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1. 发明专利

AU5839273A ULTRASONIC GENERATOR 未知
公开(公告)号：AU5839273A
公开(公告)日：1975-01-23
申请号：AU5839273
申请日：1973-07-23
申请人： HIROSHI FUJIEDA , TARO YAMAMOTO
发明人： FUJIEDA HIROSHI , YAMAMOTO TARO
IPC分类号： H03B5/30 , B06B1/02 , B06B1/08 , F23D11/34 , B05B17/06
摘要： An oscillator drives an ultrasonic transducer by rectangular waveform voltage. An automatic resonant frequency tracking system is provided in which the driving voltage is positive-fed back to the oscillator, and a system for controlling the amplitude of oscillation is provided by the negative-feed back of the driving voltage to a DC power source for the oscillator.

2. 发明专利

JPS6176174A Operation of automatic gooseneck discharge monitor 失效
标题翻译：自动GOOSENECK放电监测仪的运行
公开(公告)号：JPS6176174A
公开(公告)日：1986-04-18
申请号：JP19690784
申请日：1984-09-21
申请人： Taro Yamamoto
发明人： YAMAMOTO TARO
IPC分类号： A62C31/24 , A62C31/02 , A62C37/00

3. 发明授权

US08889337B2 Film forming method, film forming apparatus and pattern forming method 有权
标题翻译：成膜方法，成膜装置和图案形成方法
公开(公告)号：US08889337B2
公开(公告)日：2014-11-18
申请号：US11934308
申请日：2007-11-02
申请人： Hitoshi Kosugi , Taro Yamamoto , Yoshiaki Yamada , Yasuhito Saiga
发明人： Hitoshi Kosugi , Taro Yamamoto , Yoshiaki Yamada , Yasuhito Saiga
IPC分类号： G03F7/09 , B05C11/02 , G03F7/20 , G03F7/11 , H01L21/67
CPC分类号： G03F7/2041 , G03F7/11 , H01L21/6708 , H01L21/67115 , H01L21/6715
摘要： Such a film forming method is provided that can prevent peeling of surface films including a resist film from a substrate during immersion exposure.The film forming method includes the steps of forming surface films including a resist film and a protective film covering the resist film over a surface of a wafer, and forming an edge cap film by supplying an edge cap film material to at least a boundary portion including a periphery of the wafer and peripheries of the surface films such as the protective film.
摘要翻译：提供这样的成膜方法，其可以防止在浸没曝光期间从基底上包括抗蚀剂膜的表面膜的剥离。成膜方法包括以下步骤：在晶片的表面上形成包括抗蚀剂膜和覆盖抗蚀剂膜的保护膜的表面膜，以及通过将边缘帽膜材料供给到至少包括晶片的周边以及诸如保护膜的表面膜的周边。

4. 发明授权

US08578953B2 Substrate cleaning apparatus, substrate cleaning method, and computer-readable storage medium 有权
标题翻译：基板清洁装置，基板清洗方法和计算机可读存储介质
公开(公告)号：US08578953B2
公开(公告)日：2013-11-12
申请号：US12000670
申请日：2007-12-14
申请人： Yasushi Takiguchi , Taro Yamamoto , Akihiro Fujimoto , Shuuichi Nishikido , Dai Kumagai , Naoto Yoshitaka , Takahiro Kitano , Yoichi Tokunaga
发明人： Yasushi Takiguchi , Taro Yamamoto , Akihiro Fujimoto , Shuuichi Nishikido , Dai Kumagai , Naoto Yoshitaka , Takahiro Kitano , Yoichi Tokunaga
IPC分类号： B08B3/00 , B08B1/02
CPC分类号： H01L21/0209 , B08B1/002 , B08B1/04 , B08B3/02 , B08B5/02 , B08B7/0057 , H01L21/67028 , H01L21/67046 , H01L21/67051 , H01L21/68742 , H01L21/68764
摘要： A disclosed substrate cleaning apparatus for cleaning a back surface of a substrate includes a first substrate supporting portion configured to support the substrate at a first area of a back surface of the substrate, the back surface facing down; a second substrate supporting portion configured to support the substrate at a second area of the back surface of the substrate, the second area being separated from the first area; a cleaning liquid supplying portion configured to supply cleaning liquid to the back surface of the substrate; a drying portion configured to dry the second area of the back surface of the substrate; and a cleaning portion configured to clean a third area of the back surface of the substrate when the substrate is supported by the first substrate supporting portion, the third area including the second area, and a fourth area of the back surface of the substrate when the substrate is supported by the second substrate supporting portion, the fourth area excluding the second area of the back surface.
摘要翻译：公开的用于清洁基板的背面的基板清洁装置包括：第一基板支撑部，其构造成在基板的背面的第一区域处支撑基板，所述背面朝下; 第二基板支撑部，其构造成在所述基板的背面的第二区域处支撑所述基板，所述第二区域与所述第一区域分离; 清洗液供给部，构成为向所述基板的背面供给清洗液; 干燥部，其构造成干燥所述基板的背面的第二区域; 以及清洁部，其构造成当所述基板被所述第一基板支撑部支撑所述基板时，清洁所述基板的背面的第三区域，所述第三区域包括所述第二区域以及所述基板的背面的第四区域，基板由第二基板支撑部分支撑，除了后表面的第二区域之外的第四区域。

