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81. 发明授权

US08520184B2 Immersion exposure apparatus and device manufacturing method with measuring device 有权
标题翻译：浸渍曝光装置及装置制造方法与测量装置
公开(公告)号：US08520184B2
公开(公告)日：2013-08-27
申请号：US11570219
申请日：2005-06-07
申请人： Kenichi Shiraishi
发明人： Kenichi Shiraishi
IPC分类号： G03B27/52
CPC分类号： G03F7/70875 , G03B27/42 , G03F7/70341 , G03F7/70916
摘要： There is provided an exposure apparatus capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus (EX), which forms a liquid immersion area (AR2) of a liquid (LQ) on an image surface side of a projection optical system (PL), and exposes a substrate (P) via the projection optical system (PL) and the liquid (LQ) of the immersion area (AR2), is provided with a measuring device (60) which measures at least one of a property and composition of the liquid (LQ) for forming the liquid immersion area (AR2).
摘要翻译：提供一种能够精确地进行基于液浸法的曝光处理和测量处理的曝光装置。在投影光学系统（PL）的像面侧形成液体（LQ）的液浸区域（AR2）的曝光装置（EX），经由投影光学系统（PL）露出基板）和浸渍区域（AR2）的液体（LQ）之间设置有测量装置（60），其测量用于形成液浸区域（AR2）的液体（LQ）的性质和成分中的至少一种。

82. 发明授权

US08208117B2 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
标题翻译：曝光方法，基材台，曝光装置和装置制造方法
公开(公告)号：US08208117B2
公开(公告)日：2012-06-26
申请号：US12232063
申请日：2008-09-10
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/52 , G03B27/42 , G03B27/58 , G03B27/54 , G03B27/60
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
摘要翻译：曝光装置通过液体将图案图像投影到基板上来曝光基板。曝光装置包括投影光学系统，通过该投影光学系统将图案图像投射到基板上，以及可移动部件，其相对于投影光学系统可移动。至少其一部分表面为疏液性的防液构件可拆卸地设置在可动件上，该防液构件与该基板不同。

83. 发明授权

US08174668B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US08174668B2
公开(公告)日：2012-05-08
申请号：US11767425
申请日：2007-06-22
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/52 , G03B27/42
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： A lithographic apparatus includes a substrate table which holds a substrate, a projection system which projects a patterned beam of radiation onto the substrate, the projection system having a final optical element adjacent the substrate, a liquid supply system which provides a liquid to a space between the projection system and the substrate table, and a cleaning system which cleans the substrate table.
摘要翻译：光刻设备包括：保持基板的基板台，将图案化的辐射束投射到基板上的投影系统，投影系统具有邻近基板的最终光学元件;液体供应系统，投影系统和衬底台，以及清洁衬底台的清洁系统。

84. 发明授权

US08130361B2 Exposure apparatus, exposure method, and method for producing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US08130361B2
公开(公告)日：2012-03-06
申请号：US11399537
申请日：2006-04-07
申请人： Masahiko Yasuda , Takahiro Masada , Yuho Kanaya , Tadashi Nagayama , Kenichi Shiraishi
发明人： Masahiko Yasuda , Takahiro Masada , Yuho Kanaya , Tadashi Nagayama , Kenichi Shiraishi
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/70141 , G03F7/70716 , G03F9/7088
摘要： An exposure apparatus includes a substrate stage movable while holding a substrate, a substrate alignment system which detects an alignment mark (1) on the substrate held by the substrate stage and detects a reference mark (PFM) provided on the substrate stage, and a mask alignment system which detects, via a projection optical system, a reference mark (MFM) provided on the substrate stage. The reference mark (PFM) on the substrate stage is detected without a liquid by using the substrate alignment system, and the reference mark (MFM) on the substrate stage is detected using the mask alignment system via the projection optical system and the liquid. Then, a positional relationship between a detection reference position of the substrate alignment system and a projection position of an image of a pattern is obtained, thereby accurately performing alignment processing in the liquid immersion exposure.
摘要翻译：一种曝光装置，包括：在保持基板的同时可移动的基板台;基板对准系统，其检测由基板台保持的基板上的对准标记（1），并检测设置在基板台上的基准标记（PFM）;以及掩模对准系统，其经由投影光学系统检测设置在基板台上的参考标记（MFM）。通过使用衬底对准系统，无需液体检测衬底台上的参考标记（PFM），并且通过投影光学系统和液体使用掩模对准系统检测衬底台上的参考标记（MFM）。然后，获得基板对准系统的检测基准位置与图案的图像的投影位置之间的位置关系，从而在液浸曝光中精确地进行取向处理。

85. 发明授权

US08115902B2 Exposure apparatus, device manufacturing method, maintenance method, and exposure method 有权
标题翻译：曝光装置，装置制造方法，维护方法和曝光方法
公开(公告)号：US08115902B2
公开(公告)日：2012-02-14
申请号：US12457247
申请日：2009-06-04
申请人： Kenichi Shiraishi
发明人： Kenichi Shiraishi
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： An exposure apparatus can prevent disadvantages of supplying liquid of reduced cleanliness and formation of watermarks. The exposure apparatus exposes a substrate by irradiating exposure light onto the substrate via a projection optical system and a liquid, and includes a liquid supply mechanism for supplying the liquid, and a measuring device which measures a time during which the supply of the liquid from the liquid supply mechanism is stopped.
摘要翻译：曝光装置可以防止提供降低清洁度和形成水印的液体的缺点。曝光装置通过投影光学系统和液体将曝光的光照射到基板上来曝光基板，并且包括用于供给液体的液体供给机构和测量装置，该测量装置测量从液体供给机构停止。

