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    • 62. 发明专利
    • METHOD FOR FORMING PROTRUDENT ELECTRODE
    • JPH03250629A
    • 1991-11-08
    • JP4545890
    • 1990-02-28
    • HITACHI LTDHITACHI VLSI ENG
    • AKASAKI HIROSHIISHIDA TAKASHI
    • H01L21/60H01L21/321
    • PURPOSE:To simplify a process and attain a refined pitch and further, reduce a cost by covering the whole surface of a wafer after forming base metallic parts with a metallic film for forming protrudent electrodes and then, forming the protrudent electrodes selectively on the base metallic parts through partitioning the metallic film for forming protrudent electrodes. CONSTITUTION:A protection film 2 on electrodes 1 is bored, and BLMs(Ball Limiting Metalization) 3 are formed thereon. Then, a solder film 4 of a desired film thickness and a desired composition is formed by a vacuum evaporation and the like. A groove 6 for partitioning the solder film is formed on the boundary between the solder films 4 by projecting a laser beam 5 on it. By heating the solder films 4 to a solder fusing temperature after coating the surfaces of the solder films 4 with fluxes, semi-spherical solder bumps 7 are obtained on the BLMs 3 by virtue of surface tensions. Making the groove 6 for partitioning the solder film form the boundary, the solder film 4 shrinks into the right and left part respectively. Then, they change into sphere-like parts, each of which forms the shape in that the surface area is shrinked into the minimum one, on the BLMs 3 having good wettabilities for the solder films. In such a manner, by the fine working using the laser beam, the solder film formed on the whole surface of a wafer is partitioned all over the surface, and can be changed into the solder bumps.
    • 63. 发明专利
    • SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
    • JPH03142847A
    • 1991-06-18
    • JP27969689
    • 1989-10-30
    • HITACHI LTD
    • ISHIDA TAKASHI
    • H05K1/18H01L21/60
    • PURPOSE:To restrain a concentration of a thermal stress generated by a difference in a coefficient of thermal expansion by a method wherein a connecting member is formed as a needle-shaped electrode of a linear structure, one end side of it is connected to an electrode part of a wiring board and the other end side is connected to an electrode part of a semiconductor chip. CONSTITUTION:A wire 8 of a prescribed length is first passed through a wiring hole 11 in a wiring board 2; one end side of the wire 8 is pressure-bonded to an electrode 9 of the wiring board 2; a needle-shaped electrode 7 is formed. The other end side of the wire 8 is pressure-bonded to a corresponding chip electrode 4 of a semiconductor chip 1 which is fixed and bonded to a heat sink 5. Thereby, the chip electrode 4 of the semiconductor chip 1 and the electrode 9 of the wiring board 2 are connected electrically by using the needle- shaped electrode 7; In addition, all wires 8 of the wiring board 2 are pressure- bonded; after that, the semiconductor chip 1 connected to the wiring board 2 via needle-shaped electrodes 7 are sealed airtightly by using a cap 3 via sealing members 10. Thereby, a semiconductor integrated circuit device of a modular structure can be manufactured.
    • 64. 发明专利
    • SEMICONDUCTOR DEVICE COOLING METHOD AND SEMICONDUCTOR DEVICE
    • JPH0330457A
    • 1991-02-08
    • JP16398089
    • 1989-06-28
    • HITACHI LTDHITACHI VLSI ENG
    • AKASAKI HIROSHIISHIDA TAKASHIOTSUKA KANJI
    • H01L23/427
    • PURPOSE:To improve a semiconductor device in cooling efficiency and reliability, to make a cooling structure simple and miniaturized, and to protect it against corrosion and contamination caused by coolant by a method wherein specific liquid is supplied to the heat releasing part of the semiconductor device and vaporized, and the heat releasing part is cooled by latent heat of vaporization. CONSTITUTION:Specific liquid 4 is supplied to a heat releasing part 2b of a semiconductor device and vaporized, and the heat releasing part 2b is cooled by the latent heat of vaporization. For instance, liquefied CO2 4 spouted out from a liquid feed opening 3a of a liquid feed nozzle 3 is uniformly sprayed on the rear side 2b of the semiconductor chip 2, and when the fine particles of liquefied CO2 4 are vaporized, they absorb heat released from the rear side 2b of the semiconductor ship 2 as latent heat of vaporization, whereby heat exchange takes place at the surface to turn liquefied CO2 into CO2 gas 5 to cool the semiconductor chip 2. Vaporized CO2 gas 5 is exhausted through an exhaust vent 8 of a vaporizing chamber 7, introduced into a compression liquidizing mechanism 10 passing through a circulation tube 9, liquefied by compression and returned to the liquid feed nozzle 3, and spouted out again from the liquid feed opening 3a against the rear side 2b of the semiconductor chip 2.
