专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

71. 发明申请

US20090153902A1 INFORMATION PROCESSING APPARATUS, JOB EXECUTION INSTRUCTING METHOD, AND RECORDING MEDIUM STORING JOB EXECUTION INSTRUCTING PROGRAM 审中-公开
标题翻译：信息处理装置，工作执行指导方法和记录中档工作执行程序
公开(公告)号：US20090153902A1
公开(公告)日：2009-06-18
申请号：US12336142
申请日：2008-12-16
申请人： Taro YAMAMOTO
发明人： Taro YAMAMOTO
IPC分类号： G06F15/00
CPC分类号： G06F3/1205 , G06F3/1204 , G06F3/1253 , G06F3/126 , G06F3/1264 , G06F3/127 , G06F3/1285
摘要： In an information processing apparatus, if a target file to be used for job execution, which is stored in a directory, is detected as being dragged and dropped into an icon instructing to execute a job, the directory storing the target file is detected from the target file itself. And a job execution condition applied to the detected directory, which is stored in an execution condition storage, is given to the target file. And then, a controller outputs a job execution instruction to a job execution apparatus, in order to execute a job about the target file under the job execution condition given thereto.
摘要翻译：在信息处理装置中，如果检测到存储在目录中的用于作业执行的目标文件被拖放到指示执行作业的图标中，则存储目标文件的目录从目标文件本身。并且将应用于存储在执行条件存储中的检测目录的作业执行条件赋予目标文件。然后，控制器向作业执行装置输出作业执行指令，以便在给出的作业执行条件下执行关于目标文件的作业。

72. 发明申请

US20090135384A1 SUBSTRATE PROCESSING APPARATUS 有权
标题翻译：基板加工设备
公开(公告)号：US20090135384A1
公开(公告)日：2009-05-28
申请号：US12260637
申请日：2008-10-29
申请人： Taro YAMAMOTO , Hideo Funakoshi , Yuichiro Inatomi
发明人： Taro YAMAMOTO , Hideo Funakoshi , Yuichiro Inatomi
IPC分类号： G03B27/42 , G03B27/58 , G03B27/52
CPC分类号： G03F7/40 , H01L21/67051
摘要： A substrate processing apparatus includes a substrate holding stage to hold a substrate having a surface facing up, the substrate having an exposed and developed resist pattern over the surface, a rotation driving mechanism to rotate the substrate holding stage around a vertical axis, a solvent vapor discharge nozzle having a discharge hole capable of discharging solvent vapor to swell the resist pattern onto the surface of the substrate and a vacuum opening capable of absorbing the solvent vapor discharged from the discharge hole, and a moving mechanism to move the solvent vapor discharge nozzle from an edge to a center of the substrate. The substrate is rotated around the vertical axis while moving the solvent vapor discharge nozzle from the edge to the center of the substrate, discharging the solvent vapor from the discharge hole, to supply the solvent vapor over the substrate in a spiral manner.
摘要翻译：基板处理装置包括：基板保持台，用于保持表面朝上的基板，基板在表面上具有暴露和显影的抗蚀剂图案;旋转驱动机构，用于使基板保持台绕垂直轴旋转，溶剂蒸气排出口具有能够排出溶剂蒸汽的排出孔，将抗蚀剂图案溶胀到基板的表面上，以及能够吸收从排出孔排出的溶剂蒸气的真空开口，以及使溶剂蒸气喷出口从边缘到基板的中心。将溶剂蒸气喷嘴从边缘移动到基板的中心，使排出孔排出溶剂蒸气，使螺旋状的溶剂蒸气供给到基板上。

73. 发明申请

US20090130614A1 Development device and development method 有权
标题翻译：开发设备和开发方法
公开(公告)号：US20090130614A1
公开(公告)日：2009-05-21
申请号：US10584264
申请日：2004-12-24
申请人： Atsushi Ookouchi , Taro Yamamoto , Hirofumi Takeguchi , Hideharu Kyouda , Kousuke Yoshihara
发明人： Atsushi Ookouchi , Taro Yamamoto , Hirofumi Takeguchi , Hideharu Kyouda , Kousuke Yoshihara
IPC分类号： G03C5/00 , G03G15/10
CPC分类号： H01L21/67051 , G03F7/3021 , H01L21/6708 , H01L21/6715 , H01L21/6719 , Y10S134/902
摘要： A developer nozzle is moved from a periphery of a wafer toward the central portion while an exposed substrate held at a spin chuck is being rotated about a vertical axis and while a developing solution is being discharged from the developer nozzle, and this way the developing solution is supplied to the surface of the wafer, the developer nozzle having a slit-like ejection port whose longitudinal direction is oriented to the direction perpendicular to the radial direction of the wafer. The movement speed of the nozzle is higher than a case where a nozzle with a small-diameter circular nozzle is used, and this enables a development time to be reduced. Further, the thickness of a developing solution on a substrate can be reduced, so that the developing solution can be saved.
摘要翻译：显影剂喷嘴从晶片的周边朝向中心部分移动，同时保持在旋转卡盘处的暴露的基板围绕垂直轴线旋转并且显影液从显影剂喷嘴排出，并且以这种方式，显影液被提供到晶片的表面，显影剂喷嘴具有狭缝状喷射口，其纵向方向定向为垂直于晶片的径向的方向。喷嘴的移动速度高于使用具有小直径圆形喷嘴的喷嘴的情况，这使得能够减少显影时间。此外，可以减少基板上的显影液的厚度，从而可以节省显影液。

