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71. 发明申请

US20110293401A1 TURBOMOLECULAR PUMP, AND PARTICLE TRAP FOR TURBOMOLECULAR PUMP 有权
标题翻译：涡轮分子泵和用于涡轮分子泵的颗粒捕获
公开(公告)号：US20110293401A1
公开(公告)日：2011-12-01
申请号：US13146497
申请日：2010-02-05
申请人： Yukiteru Sekita , Kazuma Kubota , Tsuyoshi Moriya , Eiichi Sugawara
发明人： Yukiteru Sekita , Kazuma Kubota , Tsuyoshi Moriya , Eiichi Sugawara
IPC分类号： F01D1/36 , B01D46/00 , B01D50/00 , F04D19/04
CPC分类号： F04D29/701 , F04D19/042
摘要： A turbomolecular pump includes: a rotor (30) formed with rotating blades (32) in a plurality of stages, and rotating at high speed; a plurality of fixed blades (33) arranged along axial direction of the pump so as to alternate with respect to the rotating blades (32); a pump housing (34) containing the rotating blades (32) and the fixed blades (33), and formed with an inlet opening (21a); a circular disk (150), provided close to the inlet opening of the rotor (30), and arranged so as to oppose a surface of the rotor (30) radially inward than a root portion of the rotating blades; and a cylindrical mesh structure (153a, 153b), disposed between the inlet opening (21a) and the rotor (30), and made by interlacing fine wires. Particles that strike the rotor and bounce off are captured internally in the mesh structure (153a, 153b).
摘要翻译：涡轮分子泵包括：转子（30），其形成有多级的旋转叶片（32），并且高速旋转; 沿所述泵的轴向布置成相对于所述旋转叶片（32）交替的多个固定叶片（33）。包含旋转叶片（32）和固定叶片（33）的泵壳体（34），并形成有入口开口（21a）; 设置在所述转子（30）的入口附近的圆盘（150），并且与所述旋转叶片的根部径向向内配置成与所述转子（30）的表面相对; 以及设置在入口开口（21a）和转子（30）之间并通过交织细线制成的圆柱形网状结构（153a，153b）。撞击转子和反弹的颗粒被内部捕获在网状结构（153a，153b）中。

72. 发明授权

US08048235B2 Gate valve cleaning method and substrate processing system 有权
标题翻译：闸阀清洗方法和基板处理系统
公开(公告)号：US08048235B2
公开(公告)日：2011-11-01
申请号：US11969428
申请日：2008-01-04
申请人： Tsuyoshi Moriya , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
发明人： Tsuyoshi Moriya , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
IPC分类号： B08B6/00 , B08B5/02 , B08B7/02
CPC分类号： H01L21/67126
摘要： A gate valve cleaning method that can clean a gate valve that brings an atmospheric transfer chamber and an internal pressure variable transfer chamber that transfer a substrate into communication with each other or shuts them off from each other without bringing about a decrease in the throughput of a substrate processing system. Before the gate valve brings the atmospheric transfer chamber and the internal pressure variable transfer chamber into communication with each other, the pressure in the internal pressure variable transfer chamber is increased so that the pressure in the internal pressure variable transfer chamber can become higher than the pressure in the atmospheric transfer chamber.
摘要翻译：一种闸阀清洗方法，其能够清洁使大气传送室和内部压力可变转移室的闸阀彼此连通或彼此连通或将它们彼此关闭，而不会导致生产量的降低基板处理系统。在闸阀将大气传送室和内压可变传送室彼此连通之前，内压可变传送室中的压力增加，使得内压可变传送室中的压力可以变得高于压力在大气传递室。

