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1. 发明申请

US20060187432A1 Exposure apparatus, exposure method, and method for producing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US20060187432A1
公开(公告)日：2006-08-24
申请号：US11399537
申请日：2006-04-07
申请人： Masahiko Yasuda , Takahiro Masada , Yuho Kanaya , Tadashi Nagayama , Kenichi Shiraishi
发明人： Masahiko Yasuda , Takahiro Masada , Yuho Kanaya , Tadashi Nagayama , Kenichi Shiraishi
IPC分类号： G03B27/42
CPC分类号： G03F7/70341 , G03F7/70141 , G03F7/70716 , G03F9/7088
摘要： An exposure apparatus includes a substrate stage movable while holding a substrate, a substrate alignment system which detects an alignment mark (1) on the substrate held by the substrate stage and detects a reference mark (PFM) provided on the substrate stage, and a mask alignment system which detects, via a projection optical system, a reference mark (MFM) provided on the substrate stage. The reference mark (PFM) on the substrate stage is detected without a liquid by using the substrate alignment system, and the reference mark (MFM) on the substrate stage is detected using the mask alignment system via the projection optical system and the liquid. Then, a positional relationship between a detection reference position of the substrate alignment system and a projection position of an image of a pattern is obtained, thereby accurately performing alignment processing in the liquid immersion exposure.
摘要翻译：一种曝光装置，包括：在保持基板的同时可移动的基板台;基板对准系统，其检测由基板台保持的基板上的对准标记（1），并检测设置在基板台上的基准标记（PFM）;以及掩模对准系统，其经由投影光学系统检测设置在基板台上的参考标记（MFM）。通过使用衬底对准系统，无需液体检测衬底台上的参考标记（PFM），并且通过投影光学系统和液体使用掩模对准系统检测衬底台上的参考标记（MFM）。然后，获得基板对准系统的检测基准位置与图案的图像的投影位置之间的位置关系，从而在液浸曝光中精确地进行取向处理。

2. 发明授权

US08130361B2 Exposure apparatus, exposure method, and method for producing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US08130361B2
公开(公告)日：2012-03-06
申请号：US11399537
申请日：2006-04-07
申请人： Masahiko Yasuda , Takahiro Masada , Yuho Kanaya , Tadashi Nagayama , Kenichi Shiraishi
发明人： Masahiko Yasuda , Takahiro Masada , Yuho Kanaya , Tadashi Nagayama , Kenichi Shiraishi
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/70141 , G03F7/70716 , G03F9/7088
摘要： An exposure apparatus includes a substrate stage movable while holding a substrate, a substrate alignment system which detects an alignment mark (1) on the substrate held by the substrate stage and detects a reference mark (PFM) provided on the substrate stage, and a mask alignment system which detects, via a projection optical system, a reference mark (MFM) provided on the substrate stage. The reference mark (PFM) on the substrate stage is detected without a liquid by using the substrate alignment system, and the reference mark (MFM) on the substrate stage is detected using the mask alignment system via the projection optical system and the liquid. Then, a positional relationship between a detection reference position of the substrate alignment system and a projection position of an image of a pattern is obtained, thereby accurately performing alignment processing in the liquid immersion exposure.
摘要翻译：一种曝光装置，包括：在保持基板的同时可移动的基板台;基板对准系统，其检测由基板台保持的基板上的对准标记（1），并检测设置在基板台上的基准标记（PFM）;以及掩模对准系统，其经由投影光学系统检测设置在基板台上的参考标记（MFM）。通过使用衬底对准系统，无需液体检测衬底台上的参考标记（PFM），并且通过投影光学系统和液体使用掩模对准系统检测衬底台上的参考标记（MFM）。然后，获得基板对准系统的检测基准位置与图案的图像的投影位置之间的位置关系，从而在液浸曝光中精确地进行取向处理。