74. 发明申请

US20080280054A1 COATING FILM FORMING APPARATUS, USE OF COATING FILM FORMING APPARATUS, AND RECORDING MEDIUM 有权
标题翻译：涂膜成型装置，涂膜成型装置的使用和记录介质
公开(公告)号：US20080280054A1
公开(公告)日：2008-11-13
申请号：US12106747
申请日：2008-04-21
申请人： Nobuhiro OGATA , Hiroichi Inada , Taro Yamamoto , Akihiro Fujimoto
发明人： Nobuhiro OGATA , Hiroichi Inada , Taro Yamamoto , Akihiro Fujimoto
IPC分类号： B05D1/40 , B05B15/04 , B05B13/02 , B08B3/04 , B08B13/00
CPC分类号： H01L21/67051
摘要： A coating film forming apparatus that holds a substrate upon a spin chuck and forms a coating film by supplying a chemical liquid upon a top surface of said substrate comprises: an outer cup provided detachably to surround the spin chuck; an inner cup provided detachably to surround a region underneath the substrate held upon the chuck; a cleaning nozzle configured to supply a cleaning liquid for cleaning a peripheral edge part of the substrate, such that the cleaning liquid is supplied to a peripheral part of a bottom surface of the substrate; a cutout part for nozzle mounting, the cutout part being provided to the inner cup to engage with the cleaning nozzle; and a cleaning liquid supply tube connected to the cleaning nozzle, the cleaning nozzle being detachable to the cutout part in a state in which the cleaning liquid supply tube is connected.
摘要翻译：一种涂膜形成装置，其将基板保持在旋转卡盘上并通过在所述基板的顶表面上提供化学液体而形成涂膜，包括：可拆卸地设置以围绕旋转卡盘的外杯; 内杯，可拆卸地设置成围绕保持在卡盘上的基底下方的区域; 清洗喷嘴，其构造成供给清洗所述基板的周缘部的清洗液，使得所述清洗液被供给到所述基板的底面的周边部; 用于喷嘴安装的切口部分，所述切口部分设置到所述内杯以与所述清洁喷嘴接合; 以及连接到清洁喷嘴的清洗液供给管，清洗喷嘴在连接清洗液供给管的状态下可拆卸到切口部。

75. 发明申请

US20080163899A1 Substrate cleaning apparatus, substrate cleaning method, and computer-readable storage medium 有权
标题翻译：基板清洁装置，基板清洗方法和计算机可读存储介质
公开(公告)号：US20080163899A1
公开(公告)日：2008-07-10
申请号：US12000670
申请日：2007-12-14
申请人： Yasushi Takiguchi , Taro Yamamoto , Akihiro Fujimoto , Shuuichi Nishikido , Dai Kumagai , Naoto Yoshitaka , Takahiro Kitano , Yoichi Tokunaga
发明人： Yasushi Takiguchi , Taro Yamamoto , Akihiro Fujimoto , Shuuichi Nishikido , Dai Kumagai , Naoto Yoshitaka , Takahiro Kitano , Yoichi Tokunaga
IPC分类号： B08B3/00
CPC分类号： H01L21/0209 , B08B1/002 , B08B1/04 , B08B3/02 , B08B5/02 , B08B7/0057 , H01L21/67028 , H01L21/67046 , H01L21/67051 , H01L21/68742 , H01L21/68764
摘要： A disclosed substrate cleaning apparatus for cleaning a back surface of a substrate includes a first substrate supporting portion configured to support the substrate at a first area of a back surface of the substrate, the back surface facing down; a second substrate supporting portion configured to support the substrate at a second area of the back surface of the substrate, the second area being separated from the first area; a cleaning liquid supplying portion configured to supply cleaning liquid to the back surface of the substrate; a drying portion configured to dry the second area of the back surface of the substrate; and a cleaning portion configured to clean a third area of the back surface of the substrate when the substrate is supported by the first substrate supporting portion, the third area including the second area, and a fourth area of the back surface of the substrate when the substrate is supported by the second substrate supporting portion, the fourth area excluding the second area of the back surface.
摘要翻译：公开的用于清洁基板的背面的基板清洁装置包括：第一基板支撑部，其构造成在基板的背面的第一区域处支撑基板，所述背面朝下; 第二基板支撑部，其构造成在所述基板的背面的第二区域处支撑所述基板，所述第二区域与所述第一区域分离; 清洗液供给部，构成为向所述基板的背面供给清洗液; 干燥部，其构造成干燥所述基板的背面的第二区域; 以及清洁部，其构造成当所述基板被所述第一基板支撑部支撑所述基板时，清洁所述基板的背面的第三区域，所述第三区域包括所述第二区域以及所述基板的背面的第四区域，基板由第二基板支撑部分支撑，除了后表面的第二区域之外的第四区域。

