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1. 发明授权

US08186298B2 Coating film forming apparatus, use of coating film forming apparatus, and recording medium 有权
标题翻译：涂膜成膜装置，涂膜成膜装置的使用和记录介质
公开(公告)号：US08186298B2
公开(公告)日：2012-05-29
申请号：US12106747
申请日：2008-04-21
申请人： Nobuhiro Ogata , Hiroichi Inada , Taro Yamamoto , Akihiro Fujimoto
发明人： Nobuhiro Ogata , Hiroichi Inada , Taro Yamamoto , Akihiro Fujimoto
IPC分类号： B05B13/04 , B05D1/02
CPC分类号： H01L21/67051
摘要： A coating film forming apparatus that holds a substrate upon a spin chuck and forms a coating film by supplying a chemical liquid upon a top surface of said substrate comprises: an outer cup provided detachably to surround the spin chuck; an inner cup provided detachably to surround a region underneath the substrate held upon the chuck; a cleaning nozzle configured to supply a cleaning liquid for cleaning a peripheral edge part of the substrate, such that the cleaning liquid is supplied to a peripheral part of a bottom surface of the substrate; a cutout part for nozzle mounting, the cutout part being provided to the inner cup to engage with the cleaning nozzle; and a cleaning liquid supply tube connected to the cleaning nozzle, the cleaning nozzle being detachable to the cutout part in a state in which the cleaning liquid supply tube is connected.
摘要翻译：一种涂膜形成装置，其将基板保持在旋转卡盘上并通过在所述基板的顶表面上提供化学液体而形成涂膜，包括：可拆卸地设置以围绕旋转卡盘的外杯; 内杯，可拆卸地设置成围绕保持在卡盘上的基底下方的区域; 清洗喷嘴，其构造成供给清洗所述基板的周缘部的清洗液，使得所述清洗液被供给到所述基板的底面的周边部; 用于喷嘴安装的切口部分，所述切口部分设置到所述内杯以与所述清洁喷嘴接合; 以及连接到清洁喷嘴的清洗液供给管，清洗喷嘴在连接清洗液供给管的状态下可拆卸到切口部。

2. 发明授权

US08758855B2 Coating film forming apparatus, use of coating film forming apparatus, and recording medium 有权
标题翻译：涂膜成膜装置，涂膜成膜装置的使用和记录介质
公开(公告)号：US08758855B2
公开(公告)日：2014-06-24
申请号：US13424011
申请日：2012-03-19
申请人： Nobuhiro Ogata , Hiroichi Inada , Taro Yamamoto , Akihiro Fujimoto
发明人： Nobuhiro Ogata , Hiroichi Inada , Taro Yamamoto , Akihiro Fujimoto
IPC分类号： B05D3/12 , B08B3/04
CPC分类号： H01L21/67051
摘要： A coating film forming apparatus that holds a substrate upon a spin chuck and forms a coating film by supplying a chemical liquid upon a top surface of said substrate comprises: an outer cup provided detachably to surround the spin chuck; an inner cup provided detachably to surround a region underneath the substrate held upon the chuck; a cleaning nozzle configured to supply a cleaning liquid for cleaning a peripheral edge part of the substrate, such that the cleaning liquid is supplied to a peripheral part of a bottom surface of the substrate; a cutout part for nozzle mounting, the cutout part being provided to the inner cup to engage with the cleaning nozzle; and a cleaning liquid supply tube connected to the cleaning nozzle, the cleaning nozzle being detachable to the cutout part in a state in which the cleaning liquid supply tube is connected.
摘要翻译：一种涂膜形成装置，其将基板保持在旋转卡盘上并通过在所述基板的顶表面上提供化学液体而形成涂膜，包括：可拆卸地设置以围绕旋转卡盘的外杯; 内杯，可拆卸地设置成围绕保持在卡盘上的基底下方的区域; 清洗喷嘴，其构造成供给清洗所述基板的周缘部的清洗液，使得所述清洗液被供给到所述基板的底面的周边部; 用于喷嘴安装的切口部分，所述切口部分设置到所述内杯以与所述清洁喷嘴接合; 以及连接到清洁喷嘴的清洗液供给管，清洗喷嘴在连接清洗液供给管的状态下可拆卸到切口部。