    • 66. 发明专利
    • COOLING OF SEMICONDUCTOR DEVICE
    • JPH02180057A
    • 1990-07-12
    • JP19489
    • 1989-01-04
    • HITACHI LTD
    • ISHIDA TAKASHIYAMASHITA MANABU
    • H01L23/373H01L23/427
    • PURPOSE:To improve cooling efficiency by bringing a cooling medium directly vaporizing from a solid into directly contact with a heating part of a semiconductor device in order to cool the heating part. CONSTITUTION:Carbon dioxide 20 in a solid state powdered by a powdering processing device 11 of a cooling medium is supplied to a heating part of a semiconductor device 1 while interposing a powder supply tube 12. Then, the heating part of a semiconductor device 1, that is, a semiconductor pellet 3 is arranged inside a cooling part 13 while being sheltered from the open air. Accordingly, as compared with a liquid cooling medium, a vaporization layer to be formed between the heating part and the cooling medium can be reduced, or existence of the vaporization layer can be partly in an instant extinguished. Thereby, a calorie to be emitted to the cooling medium from the heating part of the semiconductor device increases so that cooling efficiency can be improved.
    • 67. 发明专利
    • SEMICONDUCTOR DEVICE
    • JPH01270252A
    • 1989-10-27
    • JP9811888
    • 1988-04-22
    • HITACHI LTD
    • ISHIDA TAKASHI
    • H01L23/29H01L23/28H01L23/36
    • PURPOSE:To elevate adhesion with a semiconductor pellet and a heat radiator with simple constitution and improve heat radiation efficiency by filling with gel resin in a gap between the heat conducting surface of a heat radiator equipped with a heat conducting surface with an area larger than that of a semiconductor pellet and the wiring board surface. CONSTITUTION:A heat radiator 8, which is mounted on the back of an integrated circuit forming surface 3a and equipped with a heat conducting surface with an area larger than that of a semiconductor pellet 3, is provided to the semiconductor pellet 3 which is mounted through a bump electrode 4 in the condition that the integrated circuit forming face 3a is opposed to a wiring board 5. And gel resin 10 is filled in between the heat conducting surface 8b of this heat radiator 8 and the wiring board face 5. Hereby, adhesion between the heat radiator 8 and the semiconductor pellet 3 can be elevated, and the contact condition between the back of the semiconductor pellet 3 and the heat conducting surface of the heat radiator 8 can be maintained without using a bonding means such as metallization, etc. Also, cooling efficiency of the conductor pellet 3 can be improved and reliability in operation of the semiconductor device can be improved.
    • 68. 发明专利
    • SEMICONDUCTOR DEVICE AND MANUFACTURE THEREOF
    • JPS63293931A
    • 1988-11-30
    • JP12828587
    • 1987-05-27
    • HITACHI LTD
    • SAWARA KUNIZOOTSUKA KANJIISHIDA TAKASHI
    • H01L23/34H01L21/60
    • PURPOSE:To improve remarkably heat dissipation characteristics, by performing the heat dissipation from a semiconductor region in which heat dissipation bump is used, via an insulating film composed of diamond having superior thermal conductivity. CONSTITUTION:A diamond thin film 11 is formed on the surface of a mother chip 1. A heat dissipating bump 9 is fixed on the diamond thin film 11 via a bonding metal 12, and connected to a sub-chip 3. A heat dissipating fin 16 is fixed on the surface of a substrate 2 opposite to the surface on which the mother chip 1 is fixed. The diamond thin film 11 is preferably formed by electron beam CVD method. The heat generated from a semiconductor active region 17 of the sub-chip 3 is dissipated through the diamond insulating film 11, the heat dissipating bump 9, the mother chip 1, the substrate 2 of a package, and the heat dissipating fin 16. As the thermal conductivity of the diamond thin film 11 is superior, a multichip module whose heat dissipation characteristics are excellent can be obtained.
    • 69. 发明专利
    • FLIP CHIP
    • JPS63107145A
    • 1988-05-12
    • JP25167586
    • 1986-10-24
    • HITACHI LTD
    • ISHIDA TAKASHISATO TOSHIHIKO
    • H01L21/60
    • PURPOSE:To prevent the peel-off between metal layers in ground layers beneath an electrode and to improve the life of the electrode, by forming a meniscus part at the lower edge part of the ground layer of the electrode in a flip chip having a protruding electrode. CONSTITUTION:The surface of a planar element, in which inner electrode wiring 3 consisting of an Al electrode wiring is formed, is coated with a protecting film 4 consisting of an SiO2 film, a glass film and the like. An electrode window is provided in the protecting film 4. A Cr layer 6 is constituted by chemical dry etching so as to form a meniscus 11 at the inner skirt of an egdge part 10 of the window. Then sputtering or ion milling is performed when a Cu layer 7 and an Au layer 8 are formed. As a result, the side walls of the end parts of the etched Cu layer 7 and Au layer 8 are vertically etched with respect to the protecting film 4. Stress concentration is made less by the formation of the meniscus 11 in this way, and the peel-off of the Cr layers from the other layer 5 can be prevented.