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71. 发明授权

US5220171A Wafer holding device in an exposure apparatus 失效
标题翻译：曝光装置中的保温装置
公开(公告)号：US5220171A
公开(公告)日：1993-06-15
申请号：US786885
申请日：1991-11-01
申请人： Shinichi Hara , Eiji Sakamoto , Ryuichi Ebinuma
发明人： Shinichi Hara , Eiji Sakamoto , Ryuichi Ebinuma
IPC分类号： G03F7/20 , H01L21/00 , H01L21/687
CPC分类号： H01L21/67109 , G03F7/707 , G03F7/70875
摘要： A substrate holding device includes a chuck having an attracting surface for holding a substrate, an inside space and an inside heat pipe structure provided in the inside space, the heat pipe structure removing generated heat by evaporation of a liquid medium; a temperature controlling block having a structure that allows flow of a temperature controlling medium therethrough, the temperature controlling block being thermally coupled to the attracting surface of the chuck through the heat pipe structure; and a stage for moving the chuck and the temperature controlling block as a unit, and for supporting the chuck through the temperature controlling block.

72. 发明授权

US5063582A Liquid cooled X-ray lithographic exposure apparatus 失效
标题翻译：液体冷却X射线光刻曝光装置
公开(公告)号：US5063582A
公开(公告)日：1991-11-05
申请号：US658434
申请日：1991-02-20
申请人： Tetsuzo Mori , Eiji Sakamoto , Shinichi Hara , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Kunitaka Ozawa
发明人： Tetsuzo Mori , Eiji Sakamoto , Shinichi Hara , Koji Uda , Isamu Shimoda , Shunichi Uzawa , Kunitaka Ozawa
IPC分类号： G03F7/20
CPC分类号： G03F7/709 , G03F7/707 , G03F7/70716 , G03F7/70866 , G03F7/70875
摘要： The present invention relates to a temperature control system for a lithographic exposure apparatus wherein a mask and wafer are closely disposed, and predetermined exposure energy is applied to respective shot areas of the wafer through the mask. The exposure energy is a soft-X-ray source, for example. The pattern of the mask is transferred onto the respective shot areas in a step-and-repeat manner. In the apparatus, a temperature control medium liquid is supplied into the wafer chuck which supports the wafer at the exposure position. The flow rate of the temperature control liquid is different during an exposure operation than during a non-exposure-operation. The flow control is determined in consideration of the wafer chuck vibration attributable to the supply of the liquid medium and also, of the heat generation in the wafer by the exposure energy, so that the vibration of the wafer chuck during the exposure operation is suppressed. Simultaneously the temperature rise of the wafer can also be suppressed. The pattern transfer from the mask to the wafer thus be precisely performed.

73. 发明授权

US4855123A Method of oxidizing sulfide-containing liquor 失效
标题翻译：氧化含硫液体的方法
公开(公告)号：US4855123A
公开(公告)日：1989-08-08
申请号：US170667
申请日：1988-03-10
申请人： Masayuki Suzuki , Shinichi Hara , Kuniaki Kimura , Takeo Ono , Munekazu Nakamura , Yoshihiro Ohguchi
发明人： Masayuki Suzuki , Shinichi Hara , Kuniaki Kimura , Takeo Ono , Munekazu Nakamura , Yoshihiro Ohguchi
IPC分类号： B01D24/02 , B01D24/00 , B01D24/38 , B01D29/46 , B01D29/62 , B01D29/88 , B01J21/18 , C01B17/34 , C01D1/04 , D21C11/00
CPC分类号： D21C11/0071 , B01J21/18 , C01B17/34 , C01D1/04
摘要： A method of treating an aqueous sodium sulfide solution, such as white liquor in kraft pulping systems, for the oxidation of the sulfide with oxygen in the presence of a specific activated carbon catalyst which is (a) a particulate activated carbon catalyst having an average particle diameter of 0.2-4 mm, a pore volume of at least 0.25 cc/g in pores with diameters of not smaller than 100 .ANG. and a pore volume of at least 35% of the total pore volume in pores with diameters of not smaller than 100 .ANG. or (b) a fibrous activated carbon catalyst having a specific surface area of 300-2500 m.sup.2 /g and an outer surface area of 0.1-5 m.sup.2 /g.
摘要翻译：在硫酸盐制浆系统中处理硫酸钠水溶液的方法，用于在特定活性炭催化剂存在下用氧气氧化硫化物，其是（a）具有平均颗粒的颗粒活性炭催化剂直径为0.2-4mm，孔直径不小于100的孔中的孔体积为至少0.25cc / g，孔直径不小于100的孔中孔体积为总孔体积的至少35％ ANGSTROM或（b）比表面积为300-2500m 2 / g，外表面积为0.1-5m 2 / g的纤维状活性炭催化剂。