3. 发明申请

US20120183693A1 Coating Film Forming Apparatus, Use Of Coating Film Forming Apparatus, And Recording Medium 有权
标题翻译：涂膜成型装置，涂膜成型装置和记录介质的使用
公开(公告)号：US20120183693A1
公开(公告)日：2012-07-19
申请号：US13424011
申请日：2012-03-19
申请人： Nobuhiro Ogata , Hiroichi Inada , Taro Yamamoto , Akihiro Fujimoto
发明人： Nobuhiro Ogata , Hiroichi Inada , Taro Yamamoto , Akihiro Fujimoto
IPC分类号： B05D3/00
CPC分类号： H01L21/67051
摘要： A coating film forming apparatus that holds a substrate upon a spin chuck and forms a coating film by supplying a chemical liquid upon a top surface of said substrate comprises: an outer cup provided detachably to surround the spin chuck; an inner cup provided detachably to surround a region underneath the substrate held upon the chuck; a cleaning nozzle configured to supply a cleaning liquid for cleaning a peripheral edge part of the substrate, such that the cleaning liquid is supplied to a peripheral part of a bottom surface of the substrate; a cutout part for nozzle mounting, the cutout part being provided to the inner cup to engage with the cleaning nozzle; and a cleaning liquid supply tube connected to the cleaning nozzle, the cleaning nozzle being detachable to the cutout part in a state in which the cleaning liquid supply tube is connected.
摘要翻译：一种涂膜形成装置，其将基板保持在旋转卡盘上并通过在所述基板的顶表面上提供化学液体而形成涂膜，包括：可拆卸地设置以围绕旋转卡盘的外杯; 内杯，可拆卸地设置成围绕保持在卡盘上的基底下方的区域; 清洗喷嘴，其构造成供给清洗所述基板的周缘部的清洗液，使得所述清洗液被供给到所述基板的底面的周边部; 用于喷嘴安装的切口部分，所述切口部分设置到所述内杯以与所述清洁喷嘴接合; 以及连接到清洁喷嘴的清洗液供给管，清洗喷嘴在连接清洗液供给管的状态下可拆卸到切口部。

4. 发明申请

US20080280054A1 COATING FILM FORMING APPARATUS, USE OF COATING FILM FORMING APPARATUS, AND RECORDING MEDIUM 有权
标题翻译：涂膜成型装置，涂膜成型装置的使用和记录介质
公开(公告)号：US20080280054A1
公开(公告)日：2008-11-13
申请号：US12106747
申请日：2008-04-21
申请人： Nobuhiro OGATA , Hiroichi Inada , Taro Yamamoto , Akihiro Fujimoto
发明人： Nobuhiro OGATA , Hiroichi Inada , Taro Yamamoto , Akihiro Fujimoto
IPC分类号： B05D1/40 , B05B15/04 , B05B13/02 , B08B3/04 , B08B13/00
CPC分类号： H01L21/67051
摘要： A coating film forming apparatus that holds a substrate upon a spin chuck and forms a coating film by supplying a chemical liquid upon a top surface of said substrate comprises: an outer cup provided detachably to surround the spin chuck; an inner cup provided detachably to surround a region underneath the substrate held upon the chuck; a cleaning nozzle configured to supply a cleaning liquid for cleaning a peripheral edge part of the substrate, such that the cleaning liquid is supplied to a peripheral part of a bottom surface of the substrate; a cutout part for nozzle mounting, the cutout part being provided to the inner cup to engage with the cleaning nozzle; and a cleaning liquid supply tube connected to the cleaning nozzle, the cleaning nozzle being detachable to the cutout part in a state in which the cleaning liquid supply tube is connected.
摘要翻译：一种涂膜形成装置，其将基板保持在旋转卡盘上并通过在所述基板的顶表面上提供化学液体而形成涂膜，包括：可拆卸地设置以围绕旋转卡盘的外杯; 内杯，可拆卸地设置成围绕保持在卡盘上的基底下方的区域; 清洗喷嘴，其构造成供给清洗所述基板的周缘部的清洗液，使得所述清洗液被供给到所述基板的底面的周边部; 用于喷嘴安装的切口部分，所述切口部分设置到所述内杯以与所述清洁喷嘴接合; 以及连接到清洁喷嘴的清洗液供给管，清洗喷嘴在连接清洗液供给管的状态下可拆卸到切口部。

5. 发明授权

US08808798B2 Coating method 有权
标题翻译：涂布方法
公开(公告)号：US08808798B2
公开(公告)日：2014-08-19
申请号：US13569345
申请日：2012-08-08
申请人： Takahiro Kitano , Koichi Obata , Hiroichi Inada , Nobuhiro Ogata
发明人： Takahiro Kitano , Koichi Obata , Hiroichi Inada , Nobuhiro Ogata
IPC分类号： B05D3/12 , H01L21/67 , H01L21/683 , H01L21/027 , G03F7/16
CPC分类号： H01L21/6715 , G03F7/162 , G03F7/3021 , H01L21/027 , H01L21/67051 , H01L21/6838
摘要： A coating method includes supplying a coating liquid from a coating nozzle onto a front side central portion of a substrate held on a substrate holding member, rotating the substrate holding member about a vertical axis to spread the coating liquid toward a peripheral portion of the substrate by a centrifugal force and thereby form a film of the coating liquid, forming a liquid film of a process liquid for preventing a contaminant derived from the coating liquid from being deposited or left on a back side peripheral portion of the substrate, and damping a vertical wobble of the peripheral portion of the substrate being rotated, by a posture regulating mechanism, while delivering a gas from delivery holes onto a back side region of the substrate on an inner side of the peripheral portion on which the liquid film is formed.
摘要翻译：一种涂布方法，包括将涂布液从涂布喷嘴供给到保持在基板保持部件上的基板的前侧中央部，使基板保持部件绕垂直轴旋转，使涂布液朝向基板的周边部分扩散，离心力，从而形成涂布液的膜，形成用于防止来自涂布液的污染物沉积或残留在基板的背面周边部分上的处理液的液膜，并且阻尼垂直摆动通过姿势调节机构，在从形成有液膜的周边部分的内侧将来自输送孔的气体输送到基板的背面侧，同时旋转基板的周边部。