73. 发明授权

US08012303B2 Container cleanliness measurement apparatus and method, and substrate processing system 有权
标题翻译：集装箱清洁度测量装置和方法，以及基板处理系统
公开(公告)号：US08012303B2
公开(公告)日：2011-09-06
申请号：US12199960
申请日：2008-08-28
申请人： Tsuyoshi Moriya , Toshiya Matsuda
发明人： Tsuyoshi Moriya , Toshiya Matsuda
IPC分类号： H01L21/00
CPC分类号： G01N1/2202 , G01N1/2208 , G01N15/0606 , G01N15/065 , G01N2001/2217 , G01N2015/0261 , H01L21/67028 , H01L21/67253
摘要： A container cleanliness measurement apparatus capable of preventing particles from being adhered to substrates, while improving the operation efficiency of a container for housing substrates. An FOUP inspection apparatus includes a particle-separation promoting nozzle for promoting separation of particles adhered to an inner wall of an FOUP and to carries for holding peripheral portions of wafers inside the FOUP, a particle collecting nozzle for collecting particles separated from the inner wall of the FOUP, etc., and a particle counter for measuring an amount of collected particles. The particle-separation promoting nozzle and the particle collecting nozzle constitute a probe nozzle which is adapted to enter inside the FOUP.
摘要翻译：一种能够防止颗粒附着于基板的容器清洁度测量装置，同时提高用于容纳基板的容器的操作效率。 FOUP检查装置包括用于促进分离附着在FOUP的内壁上的颗粒的颗粒分离促进喷嘴，并且用于承载用于保持FOUP内的晶片周边部分的颗粒收集喷嘴，用于收集从内部壁分离的颗粒的颗粒收集喷嘴 FOUP等，以及用于测量收集的颗粒量的颗粒计数器。颗粒分离促进喷嘴和颗粒收集喷嘴构成适于进入FOUP内部的探针喷嘴。

74. 发明授权

US07976637B2 Substrate processing system, substrate surface processing apparatus, substrate surface inspecting apparatus, substrate surface inspecting method, and storage medium storing program for implementing the method 有权
标题翻译：基板处理系统，基板表面处理装置，基板表面检查装置，基板表面检查方法以及用于实施该方法的存储介质存储程序
公开(公告)号：US07976637B2
公开(公告)日：2011-07-12
申请号：US11683164
申请日：2007-03-07
申请人： Hiroshi Nagaike , Tsuyoshi Moriya
发明人： Hiroshi Nagaike , Tsuyoshi Moriya
IPC分类号： B08B6/00 , C25F1/00
CPC分类号： H01L21/67161 , G01N21/91 , G01N21/94 , G01N21/9501 , H01J37/023 , H01J37/256 , H01J2237/20228 , H01L21/6719 , H01L21/67213
摘要： A substrate processing system which enables a minute pieces of foreign matter attached to a substrate surface to be detected and are suitable for mass production of substrates. The substrate processing system has a substrate processing apparatus that carries out predetermined processing on a substrate. The substrate processing system comprises a substrate surface processing apparatus having a fluid supply unit that supplies onto a surface of the substrate a fluid containing an altering substance that alters a substance exposed at the surface of the substrate, and a substrate surface inspecting apparatus that inspects the surface of the substrate onto which the fluid has been supplied.
摘要翻译：能够检测附着于基板表面的微小的异物的基板处理系统，适用于大量生产基板。基板处理系统具有对基板进行预定处理的基板处理装置。基板处理系统包括具有流体供给单元的基板表面处理装置，该流体供给单元向基板的表面供给包含改变在基板的表面露出的物质的变质物质的流体，以及检查基板表面检查装置已经供应流体的基底的表面。

75. 发明申请

US20100153065A1 INFORMATION PROCESSING DEVICE, INFORMATION PROCESSING METHOD AND PROGRAM 审中-公开
标题翻译：信息处理设备，信息处理方法和程序
公开(公告)号：US20100153065A1
公开(公告)日：2010-06-17
申请号：US12711255
申请日：2010-02-24
申请人： Kazuhiro KAWAMURA , Tsuyoshi Moriya , Yasutoshi Umehara
发明人： Kazuhiro KAWAMURA , Tsuyoshi Moriya , Yasutoshi Umehara
IPC分类号： G06F15/00 , G06F17/18
CPC分类号： G05B23/024 , H01L22/20 , H01L2924/0002 , H01L2924/00
摘要： An information processing device includes a first input receiving unit, a second input receiving unit, a window function processing unit, a correlation calculating unit, and an output unit. The first input receiving unit is configured to receive first information including a first time-series data related to a semiconductor process. The second input receiving unit is configured to receive second information including a second time-series data related to the semiconductor process. The window function processing unit is configured to retrieve window acquiring information from the first information during an intended period using a window function. The correlation calculating unit is configured to calculate a cross-correlation function between the window acquiring information retrieved by the window function processing unit and the second information. The output unit is configured to output information corresponding to the cross-correlation function calculated by the correlation calculating unit.
摘要翻译：信息处理装置包括第一输入接收单元，第二输入接收单元，窗函数处理单元，相关计算单元和输出单元。第一输入接收单元被配置为接收包括与半导体处理相关的第一时间序列数据的第一信息。第二输入接收单元被配置为接收包括与半导体处理相关的第二时间序列数据的第二信息。窗口功能处理单元被配置为使用窗口函数在预期期间从第一信息检索窗口获取信息。相关计算单元被配置为计算由窗函数处理单元检索的窗口获取信息与第二信息之间的互相关函数。输出单元被配置为输出与由相关计算单元计算的互相关函数相对应的信息。