86. 发明授权

US08072576B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US08072576B2
公开(公告)日：2011-12-06
申请号：US11808231
申请日：2007-06-07
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
摘要翻译：提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板投影光学系统的像平面附近。

87. 发明申请

US20090305150A1 Exposure method, exposure apparatus, and device manufacturing method 有权
标题翻译：曝光方法，曝光装置和装置制造方法
公开(公告)号：US20090305150A1
公开(公告)日：2009-12-10
申请号：US11919352
申请日：2006-04-28
申请人： Kenichi Shiraishi , Tomoharu Fujiwara
发明人： Kenichi Shiraishi , Tomoharu Fujiwara
IPC分类号： G03F7/20 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/2041
摘要： An exposure method comprises: forming an immersion region on a substrate; exposing the substrate by irradiating the substrate with an exposure light via a liquid of the immersion region; and preventing an integration value of a contact time during which the liquid of the immersion region and a first region on the substrate are in contact, from exceeding a predetermined tolerance value.
摘要翻译：曝光方法包括：在基板上形成浸渍区域; 通过用浸渍区域的液体用曝光光照射基板来曝光基板; 并且防止浸没区域的液体和基板上的第一区域接触的接触时间的积分值超过预定的公差值。

88. 发明申请

US20090015808A1 Exposure method, substrate stage, exposure apparatus, and device manufacturing method 有权
标题翻译：曝光方法，基材台，曝光装置和装置制造方法
公开(公告)号：US20090015808A1
公开(公告)日：2009-01-15
申请号：US12232063
申请日：2008-09-10
申请人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
发明人： Soichi Owa , Nobutaka Magome , Shigeru Hirukawa , Yoshihiko Kudo , Jiro Inoue , Hirotaka Kohno , Masahiro Nei , Motokatsu Imai , Hiroyuki Nagasaka , Kenichi Shiraishi , Yasufumi Nishii , Hiroaki Takaiwa
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03B27/58 , G03F7/2041 , G03F7/707 , G03F7/70716
摘要： An exposure apparatus exposes a substrate by projecting a pattern image onto the substrate through a liquid. The exposure apparatus includes a projection optical system by which the pattern image is projected onto the substrate, and a movable member which is movable relative to the projection optical system. A liquid-repellent member, at least a part of a surface of which is liquid-repellent, is provided detachably on the movable member, the liquid-repellent member being different from the substrate.
摘要翻译：曝光装置通过液体将图案图像投影到基板上来曝光基板。曝光装置包括投影光学系统，通过该投影光学系统将图案图像投射到基板上，以及可移动部件，其相对于投影光学系统可移动。至少其一部分表面为疏液性的防液构件可拆卸地设置在可动件上，该防液构件与该基板不同。

89. 发明申请

US20080225250A1 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US20080225250A1
公开(公告)日：2008-09-18
申请号：US12153357
申请日：2008-05-16
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/52
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： A liquid immersion exposure apparatus includes an optical element via which a patterned beam is projected onto a substrate in an exposure operation, a liquid supply system having a supply port from which exposure liquid is supplied, and a member which has a surface and which is different from the substrate. In the exposure operation, the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the substrate. In a cleaning operation, the member is moved to a position at which the surface of the member faces the optical element, and the liquid supply system supplies the exposure liquid from the supply port to a space between the optical element and the surface of the member.
摘要翻译：液浸曝光装置包括光学元件，在曝光操作中将图案化的光束投射到基板上，液体供应系统具有供给端口，供给端口具有曝光液体，以及具有不同表面的部件从底物。在曝光操作中，液体供应系统将曝光液体从供给口提供到光学元件和基板之间的空间。在清洁操作中，构件移动到构件的表面面向光学元件的位置，并且液体供应系统将曝光液体从供给口提供到光学元件与构件表面之间的空间。

90. 发明授权

US07388649B2 Exposure apparatus and method for producing device 有权
标题翻译：曝光装置及其制造方法
公开(公告)号：US07388649B2
公开(公告)日：2008-06-17
申请号：US11284187
申请日：2005-11-22
申请人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
发明人： Naoyuki Kobayashi , Akikazu Tanimoto , Yasushi Mizuno , Kenichi Shiraishi , Katsushi Nakano , Soichi Owa
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/7085 , G03B27/52 , G03F7/00 , G03F7/2041 , G03F7/70316 , G03F7/70341 , G03F7/70775 , G03F7/70916 , G03F7/70925 , G03F7/70958 , G03F9/7015 , G03F9/7088 , G03F9/7096
摘要： There is provided an exposure apparatus capable of forming a desirable device pattern by removing unnecessary liquid when performing exposure by projecting a pattern onto the substrate via a projection optical system and the liquid. The exposure device projects an image of the pattern onto the substrate P via the projection optical system and the liquid so as to expose the substrate P. The exposure device includes a liquid removing mechanism 40 which removes the liquid remaining on a part 7 arranged in the vicinity of the image plane of the projection optical system.
摘要翻译：提供了一种曝光装置，其能够通过经由投影光学系统和液体将图案投影到基板上时通过去除不需要的液体来形成期望的装置图案。曝光装置经由投影光学系统和液体将图案的图像投影到基板P上，以露出基板P.曝光装置包括：液体移除机构40，其去除残留在布置在基板投影光学系统的像平面附近。

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