74. 发明授权

US4685014A Production method of thin film magnetic head 失效
标题翻译：薄膜磁头的制作方法
公开(公告)号：US4685014A
公开(公告)日：1987-08-04
申请号：US403015
申请日：1982-07-29
申请人： Masanobu Hanazono , Shinichi Hara , Hirosi Akiyama , Masaaki Hayashi , Harunobu Saitoo , Takumi Kurisu
发明人： Masanobu Hanazono , Shinichi Hara , Hirosi Akiyama , Masaaki Hayashi , Harunobu Saitoo , Takumi Kurisu
IPC分类号： H01L21/31 , G11B5/31 , H01L21/302 , H01L21/3065 , G11B5/147
CPC分类号： G11B5/3163 , Y10T29/49044 , Y10T29/49064
摘要： In producing a magnetic head by thin film technique, a magnetic film is formed on an insulating member covering coil conductor films after the surface of the insulating member is flattened. After a flattening coating is formed on the insulating member, the flattening coating as well as the insulating member are etched by plasma-assisted etching technique in order to flatten the surface.
摘要翻译：在通过薄膜技术制造磁头时，在绝缘构件的表面变平后，在覆盖线圈导体膜的绝缘构件上形成磁性膜。在绝缘构件上形成平坦化的涂层之后，通过等离子体辅助蚀刻技术对平坦化涂层以及绝缘构件进行蚀刻，以使表面变平。

75. 发明授权

US4242177A Method for oxidizing malodorous sulfur compounds in kraft cooking liquor 失效
标题翻译：氧化硫酸盐蒸煮液中恶臭硫化合物的方法
公开(公告)号：US4242177A
公开(公告)日：1980-12-30
申请号：US932198
申请日：1978-08-09
申请人： Masayuki Suzuki , Nobuo Onuma , Fumihiko Ishizuka , Shinichi Hara , Akira Osawa , Akira Fukuzawa
发明人： Masayuki Suzuki , Nobuo Onuma , Fumihiko Ishizuka , Shinichi Hara , Akira Osawa , Akira Fukuzawa
IPC分类号： D21C3/00 , B01D53/48 , D21C11/00 , D21C11/04 , D21C11/06 , D21C3/02 , D21C11/08
CPC分类号： D21C11/0057 , B01D53/48
摘要： A method for oxidizing and removing remaining sodium sulfide as well as generated sulfur compounds by introducing oxygen into cooking liquor at high temperature and high pressure in the end stage of kraft cooking.
摘要翻译：在硫酸盐蒸煮的最后阶段，通过在高温和高压下将氧气引入烹调液中来氧化和除去剩余的硫化钠以及产生的硫化合物的方法。

76. 发明授权

US4050390A Method of treating sewage sludge 失效
标题翻译：污水处理方法
公开(公告)号：US4050390A
公开(公告)日：1977-09-27
申请号：US718559
申请日：1976-08-30
申请人： Shinichi Hara , Taro Kato
发明人： Shinichi Hara , Taro Kato
IPC分类号： B01J19/00 , C02F11/10 , C10B53/00 , F23G5/027 , F23G5/38 , F23G7/00 , F23G5/12
CPC分类号： C10B53/00 , C02F11/10 , F23G5/04 , F23G7/001 , Y02P20/129 , Y02W10/40
摘要： A method of treating sewage sludge is disclosed. The method makes use of an unitary multi-hearth furnace and the sewage sludge is dried in an upper part of the furnace and subjected to pyrolyzation in a lower part thereof to cause the sewage sludge to be reduced to ashes whereby a relatively small amount of exhaust gas is produced. The exhaust gas is also utilized as a heat supply source.
摘要翻译：公开了一种处理污水污泥的方法。该方法采用整体式多炉底炉，污泥在炉体上部进行干燥，并在下部进行热解，使得污水污泥减少为灰分，由此排出的废气相对较少产生气体。废气也被用作供热源。