76. 发明申请

US20100136230A1 METHOD OF CLEANING POWDERY SOURCE SUPPLY SYSTEM, STORAGE MEDIUM, SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE PROCESSING METHOD 有权
标题翻译：清洗粉源供应系统，储存介质，基板处理系统和基板处理方法
公开(公告)号：US20100136230A1
公开(公告)日：2010-06-03
申请号：US12593945
申请日：2008-03-26
申请人： Tsuyoshi Moriya , Toshio Hasegawa , Hideaki Yamasaki
发明人： Tsuyoshi Moriya , Toshio Hasegawa , Hideaki Yamasaki
IPC分类号： B05D1/12 , B05C5/00
CPC分类号： C23C16/4402
摘要： A method of cleaning a powdery source supply system prevents outflow of particles from a chamber or an introduction line in a film forming process. A substrate processing system includes a powdery source supply system and a film forming processing unit. The powdery source supply system includes an ampoule for accommodating a powdery source, a carrier gas supply unit for supplying a carrier gas into the ampoule, an introduction line for connecting the ampoule and the film forming processing unit, a purge line branched from the introduction line, and a valve for opening or closing the introduction line. When the valve is opened and the interior of the purge line is evacuated prior to the film forming process, the carrier gas supply unit supplies a carrier gas so that the viscous force acting on particles by the carrier gas is greater than the viscous force in the film forming process.
摘要翻译：清洁粉末源供应系统的方法可以防止颗粒从成膜过程中的室或引入管流出。基板处理系统包括粉末源供应系统和成膜处理单元。粉末源供给系统包括用于容纳粉末源的安瓿，用于将载气供应到安瓿中的载气供给单元，用于连接安瓿和成膜处理单元的引入管线，从导入管分支的净化管线，以及用于打开或关闭引入管线的阀。当打开阀门并且在成膜过程之前将净化管线的内部抽真空时，载气供给单元提供载气，使得由载气作用在颗粒上的粘性力大于载体气体中的粘性力成膜工艺。

77. 发明申请

US20090025552A1 GAS PURIFICATION APPARATUS AND METHOD 有权
标题翻译：气体净化装置和方法
公开(公告)号：US20090025552A1
公开(公告)日：2009-01-29
申请号：US12174040
申请日：2008-07-16
申请人： Tsuyoshi Moriya
发明人： Tsuyoshi Moriya
IPC分类号： B01D46/46
CPC分类号： B03C3/014 , B01D46/0023 , B01D46/0032 , B01D46/0063 , B01D46/42 , B01D46/4218 , B01D46/46 , B01D2275/305 , B03C3/08 , B03C3/09 , B03C3/368 , B03C3/455 , H01L21/67069 , H01L21/67167 , Y10S55/10
摘要： A gas purification apparatus capable of removing fine particles of substantially any size without lowering the efficiency of gas supply. A loader module of a substrate processing apparatus includes a fan filter unit for producing a downward flow of atmospheric air in the internal space of a transfer chamber. The fan filter unit includes a fan for generating an atmospheric air flow, a filter of mesh structure for trapping and removing particles mixed in the atmospheric air flow, an irradiation heater disposed between the fan and the filter, and a high temperature part disposed in the atmospheric air flow and higher in temperature than the filter.
摘要翻译：一种气体净化装置，其能够在不降低气体供给效率的情况下除去基本上任何尺寸的微粒。基板处理装置的装载机模块包括用于在传送室的内部空间中产生向下的大气空气流的风扇过滤器单元。风扇过滤器单元包括用于产生大气气流的风扇，用于捕集和去除在大气中混合的颗粒的网状结构的过滤器，设置在风扇和过滤器之间的照射加热器，以及设置在风扇过滤器中的高温部分大气气流和温度高于过滤器。