5. 发明授权

US08518494B2 Coating and developing apparatus, coating film forming method, and storage medium storing program for performing the method 有权
公开(公告)号：US08518494B2
公开(公告)日：2013-08-27
申请号：US11672230
申请日：2007-02-07
申请人： Taro Yamamoto , Hideharu Kyouda
发明人： Taro Yamamoto , Hideharu Kyouda
IPC分类号： B05D1/36
CPC分类号： H01L21/67017 , G03F7/11 , G03F7/168 , G03F7/2041 , G03F7/70341 , H01L21/67051 , H01L21/6715
摘要： Disclosed is a technique for preventing a water-repellent protective film formed on a resist film from peeling off during immersion exposure. A resist film is formed on the front surface of a substrate and then the peripheral edge portion of the resist film is removed. Before forming a water-repellent protective film onto the resist film, an adhesion-improving fluid, preferably hexamethyldisilazane gas, for improving the adhesion of the water-repellent protective film, is supplied to the region from which the resist film is removed.

6. 发明授权

US08445189B2 Developing device and developing method 有权
标题翻译：开发设备和开发方法
公开(公告)号：US08445189B2
公开(公告)日：2013-05-21
申请号：US13024939
申请日：2011-02-10
申请人： Taro Yamamoto , Kousuke Yoshihara , Hideharu Kyouda , Hirofumi Takeguchi , Atsushi Ookouchi
发明人： Taro Yamamoto , Kousuke Yoshihara , Hideharu Kyouda , Hirofumi Takeguchi , Atsushi Ookouchi
IPC分类号： G03C5/18 , G03C5/26 , B05B7/06 , B05B3/00
CPC分类号： G03F7/3028 , G03F7/3021
摘要： The temperature of a developing solution is varied depending on the type of resist or the resist pattern. The developing solution is applied while scanning a developer nozzle having a slit-shaped ejection port that has a length matching the width of the effective area of the substrate. After leaving the substrate with the developing solution being coated thereon for a predetermined period of time, a diluent is supplied while scanning a diluent nozzle, thereby substantially stopping the development reaction and causing the dissolved resist components to diffuse. A desired amount of resist can be quickly dissolved through the control of the developing solution temperature, while the development can be stopped before the dissolved resist components exhibit adverse effect through the supply of the diluent a predetermined timing, whereby achieving a pattern having a uniform line width and improved throughput.
摘要翻译：显影液的温度根据抗蚀剂的种类或抗蚀剂图案而变化。当扫描具有与衬底的有效面积的宽度匹配的长度的狭缝形喷射口的显影剂喷嘴时，施加显影溶液。在将其上涂覆有显影液的基板离开预定时间后，在扫描稀释剂喷嘴的同时供给稀释剂，从而基本上停止显影反应并使溶解的抗蚀剂组分扩散。可以通过控制显影液温度来快速溶解所需量的抗蚀剂，同时可以通过在预定时间内提供稀释剂而使溶解的抗蚀剂组分显示出不利影响之前，可以停止显影，从而获得具有均匀线的图案宽度和提高吞吐量。