3. 发明授权

US09063438B2 Exposure apparatus, exposure method, and method for producing device 有权
标题翻译：曝光装置，曝光方法和制造装置的方法
公开(公告)号：US09063438B2
公开(公告)日：2015-06-23
申请号：US13354899
申请日：2012-01-20
申请人： Masahiko Yasuda , Takahiro Masada , Yuho Kanaya , Tadashi Nagayama
发明人： Masahiko Yasuda , Takahiro Masada , Yuho Kanaya , Tadashi Nagayama
IPC分类号： G03F9/00 , G03F7/20
CPC分类号： G03F7/70341 , G03F7/70141 , G03F7/70716 , G03F9/7088
摘要： A liquid immersion exposure apparatus includes a projection system having a last optical element, the projection system projecting a beam onto a substrate through an immersion liquid; a movable stage having a holder by which the substrate is held; a measurement member provided on the movable stage, the measurement member having a measurement portion covered with a light-transmissive material; a first alignment system by which an alignment mark is detected not through the immersion liquid; and a second alignment system which optically obtains, using the measurement member, first positional information of the beam projected by the projection system through the immersion liquid. In order to obtain the first positional information, the movable stage is moved so that the measurement member is under the projection system and a gap between the projection system and the measurement member is filled with the immersion liquid.
摘要翻译：液浸曝光装置包括具有最后光学元件的投影系统，投影系统通过浸没液体将光束投射到基板上; 可动台，具有保持基板的保持架; 测量构件，设置在所述可移动台上，所述测量构件具有覆盖有透光材料的测量部分; 第一对准系统，通过该第一对准系统不通过浸没液体检测对准标记; 以及第二对准系统，其使用所述测量构件，通过所述浸没液体，光学地获得由所述投影系统投影的所述光束的第一位置信息。为了获得第一位置信息，移动台被移动，使得测量构件在投影系统下方，并且投影系统和测量构件之间的间隙被浸没液体填充。

4. 发明授权

US09256140B2 Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method with measurement device to measure movable body in Z direction 有权
标题翻译：移动体装置，图案形成装置和曝光装置以及在Z方向上测量移动体的测量装置的装置制造方法
公开(公告)号：US09256140B2
公开(公告)日：2016-02-09
申请号：US12263659
申请日：2008-11-03
申请人： Yuho Kanaya
发明人： Yuho Kanaya
IPC分类号： G03F7/20 , G03F9/00
CPC分类号： G03F7/70775 , G03F9/7034
摘要： On the +X and −X sides of a projection unit, a plurality of Z heads are arranged in parallel to the X-axis, by a predetermined distance half or less than half the effective width of the Y scale so that two Z heads each constantly form a pair and face a pair of Y scales. Of the pair of heads consisting of two Z heads which simultaneously face the scale, measurement values of a priority head is used, and when abnormality occurs in the measurement values of the priority head due to malfunction of the head, measurement values of the other head is used, and the positional information of the stage in at least the Z-axis direction can be measured in a stable manner and with high precision.
摘要翻译：在投影单元的+ X和-X侧上，多个Z头平行于X轴排列预定距离的一半或小于Y标尺的有效宽度的一半，从而每个Z头不断形成一对，面对一对Y尺度。在由同时面对刻度的两个Z头组成的一对头中，使用优先级头的测量值，并且当由于头部故障导致的优先级头的测量值发生异常时，另一头的测量值并且能够以高精度稳定地测量台阶的至少Z轴方向的位置信息。

5. 发明授权

US08547527B2 Movable body drive method and movable body drive system, pattern formation method and pattern formation apparatus, and device manufacturing method 有权
标题翻译：可移动体驱动方法和移动体驱动系统，图案形成方法和图案形成装置以及装置制造方法
公开(公告)号：US08547527B2
公开(公告)日：2013-10-01
申请号：US12175783
申请日：2008-07-18
申请人： Yuho Kanaya
发明人： Yuho Kanaya
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/70775 , G03F7/70516
摘要： First positional information of a stage is measured using an interferometer system, for example, an X interferometer and a Y interferometer. At the same time, second positional information of the stage is measured using an encoder system, for example, one X head and one Y head. A coordinate offset is set by performing a moving average of the difference between the first positional information and the second positional information for over a predetermined measurement time, and the reliability of output signals of the encoder system is verified using the coordinate offset. In the case the output signals are determined to be normal, the stage is servocontrolled using the sum of the first positional information and the coordinate offset. Such servocontrol by a hybrid method makes it possible to perform drive control of the stage having stability of the interferometer and accuracy of the encoder together.
摘要翻译：使用干涉仪系统例如X干涉仪和Y干涉仪来测量舞台的第一位置信息。同时，使用编码器系统例如一个X头和一个Y头测量舞台的第二位置信息。通过在预定的测量时间内执行第一位置信息和第二位置信息之间的差的移动平均值来设置坐标偏移，并且使用坐标偏移验证编码器系统的输出信号的可靠性。在输出信号被确定为正常的情况下，使用第一位置信息和坐标偏移的和对伺服电机进行伺服控制。通过混合方式的这种伺服控制使得可以执行具有干涉仪的稳定性的台阶的驱动控制和编码器的精度。