76. 发明申请

US20080038671A1 PATTERN FORMING METHOD AND APPARATUS 有权
标题翻译：图案形成方法和装置
公开(公告)号：US20080038671A1
公开(公告)日：2008-02-14
申请号：US11782233
申请日：2007-07-24
申请人： Taro YAMAMOTO , Hitoshi Kosugi , Yoshiaki Yamada , Yasuhito Saiga
发明人： Taro YAMAMOTO , Hitoshi Kosugi , Yoshiaki Yamada , Yasuhito Saiga
IPC分类号： G03B27/42 , G03C5/00
CPC分类号： G03F7/38 , G03F7/2041 , G03F7/70341
摘要： A pattern forming method includes forming a resist film or sequentially forming a resist film and a protection film in this order on a surface of a substrate; then, performing immersion light exposure that includes immersing the resist film or the resist film and the protection film formed on the substrate in a liquid during light exposure, thereby forming a predetermined light exposure pattern on the resist film; and performing a development process of the light exposure pattern by use of a development liquid, thereby forming a predetermined resist pattern. After the immersion light exposure and before the development process, the method further includes performing a hydrophilic process of turning a surface of the resist film or the protection film serving as a substrate surface into a hydrophilic state to allow the substrate surface to be wetted with the development liquid overall.
摘要翻译：图案形成方法包括在基板的表面上依次形成抗蚀剂膜或依次形成抗蚀剂膜和保护膜; 然后，在曝光期间进行浸渍曝光，其中包括将抗蚀剂膜或抗蚀剂膜和形成在基板上的保护膜浸入液体中，从而在抗蚀剂膜上形成预定的曝光图案; 并通过使用显影液进行曝光图案的显影处理，由此形成预定的抗蚀剂图案。在浸没曝光之后和显影处理之前，该方法还包括进行将抗蚀剂膜或用作基板表面的保护膜的表面转动成亲水性的亲水处理，以允许基板表面被开发液体整体。

77. 发明申请

US20080018868A1 CIRCULATION SYSTEM FOR HIGH REFRACTIVE INDEX LIQUID IN PATTERN FORMING APPARATUS 失效
标题翻译：用于形成图案的高折射率液体的循环系统
公开(公告)号：US20080018868A1
公开(公告)日：2008-01-24
申请号：US11778412
申请日：2007-07-16
申请人： Taro YAMAMOTO , Hitoshi KOSUGI , Yoshiaki YAMADA , Yasuhito SAIGA
发明人： Taro YAMAMOTO , Hitoshi KOSUGI , Yoshiaki YAMADA , Yasuhito SAIGA
IPC分类号： G03B27/42 , G21K5/10
CPC分类号： G03F7/38 , G03F7/168 , G03F7/70341 , G03F7/70991 , Y10S438/908
摘要： A circulation system for a high refractive index liquid includes a first collecting section configured to collect a high refractive index liquid used in an immersion light exposure section; a first supply section configured to supply the high refractive index liquid collected in the first collecting section to a cleaning section as a cleaning liquid; a second collecting section configured to collect the high refractive index liquid used in the cleaning section; and a second supply section configured to supply the high refractive index liquid collected in the second collecting section to the immersion light exposure section, wherein the high refractive index liquid is circulated between the immersion light exposure section and the cleaning section.
摘要翻译：用于高折射率液体的循环系统包括：第一收集部分，被配置为收集在浸没曝光部分中使用的高折射率液体; 第一供给部构造成将收集在第一收集部中的高折射率液体供给到作为清洗液的清洗部; 第二收集部，其构造成收集在所述清洗部中使用的高折射率液体; 以及第二供给部，被构造成将在第二收集部中收集的高折射率液体供给到浸没曝光部，其中高折射率液体在浸没曝光部和清洁部之间循环。