7. 发明申请

US20120006362A1 SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD 审中-公开
标题翻译：基板清洁装置和基板清洁方法
公开(公告)号：US20120006362A1
公开(公告)日：2012-01-12
申请号：US13240830
申请日：2011-09-22
申请人： Taro Yamamoto , Hideharu Kyouda , Tetsu Kawasaki , Satoru Shimura
发明人： Taro Yamamoto , Hideharu Kyouda , Tetsu Kawasaki , Satoru Shimura
IPC分类号： B08B7/04 , B08B5/02 , B08B3/04
CPC分类号： H01L21/67051
摘要： A substrate cleaning device and a substrate cleaning method reduces liquid drops remaining on a substrate to prevent the irregular heating of the substrate by a heating process due to liquid drops or water marks remaining on the substrate. A cleaning liquid is poured through a cleaning liquid pouring nozzle onto the surface of a substrate such that a region onto which the cleaning liquid is poured moves from a central part toward the circumference of the substrate. A gas is jetted radially outward at a region on the surface of the substrate behind a region onto which the cleaning liquid is poured with respect to the rotating direction of the substrate. The gas forces a liquid film of the cleaning liquid flowing on the surface of the substrate to flow in a circumferential direction and a radially outward direction.
摘要翻译：基板清洁装置和基板清洗方法减少了残留在基板上的液滴，以防止由于基板上残留液滴或水痕而导致的加热过程对基板的不规则加热。将清洗液通过清洗液注入喷嘴注入到基板的表面上，使清洗液注入的区域从基板的中心部朝向圆周方向移动。在衬底表面上的相对于衬底的旋转方向倾倒有清洁液体的区域之后的区域处，径向向外喷射气体。气体迫使在基板表面流动的清洗液体的液膜在圆周方向和径向向外的方向上流动。

8. 发明申请

US20110200321A1 COATING AND DEVELOPING APPARATUS, DEVELOPING METHOD AND NON-TRANSITORY MEDIUM 有权
标题翻译：涂料和开发设备，开发方法和非交联介质
公开(公告)号：US20110200321A1
公开(公告)日：2011-08-18
申请号：US13025300
申请日：2011-02-11
申请人： Yasushi Takiguchi , Taro Yamamoto , Hiroshi Arima , Kousuke Yoshihara , Yuichi Yoshida
发明人： Yasushi Takiguchi , Taro Yamamoto , Hiroshi Arima , Kousuke Yoshihara , Yuichi Yoshida
IPC分类号： G03B13/00
CPC分类号： G03B27/52 , G03F7/3021 , H01L21/6715 , H01L21/67178 , H01L21/6719 , H01L21/67745 , H01L21/67748 , H01L21/68742 , H01L21/68785
摘要： There is provided a coating and developing apparatus that develops a substrate of which surface is coated with resist and exposed to lights. The coating and developing apparatus includes a developing module; a cleaning module; and a transfer mechanism configured to transfer a substrate developed by the developing module to the cleaning module. The developing module includes an airtightly sealed processing vessel configured to form a processing atmosphere; a temperature control plate provided in the processing vessel and mounts thereon the substrate and cools the substrate; and an atmosphere gas supply unit configured to supply an atmosphere gas including mist of a developing solution to a surface of the substrate within the processing vessel. The cleaning module includes a mounting table configured to mount thereon the substrate; and a cleaning solution supply unit configured to supply a cleaning solution to the substrate mounted on the mounting table.
摘要翻译：提供了一种涂覆和显影装置，其显影其表面被抗蚀剂涂覆并暴露于光的基底。涂料和显影装置包括显影模块; 清洁模块; 以及传送机构，其构造成将由显影模块显影的基板传送到清洁模块。显影模块包括构造成形成处理气氛的气密密封处理容器; 设置在处理容器中并安装在其上的温度控制板并冷却基板; 以及气氛气体供给单元，被构造成将处理容器内的显影液的气雾气体气体供给至基板的表面。清洁模块包括：安装台，其安装在其上; 以及清洗液供给单元，其构造成将清洗液供给到安装在所述安装台上的基板。

