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    • 6. 发明专利
    • PLASMA DRY ETCHING DEVICE
    • JPH0750291A
    • 1995-02-21
    • JP19496393
    • 1993-08-05
    • HITACHI LTD
    • ISHIDA TAKASHI
    • C23F4/00H01L21/302H01L21/3065
    • PURPOSE:To perform etching under the optimum conditions by keeping a fixed distance between plasma and a semiconductor wafer. CONSTITUTION:High-frequency waves are applied on parallel flat electrodes 4 from a high-frequency generating means 5, and a plasma discharge area is detected by a detecting means 7. When the detection signal is too far from the prescribed position of a semiconductor wafer 6, the high-frequency power of the high-frequency generating means 5 is increased and when the detection signal is closer than the prescribed position of the semiconductor wafer, the high-frequency power of the high-frequency generating means 5 is reduced. Thus, a control means 8 performs automatic control and a distance between the plasma area and the semiconductor wafer is always kept fixed. The constitutive component in a vacuum process chamber 1 and a chamber 1a which is a container for shielding the inside of the chamber from the outside air and keeping the atmosphere are all composed of quartz.
    • 7. 发明专利
    • JPH05312731A
    • 1993-11-22
    • JP11443392
    • 1992-05-07
    • HITACHI LTD
    • ISHIDA TAKASHISATO MASAYUKINORITOMI TOYOSHIGE
    • G01B11/30G01N21/88G01N21/956H01L21/66
    • PURPOSE:To improve the accuracy of detection of the defects of an object which has fine defects such as protrusions and burrs by a method wherein a light is applied to the object placed between a light source and a mirror plane and a reflected light from the surface of the defect and the reflected light from the neighborhood of the defect are detected. CONSTITUTION:A mirror plane 6 is provided on the top surface of an XY-table 1 which positions a semiconductor chip 2. A light source 7, a half-mirror 8 and a photodetector 9 are provided above the XY-table 1. A laser beam is applied to the mirror plane 6 vertically from the light source 7 and the reflected light is refracted by a half-mirror 8 and detected by the photodetector 9. The laser beam applied to the surface of a burr 5 produced by the dicing process of a semiconductor wafer makes diffused reflection and only a part of the reflected light enters the photodetector 9. To the contrary, the most part of the laser beam which is transmitted near the burr 5 and reflected by the mirror plane 6 enters the photodetector 9. Therefore, a high contrast between the two detected reflected lights is created, so that the size and surface shape of the burr 5 can be detected with a high accuracy.
    • 10. 发明专利
    • Semiconductor device
    • 半导体器件
    • JPS61125141A
    • 1986-06-12
    • JP24601684
    • 1984-11-22
    • Hitachi Ltd
    • ISHIDA TAKASHISAWARA KUNIZO
    • H01L21/60
    • H01L24/81H01L2224/16H01L2224/81801
    • PURPOSE:To improve the heat radiation efficiency by connecting the bump electrodes for signal with the wiring on the dielectric layer of low dielectric constant on the package substrate or with the wiring on the semiconductor substrate to mount chips and by connecting the bump electrodes for power supply or grounding directly with the wiring on the package substrate. CONSTITUTION:The wiring 2 for power supply or grounding is installed on the surface of the package substrate 1 of silicon carbide. The low dielectric constant layer 3 decreases the effect of high dielectric constant of the package substrate 1. The signal electrode of the semiconductor chip 6 is electrically connected with the wiring 4 for signal by the bump electrode 5 for signal. The electrode for power supply or grounding is connected with the wiring 2 by the bump electrode 7. The heat generated in the semiconductor chip 1 conducts efficiently to the package substrate 1 through the bump electrode 7 for power supply or grounding whose thermal resistance is made small by making the radius large.
    • 目的:通过将信号用凸块电极与介质层上介质层上的布线连接在封装基板上或半导体基板上的布线上,通过连接凸块电极进行电源连接,提高散热效率 或直接与封装基板上的布线接地。 构成:用于电源或接地的布线2安装在碳化硅封装基板1的表面上。 低介电常数层3降低了封装基板1的高介电常数的影响。半导体芯片6的信号电极与布线4电连接,通过凸块电极5进行信号的信号。 用于供电或接地的电极通过凸块电极7与布线2连接。半导体芯片1中产生的热量通过其耐热性小的用于电源或接地的凸块电极7有效地传导到封装基板1 通过使半径大。