6. 发明申请

US20120213925A1 COATING APPARATUS AND METHOD 有权
标题翻译：涂装装置及方法
公开(公告)号：US20120213925A1
公开(公告)日：2012-08-23
申请号：US13462880
申请日：2012-05-03
申请人： Takahiro Kitano , Koichi Obata , Hiroichi Inada , Nobuhiro Ogata
发明人： Takahiro Kitano , Koichi Obata , Hiroichi Inada , Nobuhiro Ogata
IPC分类号： B05D3/12
CPC分类号： G03F7/162 , H01L21/6715 , H01L21/68742 , H01L21/68785
摘要： A coating method includes holding a substrate in a horizontal state on a substrate holding member; supplying a coating liquid onto a front side central portion of the substrate held on the substrate holding member; rotating the substrate holding member about a vertical axis to spread the coating liquid supplied on the front side central portion of the substrate toward a front side peripheral portion of the substrate by a centrifugal force; and damping a wobble of the substrate being rotated, by a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate, while delivering a gas from the delivery port and sucking the gas into the suction port.
摘要翻译：一种涂布方法，包括：在基板保持部件上将基板保持为水平状态; 将涂布液供给到保持在所述基板保持部件上的所述基板的前侧中央部; 使基板保持部件绕垂直轴旋转，通过离心力向基板的前侧中央部供给的涂布液扩散; 通过包括气体输送口和吸入口的摆动阻尼机构来抑制基板的摆动，所述气体输送口和吸入口均设置成面对基板的背面，同时从输送口输送气体并将气体吸入吸入口港口。

7. 发明授权

US08225737B2 Coating apparatus and method 有权
标题翻译：涂布装置及方法
公开(公告)号：US08225737B2
公开(公告)日：2012-07-24
申请号：US12394690
申请日：2009-02-27
申请人： Takahiro Kitano , Koichi Obata , Hiroichi Inada , Nobuhiro Ogata
发明人： Takahiro Kitano , Koichi Obata , Hiroichi Inada , Nobuhiro Ogata
IPC分类号： B05C5/02
CPC分类号： G03F7/162 , H01L21/6715 , H01L21/68742 , H01L21/68785
摘要： A coating apparatus includes a driving unit configured to rotate a substrate holding member about a vertical axis to spread a coating liquid supplied on a front side central portion of a substrate toward a front side peripheral portion of the substrate by a centrifugal force. The apparatus is provided with a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate and configured to damp a wobble of the substrate being rotated by delivering a gas from the delivery port and sucking the gas into the suction port.
摘要翻译：涂布装置包括驱动单元，其构造成使基板保持构件绕垂直轴线旋转，从而通过离心力向基板的前侧中央部分供给的涂布液向基板的前侧周边部分扩散。该装置设置有摆动阻尼机构，该摆动阻尼机构包括气体输送口和吸入口，两者设置为面对基板的背面，并且构造成通过从输送口输送气体来吸收正在旋转的基板的摆动并吸入气体进入吸入口。