9. 发明授权

US07959988B2 Coating film forming apparatus and method 有权
标题翻译：涂膜成膜装置及方法
公开(公告)号：US07959988B2
公开(公告)日：2011-06-14
申请号：US11944557
申请日：2007-11-23
申请人： Taro Yamamoto , Yasushi Takiguchi , Akihiro Fujimoto , Hideharu Kyouda , Junichi Kitano , Osamu Miyahara , Kenji Tsutsumi
发明人： Taro Yamamoto , Yasushi Takiguchi , Akihiro Fujimoto , Hideharu Kyouda , Junichi Kitano , Osamu Miyahara , Kenji Tsutsumi
IPC分类号： C23C14/28
CPC分类号： H01L21/6715 , H01L21/67178 , H01L21/67276
摘要： A coating film forming apparatus includes a process section including one or more coating units and one or more thermally processing units; a pre-coating cleaning unit configured to perform cleaning on a back surface and an edge portion of a substrate; and a pre-coating check unit configured to check a state of a back surface and an edge portion of the substrate. A control section is configured to realize a sequence of cleaning the substrate by the pre-coating cleaning unit, checking the substrate by the pre-coating check unit, making a judgment based on a check result thus obtained of whether or not a state of particles on a back surface and an edge portion of the substrate is within an acceptable range, and permitting transfer of the substrate into the process section where the state of particles is within the acceptable range.
摘要翻译：涂膜形成装置包括具有一个或多个涂布单元和一个或多个热处理单元的处理部分; 构造成在基板的背面和边缘部分上进行清洗的预涂层清洁单元; 以及配置为检查基板的背面和边缘部分的状态的预涂层检查单元。控制部被配置为通过预涂清洁单元实现清洁基板的顺序，通过预涂单元检查基板，基于由此获得的检查结果判断颗粒的状态在基板的后表面和边缘部分处于可接受的范围内，并且允许将基板转移到颗粒状态在可接受范围内的处理部分中。

10. 发明授权

US07918182B2 Developing device and developing method 有权
标题翻译：开发设备和开发方法
公开(公告)号：US07918182B2
公开(公告)日：2011-04-05
申请号：US10584265
申请日：2004-12-24
申请人： Taro Yamamoto , Kousuke Yoshihara , Hideharu Kyouda , Hirofumi Takeguchi , Atsushi Ookouchi
发明人： Taro Yamamoto , Kousuke Yoshihara , Hideharu Kyouda , Hirofumi Takeguchi , Atsushi Ookouchi
IPC分类号： B05C11/10
CPC分类号： G03F7/3028 , G03F7/3021
摘要： The temperature of a developing solution is varied depending on the type of resist or the resist pattern. The developing solution is applied while scanning a developer nozzle having a slit-shaped ejection port that has a length matching the width of the effective area of the substrate. After leaving the substrate with the developing solution being coated thereon for a predetermined period of time, a diluent is supplied while scanning a diluent nozzle, thereby substantially stopping the development reaction and causing the dissolved resist components to diffuse. A desired amount of resist can be quickly dissolved through the control of the developing solution temperature, while the development can be stopped before the dissolved resist components exhibit adverse effect through the supply of the diluent a predetermined timing, whereby achieving a pattern having a uniform line width and improved throughput.
摘要翻译：显影液的温度根据抗蚀剂的种类或抗蚀剂图案而变化。当扫描具有与衬底的有效面积的宽度匹配的长度的狭缝形喷射口的显影剂喷嘴时，施加显影溶液。在将其上涂覆有显影液的基板离开预定时间后，在扫描稀释剂喷嘴的同时供给稀释剂，从而基本上停止显影反应并使溶解的抗蚀剂组分扩散。可以通过控制显影液温度来快速溶解所需量的抗蚀剂，同时可以通过在预定时间内提供稀释剂而使溶解的抗蚀剂组分显示出不利影响之前，可以停止显影，从而实现具有均匀线的图案宽度和提高吞吐量。

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