置，针对每个多个条带的位置偏移，以及通过对这些缺陷应用适当的条纹校正因子来确定检测工具在多个条中检测到的其他缺陷的设计坐标。

10. 发明授权

US08989479B2 Region based virtual fourier filter 有权
标题翻译：基于区域的虚拟傅里叶滤波器
公开(公告)号：US08989479B2
公开(公告)日：2015-03-24
申请号：US13381696
申请日：2011-08-01
申请人： Lisheng Gao , Kenong Wu , Allen Park , Ellis Chang , Khurram Zafar , Junqing Huang , Ping Gu , Christopher Maher , Grace H. Chen , Songnian Rong , Liu-Ming Wu
发明人： Lisheng Gao , Kenong Wu , Allen Park , Ellis Chang , Khurram Zafar , Junqing Huang , Ping Gu , Christopher Maher , Grace H. Chen , Songnian Rong , Liu-Ming Wu
IPC分类号： G06K9/00 , G06T7/00
CPC分类号： G06T7/001 , G06T2207/10061 , G06T2207/20021 , G06T2207/20056 , G06T2207/30148
摘要： The present invention includes searching imagery data in order to identify one or more patterned regions on a semiconductor wafer, generating one or more virtual Fourier filter (VFF) working areas, acquiring an initial set of imagery data from the VFF working areas, defining VFF training blocks within the identified patterned regions of the VFF working areas utilizing the initial set of imagery data, wherein each VFF training block is defined to encompass a portion of the identified patterned region displaying a selected repeating pattern, calculating an initial spectrum for each VFF training block utilizing the initial set of imagery data from the VFF training blocks, and generating a VFF for each training block by identifying frequencies of the initial spectrum having maxima in the frequency domain, wherein the VFF is configured to null the magnitude of the initial spectrum at the frequencies identified to display spectral maxima.
摘要翻译：本发明包括搜索图像数据以便识别半导体晶片上的一个或多个图案化区域，生成一个或多个虚拟傅立叶滤波器（VFF）工作区域，从VFF工作区域获取初始图像数据集，定义VFF训练利用初始的图像数据集，在VFF工作区域的所识别的图案化区域内的块，其中每个VFF训练块被定义为包含所识别的图案化区域的一部分，显示所选择的重复模式，计算每个VFF训练块的初始频谱利用来自VFF训练块的初始图像数据组，以及通过识别在频域中具有最大值的初始频谱的频率，为每个训练块生成VFF，其中VFF被配置为在识别出显示频谱最大值的频率。

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