8. 发明授权

US08256370B2 Coating apparatus and method 有权
标题翻译：涂布装置及方法
公开(公告)号：US08256370B2
公开(公告)日：2012-09-04
申请号：US12390752
申请日：2009-02-23
申请人： Takahiro Kitano , Koichi Obata , Hiroichi Inada , Nobuhiro Ogata
发明人： Takahiro Kitano , Koichi Obata , Hiroichi Inada , Nobuhiro Ogata
IPC分类号： B05C11/02 , B05C13/00 , B05C13/02 , B05C5/00 , B05C21/00 , B05B13/04 , B65G53/16 , B65G53/00 , B65G53/26 , B65G69/06
CPC分类号： H01L21/6715 , G03F7/162 , G03F7/3021 , H01L21/027 , H01L21/67051 , H01L21/6838
摘要： A coating apparatus includes a liquid film forming mechanism configured to form a liquid film of a process liquid for preventing a contaminant derived from a coating liquid from being deposited or left on a back side peripheral portion of a substrate. The liquid film forming mechanism includes a counter face portion facing the back side peripheral portion of the substrate and a process liquid supply portion for supplying the process liquid onto the counter face portion. The coating apparatus further includes a posture regulating mechanism disposed around the substrate holding member and configured to damp a vertical wobble of the peripheral portion of the substrate being rotated. The posture regulating mechanism includes delivery holes arrayed in a rotational direction of the substrate and configured to deliver a gas onto a back side region of the substrate on an inner side of the peripheral portion.
摘要翻译：涂布装置包括：液膜形成机构，其被构造成形成用于防止来自涂布液的污染物沉积或留在基板的背面周边部分上的处理液体的液膜。液膜形成机构包括面对基板的后侧周边部分的相对面部分和用于将处理液体供给到对面部分上的处理液体供应部分。所述涂布装置还包括姿势调节机构，所述姿势调节机构设置在所述基板保持部件周围，并且被配置为抑制正在旋转的所述基板的周边部分的垂直摆动。所述姿势调节机构包括沿所述基板的旋转方向排列的排出孔，其构造成在所述周边部的内侧将气体输送到所述基板的背侧区域。

9. 发明申请

US20090285991A1 COATING APPARATUS AND METHOD 有权
标题翻译：涂装装置及方法
公开(公告)号：US20090285991A1
公开(公告)日：2009-11-19
申请号：US12390752
申请日：2009-02-23
申请人： Takahiro Kitano , Koichi Obata , Hiroichi Inada , Nobuhiro Ogata
发明人： Takahiro Kitano , Koichi Obata , Hiroichi Inada , Nobuhiro Ogata
IPC分类号： B05D3/12 , B05C13/00 , B05C11/08
CPC分类号： H01L21/6715 , G03F7/162 , G03F7/3021 , H01L21/027 , H01L21/67051 , H01L21/6838
摘要： A coating apparatus includes a liquid film forming mechanism configured to form a liquid film of a process liquid for preventing a contaminant derived from a coating liquid from being deposited or left on a back side peripheral portion of a substrate. The liquid film forming mechanism includes a counter face portion facing the back side peripheral portion of the substrate and a process liquid supply portion for supplying the process liquid onto the counter face portion. The coating apparatus further includes a posture regulating mechanism disposed around the substrate holding member and configured to damp a vertical wobble of the peripheral portion of the substrate being rotated. The posture regulating mechanism includes delivery holes arrayed in a rotational direction of the substrate and configured to deliver a gas onto a back side region of the substrate on an inner side of the peripheral portion.
摘要翻译：涂布装置包括：液膜形成机构，其被构造成形成用于防止来自涂布液的污染物沉积或留在基板的背面周边部分上的处理液体的液膜。液膜形成机构包括面对基板的后侧周边部分的相对面部分和用于将处理液体供给到对面部分上的处理液体供应部分。所述涂布装置还包括姿势调节机构，所述姿势调节机构设置在所述基板保持部件周围，并且被配置为抑制正在旋转的所述基板的周边部分的垂直摆动。所述姿势调节机构包括沿所述基板的旋转方向排列的排出孔，其构造成在所述周边部的内侧将气体输送到所述基板的背侧区域。

10. 发明授权

US08551563B2 Coating method 有权
标题翻译：涂布方法
公开(公告)号：US08551563B2
公开(公告)日：2013-10-08
申请号：US13462880
申请日：2012-05-03
申请人： Takahiro Kitano , Koichi Obata , Hiroichi Inada , Nobuhiro Ogata
发明人： Takahiro Kitano , Koichi Obata , Hiroichi Inada , Nobuhiro Ogata
IPC分类号： B05D3/12
CPC分类号： G03F7/162 , H01L21/6715 , H01L21/68742 , H01L21/68785
摘要： A coating method includes holding a substrate in a horizontal state on a substrate holding member; supplying a coating liquid onto a front side central portion of the substrate held on the substrate holding member; rotating the substrate holding member about a vertical axis to spread the coating liquid supplied on the front side central portion of the substrate toward a front side peripheral portion of the substrate by a centrifugal force; and damping a wobble of the substrate being rotated, by a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate, while delivering a gas from the delivery port and sucking the gas into the suction port.
摘要翻译：一种涂布方法，包括：在基板保持部件上将基板保持为水平状态; 将涂布液供给到保持在所述基板保持部件上的所述基板的前侧中央部; 使基板保持部件绕垂直轴旋转，通过离心力向基板的前侧中央部供给的涂布液扩散; 通过包括气体输送口和吸入口的摆动阻尼机构来抑制基板的摆动，所述气体输送口和吸入口均设置成面对基板的背面，同时从输送口输送气体并将气体吸入吸入口港口。

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