77. 发明申请

US20100208232A1 TRACKING-TYPE LASER INTERFEROMETER 有权
标题翻译：跟踪型激光干涉仪
公开(公告)号：US20100208232A1
公开(公告)日：2010-08-19
申请号：US12707255
申请日：2010-02-17
申请人： Shinichi Hara
发明人： Shinichi Hara
IPC分类号： G01B11/02
CPC分类号： G01S7/4811 , G01B11/002 , G01S17/66
摘要： A tracking-type laser interferometer in which a pattern emission control unit controls a changing mechanism such that light is emitted along a predetermined pattern when judged by a first judgment unit that at least one of received-light amounts at first and second light reception units is not greater than a first threshold value. A tracking control unit causes the changing mechanism to keep track of a retro reflector when judged by a second judgment unit that both of the received-light amounts at the first and second light reception units are greater than second threshold values during a time period in which the pattern emission control unit controls the changing mechanism for the emission of light along the pattern. The interferometer emits light along the pattern to search for the retro reflector upon losing sight thereof. Upon detection, the interferometer can keep track of the reflector again and resume measurement.
摘要翻译：一种跟踪型激光干涉仪，其中图案发射控制单元控制改变机构，使得当由第一判断单元判断时沿着预定图案发射光，第一和第二光接收单元的接收光量中的至少一个为不大于第一阈值。跟踪控制单元使第一和第二光接收单元的接收光量在第二判断单元判断时，跟踪控制单元跟踪回光反射器，在第一和第二光接收单元处的接收光量都大于第二阈值，图案发射控制单元控制沿着图案发光的改变机构。干涉仪沿着图案发光，以便在看不见时搜索复古反射器。检测后，干涉仪可以重新跟踪反射镜并恢复测量。

78. 发明申请

US20080210094A1 Package of Volatile Substance and Air Conditioner For Vehicles Provided With the Package 有权
标题翻译：挥发性物质包装和带有包装的车辆的空调
公开(公告)号：US20080210094A1
公开(公告)日：2008-09-04
申请号：US11911439
申请日：2005-04-12
申请人： Shinichi Hara , Akihiko Yoshida , Frederic Giraud , Frederic Ladrech , Yoshie Aoki , Masumi Yamaguchi , Kiyoshi Kamei , Hidenao Saito
发明人： Shinichi Hara , Akihiko Yoshida , Frederic Giraud , Frederic Ladrech , Yoshie Aoki , Masumi Yamaguchi , Kiyoshi Kamei , Hidenao Saito
IPC分类号： B01D50/00 , A61L9/04
CPC分类号： B60H3/0007 , A61L9/12 , B60H3/0021 , B60H3/0035 , Y10S261/88
摘要： The object of the present invention is to provide a package of a volatile substances which comprises a bag having a volatile substance with an antibacterial action enclosed therein, and a case having the bag enclosed therein, wherein the case is allowed to have a size and shape complying with the amount of a volatile substance having permeated the bag so that the shape of the case can be adapted to the volumes and shapes of various air conditioners, while the volatile substance can be volatilized at a predetermined rate. The package of a volatile substance according to the invention comprises a source generating the volatile substance, and a case which has the volatile-substance source enclosed therein and which has a wall at least a part of which is made of a gas-permeable resin, wherein the case is characterized in that a value expressed by the formula X×Z/Y is 200000 to 1500000 wherein X represents the surface area (mm2) of the wall; Y represents the thickness (mm) of the wall; and Z represents the vaporization amount (mg/day) of the volatile substance volatilized by the volatile-substance source per day in an atmosphere at 30° C.
摘要翻译：本发明的目的是提供一种挥发性物质的包装，其包括具有封闭在其中的具有抗菌作用的挥发性物质的袋以及其中包围袋的壳体，其中允许该壳体具有尺寸和形状符合渗透袋的挥发性物质的量，使得壳体的形状可以适应各种空调的体积和形状，而挥发性物质可以以预定的速率挥发。根据本发明的挥发性物质的包装包括产生挥发性物质的源和包含挥发性物质源的壳体，其中至少一部分壁由透气性树脂制成，其特征在于，由式XxZ / Y表示的值为200000〜1500000，其中，X表示壁的表面积（mm×2）; Y表示壁的厚度（mm）; Z表示在30℃的气氛下，挥发性物质源每天挥发的挥发性物质的蒸发量（mg /日）。