6. 发明授权

US08237919B2 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method for continuous position measurement of movable body before and after switching between sensor heads 有权
标题翻译：可移动体驱动方法和移动体驱动系统，图案形成方法和装置，曝光方法和装置以及用于在传感器头之间切换之前和之后的可移动体的连续位置测量的装置制造方法
公开(公告)号：US08237919B2
公开(公告)日：2012-08-07
申请号：US12196133
申请日：2008-08-21
申请人： Yuichi Shibazaki , Yuho Kanaya
发明人： Yuichi Shibazaki , Yuho Kanaya
IPC分类号： G03B27/58
CPC分类号： G03F7/7085 , G03F7/70775 , G03F9/7026 , G03F9/7034
摘要： A controller uses two Z heads, which are positioned above a reflection surface installed on the ±X ends of the upper surface of a table, to measure the height and tilt of the table. According to the XY position of the table, the Z heads to be used are switched from ZsR and ZsL to ZsR′ and ZsL. On the switching of the heads, the controller applies a coordinate linkage method to set an initial value of the Z heads which are to be newly used. Accordingly, although the Z heads to be used are sequentially switched according to the XY position of the table, measurement results of the height and the tilt of the table are stored before and after the switching, and it becomes possible to drive the table with high precision.
摘要翻译：控制器使用两个Z头，它们位于安装在桌子上表面的±X端的反射表面上方，以测量桌子的高度和倾斜度。根据表的XY位置，要使用的Z头从ZsR和ZsL切换到ZsR'和ZsL。在切换头部时，控制器应用坐标联动方法来设定要被新使用的Z头的初始值。因此，尽管根据工作台的XY位置依次切换要使用的Z头，但是在切换之前和之后存储表的高度和倾斜度的测量结果，并且可以以高的速度驱动工作台精确。

7. 发明授权

US08218129B2 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, measuring method, and position measurement system 有权
标题翻译：移动体驱动方法和移动体驱动系统，图案形成方法和装置，曝光方法和装置，装置制造方法，测量方法和位置测量系统
公开(公告)号：US08218129B2
公开(公告)日：2012-07-10
申请号：US12195923
申请日：2008-08-21
申请人： Yuichi Shibazaki , Yuho Kanaya
发明人： Yuichi Shibazaki , Yuho Kanaya
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/7085 , G03F7/70516 , G03F7/70775 , G03F9/7026 , G03F9/7034
摘要： By moving a wafer stage while monitoring an XY position of a wafer stage WST using an interferometer system, and scanning a Y scale in an X-axis direction and a Y-axis direction using a surface position sensor, an XY setting position of the surface position sensor is measured. Based on information of the setting position obtained, by measuring a position coordinate of the wafer stage in a perpendicular direction with respect to an XY plane and a tilt direction, the wafer stage is driven in a stable manner and with high precision.
摘要翻译：通过使用干涉仪系统监视晶片载台WST的XY位置并使用表面位置传感器在X轴方向和Y轴方向上扫描Y刻度来移动晶片台，将表面的XY设定位置测量位置传感器。基于所获得的设定位置的信息，通过相对于XY平面和倾斜方向测量晶片台的垂直方向的位置坐标，以稳定的方式高精度地驱动晶片台。

8. 发明申请

US20110299058A1 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method 有权
公开(公告)号：US20110299058A1
公开(公告)日：2011-12-08
申请号：US13137406
申请日：2011-08-11
申请人： Yuichi Shibazaki , Yuho Kanaya
发明人： Yuichi Shibazaki , Yuho Kanaya
IPC分类号： G03B27/58 , B65G47/00
CPC分类号： G03F7/70775
摘要： Positional information of a wafer stage in a Z-axis direction and a tilt direction with respect to the XY plane (for example, a θy direction) is measured, using a surface position measurement system, such as, for example, a Z head and the like, and the wafer stage is driven based on the measurement results. At the same time, positional information of the wafer stage is measured using an interferometer system such as, for example, a Z interferometer. When abnormality of the surface position measurement system is detected or when the wafer stage moves off from a measurement area of the surface position measurement system, drive control is switched to a drive control based on the measurement results of the interferometer system. Accordingly, the wafer stage can be driven continuously even at the time of abnormality generation in the surface position measurement system.