78. 发明申请

US20070184392A1 COATING AND DEVELOPING METHOD, COATING AND DEVELOPING SYSTEM AND STORAGE MEDIUM 有权
标题翻译：涂料与开发方法，涂料和开发体系和储存介质
公开(公告)号：US20070184392A1
公开(公告)日：2007-08-09
申请号：US11623481
申请日：2007-01-16
申请人： Hideharu Kyouda , Kousuke Yoshihara , Taro Yamamoto
发明人： Hideharu Kyouda , Kousuke Yoshihara , Taro Yamamoto
IPC分类号： G03C5/00
CPC分类号： G03F7/2041 , G03F7/11 , G03F7/38
摘要： A resist film formed on a substrate is coated with a water-repellent protective film and the substrate is subjected to a developing process after the substrate has been processed by an immersion exposure process. The protective film is removed from the substrate after the resist film has been processed by the immersion exposure process, the substrate is processed by a heating process, and then the substrate is subjected to a developing process. The surface of the substrate is cleaned with a cleaning liquid before the protective film is removed and after the substrate has been processed by the immersion exposure process or the surface of the substrate is cleaned with a cleaning liquid after removing the protective film and before the substrate is subjected to the heating process.
摘要翻译：在基板上形成的抗蚀剂膜涂覆有防水保护膜，并且在通过浸没曝光工艺处理基板之后对基板进行显影处理。在通过浸渍曝光工艺处理了抗蚀剂膜之后，从基板上除去保护膜，通过加热工艺处理基板，然后对基板进行显影处理。在除去保护膜之前，用浸渍曝光工序处理基板后，用清洗液清洗基板的表面，在除去保护膜之后和基板之前用清洗液清洗基板的表面进行加热处理。

79. 发明申请

US20070177869A1 Coater/developer and coating/developing method 失效
标题翻译：涂料/显影剂和涂料/显影方法
公开(公告)号：US20070177869A1
公开(公告)日：2007-08-02
申请号：US10590314
申请日：2004-12-16
申请人： Taro Yamamoto , Hideharu Kyouda
发明人： Taro Yamamoto , Hideharu Kyouda
IPC分类号： G03D5/00
CPC分类号： G03F7/162 , G03F7/168 , G03F7/3021 , G03F7/70341 , G03F7/70925 , H01L21/67028 , H01L21/67051
摘要： Accurate coating and developing having high intrasurface uniformity is achieved by suppressing the influence of components of a resist that may be eluted while a substrate coated with the resist is processed by immersion exposure. A coating unit coats a surface of a substrate with a resist. then, a first cleaning means including a cleaning nozzle cleans the substrate and then the substrate is subjected to an exposure process. Since only a small amount of components of the resist dissolves in a transparent liquid layer formed on the substrate for exposure, an exposure process can form lines in accurate line-widths. Consequently, a resist pattern of lines having accurate line-widths having high intrasurface uniformity can be formed on the substrate by developing the exposed resist.
摘要翻译：通过抑制在通过浸渍曝光处理涂布有抗蚀剂的基材时，可以抑制可能被洗脱的抗蚀剂的成分的影响来实现具有高表面内均匀性的精确涂布和显影。涂覆单元用抗蚀剂涂覆基材的表面。然后，包括清洁喷嘴的第一清洁装置清洁基板，然后对基板进行曝光处理。由于只有少量的抗蚀剂成分溶解在形成在用于曝光的基板上的透明液体层中，曝光处理可以形成精确线宽的线。因此，通过显影曝光的抗蚀剂，可以在衬底上形成具有高表面内均匀性的精确线宽的线的抗蚀剂图案。

80. 发明授权

US07048121B2 Sealed case 有权
标题翻译：密封箱
公开(公告)号：US07048121B2
公开(公告)日：2006-05-23
申请号：US10246742
申请日：2002-09-19
申请人： Taro Yamamoto , Kozo Tanaka , Taro Shimokochi , Jun Sada , Makoto Yamaguchi , Hiroyuki Mizuma
发明人： Taro Yamamoto , Kozo Tanaka , Taro Shimokochi , Jun Sada , Makoto Yamaguchi , Hiroyuki Mizuma
IPC分类号： B65D85/66
CPC分类号： G03C3/00
摘要： A sealed case includes an elongated trunk member including an overlapped part made by overlapping parts of an inside end portion and an outside end portion apart from each other in a vertical axis direction of a sheet material and first and second end portions each provided with an opening and apart from each other. The overlapped part has a fixing area to fix the inside and outside end portions. First and second cover members are fixed to the first and second open end portions of the trunk member, closing the openings.
摘要翻译：密封壳体包括细长的躯干构件，其包括由片材的纵轴方向上彼此重叠的内端部和外端部的重叠部分构成的重叠部分，第一和第二端部分别设置有开口并相互分开。重叠部分具有用于固定内端部和外端部的固定区域。第一和第二盖构件固定到主体构件的第一和第二开口端部，从而封闭开口。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式