79. 发明申请

US20070268494A1 METHOD FOR ESTIMATING ABSOLUTE DISTANCE OF TRACKING LASER INTERFEROMETER AND TRACKING LASER INTERFEROMETER 有权
标题翻译：跟踪激光干涉仪和跟踪激光干涉仪的绝对距离估计方法
公开(公告)号：US20070268494A1
公开(公告)日：2007-11-22
申请号：US11745749
申请日：2007-05-08
申请人： Shinichi Hara , Naoyuki Taketomi , Makoto Abbe
发明人： Shinichi Hara , Naoyuki Taketomi , Makoto Abbe
IPC分类号： G01B11/02
CPC分类号： G01S17/74 , G01S17/42 , G01S17/66
摘要： To provide a method for estimating an absolute distance L between a tracking laser interferometer and a retroreflector 70, the tracking laser interferometer including; the retroreflector 70 for reflecting and returning incident measurement light A in an incident direction; and a two-axis rotating mechanism 40 for rotationally moving in an exit direction of the measurement light A so that optical axes of the measurement light A and return light B are collimated, which outputs a measurement value according to an increase or decrease in the distance between the interferometer and the retroreflector 70, wherein the absolute distance L between the interferometer and the retroreflector 70 is estimated by performing arithmetic operation based on an angular position variation θ2 of the two-axis rotating mechanism 40 when a deviation amount d of the return light B from the retroreflector 70 relative to a predetermined position is given as a predetermined value d2. This enables an appropriate increase or decrease of the control amount of a tracking control according to a distance between the interferometer and the retroreflector without forcing an operator to perform a troublesome origin return operation and adding an expensive absolute distance sensor.
摘要翻译：为了提供一种用于估计跟踪激光干涉仪和后向反射器70之间的绝对距离L的方法，所述跟踪激光干涉仪包括：用于在入射方向上反射和返回入射测量光A的后向反射器70; 以及用于沿测量光A的出射方向旋转移动的双轴旋转机构40，使得测量光A和返回光B的光轴被准直，其根据距离的增减来输出测量值在干涉仪和后向反射器70之间，其中通过基于两轴旋转机构40的角度位置变化θ2进行算术运算来估计干涉仪和后向反射器70之间的绝对距离L. 来自后向反射器70的返回光B相对于预定位置的偏差量d被给定为预定值d 2。这使得能够根据干涉仪和后向反射器之间的距离适当地增加或减少跟踪控制的控制量，而不会强迫操作者执行麻烦的原点返回操作并添加昂贵的绝对距离传感器。

80. 发明申请

US20060285093A1 Immersion exposure apparatus 审中-公开
标题翻译：浸渍曝光装置
公开(公告)号：US20060285093A1
公开(公告)日：2006-12-21
申请号：US11451303
申请日：2006-06-13
申请人： Shinichi Hara , Noriyasu Hasegawa
发明人： Shinichi Hara , Noriyasu Hasegawa
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/707 , G03F7/7095
摘要： An exposure apparatus includes a projection optical system configured to project an image of a pattern of a reticle onto a substrate. The exposure apparatus exposes the substrate via the projection optical system and a liquid that is disposed between the projection optical system and the substrate. The exposure apparatus includes a top plate configured to hold the substrate, an auxiliary plate disposed around the substrate on the top plate and having a surface that is substantially flush with a surface of the substrate, and a mirror disposed on the top plate for use in measuring at least one of a position of the top plate and an orientation of the top plate. The auxiliary plate preferably is formed of a low-thermal-expansion material having a coefficient of linear expansion of no greater than 100 ppb.
摘要翻译：曝光装置包括：投影光学系统，被配置为将掩模版图案的图像投影到基板上。曝光装置经由投影光学系统和设置在投影光学系统和基板之间的液体露出基板。曝光装置包括：被配置为保持基板的顶板，设置在顶板上的基板周围的辅助板，其具有与基板的表面基本齐平的表面;以及设置在顶板上的反射镜，用于测量顶板的位置和顶板的取向中的至少一个。辅助板优选由线膨胀系数不大于100ppb的低热膨胀材料形成。

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