9. 发明授权

US09013681B2 Movable body apparatus, pattern formation apparatus and exposure apparatus, and device manufacturing method 有权
标题翻译：移动体装置，图案形成装置和曝光装置以及装置的制造方法
公开(公告)号：US09013681B2
公开(公告)日：2015-04-21
申请号：US12262484
申请日：2008-10-31
申请人： Yuho Kanaya
发明人： Yuho Kanaya
IPC分类号： G03F7/20
CPC分类号： G03F7/70775
摘要： On the +X and −X sides of a projection unit, a plurality of Y heads are arranged in parallel to the X-axis by a predetermined distance half or less than half the effective width of the scale, so that two heads each constantly form a pair and face a pair of Y scales. Similarly, on the +Y and −Y sides of the projection unit, a plurality of X heads are arranged in parallel to the Y-axis by the predetermined distance described above, so that two heads each constantly form a pair and face a pair of X scales. Of the pair of heads consisting of two heads which simultaneously face the scale, measurement values of a priority head is used, and when abnormality occurs in the measurement values of the priority head due to malfunction of the head, measurement values of the other head is used. Then, by using the measurement values of the two pairs of Y heads and the pair of X heads, a position of a stage within a two-dimensional plane is measured in a stable manner and with high precision.
摘要翻译：在投影单元的+ X和-X侧上，多个Y头与X轴平行布置预定距离的一半或小于刻度的有效宽度的一半，从而使两个头不断地形成一对，面对一对Y尺度。类似地，在投影单元的+ Y和-Y侧，多个X头与Y轴平行设置上述预定距离，使得两个头每个不断地形成一对并面对一对 X尺度在由同时面对刻度的两个头组成的一对头中，使用优先头的测量值，并且当由于头的故障而在优先级头的测量值中出现异常时，另一头的测量值为用过的。然后，通过使用两对Y头和一对X头的测量值，以稳定的方式和高精度测量二维平面内的平台的位置。

10. 发明授权

US08792086B2 Movable body drive method and movable body drive system, and pattern formation method and pattern formation apparatus 有权
标题翻译：移动体驱动方法和移动体驱动系统，图案形成方法和图案形成装置
公开(公告)号：US08792086B2
公开(公告)日：2014-07-29
申请号：US13296792
申请日：2011-11-15
申请人： Yuho Kanaya
发明人： Yuho Kanaya
IPC分类号： G03B27/58 , G03F7/20
CPC分类号： G03F7/70775 , G03F7/70725 , G03F7/7085 , G03F9/7011 , G03F9/7019 , G03F9/7088
摘要： A first positional information of a wafer stage is measured using an interferometer system such as, for example, a Z interferometer. At the same time, a second positional information of the wafer stage is measured using a surface position measurement system such as, for example, two Z heads. Moving average is applied to a difference between the first positional information and the second positional information for a predetermined measurement time to set a coordinate offset, which is used to inspect the reliability of output signals of the surface position measurement system. When the output signals are confirmed to be normal, servo control of the wafer stage is performed using a sum of the first positional information and the coordinate offset. According to this hybrid method, drive control of the wafer stage which has the stability of the interferometer and the precision of the Z heads becomes possible.
摘要翻译：使用诸如例如Z干涉仪的干涉仪系统测量晶片台的第一位置信息。同时，使用例如两个Z头的表面位置测量系统来测量晶片台的第二位置信息。将移动平均值应用于第一位置信息和第二位置信息之间的预定测量时间的差，以设置用于检查表面位置测量系统的输出信号的可靠性的坐标偏移。当输出信号被确认为正常时，使用第一位置信息和坐标偏移的和执行晶片台的伺服控制。根据该混合方式，可以实现具有干涉仪的稳定性和Z头的精度的晶片台的驱动控制。

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