78. 发明申请

US20080301972A1 EVACUATION METHOD AND STORAGE MEDIUM 有权
标题翻译：排放方法和储存介质
公开(公告)号：US20080301972A1
公开(公告)日：2008-12-11
申请号：US12134604
申请日：2008-06-06
申请人： Jun Yamawaku , Tsuyoshi Moriya , Hideaki Yakushiji , Kazumasa Abe
发明人： Jun Yamawaku , Tsuyoshi Moriya , Hideaki Yakushiji , Kazumasa Abe
IPC分类号： F26B5/04
CPC分类号： H01J37/3244 , H01J37/32449
摘要： An evacuation method which can reduce evacuation time without causing moisture-related problems. In a vacuum processing apparatus including a vacuum processing chamber, during the evacuation for the vacuum processing chamber, the pressure in the vacuum processing chamber is maintained at a pressure lower than or equal to the atmospheric pressure but higher than or equal to 6.7×102 Pa (5 Torr).
摘要翻译：可以减少疏散时间而不引起与潮湿有关的问题的疏散方法。在包括真空处理室的真空处理设备中，在真空处理室抽真空期间，真空处理室中的压力保持在低于或等于大气压力但高于或等于6.7×102Pa（ 5托）。

79. 发明申请

US20080245387A1 METHOD FOR CLEANING ELEMENTS IN VACUUM CHAMBER AND APPARATUS FOR PROCESSING SUBSTRATES 有权
公开(公告)号：US20080245387A1
公开(公告)日：2008-10-09
申请号：US12131803
申请日：2008-06-02
申请人： Tsuyoshi Moriya , Hiroshi Nagaike , Hiroyuki Nakayama
发明人： Tsuyoshi Moriya , Hiroshi Nagaike , Hiroyuki Nakayama
IPC分类号： B08B7/04 , B08B5/00
CPC分类号： H01L21/67028 , B08B3/12 , H01J37/32862 , H01L21/6831
摘要： To clean an element in a vacuum chamber by causing particles sticking to the element to scatter, the present invention uses a means for applying a voltage to the element and causing the particles to scatter by utilizing Maxwell's stress, a means for electrically charging the particles and causing the particles to scatter by utilizing the Coulomb force, a means for introducing a gas into the vacuum chamber and causing the particles sticking to the element to scatter by causing a gas shock wave to hit the element, a means for heating the element and causing the particles to scatter by utilizing the thermal stress and thermophoretic force, or a means for causing the particles to scatter by applying mechanical vibrations to the element. The thus scattered particles are removed by carrying them in a gas flow in a relatively high pressure atmosphere.

80. 发明申请

US20080240905A1 EXHAUST PUMP, COMMUNICATING PIPE, AND EXHAUST SYSTEM 有权
标题翻译：排气泵，通讯管，排气系统
公开(公告)号：US20080240905A1
公开(公告)日：2008-10-02
申请号：US12053819
申请日：2008-03-24
申请人： Eiichi SUGAWARA , Tsuyoshi Moriya
发明人： Eiichi SUGAWARA , Tsuyoshi Moriya
IPC分类号： F04D29/70
CPC分类号： F04D19/042 , F04D19/04 , F04D27/003 , F04D29/701
摘要： An exhaust pump that prevents particles from entering a processing chamber of a substrate processing apparatus. The exhaust pump connected to the processing chamber has rotary blades and an air intake portion disposed on the processing chamber side of the rotary blades. A shielding unit is disposed inside the air intake portion and shields the rotary blades when the air intake portion is viewed from the processing chamber side.
摘要翻译：一种防止颗粒进入基板处理装置的处理室的排气泵。连接到处理室的排气泵具有旋转叶片和设置在旋转叶片的处理室侧的进气部分。当从处理室侧观察进气部分时，屏蔽单元设置在进气部内部并遮蔽旋转叶片。

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